CN101752358B - 带有整合旁路电容器的紧密半导体封装及其方法 - Google Patents

带有整合旁路电容器的紧密半导体封装及其方法 Download PDF

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CN101752358B
CN101752358B CN2009102538709A CN200910253870A CN101752358B CN 101752358 B CN101752358 B CN 101752358B CN 2009102538709 A CN2009102538709 A CN 2009102538709A CN 200910253870 A CN200910253870 A CN 200910253870A CN 101752358 B CN101752358 B CN 101752358B
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CN101752358A (zh
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弗兰茨娃·赫尔伯特
刘凯
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Chongqing Wanguo Semiconductor Technology Co ltd
Alpha and Omega Semiconductor Ltd
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Abstract

本发明提出了一种带有整合旁路电容器的顶部散热的紧密半导体封装。顶部散热的紧密半导体封装包括一个带有终端引线的电路衬底、各种连接在电路衬底上的半导体芯片、各种用于连接和互联半导体芯片顶部接触区和电路衬底的高度-自适应的互联板、具有第一平顶区域的第一高度-自适应互联板结构以及具有和第一平顶区域一样高的第二平顶高度的第二高度-自适应互联板结构,一个末端带有两个电容器端子的旁路电容器,堆积在两个互联板结构上,并通过第一平顶区域和第二平顶区域连接在互联板结构上,以便减少互联寄生阻抗。

Description

带有整合旁路电容器的紧密半导体封装及其方法
技术领域
本发明涉及电子系统封装领域。更确切地说,本发明用于半导体晶片的物理级封装。
背景技术
由于具有高集成密度、相当低的静态漏电流以及不断提升的功率容量,功率金属氧化物半导体场效应管仍然广泛应用于开关电源和变频器等电力电子学领域。而且功率金属氧化物半导体场效应管还具有许多非常重要的特点,比如:不断增加的集成度、日益减小的封装尺寸以及随之而来的消费者市场上对于散热不断提高的要求。
下面列举一些美国申请12/326,065中提到的相关原有技术:
“DirectFET”技术(美国专利6,624,522,美国专利7,285,866和美国专利申请公开2007/0284722);
名为“含有漏极夹片的半导体芯片封装”的美国专利6,777,800;
相同受让人的名为“具有互联压窝板的半导体封装”的美国申请11/799,467;
名为“带有直连引线的集成电路芯片封装”的美国专利6,249,041;
名为“功率器件的自定心电极”的美国专利4,935,803;
相同受让人的名为“具有互联桥板的半导体封装”的美国专利申请公开20080087992;
相同受让人的名为“用于半导体设备封装的导电夹片”的美国专利申请号12/130,663;
相同受让人的名为“带有窗式阵列的顶部曝光夹片”的美国专利申请号12/237953;
在2008年5月18-22日,于佛罗里达州奥兰多市举行的第20届关于功率半导体设备&集成电路的国际研讨会的IEEE会议论文集的第315-318页,T.Hashimoto等人发表了一篇名为“带有贴装电容的用于稳压器中减小的寄生电感的系统级封装”的论文,该论文提出了一种用于稳压器(VR)的贴装输入电容的先进的系统级封装(SiP)。为了便于叙述,下文中将该论文简称为“IEEE论文”。图1来自于IEEE论文,一个含有寄生电感(Ls1-Ls6)的单相稳压电路以及一个系统级封装(SiP),此封装带有高边和低边金属氧化物半导体场效应管和一个驱动集成电路。相应地,图1A和图1B分别为在印刷电路板(PCB)上的系统级封装(SiP)的横截面示意图。
