CN101255018A - Low-radiation glass - Google Patents
Low-radiation glass Download PDFInfo
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- CN101255018A CN101255018A CNA2007100796266A CN200710079626A CN101255018A CN 101255018 A CN101255018 A CN 101255018A CN A2007100796266 A CNA2007100796266 A CN A2007100796266A CN 200710079626 A CN200710079626 A CN 200710079626A CN 101255018 A CN101255018 A CN 101255018A
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Abstract
A low radiation glass belongs to the technology field of energy conservation. The basic structure of the glass sequentially comprises a glass substrate, a first layer dielectric film, a metal silver film and a second layer dielectric film and the technical characteristics of the glass is that the dielectric film is composed of silicon oxide or silicon oxynitride. The inventive low radiation glass has the advantages of stable performance, high reliability and high production efficiency, which can greatly reduce cost and is beneficial to large-scale popularization and application.
Description
Technical field
The present invention relates to novel low emissivity glass, particularly have the low emissivity glass that silicon oxide or silicon oxynitride are dielectric film, belong to glass manufacturing and field of energy-saving technology.
Background technology
Low emissivity glass is a kind ofly can see through most of visible light, reflects most of near infrared ray, and has the glass of very low far infrared radiation coefficient, and energy-saving effect is very obvious.Developed country in the world, most of building all adopts this low emissivity glass.In China, the application of low emissivity glass is also very not extensive, and major cause is the cost problem.Because price is almost two times of common white glass, therefore can only be used for top-grade building, seldom adopt the residential houses.
Low emissivity glass divides on-line coating and off-line coated two kinds.On-line coating is to adopt chemical process to be coated with SnO 2 thin film on floatation glass production line, so production cost is low, but poor-performing.Off-line coated is to adopt magnetically controlled sputter method at deposition on glass multiple layer metal and dielectric film, the production cost height, but performance is good.Metallic membrane in the off-line coated low-emissivity glass generally all adopts silverskin, can divide two silver and single money kind by the number of plies of silverskin, can be divided into two kinds of mantle and dura maters by the dielectric film composition.Deielectric-coating in the mantle low emissivity glass comprises two kinds in zinc oxide, stannic oxide, because rete is softer, wears no resistance.Because these two kinds of oxide compound specific refractory poweres are lower, make the setting range of reflected light color be subjected to certain limitation.Deielectric-coating in the dura mater low emissivity glass mainly is a titanium dioxide, and what have also adopts silicon nitride to improve wear resistance at outermost layer.Titanium deoxid film is the hardness height not only, and specific refractory power is also high, and it is better that color is adjusted performance.The shortcoming of dura mater is that sputter rate is low, and working simultaneously with a lot of sputtering targets just can reach certain sedimentation rate.Also having silicon nitride in addition is the low emissivity glass of deielectric-coating, and its shortcoming is that sputter rate is low, and visible light transmissivity is low, general less employing.It is that stability is poor that existing off-line low emissivity glass also has a significant disadvantages, produce the back and must seal into double glazing in several days, otherwise film performance will change, even break away from.
Because the variety of issue that off-line coated low-emissivity glass exists makes it can only be used for high-grade office building in China, also be difficult to large-scale promotion.
Summary of the invention
The present invention is directed to the off-line low emissivity glass exists in the prior art deficiency and shortcoming, it is the low emissivity glass of medium layer that a kind of oxide compound or oxynitride with silicon is provided, make it not only have characteristics such as material is common, stable performance, and solved the high problem of existing procucts production cost, can promote the large-scale application of low radiation energy-saving glass.
Technical scheme of the present invention is as follows:
A kind of low emissivity glass has single silver-colored membrane structure, from bottom to top comprises substrate of glass, the 1st layer of dielectric film, silver-colored film, the 2nd layer of dielectric film in its basic structure successively, and it is characterized in that: described dielectric film is made of silicon oxide or silicon oxynitride.
In order to improve the sticking power between each layer film, and improve the character of silverskin, in the structure of the present invention, can also between dielectric film and silver-colored film, increase sticking power and strengthen film, this layer film can be metal titanium, zirconium, niobium, tantalum, chromium, the nickel film of individual layer, also can be the composite multilayer membrane that these metals are formed, its thickness be less than 3 nanometers.Metal mold sticking power is strengthened film and is also played a part the silverskin protective layer simultaneously, prevents silverskin oxidation in technological process.Can only between silver and its top dielectric film, add metal mold sticking power and strengthen film, also can between silver and its upper and lower medium film, all add metal sticking power and strengthen film.For the previous case, this layer film mainly plays the silverskin protective layer.It can also be the sull of metal titanium, zirconium, niobium, tantalum, chromium, nickel, zinc, aluminium, magnesium, rare earth element that sticking power is strengthened film, and it is thick in 10 nanometers.
