CN102180600A - Temperable low-radiation coated glass and preparation method thereof - Google Patents
Temperable low-radiation coated glass and preparation method thereof Download PDFInfo
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Abstract
The invention discloses a temperable low-radiation coated glass which is characterized in that a dielectric layer I (2), a dielectric layer II (3), a metal barrier layer I (4), a silver layer (5), a metal barrier layer II (6), a dielectric layer III (7) and a dielectric layer IV (8) are arranged on the surface of a glass substrate (1) from bottom to top in turn; the dielectric layer I (2) is connected with the surface of the glass substrate (1); and the dielectric layer I (2) and the dielectric layer IV (8) are silica layers, the dielectric layer II (3) and the dielectric layer III (7) are stagnate layers of zinc oxide, and the metal barrier layer I (4) and the metal barrier layer II (6) are nichrome alloy layers. Simultaneously, the invention also discloses a method for preparing the temperable low-radiation coated glass. The temperable low-radiation coated glass has the characteristics of good thermal stability, good oxidation resistance, good membrane layer firmness, good wear resistance and alkali resistance and the like.
Description
Technical field
The present invention relates to glass art, but particularly low radiation coated glass of a kind of tempering and preparation method thereof.
Background technology
Chinese patent CN2721633 discloses the low radiation coated glass that a kind of special film is, includes glass substrate, is compounded with five retes on glass substrate, and first rete is that bottom is the metal oxide rete; Second rete is the metal or alloy blocking layer; The tertiary membrane layer is an argent; The 4th rete is the metal or alloy blocking layer; The 5th rete is that upper layer is the metal oxide rete.This structure can guarantee that silver layer is not influenced by oxygen, avoids silver layer oxidized, makes that one of the functional film layer of low radiation coated glass is that silver layer can play effect well, thereby obtains stable low radiation functions.This low radiation coated glass has certain antioxidant property, and the rete wear resisting property is good, and alkaline resistance properties is good, but also has the slightly poor defective of acid resistance.
Chinese patent CN201296729 discloses the low radiation coated glass that a kind of special film is, includes glass substrate, is compounded with six retes on glass substrate, and first rete is that bottom is a silicon nitride; Second rete is a titanium oxide; The tertiary membrane layer is a zinc oxide; The 4th rete is a silver; The 5th rete is a nickel chromium triangle; The 6th rete is that upper layer is a silicon nitride.Defectives such as this low radiation coated glass exists that antioxidant property is slightly poor, the rete wear resisting property is poor, alkaline resistance properties difference and acid resistance difference.The toughened glass that adopts this coated glass preparation and get, its performance still can not meet people's requirement.
Summary of the invention
But the technical problem to be solved in the present invention provides a kind of Heat stability is good, antioxidant property is good, the rete firmness is good, wear-resisting and the low radiation coated glass of the tempering that alkaline resistance properties is good and preparation method thereof.
In order to solve the problems of the technologies described above, but the invention provides a kind of low radiation coated glass of tempering, it is characterized in that: set gradually dielectric layer I, dielectric layer II, metal barrier I, silver layer, metal barrier II, dielectric layer III and dielectric layer IV from bottom to up on the surface of glass substrate; Dielectric layer I links to each other with the surface of glass substrate, and dielectric layer I and dielectric layer IV are silicon oxide (SiO
2) layer, dielectric layer II and dielectric layer III are the stannate (SnZnO of zinc oxide
3) layer, metal barrier I and metal barrier II are nichrome (NiCr) layer.
But the improvement as the low radiation coated glass of tempering of the present invention: the thickness of glass substrate is 4～12mm.
But the further improvement as the low radiation coated glass of tempering of the present invention: dielectric layer I, dielectric layer II, metal barrier I, silver layer, metal barrier II, dielectric layer III and dielectric layer IV thickness are followed successively by: 68～72nm, 66～70nm, 0.9～1.1nm, 8～10nm, 0.8～1.0nm, 56～60nm and 53～57nm.
