CN101555101B - Down-type substrate sliming device and slimming system using the same - Google Patents
Down-type substrate sliming device and slimming system using the same Download PDFInfo
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- CN101555101B CN101555101B CN2008101784491A CN200810178449A CN101555101B CN 101555101 B CN101555101 B CN 101555101B CN 2008101784491 A CN2008101784491 A CN 2008101784491A CN 200810178449 A CN200810178449 A CN 200810178449A CN 101555101 B CN101555101 B CN 101555101B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/068—Apparatus for etching printed circuits
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- Surface Treatment Of Glass (AREA)
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Abstract
The invention provides a down-type substrate slimming device and slimming system using the same. The down-type glass slimming device includes: a fixing part for vertically fixing at least one substrate; a nozzle disposed vertically top of the substrate for etching solution flowing down along surface of the substrate. Here, a plurality of the nozzles are disposed vertically top side of the substrate, otherwise, includes a specific holding part, a slit for etching solution going through and a guide part, so that etching solution provided from nozzle etching along surface of the substrate when the etching solution is overflow, and a buffer dissepiment for preventing excessive overflow of etching solution.
Description
Technical field
The present invention relates to a kind of following to following formula glass slimming device and a kind of slimming system: said device makes etching solution lean on gravity to flow to the bottom from the top of glass naturally along glass surface; Realize the etched while of desired glass thus; Minimizing can carry out ultrathin typeization to thickness of glass by bad etc. as glass sludge and the caused cut of particle of the by product of generation glass etching after; Said system has etch module and washes module when using this device, can in an operation, wash and etching.
Background technology
Recently, along with the development of semi-conductor, display equipment industry, and, press for the technology that development is carried out slimming to the display panel made from the state of glassivation (Panel) according to the human consumer's who pursues compact product requirement.That is,, require the thickness of glass that is used in LCD substrate etc. carry out ultrathin typeization along with the slimming of equipment, as the technology of carrying out such slimming, the etching method of employing display panel (Panel).Know the prior art that adopts the chemical method for etching counter plate to carry out slimming, infusion method (Dip), gunite (Spray) etc. are arranged.
Summary of the invention
Invent problem to be solved
Yet; Engraving method like this from the outer jet etching solution, perhaps is immersed in the etching solution; Bubble is provided in order to carry out etching inevitably; Therefore, fine particle or cut on etching face, occur, therefore exist to be difficult to the problem of carrying out meticulous glass etching and adopting the thickness reducing step of glass etching.
In addition, there is following inconvenience: be accompanied by etching work procedure and will carry out the washing of etching solution; When not obtaining meticulous etching, have to carry out once more etching work procedure, therefore also exist to be difficult to operate in a large number the problem that productivity is lower.
The present invention proposes in order to address the above problem; Its purpose is; Provide a kind of following to following formula glass slimming device: in order to remove because etching solution jet-type or soak and the particle and the cut of the glass substrate that bubble (Bubble) is produced during in etching; Have as the functional spray nozzle part of supplying with the feed unit along the vertical free-falling etching solution of real estate from substrate top; Can reduce the generation of particle and cut thus significantly, high-quality glass is provided, and can carry out ultrathin typeization display panel (Panel).
Another object of the present invention is; Provide the enough operations of a kind of ability carry out before and after etching work procedure and the etching washing step to following formula glass slimming system; Except operation was simplified, also additional circulation formula etching solution and washing water system were reduced manufacturing expense thus.
The means of dealing with problems
In order to address the above problem, the invention provides a kind ofly to following formula glass slimming device, particularly have: fixed part, to substrate vertical fixing of major general; Spray nozzle part is arranged on the vertical direction of said substrate, and etching solution is flowed down along said substrate surface.At this; Said spray nozzle part is provided with a plurality of in the vertical upper direction of substrate; In addition; Have distinctive accommodation section, etching solution through slit and guide part, carry out etching along substrate surface simultaneously so that the etching solution of supplying with from spray nozzle part overflows mobile, and have the buffering next door in order to prevent etching solution from excessively flowing out.
The invention effect
If according to the present invention; Then can abandon from the outside jet-type etching work procedure that glass or liquid crystal panel are carried out, provide a kind of have etching solution is flowed down from the top of substrate, and lean on gravity to carry out the etching system of etched spray nozzle part along substrate surface; Thus; Can reduce the generation of particle and cut significantly, high-quality glass is provided simultaneously, and can carry out ultrathin typeization display panel (Panel).
In addition; Because the etch system that provides a kind of etch module and washing module to combine; Can reduce manufacturing process's expense through etching solution circulation and water lotion circulation; And, in an operation, can carry out the slimming glass that repeatable operation has perfect quality with acquisition, therefore can improve the efficient of thickness reducing step.
