CN102584030A - Coated glass with high light transmission and low radiation - Google Patents
Coated glass with high light transmission and low radiation Download PDFInfo
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- CN102584030A CN102584030A CN2012100212716A CN201210021271A CN102584030A CN 102584030 A CN102584030 A CN 102584030A CN 2012100212716 A CN2012100212716 A CN 2012100212716A CN 201210021271 A CN201210021271 A CN 201210021271A CN 102584030 A CN102584030 A CN 102584030A
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Abstract
The invention discloses coated glass with high light transmission and low radiation, which comprises a glass substrate and a film system formed on the glass substrate, wherein the film system successively comprises a first film layer composition layer, a functional layer and a second film layer composition layer from the glass substrate to the outside; the first film layer composition layer and the second film layer composition layer respectively at least comprise an Si film layer; the first Si film layer of the first film layer composition layer and the second Si film layer of the second film layer composition layer are respectively positioned on the upper side and the lower side of the function layer and are tightly adjacent to the function layer; and the function layer is an Ag layer. The glass film system disclosed by the invention can be deposited under the anaerobic condition, and the function layer of the coated glass can be effectively prevented from being oxidized. In addition, the coated glass has the advantages of simple film layer structure, strong film system adhesive force, high visible light transmittance and low radiant emittance and is easy to deposit.
Description
Technical field
The invention belongs to the coated glass production field, specifically is a kind of high light transmittance low radiation coated glass.
Background technology
Along with the raising that modern architecture requires finishing material, people are also increasingly high to the requirement as the glass of one of material of construction.Glass is the indispensable integral part of buildings and automobile, is bearing many important function, comprises outward appearance, the daylighting of beautifying constructure and automobile and gives the indoor open visual field of bringing.But simple glass sunlight transmitance is very high, ir reflectance is very low, and most of sunshine sees through in the glass inlet chamber, the meeting heating object, and these indoor energy can lose through glass with forms of radiation.According to statistics, account for 50% of whole building and heating or energy consumption for cooling through the door and window dispersed heat in the buildings, and the heat that runs off through glass just accounts for about 80% of whole window.To this phenomenon; The glass of low-radiation film has appearred plating in the market; Its thermal insulation is improved greatly; Especially in the market the single silver low radiation glass that generally adopts is the special glass that the infrared rays in the sunshine is foreclosed and simultaneously object secondary rays heat reflection gone back, and more and more receives people's welcome.But existing single silver low radiation glass adopts oxygenatedchemicals layer or oxycompound combination layer as blocking layer and dielectric layer usually, in the deposition process of said blocking layer and said dielectric layer, because the affiliation that adds of oxygen makes sedimentary in advance Ag that oxidation take place.Simultaneously, in use, the silver-colored simple substance of internal layer also is prone to oxidized in single silver low radiation glass; When its because of oxidation has lost single silver low radiation function; Make it equally with simple glass not possess heat-proof quality, and the transmittance of visible light also can step-down, makes its indoor darkness.And existing single silver low radiation coated glass membrane system adhesive power is low, under high-temperature condition, is easy to generate the phenomenon of demoulding, and the glass of forfeiture film system also can be lost low radiation functions and heat-proof quality.Thereby existing low radiation coated glass remains further to be improved.
Summary of the invention
Technical purpose of the present invention is to solve the problems of the prior art, provides a kind of film structure simple, and functional layer is difficult for taking place the high light transmittance low radiation coated glass of oxidation.
Technical scheme of the present invention is:
A kind of high light transmittance low radiation coated glass comprises substrate of glass and the film system that is formed on the substrate of glass, it is characterized in that:
Said film is outwards to comprise the first rete combination layer, functional layer and the second rete combination layer successively from substrate of glass; At least comprise all in the said first rete combination layer, the second rete combination layer that one deck is the rete of Si layer; The said first rete combination layer has a Si rete; The said second rete combination layer has the 2nd Si rete; The one Si rete of the first rete combination layer and the 2nd Si rete of the second rete combination layer lay respectively at the both sides up and down of said functional layer and are close to functional layer, and said functional layer is the Ag layer.