But the present invention also provides the preparation method of the low radiation coated glass of above-mentioned tempering simultaneously, carries out following steps successively:
1), preparation coating material:
Dielectric layer I and dielectric layer IV adopt Si as target;
Dielectric layer II and dielectric layer III adopt tin and zinc blended casting cylinder shape target as target, and the weight ratio of Zn: Sn is=50: 50;
Metal barrier I and metal barrier II adopt nichrome as target, and nickel: the weight ratio of chromium is 80: 20;
Silver layer adopts silver as target;
2), in the plane magnetic control coating equipment, make the body vacuum pressure be lower than 1.0 * 10
-5Sputtering pressure in the Torr, coating chamber I～coating chamber VII is 1.7 * 10
-3Torr～3.0 * 10
-3Torr; Glass substrate is carried out following operation successively:
1., glass substrate is sent in the coating chamber I, in coating chamber I, Si is set as target; Adopt the mode of rotary target, control mode adopts the intermediate frequency power supply sputter; With O
2: Ar=1: 2 throughput ratio feeds in the coating chamber I; Thereby forming thicknesses of layers on glass substrate is the SiO of 68～72nm
2Layer is as dielectric layer I;
2., step gains are 1. sent in the coating chamber II, tin and zinc blended casting cylinder shape target is set in coating chamber II, adopts the mode of rotary target, control mode adopts the intermediate frequency power supply sputter; With O
2: Ar=2: 1 throughput ratio feeds in the coating chamber II; Thereby forming thicknesses of layers on dielectric layer I is the SnZnO of 66～70nm
3Layer is as dielectric layer II;
3., step gains are 2. sent in the coating chamber III, nichrome is set as target in coating chamber III, control mode adopts the direct supply sputter; Ar is fed in the coating chamber III; Thereby the nichrome layer that forms thicknesses of layers and be 0.9～1.1nm on dielectric layer II is as metal barrier I;
4., step gains are 3. sent in the coating chamber IV, silver is set as target in coating chamber IV, control mode adopts the direct supply sputter; Ar is fed in the coating chamber IV; Thereby forming thicknesses of layers on metal barrier I is the silver layer of 8～10nm;
5., step gains are 4. sent in the coating chamber V, nichrome is set as target in coating chamber V, control mode adopts the direct supply sputter; Ar is fed in the coating chamber V; Thereby the nichrome layer that forms thicknesses of layers and be 0.8～1.0nm on silver layer is as metal barrier II;
6., step gains are 5. sent in the coating chamber VI, tin and zinc blended casting cylinder shape target is set in coating chamber VI, adopts the mode of rotary target, control mode adopts the intermediate frequency power supply sputter; Make O
2: Ar=2: 1 throughput ratio feeds in the coating chamber VI; Thereby forming thicknesses of layers on metal barrier II is the SnZnO of 56～60nm
3Layer is as dielectric layer III;
7., step gains are 6. sent in the coating chamber VII, Si is set as target in coating chamber VII, adopts the mode of rotary target, control mode adopts the intermediate frequency power supply sputter; With O
2: Ar=6: 1 flow feeds in the coating chamber VII; Thereby forming thicknesses of layers on dielectric layer III is the SiO of 53～57nm
2Layer is as dielectric layer IV.
ZnSnO
3In application number is 200910089738.9 patent, corresponding informing arranged.
But the low radiation coated glass of tempering of the present invention has thermostability preferably, can guarantee that in tempering or hot bending tempering process glass surface can not be subjected to the attack of environment; Thereby prevent the Na in the glass
+Ion diffusion is in rete.
In the present invention, the stannate (SnZnO of zinc oxide
3) and silicon oxide (SiO
2But) be the dielectric substance of tempering, it can prevent the infiltration of oxygen and moisture.Thickness as the nichrome (NiCr) of metal barrier I and metal barrier II layer must be controlled at more than the 0.7nm; Purpose is in order to protect when 700 ℃ the tempering temperature, and silver layer can be not oxidized.