Description of drawings
Fig. 1 illustrates the sketch chart to following formula substrate slimming apparatus structure of the present invention.
Fig. 2 is the stereographic map that the major portion of spray nozzle part structure of the present invention is shown.
Fig. 3 is the enlarged view that the major portion in buffering next door in the spray nozzle part of the present invention is shown.
Fig. 4 is the structure iron that an embodiment who is suitable for the slimming system to following formula substrate slimming device of the present invention is shown.
Fig. 5 is the structure iron that another embodiment that is suitable for the slimming system to following formula substrate slimming device of the present invention is shown.
Fig. 6 is the figure that the multiple suitable example that is suitable for the slimming system to following formula substrate slimming device of the present invention is shown.
Embodiment
It is a kind of to following formula glass slimming device that the present invention provides, and has: fixed part, to substrate vertical fixing of major general; Spray nozzle part is arranged on the vertical direction of said substrate, and etching solution is flowed down along said substrate surface.The present invention can eliminate to carrying out defectives such as etched substrate, particle that produces when promptly glass or liquid crystal panel carry out etching or sludge, and therefore a kind of high-quality substrate through slimming can be provided.
In addition, the present invention provides a kind of and it is characterized by, said spray nozzle part the vertical upper side of said substrate be provided with at least one, with the mode of adjustable nozzles flow form to following formula glass slimming device.Thus, with regard to the etching operation of a plurality of substrates, but mass production reaches desired degree.
In addition, the present invention provides a kind of and it is characterized by, and said spray nozzle part comprises: the accommodation section, hold the etching solution that injects from the outside; Guide part, the etching solution that will overflow the described accommodation section be directed to said substrate vertical upper direction to following formula glass slimming device.Do not adopt spraying or spray regime, make etching solution carry out etching naturally along will the carry out free-falling while of etched glass surface, thus, can eliminate defectives such as producing particle or cut, the high-quality substrate that passes through slimming can be provided.
In addition; The present invention provides a kind of and it is characterized by; The etching solution that upper side in the described accommodation section is formed with the definite part opening is through slit, in said lateral direction through slit, be formed with etching solution guide into equably said guide part a plurality of guides to following formula glass slimming device.Thus can to carry out the outflow of direct etch liquid naturally of etched substrate surface, therefore can improve etched efficient.
In addition, the present invention provides a kind of and it is characterized by, and is formed with the phenomenon that the flow that is used to prevent the etching solution supplied with increases at definite part rapidly in the inside of described accommodation section, the even mobile buffering of direct etch liquid next door to following formula glass slimming device.The flow that can prevent etching solution thus increases the phenomenon that perhaps sprays to top rapidly.
In addition, the present invention provides a kind of and it is characterized by, said buffering next door by the thin-plate element that is formed with a plurality of etching solutions buffering through holes constitute to following formula glass slimming device.Basically be, natural and outflow equably is provided with the buffering next door in the accommodation section for direct etch liquid, because it exists, can prevent more effectively that the flow of etching solution from increasing the phenomenon that perhaps sprays to top rapidly.
In addition, the present invention provides a kind of and it is characterized by, and said guide part adopts the structure that tilts gradually along vertically downward, its end with the corresponding mode of vertical upper direction of the upper side of said substrate arrange to following formula glass slimming device.Can make etching solution thus under the front and back side spontaneous current of substrate, and etching solution is fallen from the vertical upper direction of substrate.
In addition, the present invention provides a kind of and it is characterized by, said etching solution be selected from the hydrofluoric acid class, mix acids and non-hydrofluoric acid class etching solution any one to following formula glass slimming device.
In addition; Above-mentionedly come glass is carried out the etch system of etching and washing in order to embody to be suitable for to following formula glass slimming device; It is a kind of to following formula glass slimming system that the present invention provides; It is characterized in that comprising: the washing module has the washing chamber that at least one substrate cleaned under the state that stands vertically; Etch module; Have the substrate through said substrate washing module is carried out etched etching chamber; Said etching chamber is provided with one at least in the vertical upper side of said substrate, has: spray nozzle part makes etching solution freely fall along the surperficial of said substrate from the vertical upper direction of said substrate; Fixed part with at least one substrate vertical fixing, has mobile unit, and said fixed part is moved with moving back and forth between the inside of realizing said washing module and etch module.Thus, make and to carry out the etching and washing operation of substrate through an operation simultaneously, therefore can improve the efficient of operation sequence.
In addition, the present invention provides a kind of and it is characterized by, and said spray nozzle part comprises: the accommodation section, hold the etching solution that injects from the outside; Guide part, the etching solution that will overflow the described accommodation section be directed to said substrate vertical upper direction to following formula glass slimming system.
