CN101708961A - Off-line coated low-irradiation glass - Google Patents
Off-line coated low-irradiation glass Download PDFInfo
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Abstract
The invention relates to an off-line coated low-irradiation glass belonging to the technical field of energy saving. The basic structure of the off-line coated low-irradiation glass comprises a glass substrate, a medium layer and a silver layer. The off-line coated low-irradiation glass is technically characterized in that the medium layer comprises a plurality of sub layers, wherein at least one sub layer is made by silicon or silicon alloy film, or silica film, silicon nitrogen film, silicon oxynitride film, silicon alloy oxygen film, silicon alloy oxygen-nitrogen film and the like the components of which are gradually changed, or aluminum, titanium, zirconium, hafnium, tantalum and other metal the components of which are gradually changed or a nitrogen film of an alloy of the metals. The low-irradiation glass not only has stable performance and high reliability, but also high protection efficiency, can greatly reduce the cost and is beneficial to large-scale popularization and application.
Description
Technical field
The invention belongs to glass manufacturing and field of energy-saving technology, is the low emissivity glass of medium layer with silicon-containing film and content gradually variational film particularly.
Background technology
Architectural energy consumption accounts for 30% of total energy consumption greatly, and the building energy conservation potentiality are very big.Adopt low radiation hollow glass to cooperate Thermal insulation window frame, the heat transfer by window can be reduced to about 25% of ordinary window, effect highly significant.Low emissivity glass is a kind of most of visible light that can see through in the sunlight, the part near infrared ray in flashing back the sunlight, and have the glass of very low far infrared radiation coefficient.Developed country in the world, most of building all adopts this low emissivity glass.In China, the application of low emissivity glass is also very not extensive, and major cause is the cost problem.Because price is more much higher than common white glass, therefore can only be used for top-grade building, seldom adopt the residential houses.
Low emissivity glass divides on-line coating and off-line coated two kinds.On-line coating is to adopt chemical process to be coated with SnO 2 thin film on floatation glass production line, and heat-insulating property is poor slightly.Off-line coated is to adopt magnetically controlled sputter method in deposition on glass multiple layer metal and dielectric film, good heat insulating.Metallic membrane in the off-line coated low-emissivity glass generally all adopts silverskin, can divide Dan Yin, two silver and three silver medals etc. by the number of plies of silverskin, can be divided into two kinds of mantle and dura maters by the dielectric film composition, can be divided into high-transparency and sunshade type etc. again by function.Deielectric-coating in the mantle low emissivity glass comprises two kinds in zinc oxide, stannic oxide, because rete is softer, wears no resistance.Because these two kinds of oxide compound specific refractory poweres are lower, make the setting range of reflected light color be subjected to certain limitation.Deielectric-coating in the dura mater low emissivity glass mainly is a titanium dioxide.Titanium deoxid film is the hardness height not only, and specific refractory power is also high, and it is better that color is adjusted performance.The shortcoming of dura mater is that sputter rate is low, and working simultaneously with a lot of sputtering targets just can reach certain sedimentation rate.It is that stability is poor that existing off-line low emissivity glass also has a significant disadvantages, must seal into double glazing in several days after producing, otherwise film performance will change.Even sealing-in becomes hollow structure, because the weak respiration of soft seal, sealing materials, oxygen still can slowly enter wherein, causes performance degradation.
Because the variety of issue that off-line coated low-emissivity glass exists makes it can only be used for high-grade office building in China, also be difficult to large-scale promotion.
Summary of the invention
The present invention is directed to the off-line low emissivity glass exists in the prior art deficiency and shortcoming, a kind of low emissivity glass is provided, make it not only have common, the stable performance of material, characteristics such as not oxidation fully, and solved the high problem of existing procucts production cost, can promote the large-scale application of low radiation energy-saving glass.