在图1A所示的系统级封装(SiP)中,输入电容贴装于印刷电路板上,金属氧化物半导体场效应管通过铜引脚连接到引线框上。由于从输入电容到系统级封装之间存在寄生电感(图1中的Ls1和Ls6),由此算出系统级封装的寄生电感为0.87nH。在图1B所示的贴装输入电容的先进的系统级封装中,由于从输入电容到系统级封装之间存在一个微型回路,因此寄生电感减小了50%以上(从0.87nH减小至0.39nH)。金属氧化物半导体场效应管的上层电极(即高边金属氧化物半导体场效应管的漏极与低边金属氧化物半导体场效应管的源极)通过贴装输入电容的铜引脚连接在引线框上。高边和低边金属氧化物半导体场效应管贴装在同一个引线框上,引线框连接在输出电感上。将高边金属氧化物半导体场效应管晶片翻转,以使其漏极朝上,便于连接到输入电容的正极端子上。图1B所示的先进的系统级封装的另一优点在于,其贴装电容的等效串联电阻(ESR)较低,有利于降低谐振电流带来的电容损失。
因此,IEEE论文中所述的封装概念,是基于标准底部漏极金属氧化物半导体场效应管晶片的倒装晶片方法。铜引脚用于将金属氧化物半导体场效应管晶片的顶部连接到引线框上。就IEEE论文中提供的照片来看,尽管关于输入电容Cin是如何贴装在系统级封装的顶部上的结构细节较为有限,但是并没有证据可以证明系统级封装在用于增大输入电容顶部散热的微型接触孔外面的顶部曝光。另一结论是:除了输入电容Cin的末端之外,IEEE论文中所述的系统级封装,在高边和低边金属氧化物半导体场效应管芯片的上方,并没有大范围的顶部曝光。
因此,鉴于以上所述的原有技术,在降低系统级封装的寄生电感与电阻、降低其输入电容的等效串联电阻(ESR)、以及减少其封装热阻的同时,仍然十分需要进一步减小带有整合输入电容功率半导体器件系统级封装的尺寸。
发明内容
本发明提出了一种带有整合旁路电容器的紧密半导体封装。此紧密半导体封装包括:
一个带有数个终端引线的电路衬底,用于外部电接线;
数个底面连接在电路衬底上面的半导体芯片;
数个高度-自适应的互联板,用于将每个半导体芯片的顶部接触区连接和互联至电路衬底上,在三维成型的同时,适应顶部接触区和电路衬底之间的高度差,于是形成顶部接触区与终端引线之间的电接线;
第一个高度-自适应的互联板结构具有一个第一平顶区域,第二个高度-自适应的互联板结构具有一个第二平顶区域,此区域与第一平顶区域一样高;
一个带有两个末端电容器端子的旁路电容器,堆积在两个互联板结构上,并通过第一平顶区域和第二平顶区域连接在互联板结构上。
所述的两个末端电容器端子,可以位于电容器的对面末端处,可以是缠绕结构,或者仅仅位于电容器的底面上。
作为一种实质结构变化的形式,高度-自适应的互联板分为:
第一低热阻紧密互联板,用于将半导体芯片的顶部接触区同电路衬底连接和互联。
第二低热阻堆积式互联板的每一个互联板都堆积、互联在选定的紧密互联板上,以便增加紧密半导体封装的有效顶端散热,并/或优化与旁路电容器的连接。
此结构可以细化为,紧凑半导体的封装含有一种成型封装剂,用于密封半导体封装的大部分,只曝光平顶区域的顶部。或者,也可选用成型封装剂密封半导体封装的大部分,只曝光旁路电容器的顶部,以保持有效的顶端散热。
此结构可以改进为,至少一个堆积式互联板的顶部,在其连接紧密互联板的相应位置处含有一个外围突出部。此突出部最大限度地占据了堆积式互联板的顶面积,用于为下面的紧密互联板散热,而不受其他区域的限制。同样道理,每个紧密互联板的形状和尺寸都不依赖于它对应的堆积式互联板的顶面积,以使它们在半导体芯片上相应的连接面积达到最大,这就降低了它们的关联扩散电阻。可以通过部分刻蚀堆积式互联板的底面,制造外围突出部。也可以通过三维成型一个堆积式互联板,制造外围突出部。
另一典型实施例是,紧密互联板或堆积式互联板包含数个锁扣环,这些锁扣环同周围的数个终端引线互相啮合,以使半导体芯片在半导体封装过程中的旋转蠕动最小。
另一典型实施例是,电路衬底可以是一个带有导电芯片座的引线框,以便连接半导体芯片。或者,电路衬底也可以是一个带有数个散热孔的叠片电路,以便增强底部散热。