Further technical scheme also comprises:
The said first rete combination layer, functional layer and the second rete combination layer are sedimentary film layer structure in the oxygen free condition atmosphere.
The said first rete combination layer comprises first dielectric layer and is formed on the Si rete on said first dielectric layer; The said second rete combination layer comprises the 2nd Si rete that is deposited on the said functional layer and is formed on second dielectric layer on said the 2nd Si rete that said first dielectric layer, second dielectric layer are Si
3N
4Layer.
As preferably, the thicknesses of layers scope of a Si rete of the first rete combination layer can be made as 1-10nm in the said film system, is 2-8nm as the thicknesses of layers scope of a Si rete of the preferred first rete combination layer.
The present invention will be positioned at functional layer Ag layer, and up and down both sides and the rete that is close to functional layer are made as the plan of Si film layer; Effectively avoid the oxidation to functional layer Ag layer in deposition process and product use of existing oxide dielectric layers, improved the quality of product greatly.And the present invention is simple in structure, is easy to manufacture, and the glassy product color behind the plated film is neutral, but has that adhesive power between tempering, the rete is strong, a high visible light transmissivity, advantage that radiant ratio is low.
Description of drawings
Fig. 1 is the structural representation of high light transmittance low radiation coated glass of the present invention;
Fig. 2 is the face reflection spectrum curve of high light transmittance low radiation coated glass of the present invention;
Fig. 3 is the glass surface reflection spectrum curve of high light transmittance low radiation coated glass of the present invention;
Fig. 4 is the transmissison characteristic spectrogram of high light transmittance low radiation coated glass of the present invention;
Fig. 5 directly is deposited on the SEM figure on the substrate of glass for Ag;
Fig. 6 has the SEM figure on the substrate of glass of 1nm thickness the one Si rete for Ag is deposited on;
Fig. 7 has the SEM figure on the substrate of glass of 3nm thickness the one Si rete for Ag is deposited on;
Fig. 8 directly is deposited on the AFM figure on the substrate of glass for Ag;
Fig. 9 has the AFM figure on the substrate of glass of 1nm thickness the one Si rete for Ag is deposited on;
Figure 10 has the AFM figure on the substrate of glass of 3nm thickness the one Si rete for Ag is deposited on.
Embodiment
For technical scheme, technical characterictic that the present invention is realized, reach purpose and effect and be easy to understand and understand, below in conjunction with embodiment, further set forth the present invention.
As shown in Figure 1, a kind of high light transmittance low radiation coated glass comprises substrate of glass 1 and the film system that is formed on the substrate of glass 1, and said film is outwards to comprise successively from substrate of glass 1:
1) the first rete combination layer, the said first rete combination layer comprises at least one Si rete.Concrete, the said first rete combination layer comprises first dielectric layer 2 that is deposited on the substrate of glass 1 and is deposited on the Si rete 3 on said first dielectric layer 2;
2) functional layer 4, and said functional layer 4 is the Ag layer, and said functional layer 4 is deposited on the said Si rete 3;
3) the second rete combination layer, the said second rete combination layer comprises at least one Si rete.Concrete, the said second rete combination layer comprises the 2nd Si rete 5 that is deposited on the said functional layer 4 and is deposited on second dielectric layer 6 on said the 2nd Si rete 5.
The film system deposition whole process of high light transmittance low radiation coated glass of the present invention is carried out in anaerobic atmosphere, has suppressed the Ag layer oxidation as functional layer 4 effectively.
Consult Fig. 5-Fig. 7, the SEM that directly is deposited on the substrate of glass 1 for the Ag as functional layer 4 shown in Figure 5 schemes.Fig. 6 is the SEM figure on the substrate of glass 1 that is deposited on the Si rete 3 with 1nm thickness as the Ag of functional layer 4.Fig. 7 is the SEM figure on the substrate of glass 1 that is deposited on the Si rete 3 with 3nm thickness as the Ag of functional layer 4.Can know that from Fig. 5 the Ag particle diameter that forms said functional layer 4 is 2-3nm.Can know that from Fig. 6 deposition is as the Ag rete of functional layer 4 on the substrate of glass 1 of the Si rete 3 with 1nm thickness, coacervation takes place in said Ag, and has tangible boundary line.Can know from Fig. 7,1 deposition Ag layer on the substrate of glass of a Si rete 3 with 3nm thickness, said Ag peplomer footpath is even, and face is smooth.Fig. 6 and Fig. 7 comparison can know that deposition Ag effect is better on the substrate of glass of the Si rete 3 with 3nm thickness, and said Ag peplomer footpath is even, and face is smooth, is beneficial to follow-up film-forming process.