Technical scheme of the present invention is:
Low emissivity glass has single silver coating structure, in its basic structure, from bottom to top comprises sheet glass the 10, the 1st medium layer 11, silver layer the 12, the 2nd medium layer 13 successively.Technical characterictic of the present invention is: described each medium layer is made up of 1 to 10 sublayer, the material that constitutes the sublayer comprises zinc-oxide film, SnO 2 thin film, indium tin oxide films, silicon film, the silicon alloy film that silicon and other metal are formed based on silicon, silicon oxide film, the silicon oxide alloy firm, silicon nitride film, silicon nitride alloy firm etc., the material that constitutes the sublayer also comprises aluminium, titanium, zirconium, hafnium, niobium, the oxide compound and the nitride film of alloy between metals such as tantalum and these metals, the material that constitutes the sublayer also comprises the silicon oxide thin film that distributes along component and gradually changed refractive index on the glass surface normal direction, silicon alloy oxygen film, the silicon nitrogen film, the silicon alloy nitrogen film, the silica nitrogen film, silicon alloy oxygen nitrogen film, the material that constitutes the sublayer also comprises the aluminium that distributes along component and gradually changed refractive index on the glass surface normal direction, titanium, zirconium, hafnium, niobium, the nitrogen film of alloy between metals such as tantalum and these metals.The film that constitutes each sublayer of medium layer can be identical, also can be different, but having a sublayer at least is to be made of a kind of in silicon film and the silicon alloy film, perhaps by the silicon oxide thin film that distributes along component and gradually changed refractive index on the glass surface normal direction, silicon alloy oxygen film, the silicon nitrogen film, the silicon alloy nitrogen film, the silica nitrogen film, a kind of formation in the silicon alloy oxygen nitrogen film is perhaps by the aluminium that distributes along component and gradually changed refractive index on the glass surface normal direction, titanium, zirconium, hafnium, niobium, a kind of formation between metals such as tantalum and these metals in the nitrogen film of alloy.
Another kind of technical scheme of the present invention is:
Low emissivity glass has two silver coating structure, in its basic structure, from bottom to top comprises sheet glass the 20, the 1st medium layer the 21, the 1st silver layer the 22, the 2nd medium layer the 23, the 2nd silver layer the 24, the 3rd medium layer 25 successively.Technical characterictic of the present invention is: described each medium layer is made up of 1 to 10 sublayer, the material that constitutes the sublayer comprises zinc-oxide film, SnO 2 thin film, indium tin oxide films, silicon film, the silicon alloy film that silicon and other metal are formed based on silicon, silicon oxide film, the silicon oxide alloy firm, silicon nitride film, silicon nitride alloy firm etc., the material that constitutes the sublayer also comprises aluminium, titanium, zirconium, hafnium, niobium, the oxide compound and the nitride of alloy between metals such as tantalum and these metals, the material that constitutes the sublayer also comprises the silicon oxide thin film that distributes along component and gradually changed refractive index on the glass surface normal direction, silicon alloy oxygen film, the silicon nitrogen film, the silicon alloy nitrogen film, the silica nitrogen film, silicon alloy oxygen nitrogen film, the material that constitutes the sublayer also comprises the aluminium that distributes along component and gradually changed refractive index on the glass surface normal direction, titanium, zirconium, hafnium, niobium, the nitrogen film of alloy between metals such as tantalum and these metals.The film that constitutes each sublayer of medium layer can be identical, also can be different, but having a sublayer at least is to be made of a kind of in silicon film and the silicon alloy film, perhaps by the silicon oxide thin film that distributes along component and gradually changed refractive index on the glass surface normal direction, silicon alloy oxygen film, the silicon nitrogen film, the silicon alloy nitrogen film, the silica nitrogen film, a kind of formation in the silicon alloy oxygen nitrogen film is perhaps by the aluminium that distributes along component and gradually changed refractive index on the glass surface normal direction, titanium, zirconium, hafnium, niobium, a kind of formation between metals such as tantalum and these metals in the nitrogen film of alloy.