Another kind of technical scheme provided by the invention:
A kind of low emissivity glass, have two silver-colored membrane structures, from bottom to top comprise substrate of glass, the first layer dielectric film, the 1st layer of silver-colored film, the 2nd layer of dielectric film, the 2nd layer of silver-colored film, the 3rd layer of dielectric film in its basic structure successively, it is characterized in that: described dielectric film is made of silicon oxide or silicon oxynitride.
In order to improve the sticking power between each layer film, and improve the character of silverskin, in the structure of the present invention, can also between dielectric film and silver-colored film, increase sticking power and strengthen film, this layer film can be metal titanium, zirconium, niobium, tantalum, chromium, the nickel film of individual layer, also can be the composite multilayer membrane that these metals are formed, its thickness be less than 3 nanometers.Metal mold sticking power is strengthened film and is also played a part the silverskin protective layer simultaneously, prevents silverskin oxidation in technological process.Can only between silver and its top dielectric film, add metal mold sticking power and strengthen film, also can between silver and its upper and lower medium film, all add metal sticking power and strengthen film.For the previous case, this layer film mainly plays the silverskin protective layer.It can also be the sull of metal titanium, zirconium, niobium, tantalum, chromium, nickel, zinc, aluminium, magnesium, rare earth element that sticking power is strengthened film, and it is thick in 10 nanometers.
The present invention compared with prior art, have the following advantages and the high-lighting effect: adopting silicon oxide or silicon oxynitride in the low emissivity glass provided by the present invention is dielectric film, its specific refractory power can be adjusted arbitrarily between 1.5 to 4, has increased the handiness of structure design greatly; Silicon oxide or silicon oxynitride film densification, the intensity height has improved the stability of low emissivity glass greatly; Silicon oxide and silicon oxynitride film sedimentation rate height can be boosted productivity greatly, reduce cost.
With existing zinc oxide is that the low emissivity glass of medium layer is compared, and film deposition rate is basic identical, but stability improves greatly, needn't seal into double glazing, can preserve more than 2 months, and this just provides good precondition for production in enormous quantities.With existing silicon nitride is that the low emissivity glass of medium layer is compared, and stability is similar, but film deposition rate improves more than 2 times, is fit to very much produce in enormous quantities.Therefore, the present invention possesses the advantage of existing all kinds of low emissivity glasses, and the application of low emissivity glass is promoted greatly, and good pushing effect is played in the development of building energy conservation.
Description of drawings
Fig. 1 is the silver-colored film low emissivity glass of a list provided by the invention structural representation.
Fig. 2 is the silver-colored film low emissivity glass of the list structural representation with sticking power reinforcement layer provided by the invention.
Fig. 3 is two silver-colored film low emissivity glass structural representation provided by the invention.
Fig. 4 is the two silver-colored film low emissivity glass structural representation with sticking power reinforcement layer provided by the invention.
Embodiment
Below in conjunction with accompanying drawing concrete enforcement of the present invention is described further.
Fig. 1 is the silver-colored film low emissivity glass of a list provided by the invention structural representation.This low emissivity glass comprises substrate of glass 10 successively, be arranged on the substrate the 1st layer of dielectric film 11, silver-colored film 12, the 2nd layer of dielectric film 13.
Fig. 2 is the silver-colored film low emissivity glass of the list structural representation with sticking power reinforcement layer provided by the invention.This low emissivity glass comprises substrate of glass 10 successively, be arranged on the substrate the 1st layer of dielectric film 11, sticking power strengthens layer 14, metallic film 12, sticking power and strengthens 15, the 2nd layers of dielectric film 13 of layer.
Fig. 3 is two silver-colored film low emissivity glass structural representation provided by the invention.This low emissivity glass comprises substrate of glass 30 successively, is arranged on the 1st layer of dielectric film 31 on the substrate, the 32, the 2nd layer of dielectric film 33 of the 1st layer of silver-colored film, the 34, the 3rd layer of dielectric film 35 of the 2nd layer of silver-colored film.