But the low radiation coated glass of tempering of the present invention has the following advantages:
1, the present invention merges into a rotation zinc-tin target, oxygen enrichment sputter with tin and two targets of zinc of routine usefulness.This material (rotation zinc-tin target) has deposition height, low-cost characteristics, and SnZnO
3It is very competent material.Under the identical situation of thicknesses of layers, zinc oxide has lower light absorption, can obtain higher light penetration.
But 2, the low radiation coated glass of tempering of the present invention, visible light transmissivity is controlled at 85%～87%, has higher shading coefficient (shading coefficient is more than 0.6).The optical parametric of glass surface and face all is controlled in Natural color (neutrality) color gamut.
But 3, the low radiation coated glass of tempering of the present invention, reflectivity is less than 9%.
But 4, the low radiation coated glass of tempering of the present invention as glass substrate, can carry out tempering or curved tempering with the 6mm transparent glass, and optical property remains unchanged substantially after carrying out tempering or thermal treatment.The specific performance parameter is as follows:
Plated film face T:82.5% before the tempering, L:31.31, a:-1.37, b:1.00; Glass surface L:35.02, a:-1.80, b:-4.96.
Plated film face T:85.5% behind the tempering, L:32.36, a:-1.11, b:-0.86; Glass surface L:33.97, a:-1.31, b:-4.38.
The variation of optical parametric before and after the tempering: Δ T=3%; Δ Ef=1.09; Δ Eg=1.30.
Above-mentioned optical property detects by GB/T 2680, and the instrument of employing is a spectrophotometer: Gradner TCSH; Portable measuring colour difference instrument: Cheek
TM
5, but the low radiation coated glass of tempering of the present invention meets the requirement of GB/T 18915.2-2002, and is specific as follows: wear resistance is good: the absolute value of the visible light of sample perspective ratio is less than 4% before and after the test, and the rete firmness is good; Alkali resistance is good: the absolute value of the visible light of sample perspective ratio is less than 4% before and after the test; Acid resistance is slightly poor: the absolute value of the visible light of sample perspective ratio is less than 7% before and after the test.
But 6, the low radiation coated glass of tempering of the present invention, behind tempering or the hot bending tempering, the antioxidant property of glass increases substantially.Can place under physical environment, the no pad pasting monolithic situation about 4-6 month.After 6 months, a spot of small particles only appears in face.
But 7, the silver layer uniform distribution of the low radiation coated glass of tempering of the present invention, thereby generation spot or atomizating phenomenon inhomogeneous because of the silver particles of silver layer or that cohesion causes have been overcome.
8, can big area production, can carry out the strange land tempering; Improved production efficiency greatly.
Description of drawings
Below in conjunction with accompanying drawing the specific embodiment of the present invention is described in further detail.
But Fig. 1 is the main TV structure synoptic diagram of the low radiation coated glass of tempering of the present invention;
Fig. 2 be the A-A of Fig. 1 cut open analyse and observe enlarged diagram.
Embodiment
But embodiment 1, Fig. 1 and Fig. 2 set gradually dielectric layer I2, dielectric layer II3, metal barrier I4, silver layer 5, metal barrier II6, dielectric layer III7 and dielectric layer IV8 in conjunction with the low radiation coated glass that has provided a kind of tempering from bottom to up on the surface of glass substrate 1; Dielectric layer I2 links to each other with the surface of glass substrate 1, and dielectric layer I2 and dielectric layer IV8 are silicon oxide (SiO
2) layer, dielectric layer II3 and dielectric layer III7 are the stannate (SnZnO of zinc oxide
3) layer, metal barrier I4 and metal barrier II6 are nichrome (NiCr) layer.The thickness of glass substrate 1 is 6mm.Dielectric layer I2, dielectric layer II3, metal barrier I4, silver layer 5, metal barrier II6, dielectric layer III7 and dielectric layer IV8 thickness are followed successively by: 70nm, 68nm, 1.0nm, 9nm, 0.9nm, 58nm and 55nm.