Consult Fig. 8-Figure 10, Fig. 8 directly is deposited on the AFM figure on the substrate of glass for Ag.Fig. 9 is the AFM figure on the substrate of glass 1 that is deposited on the Si rete 3 with 1nm thickness as the Ag of functional layer 4.Figure 10 is the AFM figure on the substrate of glass 1 that is deposited on the Si rete 3 with 3nm thickness as the Ag of functional layer.Can know from Fig. 8-Figure 10, on the substrate of glass 1 that Ag directly is deposited on the substrate of glass 1, Ag is deposited on the Si rete 3 with 1nm thickness, the surfaceness that is deposited on the substrate of glass 1 of the Si rete 3 with 3nm thickness of Ag improves successively.
With above-mentioned picture is example, and in the present invention, SEM and the AFM as the Ag layer of functional layer 4 schemes to know that the thickness range of a said Si rete 3 is 1-10nm, preferably 2-8nm according to deposition on a Si rete 3 of different thickness.
Specific embodiment 1:
The film based material structure of present embodiment glassy product is: substrate of glass/Si
3N
4/ Si/Ag/Si/Si
3N
4, wherein said first dielectric layer 2 is Si
3N
4Layer, thicknesses of layers is 35.6nm, the thicknesses of layers of a said Si rete 3 is 3.1nm;
Said functional layer 4 is the Ag layer, and thicknesses of layers is 12.5nm;
The thicknesses of layers of said the 2nd Si rete 5 is 3.0nm, and said second dielectric layer 6 is Si
3N
4Layer, thicknesses of layers is 27.8nm.
The glassy product optical property that above-mentioned parameter is made is (glassy product is a 5mm common white glass) as follows:
Glass visible light transmissivity T=89.6%;
Visible light glass surface reflectivity=6.5%;
Visible light glass surface chromaticity coordinates a* (green) value=-0.6 to red;
Visible light glass surface chromaticity coordinates b* (blue) value=-3.8 to yellow;
Visible light face reflectivity=6.5%;
Visible light face chromaticity coordinates a* (green)=-0.3 to red;
Visible light face chromaticity coordinates b* (blue)=-2.0 to yellow;
Glass radiant ratio E=0.074.
Shown in Fig. 2-4, can know that by Fig. 2, Fig. 3 the glassy product of this embodiment has high permeability at visible region, the near-infrared region is had low-E, but have the Gaoyang light transmission rate at visible region by Fig. 4 knowledge capital embodiment glass.
More than show and described ultimate principle of the present invention, principal character and advantage of the present invention.The technician of the industry should understand; The present invention is not restricted to the described embodiments; That describes in the foregoing description and the specification sheets just explains principle of the present invention; Under the prerequisite that does not break away from spirit and scope of the invention, the present invention also has various changes and modifications, and these variations and improvement all fall in the scope of the invention that requires protection.The present invention requires protection domain to be defined by appending claims and equivalent thereof.
Claims (5)
1. a high light transmittance low radiation coated glass comprises substrate of glass and the film system that is formed on the said substrate of glass, it is characterized in that:
Said film is outwards to comprise the first rete combination layer, functional layer and the second rete combination layer successively from substrate of glass; All comprise a Si rete at least in the said first rete combination layer, the second rete combination layer; The said first rete combination layer has a Si rete; The said second rete combination layer has the 2nd Si rete; The one Si rete of the first rete combination layer and the 2nd Si rete of the second rete combination layer lay respectively at the both sides up and down of said functional layer and are close to functional layer, and said functional layer is the Ag layer.