Fig. 4 is the two silver-colored film low emissivity glass structural representation with sticking power reinforcement layer provided by the invention.This low emissivity glass comprises substrate of glass 30 successively, be arranged on the substrate the 1st layer of dielectric film 31, sticking power strengthens 36, the 1st layers of silver-colored film 32 of layer, sticking power and strengthens 37, the 2nd layers of dielectric film 33 of layer, sticking power and strengthen layer 38, second layer silver film 34, sticking power and strengthen 39, the 3rd layers of dielectric film 35 of layer.
Below by several specific embodiments concrete enforcement of the present invention is described further.
Embodiment 1: individual layer silverskin low emissivity glass, its structure is followed successively by: the second layer silicon oxide film of the first layer silicon oxide film of substrate of glass, 50 nanometer thickness, the silverskin of 10 nanometer thickness, 50 nanometer thickness, the specific refractory power of silicon oxide is controlled at 2.25.The visible light transmissivity of this low emissivity glass surpasses 80%, and the sunlight transmitance is 60%, and radiation coefficient is less than 0.1.
Embodiment 2: individual layer silverskin low emissivity glass, its structure is followed successively by: the second layer silicon oxide film of the first layer silicon oxide film of substrate of glass, 60 nanometer thickness, the silverskin of 10 nanometer thickness, 73 nanometer thickness, wherein the specific refractory power of the first layer silicon oxide is controlled at 2.25, the specific refractory power of second layer silicon oxide is controlled at 1.9, the visible light transmissivity of this low emissivity glass surpasses 84%, the sunlight transmitance is 60%, and radiation coefficient is less than 0.1.
Embodiment 3: individual layer silverskin low emissivity glass, its structure is followed successively by: the first layer silicon oxide film of substrate of glass, 60 nanometer thickness, the titanium oxide sticking power of 5 nanometer thickness are strengthened the silverskin of film, 10 nanometer thickness, the titanium oxide sticking power of 5 nanometer thickness is strengthened the second layer silicon oxide film of film, 73 nanometer thickness, wherein the specific refractory power of the first layer silicon oxide is controlled at 2.25, the specific refractory power of second layer silicon oxide is controlled at 1.9, the visible light transmissivity of this low emissivity glass surpasses 84%, the sunlight transmitance is 60%, and radiation coefficient is less than 0.1.
Embodiment 4: individual layer silverskin low emissivity glass, its structure is followed successively by: the first layer silicon oxide film of substrate of glass, 60 nanometer thickness, the titanium sticking power of 2 nanometer thickness are strengthened the silverskin of film, 10 nanometer thickness, the titanium sticking power of 2 nanometer thickness is strengthened the second layer silicon oxide film of film, 73 nanometer thickness, wherein the specific refractory power of the first layer silicon oxide is controlled at 2.25, the specific refractory power of second layer silicon oxide is controlled at 1.9, the visible light transmissivity of this low emissivity glass surpasses 84%, the sunlight transmitance is 60%, and radiation coefficient is less than 0.1.
Embodiment 5: individual layer silverskin low emissivity glass, its structure is followed successively by: the nickel sticking power of the first layer silicon oxide film of substrate of glass, 60 nanometer thickness, the silverskin of 10 nanometer thickness, 2 nanometer thickness is strengthened the second layer silicon oxide film of film, 73 nanometer thickness, wherein the specific refractory power of the first layer silicon oxide is controlled at 2.25, the specific refractory power of second layer silicon oxide is controlled at 1.9, the visible light transmissivity of this low emissivity glass surpasses 84%, the sunlight transmitance is 60%, and radiation coefficient is less than 0.1.
Embodiment 6: individual layer silverskin low emissivity glass, its structure is followed successively by: the second layer silicon oxynitride film of the first layer silicon oxynitride film of substrate of glass, 60 nanometer thickness, the silverskin of 10 nanometer thickness, 73 nanometer thickness, wherein the specific refractory power of the first layer silicon oxynitride is controlled at 2.25, the specific refractory power of second layer silicon oxynitride is controlled at 1.9, the visible light transmissivity of this low emissivity glass surpasses 80%, the sunlight transmitance is 60%, and radiation coefficient is less than 0.1.
Embodiment 7: individual layer silverskin low emissivity glass, its structure is followed successively by: the silicon oxide film of the silicon oxynitride film of substrate of glass, 60 nanometer thickness, the silverskin of 10 nanometer thickness, 73 nanometer thickness, wherein the specific refractory power of silicon oxynitride is controlled at 2.25, the specific refractory power of silicon oxide is controlled at 1.9, the visible light transmissivity of this low emissivity glass surpasses 80%, the sunlight transmitance is 60%, and radiation coefficient is less than 0.1.