In above-mentioned two kinds of low emissivity glasses, the silicon oxide thin film that the component of sublayer and gradually changed refractive index distribute in the formation medium layer, silicon nitrogen film, silica nitrogen film etc. are that silicone content is along the film that gradually changes on the glass surface normal direction, central plane with this sublayer is a symmetrical plane, component and specific refractory power are symmetrically distributed in the both sides up and down of this central plane, silicon components and the highest part of specific refractory power are positioned at the central plane of this sublayer, and the part that silicon components and specific refractory power are minimum is positioned at outermost two planes, this sublayer.The silicon alloy oxygen film that the component of sublayer and gradually changed refractive index distribute in the described formation medium layer, silicon alloy nitrogen film, silicon alloy oxygen nitrogen film etc. are that silicon alloy content is along the film that gradually changes on the glass surface normal direction, central plane with this sublayer is a symmetrical plane, component and specific refractory power are symmetrically distributed in the both sides up and down of this central plane, silicon alloy component and the highest part of specific refractory power are positioned at the central plane of this sublayer, and the part that silicon alloy component and specific refractory power are minimum is positioned at outermost two planes, this sublayer.The aluminium that the component of sublayer and gradually changed refractive index distribute in the described formation medium layer, titanium, zirconium, hafnium, niobium, the nitrogen film of alloy is an aluminium between metals such as tantalum and these metals, titanium, zirconium, hafnium, niobium, the content of alloy is along the film that gradually changes on the glass surface normal direction between metals such as tantalum and these metals, central plane with this sublayer is a symmetrical plane, component and specific refractory power are symmetrically distributed in the both sides up and down of this central plane, aluminium, titanium, zirconium, hafnium, niobium, the component of alloy and the central plane that the highest part of specific refractory power is positioned at this sublayer between metals such as tantalum and these metals, aluminium, titanium, zirconium, hafnium, niobium, the component and the minimum part of specific refractory power of alloy are positioned at outermost two planes, this sublayer between metals such as tantalum and these metals.
For the reliability and the life-span of improving low emissivity glass; in the both sides up and down of silver layer or the one-sided protective layer sticking power of holding concurrently that is provided with strengthen layer; this layer adopts the alloy firm between metallic film such as titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, nickel, cobalt or these metals; also can adopt stainless steel film, its thickness is less than 3 nanometers.
Described silicon alloy film based on silicon comprises the binary alloy that metals such as silicon and copper, silver, magnesium, aluminium, titanium, zirconium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, manganese, chromium, iron, cobalt, nickel are formed, and also comprises the multicomponent alloy that constitutes between silicon and the above-mentioned metal; Silicon alloy oxygen film comprises the binary alloy oxygen film that silicon and copper, silver, magnesium, aluminium, titanium, zirconium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, manganese, chromium, iron, cobalt, nickel metal are formed, and also comprises the multicomponent alloy oxygen film that constitutes between silicon and the above-mentioned metal; The silicon alloy nitrogen film comprises the binary alloy nitrogen film that silicon and copper, silver, magnesium, aluminium, titanium, zirconium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, manganese, chromium, iron, cobalt, nickel metal are formed, and also comprises the multicomponent alloy nitrogen film that constitutes between silicon and the above-mentioned metal; Silicon alloy oxygen nitrogen film comprises the binary alloy oxygen nitrogen film that silicon and copper, silver, magnesium, aluminium, titanium, zirconium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, manganese, chromium, iron, cobalt, nickel metal are formed, and also comprises the multicomponent alloy oxygen nitrogen film that constitutes between silicon and the above-mentioned metal.
Among the present invention, medium layer adopts sublayer structure, and adopts the content gradually variational structure in each sublayer, is in order to satisfy the needs of scale of mass production, and the equally distributed situation difference of its performance and specific refractory power is very little.The component uniform distribution is a special case of graded profile.After the content gradually variational structure, can adopt the reactive magnetron sputtering method of standard to make on a large scale fully in employing sublayer structure and the sublayer.
Sticking power reinforcement layer also has the defencive function to silver layer simultaneously, prevents that silver layer is oxidized in the silica cvd dielectric layer process.