另一典型实施例是,半导体芯片和旁路电容器都是功率转换电路输出级的组成元件,其中半导体芯片包含一个源极位于底部的高边(BSHS)金属氧化物半导体场效应管和一个低边(LS)金属氧化物半导体场效应管。
本发明提出了另一种可选的带有整合旁路电容器的紧密半导体封装,它包括:
一个带有第一终端引线的电路衬底,以便外部电接线;
第一高度-自适应的互联板,以便与半导体芯片的顶部接触区连接,形成用于外部电接线的第二终端引线,在三维成型的同时,适应顶部接触区和第二终端引线之间的高度差。
第一高度-自适应互联板的第一互联板结构具有一个第一平顶区域,第二高度-自适应互联板的第二互联板结构具有一个第二平顶区域,此区域与第一平顶区域一样高。
一个带有两个末端电容器端子的旁路电容器,堆积在两个互联板结构上,并通过第一平顶区域和第二平顶区域连接在互联板结构上。
本发明提出了一种半导体封装方法,此封装含有一个旁路电容器,以及数个同高度-自适应的紧密互联板和高度-自适应的堆积式互联板相互连接的半导体芯片。这种方法包括:
a)制备一个带有数个终端引线的电路衬底,以便外部电接线;
b)制备半导体芯片,并贴装在电路衬底上;
c)在半导体芯片和电路衬底的顶部接触区,制备并贴装数个紧密互联板,以便在顶部接触区和终端引线之间的电接线;
d)在所选的数个紧密互联板上,制备并贴装数个堆积式互联板,同时确保第一堆积式互联板具有一个第一平顶区域,第二堆积式互联板具有一个第二平顶区域,且与第一平顶区域相持平;
e)在封装过程中,使密封剂成型;
f)除去顶部成型密封剂,使得第一平顶区域和第二平顶区域的顶面完全裸露;
g)制备末端带有两个终端电容端子的旁路电容器,在两个堆积式互联板的结构上,通过第一平顶区域和第二平顶区域,堆积并连接旁路电容器。
封装方法的另一种方案是,上述的e)和f)可以用以下替代:
e)在第一平顶区域和第二平顶区域的顶面上沉积一层可分离的掩膜;
f)在封装过程中,使密封剂成型,然后除去可分离的掩膜,使得第一平顶区域和第二平顶区域的顶面完全裸露。
封装方法的另一种方案是,上述的e)、f)和g)可以用以下替代:
e)制备末端带有两个终端电容端子的旁路电容器,在两个堆积式互联板的结构上,通过第一平顶区域和第二平顶区域,堆积并连接旁路电容器;
f)在封装过程中,使密封剂成型;
g)任选,除去顶部成型密封剂,使得第一平顶区域和第二平顶区域的顶面完全裸露。
对于本领域的技术人员而言,本发明及其数个实施例将在说明书的以下内容中详细阐述。
附图说明
图1为一个IEEE论文中原有技术的单相稳压器电路,含有一个配有高边和低边金属氧化物半导体场效应管以及驱动集成电路的系统级封装;
图1A和图1B为IEEE论文中原有技术的印刷电路板上的系统级封装的两个对应的横截面示意图;
图2为本发明的第一部分的半导体封装,在一个引线框上含有两个半导体芯片;
图3A至图3D为本发明的四个其他部分的半导体封装,在一个引线框上,每个封装都包含两个半导体芯片;
图4A至图4B为本发明的一种完整的带有成型密封剂的紧密半导体封装;
图5表示本发明的一种可选的带有成型密封剂的紧密半导体封装。
具体实施方式
本文所含的上述及以下说明和附图,仅仅关注一个或多个本发明当前的最佳实施例,并对一些典型的可选择的方法与/或可选的实施例加以说明。因此,本说明和附图仅用作解释说明,并不能以此局限本发明的范围。本领域的技术人员可以轻松识别各种变化、修改以及替换。这些变化、修改和替换应被认为属于本发明的保护范围。
图2表示本发明的一个含有半导体芯片一520a和半导体芯片二520b的第一部分半导体封装500。第一部分的半导体封装500包括:
一个电路衬底,即本图中的引线框502,含有数个终端引线506a和506b,以便外部电接线;
半导体芯片一520a和半导体芯片二520b的底面分别通过其芯片座一504a和芯片座二504b连接在引线框502上。也可选择,在一个芯片座上同时容纳两个半导体芯片520a和520b;
一个低热阻、低电阻的紧密互联板一526a,用于将半导体芯片一520a的顶部接触区和引线框502连接并互联,在三维成型的同时,适应顶部接触区和引线框之间的高度差,于是形成半导体芯片一520a顶部接触区与终端引线506a之间的电接线;
同样地,一个低热阻、低电阻的紧密互联板二526b,用于将半导体芯片二520b的顶部接触区和引线框502连接并互联,在三维成型的同时,适应顶部接触区和引线框之间的高度差,于是形成半导体芯片一520b顶部接触区与终端引线506b之间的电接线;
