KR101673417B1

KR101673417B1 - Manufacturing Method for Reducing Thickness Deflection of Ultra-Thin Type Glass Plate

Info

Publication number: KR101673417B1
Application number: KR1020150099532A
Authority: KR
Inventors: 김종호; 김덕현; 박동해; 송영남; 전재균; 박찬주
Original assignee: 에스피텍 주식회사
Priority date: 2015-07-14
Filing date: 2015-07-14
Publication date: 2016-11-07

Abstract

The present invention relates to a manufacturing method of an ultra-thin glass having a minimized thickness difference, in which a glass material is etched to a thickness of 550-700 m in an etching device and processed into an ultra-thin glass having a thickness of 50 m or less. The manufacturing method comprises: a first loading step of loading the glass material on a first jig, and loading the same on an etching device; a first etching step of performing an etch by spraying an etching solution via a top-spray nozzle spraying technique, a side-spray nozzle spraying technique, or a top-and-side spray nozzle spraying technique, and performing a first etch on the glass material to a thickness of 150-250 m in order to reduce the thickness difference and thereby processing the first glass material into a first etched glass; a first unloading step of unloading the first-etched first etched glass from the first jig; a second loading step of loading the first-etched glass on a second jig, and loading the same on the etching device; a second etching step of performing a second etching on the first-etched glass to a thickness of 50 m or less by spraying an etching solution via a top-spray nozzle spraying technique, a side-spray nozzle spraying technique, or a top-and-side spray nozzle spraying technique, and thereby processing the first-etched glass into an ultra-thin glass; and a second unloading step of discharging the second jig on which the second-etched ultra-thin glass is loaded from the etching device, and unloading the ultra-thin glass from the second jig. According to the manufacturing method of an ultra-thin glass having a minimized thickness difference, since the entire operation takes only two processes, the operation efficiency can be increased by reducing the number of operators required, the quality can be improved by keeping the thickness difference within 5%, and the yield can be maximized by not touching the bottom surface during the operation and thereby maintaining the failure rate within 5% or less.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a manufacturing method of an ultra-thin glass having a minimized thickness variation,

The present invention relates to a method of manufacturing an ultra-thin glass, and more particularly, to a method of manufacturing an ultra-thin glass having a minimized thickness deviation so that a thickness deviation of an ultra-thin glass of 0.05 mm or less used in a flexible display product is minimized.

The curved display, which is now in the form of a curved shape that is now available, will continue to evolve in the future in the form of Ben Double (Foldable), Foldable (foldable), Rollerable (spoken) Such a foldable type is a patent related to Shimadone Display that can be folded in half like a wallet by Samsung Electronics.

According to the patent, the display can freely fold back and forth without any damage to the screen, and it can bend at a ratio of half (5: 5) or 3: 7, and the angle of folding is 90 degrees. And how to implement and implement the smartphone to which the folder display can be applied.

High-strength films are applied to flexible display products such as foldable displays. However, high-strength film products can be folded more than 100,000 times because of the disadvantage of less than 100,000 times in the bending test and less than 96% in transmittance. It will be a trend to apply very thin glass instead.

In order to apply glass to flexible display products, it is required to secure mass production technology for very thin glass slimming technology of 0.05 mm (50 μm) or less.

In addition, it is urgently required to develop a technology for thinning a display panel, which is manufactured in a form in which glass is cemented, in accordance with the recent developments in the semiconductor and display equipment industries and the needs of consumers who desire small and light products.

That is, the thickness of the glass used for the substrate of the LCD is required to be thin in accordance with the thinning of the equipment, and such thinning technique is performed through etching of the display panel.

Dip, spray and dip & spray methods are widely known in the past as thinning techniques.

However, this also requires a very complicated process, a very high cost, difficulty in maintenance, and scratches on the glass surface.

Even though such scratches may be microscopic, a fatal error occurs in advanced equipment such as a display panel, and the value of the product is remarkably reduced, so that a small scratch is very important that the glass is immediately disposed of.

That is, whichever of the above techniques is used, when the display panel is etched by bubbling or spraying with an external etching solution, the surface of the glass is damaged by microscopic scratches or particles, Which causes a fatal quality defect in equipment such as a display that requires a very thin display panel, even if the thin display panel has a very fine scratch, it is disadvantageous that the cost is greatly increased.