Its preparation method is for carrying out following steps successively:
1), preparation coating material:
Dielectric layer I2 and dielectric layer IV8 adopt Si as target;
Dielectric layer II3 and dielectric layer III7 adopt tin and zinc blended casting cylinder shape target as target, and the weight ratio of Zn: Sn is=50: 50;
Metal barrier I4 and metal barrier II6 adopt nichrome as target, and nickel: the weight ratio of chromium is 80: 20;
2), in the plane magnetic control coating equipment, make the body vacuum pressure be lower than 1.0 * 10
-5Torr (for example is 0.7 * 10
-5Torr), the sputtering pressure in coating chamber I～coating chamber VII is 2.0 * 10
-3Torr～2.2 * 10
-3Torr; With the 6mm transparent glass as glass substrate 1.
The for example optional plane magnetic control coating equipment that has U.S. AIRCO company to produce, the body vacuum pressure is meant that coating equipment vacuumizes the vacuum tightness that reaches processing requirement.
1., glass substrate 1 is sent in the coating chamber I, in coating chamber I silicon target is set, adopts the mode of rotary target (rotating speed is 15rpm), control mode adopts intermediate frequency power supply sputter (sputtering power is 43-45KW, and supply frequency is 30KHZ-40KHZ); Making oxygen argon ratio (is O for 100sccm: 200sccm
2: Ar=1: 2 throughput ratio) feed in the coating chamber I, coating speed is 200cm/min; Thereby forming thicknesses of layers on glass substrate 1 is the SiO of 70nm
2Layer is as dielectric layer I2.
2., step gains are 1. sent in the coating chamber II, tin and zinc blended casting cylinder shape target is set in coating chamber II, adopt the mode of rotary target (rotating speed is 15rpm), control mode adopts intermediate frequency power supply sputter (sputtering power is 42-45KW, and supply frequency is 30KHZ-40KHZ); Making oxygen argon ratio (is O for 400sccm: 200sccm
2: Ar=2: 1 throughput ratio) feed in the coating chamber II, coating speed is 200cm/min, is the SnZnO of 68nm thereby form thicknesses of layers on dielectric layer I2
3Layer is as dielectric layer II3.
3., step gains are 2. sent in the coating chamber III, nichrome is set as target in coating chamber III, control mode adopts direct supply (volts DS is the continuous current control of 280V) sputter; The Ar of 250sccm is fed in the coating chamber III; Coating speed is 200cm/min, and sputtering power is 1KW, is that the nichrome layer of 1.0nm is as metal barrier I4 thereby form thicknesses of layers on dielectric layer II3.
4., step gains are 3. sent in the coating chamber IV, silver is set as target in coating chamber IV, control mode adopts direct supply (volts DS is the continuous current control of 280V) sputter; The Ar of 250sccm is fed in the coating chamber IV, and coating speed is 200cm/min, and sputtering power is 3KW, and forming thicknesses of layers on metal barrier I4 is the silver layer 5 of 9nm.
5., step gains are 4. sent in the coating chamber V, nichrome is set as target in coating chamber V, control mode adopts direct supply (volts DS is the continuous current control of 280V) sputter; The Ar of 250sccm is fed in the coating chamber V; Coating speed is 200cm/min, and sputtering power is 0.9KW; Thereby the nichrome layer that forms thicknesses of layers and be 0.9nm on silver layer 5 is as metal barrier II6.