The present invention compared with prior art has the following advantages and the high-lighting effect: in the low emissivity glass provided by the present invention, the specific refractory power of medium layer can be adjusted arbitrarily between 1.5 to 4, has increased the handiness of structure design greatly; These film densifications, the intensity height has improved the stability of low emissivity glass greatly; Silicon oxide thin film sedimentation rate height can be boosted productivity greatly, reduces cost.
Compare with existing low emissivity glass, stability improves greatly, can deposit in the air midium or long term.Owing to do not have problem of oxidation, seal into hollow structure after, be not afraid of weak respiration, even oxygen enters in the double glazing, performance can not reduce yet, and more the film break-off can not occur.These are for producing in enormous quantities and widespread use provides good precondition.The present invention has overcome the shortcoming of existing all kinds of low emissivity glasses fully, and the application of low emissivity glass is promoted greatly, and good pushing effect is played in the development of building energy conservation.
Description of drawings
Fig. 1 is single silver coating structure low emissivity glass structural representation provided by the invention.This low emissivity glass comprises sheet glass 10 successively, is arranged on the 1st medium layer 11 on the substrate, silver layer the 12, the 2nd medium layer 13.
Fig. 2 has the protective layer interface of holding concurrently and improves single silver coating structure low emissivity glass structural representation of layer for provided by the invention.This low emissivity glass comprises sheet glass 10 successively, be arranged on the substrate the 1st medium layer 11, the protective layer interface of holding concurrently improves layer 14, silver layer 12, the protective layer interface of holding concurrently and improves layer the 15, the 2nd medium layer 13.
Fig. 3 is two silver-colored structure low emissivity glass structural representation provided by the invention.This low emissivity glass comprises sheet glass 20 successively, is arranged on the 1st medium layer the 21, the 1st silver layer the 22, the 2nd medium layer the 23, the 2nd silver layer the 24, the 3rd medium layer 25 on the substrate.
Fig. 4 has the protective layer interface of holding concurrently and improves the two silver-colored structure low emissivity glass structural representation of layer for provided by the invention.This low emissivity glass comprises sheet glass 20 successively, be arranged on the substrate the 1st layer of medium 21, the protective layer interface of holding concurrently improves layer the 26, the 1st silver layer 22, the protective layer interface of holding concurrently and improves layer the 27, the 2nd medium layer 23, the protective layer interface of holding concurrently and improve layer the 28, the 2nd silver layer 24, the protective layer interface of holding concurrently and improve layer the 29, the 3rd medium layer 25.
Fig. 5 is the structural representation of gradually changed refractive index medium layer in Dan Yin provided by the invention and the two silver low radiation glass.Medium layer is made of some sublayers, N
1Represent the highest position of specific refractory power, N
2Represent the minimum position of specific refractory power.
Embodiment
Below by several specific embodiments enforcement of the present invention is described further.
Embodiment 1: single silver coating structure low emissivity glass, its structure is followed successively by: the 2nd layer of medium layer of the 1st medium layer of sheet glass, 45 nanometer thickness, the silver layer of 10 nanometer thickness, 54 nanometer thickness.Medium layer adopts silicon oxide thin film, and the 1st medium layer adopts 3 sublayers, and each sublayer structure is identical, the position that silicon components is high, and specific refractory power is controlled at 2.3, the position that silicon components is minimum, specific refractory power is controlled at 1.5; The 2nd medium layer also adopts 3 sublayers, and each sublayer structure is identical, the position that silicon components is high, and specific refractory power is controlled at 2.1, the position that silicon components is minimum, specific refractory power is controlled at 1.5.The visible light transmissivity of this low emissivity glass surpasses 85%, and the sunlight transmitance surpasses 65%, and radiation coefficient is less than 0.05.