A method of manufacturing an ultra-thin glass plate disclosed in Japanese Patent No. 10-1304103 includes the steps of inserting a jig equipped with a glass plate having a first thickness into a spray bath provided with a spray nozzle and spraying an etchant onto the glass plate with the spray nozzle, Forming a glass plate having a second thickness that is thinner; The etching solution is filled in the spray bath to fill the jig and the etching solution is injected into the spray nozzle to transfer the etching solution to the glass plate having the second thickness in the form of a water stream so that the reaction product on the surface of the glass plate reacted with the etching solution Thereby forming a glass plate having a third thickness that is thinner than the second thickness; Forming an ultrasonic rod on the spray bath and vibrating the glass plate having the third thickness with an ultrasonic bar to remove the reaction product to form a glass plate having a fourth thickness thinner than the third thickness , 700 ㎛ thick raw materials should be first processed to 200 ~ 300 ㎛, then second processed to 100 ㎛ and third processed to 50 ㎛, and ultrasound should be used for third processing. Therefore, Is over 30%, resulting in quality deterioration. In addition, a breakage rate of 40% or more occurs in the work, resulting in a significantly low product yield.

The top down type glass thinning method disclosed in Japanese Patent No. 10-0835745 is a method for thinning a glass by vertically setting a glass or a display panel by a fixing part for fixing the glass and a display panel and for controlling the flow rate of the etching liquid uniformly, It is a general method to slice the glass or the display panel by flowing the etching solution uniformly or varying the flow rate of the etching solution along the surface of the glass from the upper part to the lower part and is limited to the top spray method The present invention is specific and the etching method is not limited.

1. Korean Patent Registration No. 10-1304103 (Registered Date: Sep. 05, 2013) Manufacturing method of ultra-thin glass plate 2. Korean Patent Laid-Open Publication No. 10-2015-0046219 (published on Apr. 29, 2015), a method of processing a flexible glass substrate, and a substrate stack including a flexible glass substrate and a carrier substrate 3. Korean Patent Registration No. 10-0835745 (Registered on May 30, 2008) Top down method of glass thinning

In order to solve the above problems, the present invention simplifies the process by a two-step etching process. In the first-step etching process, the left and right sides and bottom surfaces of the raw material glass are fixed after the etch rate is raised to improve productivity, The present invention provides a method of manufacturing an ultra-thin glass which minimizes the thickness deviation of the glass substrate by reducing the glass breakage rate and reducing the thickness variation of the glass substrate by only fixing the left and right sides of the glass and flooding the bottom surface.

The manufacturing method of the present invention is a method for manufacturing ultra slim glass to a thickness of 50 탆 or less by etching a raw material glass having a thickness of 550 탆 or 700 탆 in an etching apparatus and loading the raw glass into the first jig, A first loading step of loading a first jig loaded with a raw material glass into the etching apparatus; Top Spray Nozzle Spray, side spray nozzle spray or top and side spray nozzle spray to etch the etchant and reduce thickness variation. A first etching step of performing primary etching to a thickness of 150 to 250 占 퐉 to form a primary etching glass; A first unloading step of unloading the first etching glass from the first jig after discharging the first jig loaded with the first etching glass from the etching apparatus; A second loading step of loading the first etch glass into the second jig and loading the second jig loaded with the first etch glass into the etch apparatus; Top spray nozzles (Top Spray Nozzle) Spray nozzles (Side Spray Nozzle) or Top and Side Spray Nozzle spray nozzles are used to spray the etchant, A secondary etching step of fabricating ultra-thin glass; And a second unloading step of unloading the ultra-thin glass from the second jig after ejecting the second jig having the second ultra-thin glass loaded thereon from the etching apparatus.

A first rinsing step of cleaning the etching solution remaining in the first etching glass with a washing solution for etching unevenness and stain removal causing a defect between the first etching step and the first unloading step; And a second rinsing step of cleaning the etchant remaining in the ultra-thin glass for cleaning the remaining etchant and the etchant causing defects between the second etching step and the second unloading step .

In the first etching step, the left and right surfaces and the bottom surface of the raw material glass are fixed to the first jig in order to increase the etching rate and increase the productivity.

In the secondary etching step, the left and right surfaces of the first etching glass are fixed to the second jig in order to prevent the first and second etching windows from being shaken to the left and right at the time of injection of the etching liquid to a thickness of 100 μm or less, And the lower surface is not fixed to the second jig but is installed to be floated by a predetermined height on the bottom surface to give flexibility to the primary etching glass and to prevent the lower part of the primary etching glass from becoming an excessive angle.