一个低热阻的堆积式互联板一530a,通过粘合剂528a或一种相似的材料,堆积并连接在紧密互联板526a上,以便增加部分半导体封装的有效顶端散热。同样地,一个低热阻的堆积式互联板二530b,通过粘合剂528b或一种相似的材料,堆积并连接在紧密互联板526b上,以便增加部分半导体封装的有效顶端散热。应当注意到,堆积式互联板一530a具有一个第一平顶区域534a,堆积式互联板二530b具有一个第二平顶区域534b,它同第一平顶区域534a一样高。还应当注意到,堆积式互联板一530a的顶部具有一个底面部分刻蚀的外围突出部532a,532a位于紧密互联板一526a上方,而且堆积式互联板二530b的顶部具有一个底面部分刻蚀的外围突出部532b,532b位于紧密互联板二526b上方。此设计也可变为,通过堆积式互联板的三维成型,产生外围突出部。正如美国申请12/326,065中所述,紧密互联板和堆积式互联板,同带有外围突出部的堆积式互联板相互连接,这种连接会使用于散热的平顶区域裸露的面积达到最大,而不受来自于下面紧密互联板的其他区域的限制。它们的相互连接还会使芯片-终端引线之间的电阻和芯片-外界环境之间的热阻都达到最小,同时增加顶端芯片电极的数量,并提升高度较低的板的性能。与本发明的一个实施例一致,成型密封剂535覆盖了部分半导体封装的除了第一和第二平顶区域534a和534b以外的大部分区域。经由此例,半导体芯片一520a可以是一个低边(LS)金属氧化物半导体场效应管,半导体芯片二520b可以是一个高边(HS)金属氧化物半导体场效应管。
图3A至图3D表示本发明的另外四个部分半导体封装600、700、800和900,其中每一个都含有位于引线框上的两个半导体芯片。图3A中的部分半导体封装600在引线框602上封装了半导体芯片一620a和半导体芯片二620b。紧密互联板一626a和堆积式互联板一630a,用于将半导体芯片一620a的顶部接触区的大部分区域和引线框602的终端引线606b相互连接起来。紧密互联板二626b和堆积式互联板二630b,用于将半导体芯片二620b的顶部接触区的大部分区域和引线框602的终端引线606f、606g以及606h相互连接起来。另外,还有一个额外的互联板626c,用于将半导体芯片一620a的顶部接触区的小部分区域和引线框602的终端引线606a相互连接起来。例如,顶部接触区的小部分区域如果是金属氧化物半导体场效应管半导体芯片的顶部栅极接点,那么这时额外的互联板626c就是一个栅极夹片。连接线622b用于将半导体芯片二620b的顶部接触区的小部分区域和引线框602的引线606e相互连接起来。应当注意到,堆积式互联板一630a具有一个第一平顶区域634a,堆积式互联板二630b具有一个第二平顶区域634b,634b与第一平顶区域634a一样高。
图3B中的部分半导体封装700在引线框702上封装了半导体芯片一720a和半导体芯片二720b。紧密互联板一726a和堆积式互联板一730a,用于将半导体芯片一720a的顶部接触区的大部分区域和引线框702的终端引线706b相互连接起来。紧密互联板二726b和堆积式互联板二730b,用于将半导体芯片二720b的顶部接触区的大部分区域和引线框702的终端引线706f、706g以及706h相互连接起来。另外,连接线一722a用于将半导体芯片一720a的顶部接触区的小部分区域和引线框702的引线706a相互连接起来,连接线二722b用于将半导体芯片二720b的顶部接触区的小部分区域和引线框702的引线706e相互连接起来。应当注意到,堆积式互联板一730a具有一个第一平顶区域734a,堆积式互联板二730b具有一个第二平顶区域734b,734b与第一平顶区域734a一样高。还应当注意到,堆积式互联板一730a具有一个底面部分刻蚀的外围突出部732a,堆积式互联板二730b也具有一个底面部分刻蚀的外围突出部732b,它们同连接线一722a和连接线二722b具有相同特性。