Embodiment 8: individual layer silverskin low emissivity glass, its structure is followed successively by: the silverskin of the silicon oxynitride film of substrate of glass, 40 nanometer thickness, the pellumina of 3 nanometer thickness, 10 nanometer thickness, the pellumina of 3 nanometers, the silicon oxide film of 73 nanometer thickness, wherein the specific refractory power of silicon oxynitride is controlled at 3.0, the specific refractory power of silicon oxide is controlled at 2.4, the visible light transmissivity of this low emissivity glass surpasses 80%, the sunlight transmitance is 50%, and radiation coefficient is less than 0.1.
Embodiment 9: double-deck silverskin low emissivity glass, its structure is followed successively by: the silicon oxide film of the oxide film of substrate of glass, 60 nanometer thickness, the silverskin of 10 nanometer thickness, 120 nanometer thickness, the silverskin of 10 nanometer thickness, the silicon oxide film of 60 nanometer thickness, the specific refractory power of silicon oxide is controlled at 2.3, the visible light transmissivity of this low emissivity glass surpasses 50%, the sunlight transmitance is 30%, and radiation coefficient is less than 0.05.
Embodiment 10: double-deck silverskin low emissivity glass, its structure is followed successively by: the silicon oxide film of the silverskin of the oxide film of substrate of glass, 60 nanometer thickness, the chromium film of 2 nanometer thickness, 10 nanometer thickness, the chromium film of 2 nanometers, 120 nanometer thickness, the chromium film of 2 nanometer thickness, the silverskin of 10 nanometer thickness, the chromium film of 2 nanometers, the silicon oxide film of 60 nanometer thickness, the specific refractory power of silicon oxide is controlled at 2.3, the visible light transmissivity of this low emissivity glass surpasses 50%, the sunlight transmitance is 30%, and radiation coefficient is less than 0.05.
Embodiment 11: double-deck silverskin low emissivity glass, its structure is followed successively by: the silverskin of the chromium film of the oxide film of substrate of glass, 60 nanometer thickness, the silverskin of 10 nanometer thickness, 2 nanometers, the silicon oxide film of 120 nanometer thickness, 10 nanometer thickness, the chromium film of 2 nanometers, the silicon oxide film of 60 nanometer thickness, the specific refractory power of silicon oxide is controlled at 2.3, the visible light transmissivity of this low emissivity glass surpasses 50%, the sunlight transmitance is 30%, and radiation coefficient is less than 0.05.
Embodiment 12: double-deck silverskin low emissivity glass, its structure is followed successively by: the silicon oxide film of the silverskin of the oxide film of substrate of glass, 60 nanometer thickness, the tantalum-oxide film of 5 nanometer thickness, 10 nanometer thickness, the tantalum-oxide film of 5 nanometers, 120 nanometer thickness, the tantalum-oxide film of 5 nanometer thickness, the silverskin of 10 nanometer thickness, the tantalum-oxide film of 5 nanometers, the silicon oxide film of 60 nanometer thickness, the specific refractory power of silicon oxide is controlled at 2.3, the visible light transmissivity of this low emissivity glass surpasses 60%, the sunlight transmitance is 30%, and radiation coefficient is less than 0.05.
Embodiment 13: double-deck silverskin low emissivity glass, its structure is followed successively by: the silverskin of the silicon oxide film of the silverskin of the oxide film of substrate of glass, 60 nanometer thickness, the tantalum-oxide film of 5 nanometer thickness, 10 nanometer thickness, the tantalum-oxide film of 5 nanometers, 120 nanometer thickness, the tantalum-oxide film of 5 nanometer thickness, 10 nanometer thickness, the tantalum-oxide film of 5 nanometers, the nitrogenize oxygen silicon fiml of 73 nanometer thickness, the specific refractory power of silicon oxide is controlled at 2.3, the specific refractory power of silicon oxynitride is controlled at 2, the visible light transmissivity of this low emissivity glass surpasses 50%, the sunlight transmitance is 30%, and radiation coefficient is less than 0.05.
Claims (6)
1. low emissivity glass, has single silver-colored membrane structure, from bottom to top comprise substrate of glass (10), the 1st layer of dielectric film (11), silver-colored film (12), the 2nd layer of dielectric film (13) in its basic structure successively, it is characterized in that: described dielectric film is made of silicon oxide or silicon oxynitride.