Wherein the first etching step has an etching rate of 1 to 10 mu m / min, an injection pressure of 0.3 to 4.0 kgf / cm < 2 >, the secondary etching step has an etching rate of 1 to 10 mu m / min, 0.3 to 4.0 kgf / cm2.

The purity of the pure water should be at least 0.1 M OMEGA. The alkaline water detergent solution may be added to potassium hydroxide (KOH) or sodium hydroxide (NaOH) solution at a surface resistance (DI Spray Nozzle) spraying method, a side spraying method, a spraying method, a spraying method, and a spraying method. A side spray nozzle spraying method or a top and side spray nozzle spraying method is used, and the wash liquid spraying pressure is 0.3 to 4.0 kgf / cm 2.

The first jig includes a first frame portion having an outer shape; A first support member coupled to the first frame portion to support the left and right side surfaces and the bottom surface of the raw material glass and to support two symmetrical two sides and a pair of six first support rods, And the first support frame has a cross-sectional shape such that the left and right sides or bottom surfaces of the raw material glass can be fitted.

The second jig includes a second frame part having an outer shape; The first and second support members are coupled to the second frame portion to support the left and right side surfaces of the first etching glass and support the first and second support members. And a second support frame for supporting the first and second support windows on the left and right sides of the first etchant glass, the support plate comprising a first support plate and a second support plate; A screw provided on the support plate to closely contact the first support plate and the second support plate so as to eliminate a clearance between the first etch glass and the support plate and to support the primary etch glass with the left and right supports without supporting the bottom, .

The problems to be solved by the present invention can be solved by the above-described manufacturing method.

According to the manufacturing method of the ultra-thin glass according to the present invention, since the second machining is completed, the work efficiency is improved, the work efficiency is improved, the thickness deviation is maintained within ± 5%, the quality is improved, It is possible to maximize the improvement of the yield by reducing the breakage rate to 5% or less.

1 is a flowchart of a method for manufacturing an ultra-thin glass with minimized thickness deviation according to the present invention
FIG. 2 is a perspective view of a first jig and a raw material glass primary loading perspective view according to a method of manufacturing an ultra-thin glass according to the present invention,
FIG. 3 is a schematic view showing a first loading plan view of a first jig and a raw material glass according to a method of manufacturing an ultra-thin glass according to the present invention,
FIG. 4 is a cross-sectional view of a raw glass and a primary etched glass according to the method of manufacturing an ultra-thin glass with minimized thickness deviation according to the present invention,
FIG. 5 is a diagram illustrating a first and a second etching spraying method according to a method of manufacturing an ultra-thin glass with minimized thickness deviation according to the present invention
Fig. 6 is a view showing an example of a first-stage rinsing according to a method of manufacturing an ultra-thin glass in which the thickness deviation of the present invention is minimized
FIG. 7 is a perspective view showing a second loading perspective view of a second jig and a first etching glass according to a method of manufacturing an ultra-thin glass according to the present invention,
FIG. 8 is a schematic view showing a second loading plan view of a second jig and a first etching glass according to a method of manufacturing an ultra-thin glass according to the present invention,
FIG. 9 is a cross-sectional view of the first etching glass and the ultra-thin glass state before and after the second etching according to the method of manufacturing the ultra-thin glass with minimized thickness deviation of the present invention
Fig. 10 is a drawing of an example of secondary rinsing according to a method of manufacturing an ultra-thin glass with minimized thickness deviation according to the present invention
11 is a first jig schematic perspective view of a method of manufacturing an ultra-thin glass according to the present invention,
FIG. 12 is a schematic view of a first support according to a method of manufacturing an ultra-thin glass according to the present invention,
13 is a schematic view of a second jig according to the method of manufacturing an ultra-thin glass with minimized thickness deviation according to the present invention.
FIG. 14 is a schematic view of a second supporting frame according to a method of manufacturing an ultra-thin glass according to the present invention,

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First, a detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.

The terms used below are defined in consideration of the functions of the present invention. These terms may vary depending on the intention or custom of the user, operator, and the like. The definition of " ultra thin glass "Quot; and "on " basis. &Lt; / RTI >

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, a preferred embodiment of a method for manufacturing ultra-thin glass with minimized thickness deviation according to the present invention will be described in detail.

The following examples are merely illustrative of the present invention and are not intended to limit the scope of the present invention.