图3C中的部分半导体封装800在引线框802上封装了半导体芯片一820a和半导体芯片二820b。紧密互联板一826a和堆积式互联板一830a,用于将半导体芯片一820a的顶部接触区的大部分区域和引线框802的终端引线806b相互连接起来。紧密互联板二826b和堆积式互联板二830b,用于将半导体芯片二820b的顶部接触区的大部分区域和引线框802的终端引线806f、806g以及806h相互连接起来。另外,连接线一822a用于将半导体芯片一820a的顶部接触区的小部分区域和引线框802的引线806a相互连接起来,连接线二822b用于将半导体芯片二820b的顶部接触区的小部分区域和引线框802的引线806e相互连接起来。应当注意到,堆积式互联板一830a具有一个第一平顶区域834a,堆积式互联板二830b具有一个第二平顶区域834b,834b与第一平顶区域834a一样高。第二,堆积式互联板一830a和堆积式互联板830b分别具有顶面压窝831a和831b,用于锁住在紧密互联板一826a和紧密互联板二826b上的底部压窝(图中没有画出),以便减小相关的粘着应力,增强相关的粘着剂流动。另外,美国申请12/326,065中所述的锚定孔、梳状物和窗户之间平面外的导电桥等高度较低的结构的其他特性也可以加入到任一或全部堆积式互联板上。第三,堆积式互联板二830b具有一个锁扣环829b,829b的位置和尺寸取决于,堆积式互联板二830b与紧密互联板二826b的连接,要使得锁扣环同周围的终端引线806f和806g互相啮合,以便半导体芯片二820b和紧密互联板二826b在部分半导体封装800的封装过程中产生的旋转蠕动最小。堆积式互联板一830a有一个类似的锁扣环829a。第四,堆积式互联板一830a和堆积式互联板二830b的顶部区域是特制的,它们分别略小于紧密互联板一826a和紧密互联板二826b的顶部区域,以致于产生一系列狭长带828a和828b。在接下来密封带有成型密封剂的部分半导体封装800时,这些狭长带828a和828b将用于增强成型密封剂在部分半导体封装800上的粘着力。
图3D中的部分半导体封装900在引线框902上封装了半导体芯片一920a和半导体芯片二920b。紧密互联板一926a和堆积式互联板一930a,用于将半导体芯片一920a的顶部接触区的大部分区域和引线框902的终端引线906b相互连接起来。紧密互联板二926b和堆积式互联板二930b,用于将半导体芯片二920b的顶部接触区的大部分区域和引线框902的终端引线906f、906g以及906h相互连接起来。另外,连接线一922a用于将半导体芯片一920a的顶部接触区的小部分区域和引线框902的引线906a相互连接起来,连接线二922b用于将半导体芯片二920b的顶部接触区的小部分区域和引线框902的引线906e相互连接起来。应当注意到,堆积式互联板一930a具有一个第一平顶区域934a,堆积式互联板二930b具有一个第二平顶区域934b,934b与第一平顶区域934a一样高。另外,堆积式互联板二930b具有一个锁扣环929b,929b的位置和尺寸取决于,当堆积式互联板二930b连接在紧密互联板二926b上时,要使得锁扣环同周围的终端引线906f和906g互相啮合,以便半导体芯片二920b和紧密互联板二926b在部分半导体封装900的封装过程中产生的旋转蠕动最小。堆积式互联板一930a有一个类似的锁扣环929a。
图4A和图4B表示本发明的带有成型封装剂1030的紧密半导体封装1000a的完整形式。图4A中,部分半导体封装1000,可通过将成型密封剂1030在本发明之前所述的任意一个部分半导体封装(图2A、图3A至图3D)上注塑成型,然后除去成型密封剂1030的顶部,直到它们对应的堆积式互联板的第一平顶区域1034a和第二平顶区域1034b裸露出来,这样才能保持有效的顶部散热。基础引线框1002的各种终端引线1006e、1006f、1006g和1006h也必定通过成型密封剂1030裸露出来,便于进行外部电接线。旁路电容器1050的末端带有两个末端电容端子1050a和1050b,然后将旁路电容器1050堆积并连接在两个平顶区域1034a和1034b上。它的末端电容端子1050a和1050b缠绕在电容器的末端,然而也可以将它们放置在底边上。本发明的一个最佳实施例是将一个外形紧凑的表面组装器件(SMD)类型的电容用作旁路电容1050。这样一来,旁路电容器1050就紧密连接在半导体封装1000a上,互联寄生阻抗(电感和等效串联电阻(ESR))也随之降低。