In addition; The present invention provides a kind of and it is characterized by; The etching solution that upper side in above-mentioned described accommodation section to following formula glass slimming system is formed with the definite part opening passes through slit; In said lateral direction through slit, be formed with etching solution guide into equably said guide part a plurality of guides to following formula glass slimming system.
In addition, the present invention provides a kind of and it is characterized by, be formed with in the inside of described accommodation section buffering next door that the flow that is used to prevent the etching solution supplied with increases rapidly to following formula glass slimming system.
In addition, the present invention provides a kind of and it is characterized by, said buffering next door by the thin-plate element that is formed with a plurality of etching solutions buffering through holes constitute to following formula glass slimming system.
In addition, the present invention provides a kind of and it is characterized by, and also has etching solution circulation feed unit, and it comprises the etching solution that uses in said etch module is fed to said etching chamber, make used etching solution once more the round-robin structure to following formula glass slimming system.Thus, can effectively use etching solution, practice thrift the manufacturing expense of thickness reducing step.
In addition, the present invention provides a kind of and it is characterized by, said etching solution circulation feed unit comprise etching solution master storage vessel with etching solution supply pump of supplying with etching solution to following formula glass slimming system.
In addition, the present invention provides a kind of and it is characterized by, have the etching solution returnable that is used to be recovered in the used etching solution of said etching chamber to following formula glass slimming system.Can improve the organic efficiency of etching solution thus.
In addition, the present invention provides a kind of and it is characterized by, and said etching solution feed unit has at least one filter house, and this filter house carries out filtering to following formula glass slimming system to used etching solution in said etching chamber.Thus, can eliminate the dirts such as sludge that are contained in the etching solution, improve the efficient of etching work procedure.
In addition; The present invention provides a kind of and it is characterized by; Have the etching solution that feeds to said etching chamber carried out filtering first strainer, said etching solution returnable also have to the etching solution that reclaims from said etching chamber carry out filtering second strainer to following formula glass slimming system.Thus, can eliminate the sludge that is contained in the etching solution or corrode thing, etch residues, improve etched efficient.
In addition, the present invention provides a kind of and it is characterized by, and said etching solution master storage vessel also has the 3rd strainer, the 3rd strainer filter the etching solution that reclaims from said etching chamber sludge to following formula glass slimming system.Can improve etched efficient thus.
In addition; The present invention provides a kind of and it is characterized by; Said washing module also has washing and uses the water cycle feed unit; This washing has adopted the washing water that will in said washing module, use to feed to said washing chamber with the water cycle feed unit, with used washing water once more the round-robin structure to following formula glass slimming system.Thus, can proceed to the matting of substrate, therefore can improve the efficient of thickness reducing step from etching work procedure.
In addition, the present invention provides a kind of and it is characterized by, said washing with the water cycle feed unit have through washing water supply pump supply with the washing water washing water master storage vessel to following formula glass slimming system.
In addition, the present invention can provide a kind of it is characterized by, also have the washing water returnable that is used to be recovered in the used washing water in said washing chamber to following formula glass slimming system.
In addition, the present invention provides a kind of and it is characterized by, and said washing has at least one strainer with the water cycle feed unit, and this strainer carries out filtering to following formula glass slimming system to the washing water that has cleaned said substrate.Thus, can obtain effectively washing effect through the filtration of washing water.
In addition, the present invention provides a kind of and it is characterized by, and said washing water master storage vessel also has the 4th strainer, and the 4th strainer filters the washing water that feeds to said washing chamber; Said washing water returnable also has the 5th strainer, and the 5th strainer carries out filtering to following formula glass slimming system to the washing water that reclaims from said washing chamber.
In addition, the present invention provides a kind of and it is characterized by, with said washing module be provided with at least one to following formula glass slimming system.Thus, can guarantee the efficient of series-operation, and can provide on the manufacture convenience and when mass production the economy on the operation.
In addition, the present invention provides a kind of and it is characterized by, with said etch module be provided with at least one to following formula glass slimming system.
In addition, the present invention provides a kind of and it is characterized by, the gangway of substrate be formed on same position to following formula glass slimming system.
In addition, the present invention provides a kind of and it is characterized by, the gangway of said substrate be formed on different positions to following formula glass slimming system.
In addition, the present invention provides a kind of and it is characterized by, in said washing module and structure that said etch module is connected, form in said washing module substrate the gangway to following formula glass slimming system.
In addition; The present invention provides a kind of and it is characterized by; In the front side of said at least one etch module or rear side when being connected with the washing module; The input port of said substrate is formed on the washing module of said front, the relief outlet of said substrate be formed on etching operation finish after the washing module that is transferred of substrate to following formula glass slimming system.