FIG. 1 is a flowchart of a method of manufacturing an ultra-thin glass with minimized thickness deviation according to the present invention, FIG. 2 is a perspective view of a first loading and a raw material glass first loading according to a method of manufacturing ultra- FIG. 3 is a first loading plan view of a first jig and a raw material glass according to a method of manufacturing an ultra-thin glass in which the thickness deviation of the present invention is minimized. FIG. FIG. 5 is a view illustrating an example of a first and second etching spraying method according to a method of manufacturing an ultra-thin glass with minimized thickness deviation of the present invention. FIG. 6 is a cross- FIG. 7 is a schematic view illustrating a method of manufacturing an ultra-thin glass according to a second embodiment of the present invention, FIG. 8 is a second loading plan view of a second jig and a first etching glass according to a method of manufacturing an ultra-thin glass with minimized thickness deviation of the present invention, and FIG. 9 is a view FIG. 10 is a view showing an example of secondary rinsing according to a method of manufacturing an ultra-thin glass with minimized thickness deviation of the present invention, and FIG. 11 is a schematic perspective view of a first jig according to a method of manufacturing an ultra-thin glass in which the thickness deviation of the present invention is minimized, FIG. 12 is a schematic view of a first support according to a method of manufacturing ultra- Fig. 14 is a cross-sectional view of a second jig according to a method of manufacturing an ultra-thin glass according to the present invention, Rent a schematic.

As shown in FIG. 1, the method of manufacturing an ultra-thin glass according to the present invention minimizes the thickness deviation of the present invention is performed by etching the raw material glass 3 having a thickness of 550 탆 or 700 탆 in an etching apparatus, (1) for loading the raw material glass (3) into the first jig (1) and loading the first jig (1) loaded with the raw material glass (3) 1 loading step; Top Spray Nozzle Spray, side spray nozzle spray or top and side spray nozzle spray to etch the etchant and reduce thickness variation. A primary etching step of performing primary etching to a thickness of 150 to 250 탆 and processing the primary etching glass (4); After the first jig 1 on which the first etching window 4 is mounted is discharged from the etching apparatus, the first etching glass 4 is unloaded from the first jig 1, A first unloading step; A second loading step of loading the first etching glass (4) into the second jig (2) and loading the second jig (2) loaded with the first etching glass (4) into the etching apparatus; Top spray nozzles (Top Spray Nozzle) Spray nozzles (Side Spray Nozzle) or Top and Side Spray Nozzle spray nozzles are used to spray the etchant, A second etching step of making an ultra-thin glass (5); And a second unloading step of unloading the ultra-thin glass 5 from the second jig after ejecting the second jig 2 having the second ultra-thin glass 5 loaded thereon from the etching apparatus .

The manufacturing method includes a first rinsing process (cleaning process) for cleaning the etchant remaining in the first etching glass 4 to remove etching unevenness and stains that cause a defect between the first etching process and the first unloading process Rinsing step for cleaning the etchant remaining in the ultra-thin glass (5) to remove residual etchant and etchant stains causing defects between the second etching step and the second unloading step, (Rinsing) step may be further included.

The raw material glass 3 used in the present invention is a soda lime glass containing sodium carbonate (Na ₂ CO ₃ ) as a main component and produced by NSG, Asahi Glass, Corning, and the like.

According to the manufacturing method of the present invention, since the second machining is completed, the work efficiency is improved, the work efficiency is improved, the thickness deviation is maintained within ± 5%, the quality is improved, Or less, thereby maximizing the improvement of the yield.

The manufacturing method will be described in detail as follows.

The first loading step includes loading the raw material glass 3 into the first jig 1 and loading the first jig 1 loaded with the raw material glass 3 into the etching apparatus, A first glass jig loading step of loading the raw material glass (3) into the first jig (1); And a first now etch device loading step of loading the first jig (1) loaded with the raw material glass (3) into the etch apparatus.

As shown in FIGS. 2 and 3, the first jig 1 includes a first frame portion 11 having an outer shape; A first support part (11) coupled to the first frame part (11) for holding and supporting left and right side surfaces and a bottom surface of the raw material glass (3), two first and second support parts 121 are composed of a plurality of first support portions 12 for loading a plurality of the raw material glass 3.

The first support 121 used for the left and right side surfaces of the raw material glass 3 may have a cross-sectional shape so that the raw material glass 3 can be fitted.

Since the first support 121 used for the bottom surface of the raw material glass 3 serves only as a simple support, a special shape is not required and both the rounded surface and the flat surface can be used.