2. a kind of high light transmittance low radiation coated glass according to claim 1 is characterized in that:
The said first rete combination layer, functional layer and the second rete combination layer are sedimentary film layer structure in the oxygen free condition atmosphere.
3. a kind of high light transmittance low radiation coated glass according to claim 2 is characterized in that:
The said first rete combination layer comprises first dielectric layer and is formed on the Si rete on said first dielectric layer; The said second rete combination layer comprises the 2nd Si rete that is deposited on the said functional layer and is formed on second dielectric layer on said the 2nd Si rete that said first dielectric layer, second dielectric layer are Si
3N
4Layer.
4. according to the described a kind of high light transmittance low radiation coated glass of arbitrary claim among the claim 1-3, it is characterized in that:
The thicknesses of layers scope of the Si rete in the said first rete combination layer is 1-10nm.
5. according to the described a kind of high light transmittance low radiation coated glass of claim 1-3, it is characterized in that:
The thicknesses of layers scope of the Si rete in the said first rete combination layer is 2-8nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012100212716A CN102584030A (en) | 2012-01-31 | 2012-01-31 | Coated glass with high light transmission and low radiation |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012100212716A CN102584030A (en) | 2012-01-31 | 2012-01-31 | Coated glass with high light transmission and low radiation |
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| CN102584030A true CN102584030A (en) | 2012-07-18 |
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ID=46473373
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012100212716A Pending CN102584030A (en) | 2012-01-31 | 2012-01-31 | Coated glass with high light transmission and low radiation |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104309220A (en) * | 2014-10-30 | 2015-01-28 | 中山市亨立达机械有限公司 | Golden single-silver LOW-E glass with special film system |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20000019637A (en) * | 1998-09-14 | 2000-04-15 | 윤종용 | Portable computer |
| JP2007070146A (en) * | 2005-09-06 | 2007-03-22 | Nippon Sheet Glass Co Ltd | Low emissive multilayered glass |
| CN200958077Y (en) * | 2006-10-19 | 2007-10-10 | 林嘉宏 | Low-radiant strengthened film-coating glass |
| CN101648778A (en) * | 2009-09-24 | 2010-02-17 | 李德杰 | Low-radiation glass |
| CN101708961A (en) * | 2009-12-01 | 2010-05-19 | 李德杰 | Off-line coated low-irradiation glass |
| FR2927897B1 (en) * | 2008-02-27 | 2011-04-01 | Saint Gobain | ANTISOLAR GLAZING HAVING IMPROVED LUMINOUS TRANSMISSION COEFFICIENT. |
| CN201908045U (en) * | 2010-12-30 | 2011-07-27 | 林嘉宏 | Single-silver-layer low-emissivity coated glass capable of being processed at different places |
-
2012
- 2012-01-31 CN CN2012100212716A patent/CN102584030A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20000019637A (en) * | 1998-09-14 | 2000-04-15 | 윤종용 | Portable computer |
| JP2007070146A (en) * | 2005-09-06 | 2007-03-22 | Nippon Sheet Glass Co Ltd | Low emissive multilayered glass |
| CN200958077Y (en) * | 2006-10-19 | 2007-10-10 | 林嘉宏 | Low-radiant strengthened film-coating glass |
| FR2927897B1 (en) * | 2008-02-27 | 2011-04-01 | Saint Gobain | ANTISOLAR GLAZING HAVING IMPROVED LUMINOUS TRANSMISSION COEFFICIENT. |
| CN101648778A (en) * | 2009-09-24 | 2010-02-17 | 李德杰 | Low-radiation glass |
| CN101708961A (en) * | 2009-12-01 | 2010-05-19 | 李德杰 | Off-line coated low-irradiation glass |
| CN201908045U (en) * | 2010-12-30 | 2011-07-27 | 林嘉宏 | Single-silver-layer low-emissivity coated glass capable of being processed at different places |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104309220A (en) * | 2014-10-30 | 2015-01-28 | 中山市亨立达机械有限公司 | Golden single-silver LOW-E glass with special film system |
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Application publication date: 20120718 |