6., step gains are 5. sent in the coating chamber VI, tin and zinc blended casting cylinder shape target is set in coating chamber VI, adopt the mode of rotary target (rotating speed is 15rpm), control mode adopts intermediate frequency power supply sputter (sputtering power is 37-39KW, and supply frequency is 30KHZ-40KHZ); Making oxygen argon ratio (is O for 400sccm: 200sccm
2: Ar=2: 1 throughput ratio) feed in the coating chamber VI, coating speed is 200cm/min; Thereby forming thicknesses of layers on metal barrier II6 is the SnZnO of 58nm
3Layer is as dielectric layer III7.
7., step gains are 6. sent in the coating chamber VII, in coating chamber VII silicon target is set, adopts the mode of rotary target (rotating speed is 15rpm), control mode adopts intermediate frequency power supply sputter (sputtering power is 37-40KW, and supply frequency is 30KHZ-40KHZ); Making oxygen argon ratio (is O for 360sccm: 60sccm
2: Ar=6: 1 throughput ratio) feed in the coating chamber VII, coating speed is 200cm/min; Thereby forming thicknesses of layers on dielectric layer III7 is the SiO of 55nm
2Layer is as dielectric layer IV8.
Above-mentioned steps 1.～7. thickness of middle rete can be measured calculating by membrane uniformity (being called DDR again) software (Germany), and this is a routine techniques.
After testing: but the performance data of the low radiation coated glass of this tempering is as follows:
Plated film face T:82.5% before the tempering, L:31.31, a:-1.37, b:1.00, glass surface L:35.02, a:-1.80, b:-4.96; E (radiant ratio): 0.13.
Plated film face T:85.5% behind the tempering, L:32.36, a:-1.11, b:-0.86, glass surface L:33.97, a:-1.31, b:-4.38; E (radiant ratio): 0.11.
The variation of optical parametric before and after the tempering: Δ T=3%; Comprehensive aberration: Δ Ef=1.09; Δ Eg=1.30.
This optical property detects by GB/T 2680, and the instrument of taking is a spectrophotometer: Gradner TCSII; Portable measuring colour difference instrument: Cheek
TM
But the low radiation coated glass of the tempering of experiment 1, employing the foregoing description 1 gained prepares toughened glass, and concrete processing step and condition are as follows:
The annealing furnace of preparation toughened glass must adopt the flat curved annealing furnace of forced convection.
Concrete processing step: but the low radiation coated glass of the tempering of the foregoing description 1 gained is carried out the computer cutting by dimensional requirement, edging (boring), glass cleans, and is sent to last slice platform of annealing furnace after the glass cleaning, and following steel process parameter is set:
Upper temp: 657 ℃; Temperature of lower: 657 ℃; Heat-up time: 450s; The tempering time: 30s;
Cooling time: 140s; Tempering blast: 70%; Cooling wind pressure: 70%; Start blast: 30%;
Blast deviation: 0%; Pitch between wind: 25mm; Blow between time-delay: 4.0s; Blast transit time: 10s.
Glass enters heating zone automatically, comes and goes to heat, and after arriving heat-up time, glass enters flat steel or curved tempering air blast cooling automatically, after cooling time, runs to down the sheet platform automatically, after the Quality Inspector tests, cases for qualified.
The result is:
Behind tempering or the hot bending tempering, the rete optical parametric changes less (Δ Ef=1.09; Δ Eg=1.30), emissivity change less (Δ E=0.01), transmitance changes less (Δ T=3%).
Comparative Examples 1, the low radiation coated glass of Chinese patent CN201296729 gained is detected:
Its performance data is as follows:
Its visible light transmissivity is 80%, and shading coefficient is 0.62, and reflectivity is 10%.The specific performance parameter is as follows:
Plated film face T:81% L:33.28 a:-2.31 b:-1.19 before the tempering, glass surface L:34.63 a:-2.53b:-3.65; E (radiant ratio): 0.14.
Plated film face T:86% L:35.02 a:-0.79 b:4.30 behind the tempering, glass surface L:31.82 a:-0.67 b:-1.87; E (radiant ratio): 0.12.