Since the raw material glass 3 has a thickness of 550 탆 or 700 탆 and has a constant strength in the first glass jig loading step, there is no risk of breakage during the processing step. Therefore, the etching rate indicating the etching thickness per minute is increased The first jig 1 is provided with two positions on the left and right sides and two positions on the bottom surface in total of six positions so that the raw material glass 3 can be stably stood without being shaken to the left and right in the etching, (Not shown).

The primary etching step includes a top spray nozzle spraying method in which the raw material glass 3 is sprayed from above as shown in FIG. 5-1, a side spray nozzle spraying method in which the glass is sprayed from the front / rear of the glass as shown in FIG. 5-2, -3, and the top and side spray nozzles are sprayed from the front and the rear. In order to reduce the thickness variation, the first etching is performed to a thickness of 150 to 250 μm, And processing it into the car-etched glass 4.

In the first etching step of the present invention, all of the above three injection methods are applied.

The gap between the first support 121 and the raw material glass 3 on the left and right sides where the raw material glass 3 is contacted and fixed is almost no clearance at the initial stage of etching, There is no shaking, and therefore the breakage of the glass does not occur.

However, when the thickness is less than 150 탆, the clearance is severely generated and the left / right shaking becomes worse. At this time, the glass breakage occurs. When the thickness exceeds 250 탆, excessive deviation occurs in the glass thickness. It is preferable to perform the first etching to a thickness of 150 to 250 mu m.

The etchant mainly contains hydrofluoric acid and ammonium fluoride.

The first etching step preferably has an etching rate of 1 to 10 탆 / min and an injection pressure of 0.3 to 4.0 kgf / cm 2 as shown in Tables 1, 2 and 3 below.

Table 1 shows the state of the first etching glass 4 according to the thickness change after the completion of etching when the etching rate (Etching Rate): 5 탆 / min and the spray pressure: 1.5 kgf / It is the test result that I confirmed. Etching rate (Etching Rate): 5 占 퐉 / min; Spraying Pressure: 1.5 kgf / cm2;

As shown in Table 1, after the etch rate and the injection pressure were fixed at the first etching, the quality was satisfactory in the range of 150 to 250 μm when the etching was completed.

Primary etching conditions

result

Remarks
Thickness after etching
etching
Rate
Injection pressure
300 탆

5 탆 / min

1.5kgf / cm2

x
Defective thickness deviation (± 30%)
250 탆
0
Good thickness deviation (± 5%) / No glass breakage
200 탆
0
Good thickness deviation (± 5%) / No glass breakage
150 탆
0
Good thickness deviation (± 5%) / No glass breakage
100 탆
x
Glass broken

Table 2 shows the test results of the state of the primary etching glass 4 according to the etching rate change when the spray pressure at the time of the first etching was 1.5 kgf / to be. Etching rate (Etching Rate): 5 占 퐉 / min; Spraying Pressure: 1.5 kgf / cm2;

As shown in Table 2, the injection quality during the primary etching, the thickness after the completion of etching, and the etching rate after 1.0 to 10 탆 / min were satisfactory.

Primary etching conditions

result

Remarks
Thickness after etching
etching
Rate
Injection pressure

200 탆

0.8 탆 / min

1.5kgf / cm2

x
Defective thickness deviation (± 30%)
1.0
0
Good thickness deviation (± 5%)
5.0
0
Good thickness deviation (± 5%)
10
0
Good thickness deviation (± 5%)
12
x
Defective thickness deviation (± 30%)

Table 3 shows the test results of the state of the first etching glass 4 according to the change of the injection pressure when the thickness is 200 탆 and the etching rate is 5 탆 / mim after the first etching. Etching rate (Etching Rate): 5 占 퐉 / min; Spraying Pressure: 1.5 kgf / cm2;

As shown in Table 3, after the completion of the etching at the time of the first etching, the thickness and the etch rate were fixed, and the quality was good at the injection pressure of 0.3 to 4 kgf / ㎠.

Primary etching conditions

result

Remarks
Thickness after etching
etching
Rate
Injection pressure

200 탆

5 탆 / min

0.1 kgf / cm 2
x
Defective thickness deviation (± 30%)
0.3
0
Good thickness deviation (± 5%)
1.5
0
Good thickness deviation (± 5%)
4
0
Good thickness deviation (± 5%)
4.2
x
Glass broken

The primary rinsing step is a step of cleaning the etchant remaining in the primary etch glass 4 with wash water to remove defects such as etch unevenness and stain removal as shown in FIG.

On the surface of the primary etching glass 4 having been subjected to the first etching, a considerable amount of etchant mainly composed of hydrofluoric acid and ammonium fluoride is strongly acidic (pH 2.0 or less), and etching residue unevenness / unevenness It is necessary to do rinsing.