Embodiment 2: single silver coating structure low emissivity glass, its structure is followed successively by: the 2nd medium layer of layer, 51 nanometer thickness is improved at the 1st medium layer of sheet glass, 39 nanometer thickness, the titanium protective layer of 2 nanometer thickness titanium protective layer that the interface improves silver layer, 2 nanometer thickness of layer, the 10 nanometer thickness interface of holding concurrently of holding concurrently.Medium layer adopts sial oxygen film, and silicon and aluminium atomicity ratio are 10: 1, and the 1st medium layer adopts 3 sublayers, and each sublayer structure is identical, the position that the sial component is high, and specific refractory power is controlled at 2.3, the position that the sial component is minimum, specific refractory power is controlled at 1.5; The 2nd medium layer also adopts 3 sublayers, and each sublayer structure is identical, the position that the sial component is the highest, and specific refractory power is controlled at 2.3, the position that the sial component is minimum, specific refractory power is controlled at 1.5.The visible light transmissivity of this low emissivity glass surpasses 85%, and the sunlight transmitance surpasses 65%, and radiation coefficient is less than 0.07.
Embodiment 3: single silver coating structure low emissivity glass, its structure is followed successively by: the 2nd layer of medium layer of the 1st medium layer of sheet glass, 36 nanometer thickness, the silver layer of 10 nanometer thickness, 45 nanometer thickness.Medium layer adopts the silicon nitrogen film, and the 1st medium layer adopts 3 sublayers, and each sublayer structure is identical, the position that silicon components is high, and specific refractory power is controlled at 2.6, the position that silicon components is minimum, specific refractory power is controlled at 2.0; The 2nd medium layer also adopts 3 sublayers, and each sublayer structure is identical, the position that silicon components is high, and specific refractory power is controlled at 2.3, the position that silicon components is minimum, specific refractory power is controlled at 2.0.The visible light transmissivity of this low emissivity glass surpasses 85%, and the sunlight transmitance surpasses 65%, and radiation coefficient is less than 0.05.
Embodiment 4: single silver coating structure low emissivity glass, its structure is followed successively by: the 2nd medium layer of the 1st medium layer of sheet glass, 3 nanometer thickness, the silver layer of 10 nanometer thickness, 15 nanometer thickness.The 1st medium layer has only a sublayer, is zinc-oxide film, and the 2nd medium layer adopts 2 sublayers, be respectively the zinc oxide after 8 nanometers and the silicon of 7 nanometer thickness, the visible light transmissivity of this low emissivity glass surpasses 75%, and the sunlight transmitance surpasses 50%, and radiation coefficient is less than 0.05.
Embodiment 5: single silver coating structure low emissivity glass, its structure is followed successively by: the 2nd medium layer of the 1st medium layer of sheet glass, 5 nanometer thickness, the silver layer of 10 nanometer thickness, 25 nanometer thickness.The 1st medium layer has only 1 sublayer, adopt hafnium nitride film, the 1st medium layer adopts 2 sublayers, the silicon nitrogen film of the content gradually variational of difference 5 nanometer thickness and the silicon nitride film of 20 nanometer thickness, wherein in the silicon nitrogen film of content gradually variational, the position that specific refractory power is the highest, specific refractory power is controlled at 2.8, the position that specific refractory power is minimum, specific refractory power is controlled at 2.0.The visible light transmissivity of this low emissivity glass surpasses 80%, and it is 60% that the sunlight transmitance surpasses, and radiation coefficient is less than 0.07.
Embodiment 6: single silver coating structure low emissivity glass, its structure is followed successively by: the 2nd layer of medium layer of the 1st medium layer of sheet glass, 42 nanometer thickness, the silver layer of 10 nanometer thickness, 51 nanometer thickness.Medium layer adopts the silica nitrogen film, and the 1st medium layer adopts 3 sublayers, and each sublayer structure is identical, the position that silicon components is high, and specific refractory power is controlled at 2.4, the position that silicon components is minimum, specific refractory power is controlled at 1.6; The 2nd medium layer also adopts 3 sublayers, and each sublayer structure is identical, the position that silicon components is high, and specific refractory power is controlled at 2.1, the position that silicon components is minimum, specific refractory power is controlled at 1.6; The visible light transmissivity of this low emissivity glass surpasses 85%, and the sunlight transmitance surpasses 65%, and radiation coefficient is less than 0.05.