Wear resistance: the absolute value of the visible light of sample perspective ratio is greater than 4% (being about 6%) before and after the test; Alkali resistance: the absolute value of the visible light of sample perspective ratio is greater than 4% (being about 6%) before and after the test; Acid resistance: the absolute value of the visible light of sample perspective ratio is greater than 10% before and after the test.Can place under physical environment, the no pad pasting monolithic situation about 2-4 month.
Contrast experiment 1, the above-mentioned Comparative Examples 1 described coated glass of employing prepare toughened glass, and concrete processing step and condition are as testing 1.
The result is: the rete optical parametric changes less (Δ Ef=5.96; Δ Eg=3.81), emissivity change less (Δ E=0.02), transmitance changes less (Δ T=6%).
At last, it is also to be noted that what more than enumerate only is several specific embodiments of the present invention.Obviously, the invention is not restricted to above embodiment, many distortion can also be arranged.All distortion that those of ordinary skill in the art can directly derive or associate from content disclosed by the invention all should be thought protection scope of the present invention.
Claims (4)
1. but the low radiation coated glass of tempering is characterized in that: set gradually dielectric layer I (2), dielectric layer II (3), metal barrier I (4), silver layer (5), metal barrier II (6), dielectric layer III (7) and dielectric layer IV (8) from bottom to up on the surface of glass substrate (1); Described dielectric layer I (2) links to each other with the surface of glass substrate (1), dielectric layer I (2) and dielectric layer IV (8) are silicon oxide layer, dielectric layer II (3) and dielectric layer III (7) are the stannic acid salt deposit of zinc oxide, and metal barrier I (4) and metal barrier II (6) are the nichrome layer.
2. but the low radiation coated glass of tempering according to claim 1, it is characterized in that: the thickness of described glass substrate (1) is 4～12mm.
3. but the low radiation coated glass of tempering according to claim 1 and 2, it is characterized in that: described dielectric layer I (2), dielectric layer II (3), metal barrier I (4), silver layer (5), metal barrier II (6), dielectric layer III (7) and dielectric layer IV (8) thickness are followed successively by: 68～72nm, 66～70nm, 0.9～1.1nm, 8～10nm, 0.8～1.0nm, 56～60nm and 53～57nm.
4. but as the preparation method of the low radiation coated glass of any one tempering in the claim 1～3, it is characterized in that carrying out successively following steps:
1), preparation coating material:
Dielectric layer I (2) and dielectric layer IV (8) adopt Si as target;
Dielectric layer II (3) and dielectric layer III (7) adopt tin and zinc blended casting cylinder shape target as target, and the weight ratio of described Zn: Sn is=50: 50;
Metal barrier I (4) and metal barrier II (6) adopt nichrome as target, and described nickel: the weight ratio of chromium is 80: 20;
Silver layer (5) adopts silver as target;
2), in the plane magnetic control coating equipment, make the body vacuum pressure be lower than 1.0 * 10
-5Sputtering pressure in the Torr, coating chamber I～coating chamber VII is 1.7 * 10
-3Torr～3.0 * 10
-3Torr; Glass substrate (1) is carried out following operation successively:
1., glass substrate (1) is sent in the coating chamber I, in coating chamber I, Si is set as target; Adopt the mode of rotary target, control mode adopts the intermediate frequency power supply sputter; With O
2: Ar=1: 2 throughput ratio feeds in the coating chamber I; Thereby going up the formation thicknesses of layers at glass substrate (1) is the SiO of 68～72nm
2Layer is as dielectric layer I (2);
2., step gains are 1. sent in the coating chamber II, tin and zinc blended casting cylinder shape target is set in coating chamber II, adopts the mode of rotary target, control mode adopts the intermediate frequency power supply sputter; With O