In addition, the present invention provides a kind of and it is characterized by, also have drip washing or irradiation modules to following formula glass slimming system.Realize the perfect of operation thus.
Below, describe with reference to accompanying drawing to structure of the present invention and effect.
In Fig. 1; Main points to following formula glass slimming device of the present invention are; Under the state that glass or liquid crystal panel (below be called " substrate ") 20 stood vertically, etching solution is free-falling from substrate top along substrate surface to carry out etching simultaneously making, and realizes slimming.In addition, have the etching chamber 10 of etching substrates, be useful on the fixed part 30 that stands vertically substrate in the set inside of this etching chamber 10.
This fixed part 30 is to form with the structure that can stand vertically substrate, the structure of left and right sides chucking substrate or clamping (Clamp) structure etc., but so long as clamping substrate and erectting and the fixed works just can be deformed into various structures.In preferred present embodiment, fixed part 30 is to insert substrate and the fixed anchor clamps from top to the bottom.These anchor clamps have and can insert and the structure of fixing at least one substrate, and its underpart is fixed on the mode that the inner state of etching chamber can be loaded or unload with substrate and is connected with mobile unit 50.For etching chamber with after can this substrate of conveyance between each chamber under one or more washing chamber situation about being connected of stating, move unit 50 preferably have the conveyance track also can be through synchronous Tape movement.But, do not realize that through the whole bag of tricks such as indivedual conveyance rollers, string rubbers type of drive also can only for due to this.Certainly, preferably form the supply can comprehensively regulate etching solution, through moving moving and the control part (not shown) of etching speed of the substrate that carries out the unit.
The present invention has the spray nozzle part 100 that is used for supplying with from the vertical top of substrate etching solution on etching chamber top.
Structure and effect to spray nozzle part 100 describe with reference to Fig. 2.Shown in Fig. 2 (a), spray nozzle part 100 comprises: accommodation section 110 is used to hold the etching solution of supplying with from outside etching solution supply-pipe P; Guide part 120 guides the etching solution that is contained in this accommodation section 110 after overflowing the accommodation section, to flow to the vertical upper direction of substrate.
With regard to guide part 120, as shown in the figure, preferably, from the part that is connected with the accommodation section until the part of substrate be formed obliquely with respect to orientation substrate so that etching solution arrives substrate top naturally when the periphery of accommodation section moves.
Guide part adopts the structure of S very close to each other basically, and etching solution is flow down directly over substrate.In addition, as other instances, guide part 120 forms gap S at central part, and the definite part on substrate top is sandwiched in the structure of this gap S and also can.So,, can etching solution be supplied on the substrate both side surface equably, improve etched efficient if the top of substrate is sandwiched in the gap of guide part.
Especially, preferably, on the upper side of described accommodation section, be formed with the etching solution with definite part opening shape and pass through slit 130, it is outside that the etching solution that overflows the accommodation section is flowed to.
In addition, etching solution preferably forms on the long dimensional directions of accommodation section 110 through slit 130.Through on the lateral direction of slit 130, preferably form a plurality of guides 140 at this etching solution to guide etching solution into guide part 120 equably.This guide 140 can cloudy mode of carving be formed with guiding groove, so that etching solution flows to and the direction that intersects vertically through slit 130.Thus, etching solution is guided guide part into along the buckling shape of the main part of accommodation section naturally.
Shown in Fig. 2 (b), in other embodiments, will be integrally formed through slit 130 and etching solution guide 140, forming through after the slit, form guide 140 at two ends and also can through slit 130 with the perpendicular direction of the long dimensional directions of accommodation section.
In order to prevent to make etching solution from passing through the effusive rapidly phenomenon of slit owing to the increase rapidly of the etching solution that flows into from the pipe P that supplies with etching solution, preferably, 110 the set inside buffering next door 150 in the accommodation section.Preferably, buffering next door 150 is disposed at inside, accommodation section, has the thin sheet form that is formed with etching solution buffering through hole 151.Should pass towards the next door 150 owing to exist, and can prevent that the etching solution of accommodation section from rising rapidly, and can regulate the feed speed and the flow of etching solution, and can evenly flow by direct etch liquid.
Shown in Fig. 2 (c)～(e), accommodation section 110 can form different shape.Promptly; So long as can supply with the structure of etching solution equably; The shape (d) that section has certain inclination for oval (c), section for circular (e) or top waits and can make that etching solution is smooth and easy to flow and make the periphery of accommodation section be rendered as the structure of curved surface, just all can adopt.