Embodiment 7: two silver-colored structure low emissivity glasses, its structure is followed successively by: the 1st silver layer of sheet glass, 30 nanometer thickness the 1st medium layer, 10 nanometer thickness, the 2nd medium layer of 78 nanometer thickness, the 2nd silver layer of 10 nanometer thickness, the 3rd medium layer of 39 nanometer thickness.Medium layer adopts silicon oxide thin film, and the 1st medium layer adopts 3 sublayers, and each sublayer structure is identical, the position that silicon components is high, and specific refractory power is controlled at 2.4, the position that silicon components is minimum, specific refractory power is controlled at 1.5; The 2nd medium layer adopts 6 sublayers, and each sublayer structure is identical, the position that silicon components is high, and specific refractory power is controlled at 2.1, the position that silicon components is minimum, specific refractory power is controlled at 1.5; The 3rd medium layer adopts 3 sublayers, and each sublayer structure is identical, the position that silicon components is high, and specific refractory power is controlled at 2.1, the position that silicon components is minimum, specific refractory power is controlled at 1.5.The visible light transmissivity of this low emissivity glass surpasses 80%, and infrared transmittivity is lower than 35%, and radiation coefficient is less than 0.07.
Embodiment 8: two silver-colored structure low emissivity glasses; its structure is followed successively by: layer is improved at the titanium protective layer of sheet glass, 30 nanometer thickness the 1st medium layer, the 2 nanometer thickness interface of holding concurrently; layer is improved at the 1st silver layer of 10 nanometer thickness, the titanium protective layer of the 2 nanometer thickness interface of holding concurrently; layer is improved at the 2nd medium layer of 78 nanometer thickness, the titanium protective layer of the 2 nanometer thickness interface of holding concurrently; layer, the 3rd medium layer of 39 nanometer thickness are improved in the 2nd silver layer of 10 nanometer thickness, the titanium protective layer of the 2 nanometer thickness interface of holding concurrently.Medium layer adopts silicon oxide thin film, and the 1st medium layer adopts 3 sublayers, and each sublayer structure is identical, the position that silicon components is high, and specific refractory power is controlled at 2.4, the position that silicon components is minimum, specific refractory power is controlled at 1.5; The 2nd medium layer adopts 6 sublayers, and each sublayer structure is identical, the position that silicon components is high, and specific refractory power is controlled at 2.1, the position that silicon components is minimum, specific refractory power is controlled at 1.5; The 3rd medium layer also adopts 3 sublayers, and each sublayer structure is identical, the position that silicon components is high, and specific refractory power is controlled at 2.1, the position that silicon components is minimum, specific refractory power is controlled at 1.5.The visible light transmissivity of this low emissivity glass surpasses 80%, and infrared transmittivity is lower than 35%, and radiation coefficient is less than 0.07.
Claims (5)
1. low emissivity glass, has single silver coating structure, in its basic structure, from bottom to top comprise sheet glass 10 successively, the 1st medium layer 11, silver layer 12, the 2nd medium layer 13, it is characterized in that: described each medium layer is made up of 1 to 10 sublayer, the material that constitutes the sublayer comprises zinc-oxide film, SnO 2 thin film, indium tin oxide films, silicon film, the silicon alloy film that silicon and other metal are formed based on silicon, silicon oxide film, the silicon oxide alloy firm, silicon nitride film, silicon nitride alloy firm etc., the material that constitutes the sublayer also comprises aluminium, titanium, zirconium, hafnium, niobium, the oxide compound and the nitride film of alloy between metals such as tantalum and these metals, the material that constitutes the sublayer also comprises the silicon oxide thin film that distributes along component and gradually changed refractive index on the glass surface normal direction, silicon alloy oxygen film, the silicon nitrogen film, the silicon alloy nitrogen film, the silica nitrogen film, silicon alloy oxygen nitrogen film, the material that constitutes the sublayer also comprises the aluminium that distributes along component and gradually changed refractive index on the glass surface normal direction, titanium, zirconium, hafnium, niobium, the nitrogen film of alloy between metals such as tantalum and these metals; The film that constitutes each sublayer of medium layer can be identical, also can be different, but having a sublayer at least is to be made of a kind of in silicon film and the silicon alloy film, perhaps by the silicon oxide thin film that distributes along component and gradually changed refractive index on the glass surface normal direction, silicon alloy oxygen film, the silicon nitrogen film, the silicon alloy nitrogen film, the silica nitrogen film, a kind of formation in the silicon alloy oxygen nitrogen film is perhaps by the aluminium that distributes along component and gradually changed refractive index on the glass surface normal direction, titanium, zirconium, hafnium, niobium, a kind of formation between metals such as tantalum and these metals in the nitrogen film of alloy.