图5表示本发明的另一种带有成型密封剂1030的紧密半导体封装1000b。其中部分半导体封装的制备可以通过将本发明之前所述的部分半导体封装(图2A、图3A至图3D)的两个平顶区域1034a和1034b(本图中不可见)上的表面组装器件(SMD)类型的电容器1050堆积并互联起来。将成型密封剂1030注塑到正在进行的封装中,然后除去成型密封剂1030的顶部,直到旁路电容器1050的顶面裸露出来。与图4B所示的半导体封装1000a相比,旁路电容器1050非常稳固地嵌入半导体封装1000b中,半导体封装1000b具有更好的整体密封性,但是有效的顶端散热却相对1000a要差一些。
对于本领域的技术人员,应该已经掌握,本发明在实施过程中,尽管可以在带有紧密旁路电容的紧密半导体封装时,将堆积式互联板封装进去,但这并不是必须的。以图3A中的部分半导体封装600为例,如果没有堆积式互联板630a和630b,那么只需要保证每一个紧密互联板626a和626b都有一个平顶区域,这些平顶区域分别与第一平顶区域634a和第二平顶区域634b类似,每个高度都相同,以便紧密连接在旁路电容器上。而且,在本发明范畴内,为了方便外部电接线,用一个具有数个终端引线的迭片电路作为电路衬底,而不是用引线框。但是,为了保证有效的底部散热,迭片电路应该含有数个导热通孔。此外,每个半导体芯片620a和620b的方向都是衬底向下,或倒置在覆晶结构中。为了更大限度地发挥本发明的优势,下面列举几项关于选择材料属性方面的原则:
电路衬底应导热、导电;紧密互联板应导电、导热;堆积式互联板应导热或既导热又导电。
参见图3A、图4A和图4B,本发明半导体封装1000a的封装方法包括:
a)制备一个带有各种终端引线606a、606b、606f、606g和606h的引线框602,用于外部电接线。例如,为了满足行业标准,实现线脚向外,应使用行业标准的DFN引线框。将粘着剂涂覆在引线框压模垫和数个终端引线上。制作粘着剂可以用焊膏、导电和/或导热的环氧树脂等,这样它就能够抵御高温或紫外线。
b)在引线框602的引线框压模垫上安装两个半导体芯片620a和620b。更确切地说,可以仿照标准芯片固定工艺,将半导体芯片620a和620b通过焊锡焊接在引线框602上。半导体芯片620a和620b上应使用可焊接的顶部金属。比如,金属氧化物半导体场效应管芯片的顶部源极和栅极的焊盘上裸露的金属铝,应用无电沉积上NiAu。
c)在半导体芯片620a和620b的顶部接触区分别安装紧密互联板626a和626b,引线框602用于在顶部接触区和各种终端引线606a、606b、606f、606g和606h之间的电接线。更确切地说,可以通过焊接芯片完成安装。同样地,紧密互联板三626c可以同时安装在半导体芯片一620a的另一个顶部接触区以及终端引线606a上。粘着剂涂覆在紧密互联板626a和626b上。
d)在紧密互联板626a和626b上分别安装堆积式互联板630a和630b。更确切地说,可以通过焊接完成安装。也可以选用导电、导热的环氧树脂完成安装。处理此封装,并激活各种粘着剂,以便在堆积式互联板630a、630b和紧密互联板626a、626b之间形成紧密稳固的连接。封装处理过程可以使用高温、紫外线等,让焊锡膏回流或让环氧树脂固化。重要的是,各种相关的半导体芯片的厚度、板的厚度以及粘着剂的厚度取决于要使第二平顶区域634b与第一平顶区域634a高度一致。
e)在封装过程中,使成型密封剂1030成型。
f)除去成型密封剂1030的顶部,直到堆积式互联板630a和630b的两个平顶区域裸露出来。更确切地说,可以通过机械研磨除去成型密封剂。
g)通过两个平顶区域,在两个堆积式互联板630a和630b上堆积并连接旁路电容器1050。
如上所述,用于制备图5所示的紧密半导体封装1000b的上述步骤e)和f)可以用以下方法代替:
在封装过程中,在两个平顶区域1034a和1034b上堆积并连接表面组装器件(SMD)类型的旁路电阻器1050,使成型密封剂1030成型,然后除去成型密封剂1030的顶部,直到旁路电容器1050的顶面裸露出来为止。
