CN101784961B - 采用含亲水性聚合物的显影剂溶液对平版印刷版的冲洗 - Google Patents

采用含亲水性聚合物的显影剂溶液对平版印刷版的冲洗 Download PDF

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Publication number
CN101784961B
CN101784961B CN200880104054.5A CN200880104054A CN101784961B CN 101784961 B CN101784961 B CN 101784961B CN 200880104054 A CN200880104054 A CN 200880104054A CN 101784961 B CN101784961 B CN 101784961B
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China
Prior art keywords
developer
weight
coating
alkyl
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CN200880104054.5A
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English (en)
Chinese (zh)
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CN101784961A (zh
Inventor
B·施特雷梅尔
C·辛普森
O·皮斯特特
H·鲍曼
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Eastman Kodak Co
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Eastman Kodak Co
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Publication of CN101784961A publication Critical patent/CN101784961A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CN200880104054.5A 2007-08-23 2008-08-21 采用含亲水性聚合物的显影剂溶液对平版印刷版的冲洗 Expired - Fee Related CN101784961B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP07114864.7 2007-08-23
EP07114864A EP2028548B1 (en) 2007-08-23 2007-08-23 Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer
PCT/EP2008/060930 WO2009024592A1 (en) 2007-08-23 2008-08-21 Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer

Publications (2)

Publication Number Publication Date
CN101784961A CN101784961A (zh) 2010-07-21
CN101784961B true CN101784961B (zh) 2013-06-19

Family

ID=38961054

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200880104054.5A Expired - Fee Related CN101784961B (zh) 2007-08-23 2008-08-21 采用含亲水性聚合物的显影剂溶液对平版印刷版的冲洗

Country Status (7)

Country Link
US (1) US8652759B2 (https=)
EP (1) EP2028548B1 (https=)
JP (1) JP2010537238A (https=)
CN (1) CN101784961B (https=)
DE (1) DE602007005475D1 (https=)
ES (1) ES2339394T3 (https=)
WO (1) WO2009024592A1 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5422146B2 (ja) * 2008-03-25 2014-02-19 富士フイルム株式会社 平版印刷版作成用処理液および平版印刷版原版の処理方法
JP2010097175A (ja) * 2008-09-22 2010-04-30 Fujifilm Corp 平版印刷版の作製方法及び平版印刷版原版
ATE555904T1 (de) 2009-08-10 2012-05-15 Eastman Kodak Co Lithografische druckplattenvorläufer mit betahydroxy-alkylamid-vernetzern
EP2293144B1 (en) 2009-09-04 2012-11-07 Eastman Kodak Company Method of drying lithographic printing plates after single-step-processing
JP5541913B2 (ja) * 2009-12-25 2014-07-09 富士フイルム株式会社 平版印刷版の作製方法
JP5346845B2 (ja) * 2010-02-26 2013-11-20 富士フイルム株式会社 平版印刷版の作製方法及び平版印刷版原版用現像液
EP2693270B1 (en) * 2011-03-28 2015-12-09 FUJIFILM Corporation Method for producing lithographic printing plate
EP2869122A4 (en) * 2012-06-29 2016-03-02 Fujifilm Corp METHOD FOR CONCENTRATING PROCESS WASTEWATER AND RECYCLING PROCESS FOR WASTE WATER
JP5661136B2 (ja) * 2013-04-10 2015-01-28 富士フイルム株式会社 平版印刷版現像用処理液及び平版印刷版の作製方法
KR101759571B1 (ko) * 2017-04-10 2017-07-19 영창케미칼 주식회사 Euv용 감광성 포토레지스트 미세패턴 형성용 현상액 조성물
EP3392709A1 (en) 2017-04-21 2018-10-24 Agfa Nv A lithographic printing plate precursor
CN115612223B (zh) * 2021-07-15 2025-07-25 乐凯华光印刷科技有限公司 一种聚乙烯醇衍生物和聚丙烯酸树脂的杂化聚合物和一种耐化学品热敏版
CN119219844B (zh) * 2024-09-24 2025-11-11 苏州银炙新材料科技有限公司 一种防污显影涂层材料及其制备方法与应用