In addition, as shown in Figure 3, preferably, buffering next door 150 forms thin sheet form, is formed with a plurality of etching solution buffering through holes 151 simultaneously, the lift velocity that can regulate etching solution thus.Especially; The communicating pores that buffering through hole 151 so long as be equivalent to cushions next door thickness gets final product; In addition, the shape of these through holes adopt as Fig. 3 (b) shown in round shape also can, preferably the handstand truncated cone of employing shown in Fig. 3 (c) can more effectively be controlled the lift velocity of etching solution.The buffering through hole is not limited thereto, and can adopt various section shapes such as tetragon, rhombus, ellipse as required.
The etching solution of being supplied with can use the hydrofluoric acid class basically, mix various etching solutions such as acids or non-hydrofluoric acid class.Especially, the etching solution that uses as glass etching liquid usually is all applicable to this device.That is the reaction that, contains the etching solution series of hydrofluoric acid can be explained by following formula.Basically be, glass combines with fluorine in the hydrofluoric acid, generates sludge (SiF
4) and water, simultaneously glass is carried out this principle of slimming.
aHF+bSiF
4→cSiF
4+dH
2O
Thereby, in being suitable for an example of etching solution, use HF as the etching solution of hydrofluoric acid class, wherein, can sneak into additive and the tensio-active agent of water, trace and use.
Etching solution as mixing acids can use HF basically, wherein, can sneak into nitric acid (HNO
3), sulfuric acid (H
2SO
4) and use, also can add additive.
As the etching solution of non-hydrofluoric acid class, use Neutral ammonium fluoride (NH4F) basically, acid ammonium fluoride (NH
4FHF) etc. ammonium fluoride wherein adds sulfuric acid or tensio-active agent and uses and also can.
The etching chamber that comprises above structure constitute have etching solution supply with storage vessel and a plurality of strainers to following formula glass slimming system; And through combining with the washing module that the substrate before and after the etching is washed; Make every effort to realize the robotization and the series-operation of operation, can improve the efficient of operation.
As shown in Figure 4; Can form following structure: etching chamber 100 is combined with washing chamber 200; The operation of washing substrate is connected with etching work procedure as integrated operation; Have etching solution circulation feed unit or wash circulation feed unit (below be called " etch module " reach " washing module "), to circulate washing between chamber and the etching chamber through moving the unit.Especially, as the part that drops into substrate, on washing one side, chamber, form the gangway; Through moving the unit substrate is loaded into washing chamber 200, after basic washing EO, through moving unitary driving; The passage portion (not shown) that forms via the connection portion at washing chamber and etching chamber automatically is loaded into etching chamber, carries out etching operation at this, afterwards; The substrate of etching operation of being through with is sent to the washing chamber once more, after through the washing operation, discharges from the washing chamber.Especially, for the integrity of operating, such operation that moves back and forth is certainly carried out repeatedly.Such embodiment can carry out various deformation, and this is described in the back.
Structure of the present invention is specified; The present invention can possess the etch module with following structure: have the etching solution master storage vessel 300 that is used for supplying with to etching chamber etching solution; Etching solution is fed to the said nozzle portion of etching chamber through etching solution supply pump 310; After substrate is carried out etching, once more etching solution is recovered in the etching solution master storage vessel.Mounting filtering device 320,330 respectively in the supply of etching solution and recovery process certainly; And then; In etching solution master storage vessel, load other strainers, desludging, the recycle pump 340 of the etching solution that perhaps externally is provided for separately circulating; And strainer 350 is set to filter sludge, can purify etching solution thus.Thus, can not discard employed etching solution in etching work procedure and continue to use, therefore can guarantee the economy of manufacturing process, and can realize the lightening of accurate substrate.
Especially, can have washing chamber 200, it combines with above-mentioned etching chamber, and substrate is arrived wherein by conveyance through moving the unit.In this washing chamber; Substrate is being imported before the etching chamber cleaning base plate in advance, through the successive operation with substrate transferring in etching chamber and carry out etching, then; The substrate that will pass through etching operation once more conveyance in the washing chamber; After cleaning, discharge, therefore carry out the thickness reducing step of substrate, can make every effort to realize the simplification of operation through simple series-operation.
With reference to Fig. 5 other embodiment to following formula glass slimming system of the present invention of further segmentation are described.Certainly; Of the present invention to following formula glass slimming system basically; Have etching chamber 100 and washing chamber 200,, have in addition through being used to supply with the structure that etching solution circulates with the etching solution master storage vessel of washing water 300 and washing water master storage vessel 210 and supplies with various liquid.To this, also have a plurality of strainers that are used for desludging or dirt, perhaps also have the pump of the various liquid that are used to circulate, deformable is a various embodiments.That is, etching solution filtered make its operable filter element in following formula slimming system, at least one being set, for the efficiency of series-operation, the user can regulate certainly as required.