提出了一种带有紧密互联板、堆积式互联板以及整合旁路电容器的紧密半导体封装,用于封装半导体芯片,可以同时降低芯片-终端的电阻、芯片-外界环境的热阻以及旁路电容器的互联寄生阻抗。对于本领域的技术人员应该能够掌握,所述的各种实施例只要通过简单的改动,就能用于许多其他的应用。尽管上述说明包含许多特例,但是这些特例仅用于对本发明现有的数个最佳实施例作解释说明,不能据此局限本发明的范围。例如,本发明的半导体封装系统不仅适用于本文所述的金属氧化物半导体场效应管芯片,而且更加适用于范围很广的半导体芯片的封装,如绝缘栅双极晶体管以及由SiGe、SiC、GaAs和GaN制备的芯片。又例如,本发明还可扩展用于制造堆积式互联板的多层。
通过上述说明和附图,提出了数个关于特殊结构的实施例。本领域的技术人员如能将本发明应用到数个其他特殊领域中去,那将是令人欣喜的。无需过多的实验,本领域的技术人员就应能掌握这些实施例。因此,从本专利文件出发,本发明的范围并不仅局限于上述说明中的典型实施例,而是由权利要求书中声明。基于权利要求书中的内容和范围,所作的任何和全部修正,都将被认为属于本发明的保护范畴。
尽管本发明的内容已经通过上述优选实施例作了详细介绍,但应当认识到上述的描述不应被认为是对本发明的限制。在本领域技术人员阅读了上述内容后,对于本发明的多种修改和替代都将是显而易见的。因此,本发明的保护范围应由所附的权利要求来限定。

Claims (25)

1.一种带有整合旁路电容器的紧密半导体封装,其特征在于,该半导体封装包括:
一个带有数个终端引线的电路衬底,用于外部电接线;
数个底面连接在电路衬底上面的半导体芯片;
数个高度一自适应的互联板,用于连接每个半导体芯片的顶部接触区,并将其互联至电路衬底上,在三维成型的同时,适应顶部接触区和电路衬底之间的高度差,于是形成顶部接触区与终端引线之间的电接线;
第一个高度一自适应的互联板结构具有一个第一平顶区域,第二个高度一自适应的互联板结构具有一个第二平顶区域,此区域与第一平顶区域一样高;
一个带有两个末端电容器端子的旁路电容器,堆积在两个互联板结构上,并通过第一平顶区域和第二平顶区域连接在互联板结构上;
其中,旁路电容器紧密整合在半导体封装内,降低了互联寄生阻抗。
2.一种带有整合旁路电容的紧密半导体封装,其特征在于,该半导体封装包括:
一个带有数个终端引线的电路衬底,用于外部电接线;
数个底面连接在电路衬底上面的半导体芯片;
第一高度一自适应的互联板,用于将所述的半导体芯片的顶部接触区连接和互联至所述的电路衬底上,在三维成型的同时,适应顶部接触区和电路衬底之间的高度差,于是形成所述的顶部接触区与所述的终端引线之间的电接线;
第二高度一自适应的互联板,用于连接所述的半导体芯片的顶部接触区,形成数个终端引线,用于外部电接线,并在三维成型的同时,适应之间的高度差;
所述的第一高度一自适应的互联板的第一部分还包括一个第一平顶区域,其第二部分还包括一个和第一平顶区域一样高的第二平顶区域; 
以及一个带有两个末端电容端子的旁路电容器,堆积在两个互联板部分上,并通过第一平顶区域和第二平顶区域连接在互联板上;
其中,旁路电容器紧密整合在半导体封装内,降低了互联寄生阻抗。
3.如权利要求1中所述的紧密半导体封装,其特征在于,其中所述的每个高度一自适应的互联板还包括:
第一低热阻、低电阻的紧密互联板,用于连接所述的半导体芯片的顶部接触区,并将其互联至所述的电路衬底上;
和第二低热阻的堆积式互联板,每个第二堆积式互联板都堆积并连接在所选的紧密互联板上,以便增加紧密半导体封装的有效散热。
4.如权利要求1中所述的紧密半导体封装,其特征在于,还包括一种成型密封剂,用于密封半导体封装中的区域,除了旁路电容器的顶面以外,以便保持有效的顶部散热。
5.如权利要求1中所述的紧密半导体封装,其特征在于,还包括一种成型密封剂,用于密封半导体封装中的区域,除了第一平顶区域和第二平顶区域以外。
6.如权利要求3中所述的紧密半导体封装,其特征在于,还包括一种成型密封剂,用于密封半导体封装中的区域,除了旁路电容器的顶面以外,以便保持有效的顶部散热。
7.如权利要求3中所述的紧密半导体封装,其特征在于,还包括一种成型密封剂,用于密封半导体封装中的区域,除了第一平顶区域和第二平顶区域以外。
8.如权利要求3中所述的紧密半导体封装,其特征在于,其中至少一个堆积式互联板的顶部还含有一个在紧密互联板上的外围突出部,此突出部使得所述的至少一个堆积式互联板的顶面区域达到最大,用于为下面的紧密互 联板散热,而不受其他区域的限制。