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5217813A (en) * 1990-12-14 1993-06-08 Basf Aktiengesellschaft Polyethyleneimine and polyvinylamine derivatives, aluminum-based substrate materials coated with these derivatives and the use thereof for the production of offset printing plates
EP1260866A2 (en) * 2001-05-18 2002-11-27 Kodak Polychrome Graphics Company Ltd. Additive composition for rinse water and method for surface treatment of lithographic printing plates
EP1457836A2 (en) * 2003-03-10 2004-09-15 Fuji Photo Film Co., Ltd. Developing solution for lithographic printing plate precursor and method for preparing lithographic printing plate
EP1521123A1 (en) * 2003-10-02 2005-04-06 Agfa-Gevaert Alkaline Developer for radiation sensitive compositions
EP1722275A1 (en) * 2005-05-10 2006-11-15 Agfa-Gevaert N.V. Method for processing lithographic printing plates

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4186250A (en) * 1975-04-07 1980-01-29 The Dow Chemical Company Method of desensitizing image-bearing lithographic plates
JPS54138705A (en) * 1978-04-18 1979-10-27 Mitsubishi Paper Mills Ltd Method of treating improved flat printing plate
US4873174A (en) * 1988-02-03 1989-10-10 Hoechst Celanese Corporation Method of using developer-finisher compositions for lithographic plates
JP4064055B2 (ja) * 2000-12-08 2008-03-19 富士フイルム株式会社 平版印刷版の製版方法
US6649319B2 (en) * 2001-06-11 2003-11-18 Kodak Polychrome Graphics Llc Method of processing lithographic printing plate precursors
JP2004109442A (ja) * 2002-09-18 2004-04-08 Fuji Photo Film Co Ltd 平版印刷版の製版方法
JP2004294987A (ja) * 2003-03-28 2004-10-21 Fuji Photo Film Co Ltd 感光性平版印刷版用現像液及び平版印刷版の製版方法
JP2005196143A (ja) * 2003-12-03 2005-07-21 Fuji Photo Film Co Ltd 感光性平版印刷版用現像液
DE602005012995D1 (de) * 2004-08-16 2009-04-09 Fujifilm Corp Flachdruckplattenvorläufer
DE102004041610B4 (de) * 2004-08-27 2006-09-07 Kodak Polychrome Graphics Gmbh Verfahren zur Herstellung einer Lithographie-Druckplatte
EP1810081B1 (en) * 2004-11-05 2020-01-08 Agfa Nv Photopolymerizable composition
DE102004057294A1 (de) * 2004-11-26 2006-06-01 Basf Drucksysteme Gmbh Verwendung von Polymeren, welche mit Säuregruppen modifizierte Aminogruppen aufweisen, zur Herstellung von Feuchtmitteln oder Feuchtmittelkonzentraten sowie in Feuchtmittelumläufen für den Offsetdruck
JP2006267340A (ja) * 2005-03-23 2006-10-05 Mitsubishi Paper Mills Ltd 平版印刷版の現像処理方法
EP2062737A1 (en) * 2007-11-20 2009-05-27 Eastman Kodak Company Processing of lithographic printing plates with hydrophilic polymer in finisher solution

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5217813A (en) * 1990-12-14 1993-06-08 Basf Aktiengesellschaft Polyethyleneimine and polyvinylamine derivatives, aluminum-based substrate materials coated with these derivatives and the use thereof for the production of offset printing plates
EP1260866A2 (en) * 2001-05-18 2002-11-27 Kodak Polychrome Graphics Company Ltd. Additive composition for rinse water and method for surface treatment of lithographic printing plates
EP1457836A2 (en) * 2003-03-10 2004-09-15 Fuji Photo Film Co., Ltd. Developing solution for lithographic printing plate precursor and method for preparing lithographic printing plate
EP1521123A1 (en) * 2003-10-02 2005-04-06 Agfa-Gevaert Alkaline Developer for radiation sensitive compositions
EP1722275A1 (en) * 2005-05-10 2006-11-15 Agfa-Gevaert N.V. Method for processing lithographic printing plates

Also Published As

Publication number Publication date
WO2009024592A1 (en) 2009-02-26
US8652759B2 (en) 2014-02-18
DE602007005475D1 (de) 2010-05-06
EP2028548B1 (en) 2010-03-24
EP2028548A1 (en) 2009-02-25
CN101784961A (zh) 2010-07-21
ES2339394T3 (es) 2010-05-19
US20100190110A1 (en) 2010-07-29
JP2010537238A (ja) 2010-12-02

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Granted publication date: 20130619

Termination date: 20160821