Enumerate a wherein example, can have: the etching solution supply pump 310 that is used for supplying with etching solution to etching chamber 100; Be used for the etching solution of being supplied with is carried out filtering first strainer 320; Be used for after etching operation, reclaiming the etching solution returnable 370 of etching solution; Etching solution is reclaimed pump 360 from the etching solution that returnable is transplanted on etching solution master storage vessel; And be arranged on this recovery path, be used for etching solution is carried out filtering second strainer 330.Certainly, the pump 340 and the 3rd strainer 350 of the etching solution that can be provided for separately in the outside of etching solution master storage vessel circulating are to filter sludge once more.These strainers can add or reduce as required, can adjust adaptably and change with working condition.
In the washing chamber, have the washing water master storage vessel 210 and washing water supply pump 220 that are used to supply with the washing water basically, also can have at least one strainer that is used for the filtered water scouring water.For example, the quantity of strainer can be regulated by the user according to the speed and the efficient of operation sequence, as an example wherein, can have the 4th strainer 230 of removing dirt in the washing water.After the washing EO, reclaim pump 250 to washing water master storage vessel 210 recycle-water scouring waters through washing water returnable 260 that is used for the recycle-water scouring water and the washing water that is used for the recycle-water scouring water.Certainly, also preferably has for example the 5th strainer 240 of other strainers in the case, with the filtered water scouring water.These strainers can add or reduce as required, can adjust adaptably and change with working condition.
Use Fig. 6 to describe to the various variation to following formula glass slimming system of the present invention.
That is be that repeated multiple times is washed the structure with etching work procedure, has as this structure: the substruction (a) that only has washing module and etch module to constitute when through mobile unit a plurality of substrates being moved back and forth; Two washing modules are set, the structure (b) of etch module is set; In the middle of etch module places, in the forward and backward structure (c) that the washing module is set of this etch module; In the centre two etch module are set, the structure (d) of washing module is set at its two ends; And the structure of (d) is provided with structure (e) of drip washing and drying process chamber etc.
Especially, for the efficiency of operation,, in the washing module side gangway of substrate is set, after carrying out etching and washing step repeatedly, at same direction discharge substrate at above-mentioned (a) with (b) in the structure.Can certainly form relief outlet in the etch module side, but when washing module when being arranged at the front side,, preferably discharge from the front side in order to remove the etching solution after the etching.
In addition, like (c) and (e) shown in the structure, when at least one etch module is set in the centre,, then preferably the input port and the relief outlet of substrate is respectively formed at not homonymy if consider the efficiency of operation.Certainly, the same with the structure of above-mentioned (a) and (b), also can the gangway be arranged on a side during this situation.
In different variation; Can use and move the unit and carry out the reciprocation cycle operation, in addition, after etch module in the structure of combination water mold cleaning piece; Be employed in etching and discharge the structure of product afterwards immediately, preferably adopt the series-operation structure of not carrying out reciprocation cycle and discharging product immediately.
More than, enumerate the clear the present invention of concrete embodiment, but the present invention in the scope that does not break away from category of the present invention, certainly carries out various distortion not only for due to these concrete examples.Thereby technological thought of the present invention is only for due to specific embodiment, and be defined in the claim scope and the scope that is equal to it in.
Claims (29)
1. one kind to following formula glass slimming device, has:
Fixed part is with at least one substrate vertical fixing;
Spray nozzle part is arranged on the vertical direction of said substrate, and etching solution is flowed down along said substrate surface;
Said spray nozzle part comprises:
The accommodation section holds the etching solution that injects from the outside;
Guide part, the etching solution that will overflow the described accommodation section is directed to the vertical upper direction of said substrate.
2. according to claim 1ly it is characterized in that to following formula glass slimming device said spray nozzle part is provided with one at least in the vertical upper side of said substrate, form with the mode of adjustable nozzles flow.
3. according to claim 1 to following formula glass slimming device; It is characterized in that; The etching solution that upper side in the described accommodation section is formed with the definite part opening passes through slit; In said lateral direction, be formed with a plurality of guides of etching solution being guided equably into said guide part through slit.
4. describedly it is characterized in that according to claim 1 or 3, be formed with the buffering next door that the flow that is used to prevent the etching solution supplied with increases rapidly in the inside of described accommodation section to following formula glass slimming device.
5. according to claim 4ly it is characterized in that said buffering next door is made up of the thin-plate element that is formed with a plurality of etching solutions buffering through holes to following formula glass slimming device.
6. according to claim 1ly it is characterized in that to following formula glass slimming device that said guide part adopts the structure that tilts gradually along vertically downward, its end is to arrange with the corresponding mode of vertical upper direction of the upper side of said substrate.