2. low emissivity glass according to claim 1, it is characterized in that: between dielectric film and silver-colored film, increase sticking power and strengthen film, this layer film can be metal titanium, zirconium, niobium, tantalum, chromium, the nickel film of individual layer, also can be the composite multilayer membrane that these metals are formed, its thickness be less than 3 nanometers.
3. low emissivity glass according to claim 1, it is characterized in that: between dielectric film and silver-colored film, increase sticking power and strengthen film, this layer film comprises the sull of metal titanium, zirconium, niobium, tantalum, chromium, nickel, zinc, aluminium, magnesium, rare earth element, and it is thick in 10 nanometers.
4. low emissivity glass, have two silver-colored membrane structures, from bottom to top comprise substrate of glass (30), the first layer dielectric film (31), the 1st layer of silver-colored film (32), the 2nd layer of dielectric film (33), the 2nd layer of silver-colored film (34), the 3rd layer of dielectric film (35) in its basic structure successively, it is characterized in that: described dielectric film is made of silicon oxide or silicon oxynitride.
5. low emissivity glass according to claim 4, it is characterized in that: between dielectric film and silver-colored film, increase sticking power and strengthen film, this layer film can be metal titanium, zirconium, niobium, tantalum, chromium, the nickel film of individual layer, also can be the composite multilayer membrane that these metals are formed, its thickness be less than 3 nanometers.
6. low emissivity glass according to claim 4, it is characterized in that: between dielectric film and silver-colored film, increase sticking power and strengthen film, this layer film comprises the sull of metal titanium, zirconium, niobium, tantalum, chromium, nickel, zinc, aluminium, magnesium, rare earth element, and it is thick in 10 nanometers.
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| CNA2007100796266A CN101255018A (en) | 2007-02-28 | 2007-02-28 | Low-radiation glass |
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| CNA2007100796266A CN101255018A (en) | 2007-02-28 | 2007-02-28 | Low-radiation glass |
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| CN101255018A true CN101255018A (en) | 2008-09-03 |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102180600A (en) * | 2011-03-13 | 2011-09-14 | 杭州春水镀膜玻璃有限公司 | Temperable low-radiation coated glass and preparation method thereof |
| CN104553202A (en) * | 2015-01-27 | 2015-04-29 | 大连爱瑞德纳米科技有限公司 | Window film and production method thereof as well as window film fixing structure and fixing method |
| CN105174744A (en) * | 2015-07-15 | 2015-12-23 | 重庆绿森钢化中空玻璃有限公司 | Double-silver low-emissivity coated glass, and laminated glass products based on double-silver low-emissivity coated glass |
| CN105271815A (en) * | 2015-09-28 | 2016-01-27 | 赛柏利安工业技术（苏州）有限公司 | Double-silver energy saving glass of selective sunlight filtering membrane system |
| CN105346159A (en) * | 2015-09-28 | 2016-02-24 | 赛柏利安工业技术（苏州）有限公司 | Three-silver energy-saving glass with sunshine selective filter film system |
-
2007
- 2007-02-28 CN CNA2007100796266A patent/CN101255018A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102180600A (en) * | 2011-03-13 | 2011-09-14 | 杭州春水镀膜玻璃有限公司 | Temperable low-radiation coated glass and preparation method thereof |
| CN104553202A (en) * | 2015-01-27 | 2015-04-29 | 大连爱瑞德纳米科技有限公司 | Window film and production method thereof as well as window film fixing structure and fixing method |
| CN105174744A (en) * | 2015-07-15 | 2015-12-23 | 重庆绿森钢化中空玻璃有限公司 | Double-silver low-emissivity coated glass, and laminated glass products based on double-silver low-emissivity coated glass |
| CN105174744B (en) * | 2015-07-15 | 2018-08-10 | 重庆绿森钢化中空玻璃有限公司 | Double-silver low-emissivity coated glass and laminated glass articles based on the coated glass |
| CN105271815A (en) * | 2015-09-28 | 2016-01-27 | 赛柏利安工业技术（苏州）有限公司 | Double-silver energy saving glass of selective sunlight filtering membrane system |
| CN105346159A (en) * | 2015-09-28 | 2016-02-24 | 赛柏利安工业技术（苏州）有限公司 | Three-silver energy-saving glass with sunshine selective filter film system |
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Open date: 20080903 |