2: Ar=2: 1 throughput ratio feeds in the coating chamber II; Thereby going up the formation thicknesses of layers at dielectric layer I (2) is the SnZnO of 66～70nm
3Layer is as dielectric layer II (3);
3., step gains are 2. sent in the coating chamber III, nichrome is set as target in coating chamber III, control mode adopts the direct supply sputter; Ar is fed in the coating chamber III; Thereby go up forming thicknesses of layers at dielectric layer II (3) is that the nichrome layer of 0.9～1.1nm is as metal barrier I (4);
4., step gains are 3. sent in the coating chamber IV, silver is set as target in coating chamber IV, control mode adopts the direct supply sputter; Ar is fed in the coating chamber IV; Thereby going up the formation thicknesses of layers at metal barrier I (4) is the silver layer (5) of 8～10nm;
5., step gains are 4. sent in the coating chamber V, nichrome is set as target in coating chamber V, control mode adopts the direct supply sputter; Ar is fed in the coating chamber V; Thereby go up forming thicknesses of layers at silver layer (5) is that the nichrome layer of 0.8～1.0nm is as metal barrier II (6);
6., step gains are 5. sent in the coating chamber VI, tin and zinc blended casting cylinder shape target is set in coating chamber VI, adopts the mode of rotary target, control mode adopts the intermediate frequency power supply sputter; Make O
2: Ar=2: 1 throughput ratio feeds in the coating chamber VI; Thereby going up the formation thicknesses of layers at metal barrier II (6) is the SnZnO of 56～60nm
3Layer is as dielectric layer III (7);
7., step gains are 6. sent in the coating chamber VII, Si is set as target in coating chamber VII, adopts the mode of rotary target, control mode adopts the intermediate frequency power supply sputter; With O
2: Ar=6: 1 throughput ratio feeds in the coating chamber VII; Thereby going up the formation thicknesses of layers at dielectric layer III (7) is the SiO of 53～57nm
2Layer is as dielectric layer IV (8).
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| CN103213345A (en) * | 2013-04-28 | 2013-07-24 | 中山源谥真空科技有限公司 | Workpiece comprising color-changing-resistant abrasion-resistant composite film and method for forming composite film on surface of workpiece |
| CN103940755A (en) * | 2013-07-01 | 2014-07-23 | 北京物华天宝安全玻璃有限公司 | Angle test method for toughened double-silver film-coated glass and devices thereof |
| CN107746188A (en) * | 2013-03-13 | 2018-03-02 | 分子间公司 | For producing coat system, the method and apparatus of the low emissivity glass for including ternary alloy three-partalloy |
| CN108793768A (en) * | 2018-06-29 | 2018-11-13 | 南通安企熙医疗科技有限公司 | A kind of low emissivity glass with ZrN layers |
| CN114735945A (en) * | 2022-04-15 | 2022-07-12 | 深圳南玻应用技术有限公司 | Composite glass and preparation method and application thereof |
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|---|---|---|---|---|
| CN107746188A (en) * | 2013-03-13 | 2018-03-02 | 分子间公司 | For producing coat system, the method and apparatus of the low emissivity glass for including ternary alloy three-partalloy |
| CN103213345A (en) * | 2013-04-28 | 2013-07-24 | 中山源谥真空科技有限公司 | Workpiece comprising color-changing-resistant abrasion-resistant composite film and method for forming composite film on surface of workpiece |
| CN103940755A (en) * | 2013-07-01 | 2014-07-23 | 北京物华天宝安全玻璃有限公司 | Angle test method for toughened double-silver film-coated glass and devices thereof |
| CN108793768A (en) * | 2018-06-29 | 2018-11-13 | 南通安企熙医疗科技有限公司 | A kind of low emissivity glass with ZrN layers |
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| CN114735945B (en) * | 2022-04-15 | 2023-09-26 | 深圳南玻应用技术有限公司 | Composite glass and preparation method and application thereof |
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Application publication date: 20110914 |