7. according to claim 6ly it is characterized in that said etching solution is any one of etching solution that is selected from the hydrofluoric acid class, mixes acids and non-hydrofluoric acid class to following formula glass slimming device.
8. one kind to following formula glass slimming system, it is characterized in that comprising:
The washing module has the washing chamber that at least one substrate cleaned under the state that stands vertically;
Etch module has the substrate through said substrate washing module is carried out etched etching chamber,
Said etching chamber is provided with one at least in the vertical upper side of said substrate, has: spray nozzle part makes etching solution freely fall along the surperficial of said substrate from the vertical upper direction of said substrate; Fixed part, with at least one substrate vertical fixing,
Have mobile unit, said fixed part is moved with moving back and forth between the inside of realizing said washing module and etch module;
Said spray nozzle part comprises:
The accommodation section holds the etching solution that injects from the outside;
Guide part, the etching solution that will overflow the described accommodation section is directed to the vertical upper direction of said substrate.
9. according to claim 8 to following formula glass slimming system; It is characterized in that; The etching solution that upper side in the described accommodation section is formed with the definite part opening passes through slit; In said lateral direction, be formed with a plurality of guides of etching solution being guided equably into said guide part through slit.
10. according to claim 9ly it is characterized in that, be formed with the buffering next door that the flow that is used to prevent the etching solution supplied with increases rapidly in the inside of described accommodation section to following formula glass slimming system.
11. according to claim 10ly it is characterized in that said buffering next door is made up of the thin-plate element that is formed with a plurality of etching solutions buffering through holes to following formula glass slimming system.
12. it is according to claim 9 to following formula glass slimming system; It is characterized in that; Also have etching solution circulation feed unit, it comprises the etching solution that uses in said etch module is fed to said etching chamber, makes used etching solution round-robin structure once more.
13. according to claim 12ly it is characterized in that said etching solution circulation feed unit comprises the etching solution master storage vessel with etching solution supply pump of supplying with etching solution to following formula glass slimming system.
14. according to claim 12ly it is characterized in that having the etching solution returnable that is used to be recovered in the used etching solution of said etching chamber to following formula glass slimming system.
15. according to claim 12ly it is characterized in that to following formula glass slimming system said etching solution circulation feed unit has at least one filter house, this filter house filters used etching solution in said etching chamber.
16. according to claim 14ly it is characterized in that to following formula glass slimming system,
Have the etching solution that feeds to said etching chamber carried out filtering first strainer,
The etching solution that said etching solution returnable also has reclaiming from said etching chamber carries out filtering second strainer.
17. according to claim 13ly it is characterized in that to following formula glass slimming system said etching solution master storage vessel also has the 3rd strainer, the 3rd strainer filters the sludge of the etching solution that reclaims from said etching chamber.
18. according to claim 11 or 16 described to following formula glass slimming system; It is characterized in that; Said washing module also has washing and uses the water cycle feed unit; This washing has adopted the washing water that will in said washing module, use to feed to said washing chamber with the water cycle feed unit, with used washing water round-robin structure once more.
19. according to claim 18ly it is characterized in that said washing has the washing water master storage vessel of supplying with the washing water through washing water supply pump with the water cycle feed unit to following formula glass slimming system.
20. according to claim 19ly it is characterized in that also having the washing water returnable that is used to be recovered in the used washing water in said washing chamber to following formula glass slimming system.
21. according to claim 20ly it is characterized in that to following formula glass slimming system said washing has at least one strainer with the water cycle feed unit, this strainer filters the washing water that has cleaned said substrate.
22. according to claim 21ly it is characterized in that to following formula glass slimming system said washing water master storage vessel also has the 4th strainer, the 4th strainer filters the washing water that feeds to said washing chamber; Said washing water returnable also has the 5th strainer, and the 5th strainer filters the washing water that reclaims from said washing chamber.
23. according to claim 8ly it is characterized in that, said washing module be provided with at least one to following formula glass slimming system.
24. according to claim 23ly it is characterized in that, said etch module be provided with at least one to following formula glass slimming system.
25., it is characterized in that the gangway of substrate is formed on same position according to claim 23 or 24 described to following formula glass slimming system.
26., it is characterized in that the gangway of said substrate is formed on different positions according to claim 23 or 24 described to following formula glass slimming system.
27. describedly it is characterized in that according to claim 23 or 24, in said washing module and structure that said etch module is connected, form the gangway of substrate in said washing module to following formula glass slimming system.
28. according to claim 23 or 24 described to following formula glass slimming system; It is characterized in that; When being connected with the washing module in the front side of said at least one etch module; The input port of said substrate is formed on the washing module of front, the relief outlet of said substrate be formed on etching operation finish after the washing module that is transferred of substrate.