2. low emissivity glass, have two silver coating structure, in its basic structure, from bottom to top comprise sheet glass 20 successively, the 1st medium layer 21, the 1st silver layer 22, the 2nd medium layer 23, the 2nd silver layer 24, the 3rd medium layer 25, it is characterized in that: described each medium layer is made up of 1 to 10 sublayer, the material that constitutes the sublayer comprises zinc-oxide film, SnO 2 thin film, indium tin oxide films, silicon film, the silicon alloy film that silicon and other metal are formed based on silicon, silicon oxide film, the silicon oxide alloy firm, silicon nitride film, silicon nitride alloy firm etc., the material that constitutes the sublayer also comprises aluminium, titanium, zirconium, hafnium, niobium, the oxide compound and the nitride film of alloy between metals such as tantalum and these metals, the material that constitutes the sublayer also comprises the silicon oxide thin film that distributes along component and gradually changed refractive index on the glass surface normal direction, silicon alloy oxygen film, the silicon nitrogen film, the silicon alloy nitrogen film, the silica nitrogen film, silicon alloy oxygen nitrogen film, the material that constitutes the sublayer also comprises the aluminium that distributes along component and gradually changed refractive index on the glass surface normal direction, titanium, zirconium, hafnium, niobium, the nitrogen film of alloy between metals such as tantalum and these metals; The film that constitutes each sublayer of medium layer can be identical, also can be different, but having a sublayer at least is to be made of a kind of in silicon film and the silicon alloy film, perhaps by the silicon oxide thin film that distributes along component and gradually changed refractive index on the glass surface normal direction, silicon alloy oxygen film, the silicon nitrogen film, the silicon alloy nitrogen film, the silica nitrogen film, a kind of formation in the silicon alloy oxygen nitrogen film is perhaps by the aluminium that distributes along component and gradually changed refractive index on the glass surface normal direction, titanium, zirconium, hafnium, niobium, a kind of formation between metals such as tantalum and these metals in the nitrogen film of alloy.
3. according to claim 1 and 2 described low emissivity glasses, it is characterized in that: the silicon oxide thin film that the component of sublayer and gradually changed refractive index distribute in the described formation medium layer, silicon nitrogen film, silica nitrogen film etc. are that silicone content is along the film that gradually changes on the glass surface normal direction, central plane with this sublayer is a symmetrical plane, component and specific refractory power are symmetrically distributed in the both sides up and down of this central plane, silicon components and the highest part of specific refractory power are positioned at the central plane of this sublayer, and the part that silicon components and specific refractory power are minimum is positioned at outermost two planes, this sublayer; The silicon alloy oxygen film that the component of sublayer and gradually changed refractive index distribute in the described formation medium layer, silicon alloy nitrogen film, silicon alloy oxygen nitrogen film etc. are that silicon alloy content is along the film that gradually changes on the glass surface normal direction, central plane with this sublayer is a symmetrical plane, component and specific refractory power are symmetrically distributed in the both sides up and down of this central plane, silicon alloy component and the highest part of specific refractory power are positioned at the central plane of this sublayer, and the part that silicon alloy component and specific refractory power are minimum is positioned at outermost two planes, this sublayer; The aluminium that the component of sublayer and gradually changed refractive index distribute in the described formation medium layer, titanium, zirconium, hafnium, niobium, the nitrogen film of alloy is an aluminium between metals such as tantalum and these metals, titanium, zirconium, hafnium, niobium, the content of alloy is along the film that gradually changes on the glass surface normal direction between metals such as tantalum and these metals, central plane with this sublayer is a symmetrical plane, component and specific refractory power are symmetrically distributed in the both sides up and down of this central plane, aluminium, titanium, zirconium, hafnium, niobium, the component of alloy and the central plane that the highest part of specific refractory power is positioned at this sublayer between metals such as tantalum and these metals, aluminium, titanium, zirconium, hafnium, niobium, the component and the minimum part of specific refractory power of alloy are positioned at outermost two planes, this sublayer between metals such as tantalum and these metals.