9.如权利要求8中所述的紧密半导体封装,其特征在于,其中所述的至少一个堆积式互联板外围在其低边被部分刻蚀,以生成外围突出部。
10.如权利要求8中所述的紧密半导体封装,其特征在于,其中所述的至少一个堆积式互联板三维成型,以生成外围突出部。
11.如权利要求8中所述的紧密半导体封装,其特征在于,其中每个所述的紧密互联板的形状和尺寸都不依赖于它对应的堆积式互联板的顶面积,以使它们在半导体芯片上相应的连接面积达到最大,这就降低了它们的关联扩散电阻。
12.如权利要求1中所述的紧密半导体封装,其特征在于,其中至少一个所述的高度-自适应的紧密互联板还包含数个锁扣环,这些锁扣环同周围的数个终端引线互相啮合,以使半导体芯片在半导体封装过程中的旋转蠕动最小。
13.如权利要求1中所述的紧密半导体封装,其特征在于,其中至少一个所述的堆积式互联板还包含数个锁扣环,这些锁扣环同周围的数个终端引线互相啮合,以使半导体芯片在半导体封装过程中的旋转蠕动最小。
14.如权利要求1中所述的紧密半导体封装,其特征在于,其中至少一个堆积式互联板还含有数个平面外的导电桥,用于弹性连接所述的数个紧密互联板。
15.如权利要求1中所述的紧密半导体封装,其特征在于,其中所述的电路衬底是一个含有导电压模板的引线框,用于连接若干半导体芯片。
16.如权利要求1中所述的紧密半导体封装,其特征在于,其中所述的电路衬 底是一个含有数个终端引线的迭片电路,用于增加底部散热。
17.如权利要求1中所述的紧密半导体封装,其特征在于,其中所述的半导体芯片的数量还包括一个高边金属氧化物半导体场效应管和一个低边金属氧化物半导体场效应管,这两个场效应管和所述的旁路电容器构成了一个功率转换电路。
18.如权利要求3中所述的紧密半导体封装,其特征在于,其中所述的半导体芯片的数量还包括一个高边金属氧化物半导体场效应管和一个低边金属氧化物半导体场效应管,这两个场效应管和所述的旁路电容器构成了一个功率转换电路。
19.如权利要求18中所述的紧密半导体封装,其特征在于,其中所述的高边金属氧化物半导体场效应管为底部源极型高边金属氧化物半导体场效应管。
20.如权利要求18中所述的紧密半导体封装,其特征在于,还包括一种成型密封剂,用于密封半导体封装中的区域,除了第一平顶区域和第二平顶区域以外。
21.一种带有旁路电容器及与数个高度-自适应的紧密互联板和高度-自适应的堆积式互联板相互连接的数个半导体芯片的半导体封装方法,其特征在于,此方法包括:
a)制备一个带有数个终端引线的电路衬底,以便外部电接线;
b)制备半导体芯片,并贴装在电路衬底上;
c)在所述的半导体芯片和所述的电路衬底的顶部接触区,制备并贴装数个紧密互联板,以便在所述的顶部接触区和所述的终端引线之间的电接线;
d)在所选的数个紧密互联板上,制备并贴装数个堆积式互联板,同时确保第一堆积式互联板具有一个第一平顶区域,第二堆积式互联板具有 一个第二平顶区域,且与第一平顶区域相持平;
e)制备一个末端带有两个终端电容端子的旁路电容器,在两个堆积式互联板的结构上,通过第一平顶区域和第二平顶区域,堆积并连接旁路电容器。
22.如权利要求21所述的半导体封装方法,其特征在于,所述的方法d)之后还包括以下步骤:
d1)在封装过程中,使密封剂成型;
d2)除去顶部成型密封剂,使得第一平顶区域和第二平顶区域的顶面完全裸露。
23.如权利要求21所述的半导体封装方法,其特征在于,所述的方法还包括:
f)在所述的旁路电容器的顶面上放置一层可分离的掩膜;
g)在封装过程中,使密封剂成型;
h)在封装过程中,除去上述可分离的掩膜,使旁路电容器的顶面裸露,以保持有效的顶部散热。
24.如权利要求21所述的半导体封装方法,其特征在于,所述的电路衬底是一个引线框,还包括在引线框压模板和引线框引线上涂覆粘着剂。
25.如权利要求21所述的半导体封装方法,其特征在于,其中制备和贴装数个堆积式互联板还包括:
d1)在所选的数个所述的紧密互联板上涂覆一层粘着剂,用于连接堆积式互联板和紧密互联板;
d2)处理封装过程,并激活粘着剂,以便在堆积式互联板和所选的紧密互联板之间形成紧密稳固的连接。 
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