29., it is characterized in that also having drip washing or irradiation modules according to claim 23 or 24 described to following formula glass slimming system.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2008-0033314 | 2008-04-10 | ||
| KR1020080033314A KR100889949B1 (en) | 2008-04-10 | 2008-04-10 | Method for slimming glass and slimming system of the same |
| KR1020080033314 | 2008-04-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101555101A CN101555101A (en) | 2009-10-14 |
| CN101555101B true CN101555101B (en) | 2012-05-23 |
Family
ID=40698571
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008101784491A Expired - Fee Related CN101555101B (en) | 2008-04-10 | 2008-11-26 | Down-type substrate sliming device and slimming system using the same |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5272197B2 (en) |
| KR (1) | KR100889949B1 (en) |
| CN (1) | CN101555101B (en) |
| TW (1) | TWI393681B (en) |
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| KR101038572B1 (en) * | 2009-06-05 | 2011-06-02 | 주식회사 엠엠테크 | Etching system using the vacuum absorption zig for fixing substrate |
| KR101081466B1 (en) * | 2009-07-30 | 2011-11-08 | 노바테크인더스트리 주식회사 | A jig for slimming a glass substrate and a construction for slimming a glass substrate |
| KR101195374B1 (en) * | 2010-07-29 | 2012-10-29 | 주식회사 엠엠테크 | top-down spray type substrate etching device |
| KR101168701B1 (en) | 2010-11-15 | 2012-07-30 | (주)에프아이에스 | Eching Apparatus With Guide Blade |
| KR101252601B1 (en) | 2011-08-25 | 2013-04-10 | (주) 청심이엔지 | Apparatus for etching glass wafer |
| KR101371159B1 (en) | 2012-01-30 | 2014-03-06 | (주) 청심이엔지 | Anti-shock etching apparatus for glass wafer |
| KR101352469B1 (en) | 2012-02-02 | 2014-01-17 | (주) 청심이엔지 | Apparatus for etching glass wafer |
| KR101151296B1 (en) * | 2012-02-03 | 2012-06-08 | 주식회사 엠엠테크 | Apparatus for etching substrate |
| KR101391078B1 (en) | 2012-02-14 | 2014-04-30 | 주식회사 아바텍 | Apparatus for etching a glass substrate |
| CN102659321B (en) * | 2012-05-14 | 2015-03-18 | 汕头市拓捷科技有限公司 | Equipment and method for single-surface thinning of multiple pieces of glass |
| TW201402491A (en) * | 2012-07-09 | 2014-01-16 | Global Display Co Ltd | System for manufacturing ultra-thin glass |
| KR101338849B1 (en) | 2012-08-09 | 2013-12-06 | 노바테크 (주) | Blade for etching glass substrate |
| KR101388563B1 (en) * | 2013-02-25 | 2014-04-23 | (주) 청심이엔지 | Apparatus for etching glass wafer |
| CN103880295B (en) * | 2014-02-26 | 2017-01-11 | 江西沃格光电股份有限公司 | Glass thinning equipment and glass thinning method |
| KR101624716B1 (en) * | 2014-12-22 | 2016-05-26 | 주식회사 토비스 | a nozzle for other types etchant, and a etching apparatus for double sided having the same |
| JP2016179913A (en) * | 2015-03-23 | 2016-10-13 | 三和フロスト工業株式会社 | Etching method of glass substrate and device therefor |
| CN104991357B (en) * | 2015-06-26 | 2018-12-07 | 武汉华星光电技术有限公司 | LCD glass substrate etches bearing fixture and top-jet-type etching machine |
| KR101673417B1 (en) * | 2015-07-14 | 2016-11-07 | 에스피텍 주식회사 | Manufacturing Method for Reducing Thickness Deflection of Ultra-Thin Type Glass Plate |
| CN108227257B (en) * | 2018-02-06 | 2021-01-26 | 京东方科技集团股份有限公司 | Thinning device and thinning method |
| CN109485263A (en) * | 2018-10-18 | 2019-03-19 | 武汉华星光电半导体显示技术有限公司 | Panel thinning apparatus and its fixed structure |
| KR102020789B1 (en) | 2019-01-21 | 2019-11-04 | 주식회사 티오텍 | Glass plate etching apparatus having improved rectangular corner etching efficiency |
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Also Published As
| Publication number | Publication date |
|---|---|
| JP5272197B2 (en) | 2013-08-28 |
| TW201002636A (en) | 2010-01-16 |
| CN101555101A (en) | 2009-10-14 |
| TWI393681B (en) | 2013-04-21 |
| KR100889949B1 (en) | 2009-03-20 |
| JP2009249276A (en) | 2009-10-29 |
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