4. according to claim 1 and 2 described low emissivity glasses; it is characterized in that: in the both sides up and down of silver layer or the one-sided protective layer sticking power of holding concurrently that is provided with strengthen layer; this layer adopts the alloy firm between metallic film such as titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, nickel, cobalt or these metals; also can adopt stainless steel film, its thickness is less than 3 nanometers.
5. according to claim 1 and 2 described low emissivity glasses, it is characterized in that: described silicon alloy film based on silicon comprises the binary alloy that metals such as silicon and copper, silver, magnesium, aluminium, titanium, zirconium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, manganese, chromium, iron, cobalt, nickel are formed, and also comprises the multicomponent alloy that constitutes between silicon and the above-mentioned metal; Silicon alloy oxygen film comprises the binary alloy oxygen film that silicon and copper, silver, magnesium, aluminium, titanium, zirconium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, manganese, chromium, iron, cobalt, nickel metal are formed, and also comprises the multicomponent alloy oxygen film that constitutes between silicon and the above-mentioned metal; The silicon alloy nitrogen film comprises the binary alloy nitrogen film that silicon and copper, silver, magnesium, aluminium, titanium, zirconium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, manganese, chromium, iron, cobalt, nickel metal are formed, and also comprises the multicomponent alloy nitrogen film that constitutes between silicon and the above-mentioned metal; Silicon alloy oxygen nitrogen film comprises the binary alloy oxygen nitrogen film that silicon and copper, silver, magnesium, aluminium, titanium, zirconium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, manganese, chromium, iron, cobalt, nickel metal are formed, and also comprises the multicomponent alloy oxygen nitrogen film that constitutes between silicon and the above-mentioned metal.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102384599A (en) * | 2011-10-11 | 2012-03-21 | 李德杰 | Solar heat collecting tube |
| CN102584030A (en) * | 2012-01-31 | 2012-07-18 | 林嘉宏 | Coated glass with high light transmission and low radiation |
| CN103395239A (en) * | 2013-07-09 | 2013-11-20 | 重庆大学 | Low-radiation thin film with silicon-aluminum nitride medium layer and preparation technology thereof |
| CN103864315A (en) * | 2014-03-12 | 2014-06-18 | 江苏汇景薄膜科技有限公司 | Low-emissivity coated glass with titanium-silver compound function layer and preparation method thereof |
-
2009
- 2009-12-01 CN CN200910238534A patent/CN101708961A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102384599A (en) * | 2011-10-11 | 2012-03-21 | 李德杰 | Solar heat collecting tube |
| CN102584030A (en) * | 2012-01-31 | 2012-07-18 | 林嘉宏 | Coated glass with high light transmission and low radiation |
| CN103395239A (en) * | 2013-07-09 | 2013-11-20 | 重庆大学 | Low-radiation thin film with silicon-aluminum nitride medium layer and preparation technology thereof |
| CN103864315A (en) * | 2014-03-12 | 2014-06-18 | 江苏汇景薄膜科技有限公司 | Low-emissivity coated glass with titanium-silver compound function layer and preparation method thereof |
| CN103864315B (en) * | 2014-03-12 | 2016-03-02 | 江苏汇景薄膜科技有限公司 | A kind of silver-colored titanium complex functional layer Low emissivity energy-saving glass and preparation method thereof |
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Application publication date: 20100519 |