The wash water is DI water or an alkaline water solution, and the purity of the pure water is not less than 0.1 M OMEGA.

The alkaline aqueous solution is prepared by adding a surfactant to the potassium hydroxide (KOH) or sodium hydroxide (NaOH) solution in order to shorten the surface resistance and shorten the rinsing time, .

The surfactant has an effect of lowering the surface resistance, which helps to more efficiently remove the etchant on the glass surface and shortens the rinsing time than when the surfactant is not included

The wash water spraying method may be a Top Spray Nozzle spraying method, a Side Spray Nozzle spraying method or a Top and Side Spray Nozzle spraying method, The pressure is preferably 0.3 to 4.0 kgf / cm 2.

The first unloading step may include discharging the first jig 1, on which the first etching glass 4 is mounted, from the etching apparatus, and then removing the first etching glass 4 from the first The unloading is performed in the jig 1.

The first unloading step includes a first jig discharging step of discharging the first jig 1 on which the first etching glass 4 is mounted, from the etching apparatus, and a second jig discharging step of discharging the first etching glass 4 ) Is unloaded from the first jig (1).

The second loading step may include loading the primary etch glass 4 into the second jig 2 and loading the second jig 2 loaded with the primary etch glass 4 into the etch apparatus .

The second loading step includes a first etching step for loading the first etching glass 4 into the second jig 2, a second jig loading step for loading the first etching glass 4 into the second jig 2, And a second jig etching device loading step of loading the substrate 2 into the etching apparatus.

As shown in FIGS. 7 and 8, the second jig 2 includes a second frame portion 21 having an outer shape; A second support 221 which is coupled to the second frame 21 to support and support the left and right sides of the primary etch glass 4, And a plurality of second supporting portions 22 for loading a plurality of sheets of the first etching glass.

The second support base 221 can support the left or right side of the first etching glass 4 on both sides and includes a support plate 2211 composed of a first support plate 22111 and a second support plate 22112; The first support plate 22111 and the second support plate 22112 are closely attached to the support plate 2211 so as to eliminate a clearance between the primary etch glass 4 and the support plate 2211, And a screw 2212 that allows the glass 4 to be supported by the left and right supports without the bottom support.

In the second etching step, the left and right surfaces of the first etching glass (4) are formed to have a thickness of 100 μm or less in order to prevent the first and second etching windows And the lower surface of the first jig 2 is not fixed to the second jig 2 but is provided at a predetermined height on the bottom surface as shown in Fig. 7 to provide flexibility to the primary etching window 4, Thereby preventing the lower portion of the glass 4 from becoming an excessive angle.

The secondary etching step may include a top spray nozzle spraying method in which the primary etch glass 4 is sprayed from above as shown in FIG. 5-1, a side spray nozzle spraying method in which the glass is sprayed in front of or behind the glass as shown in FIG. 5-2, 5-3, the top and side spray nozzles are sprayed from the front and the back, and the etchant is sprayed by the spraying method of the top and side, and is etched to a thickness of 50 탆 or less to form the ultra-thin glass 5 9, the part of the primary etching glass 4 adhered between the first supporting plate 22111 and the second supporting plate 22112 as shown in the drawing after the secondary etching, which is the lower drawing of FIG. 9, Since it is not touched, it is not etched and it is cut and used in other process.

In the second etching step of the present invention, all of the above three injection methods are applied.

The left and right side portions to which the primary etching glass 4 is fixed by being brought into contact with the first support plate 22111 and the second support plate 22112 with the screw 2212, Since the first etching glass 4 is closely adhered between the first and second supporting plates 22112 and 22112, there is no clearance between the first etching glass and the first and second supporting plates 22111 and 22112, The first etching glass 4 can be floated at a predetermined height from the bottom surface without supporting the bottom surface of the first etching glass 4.

Thus, since only the two left and right surfaces of the primary etching glass 4 are fixed, flexibility is ensured and the secondary etching is not damaged in the left / right shaking during the secondary etching.

The etchant mainly contains hydrofluoric acid and ammonium fluoride.

The secondary etching step preferably has an etching rate of 1 to 10 탆 / min and an injection pressure of 0.3 to 4.0 kgf / cm 2 as shown in Tables 4, 5 and 6 below.

Table 4 shows that after the first etching condition is completed, the etching is completed at a thickness of 200 탆, an etching rate of 5 탆 / min, an injection pressure of 1.5 kgf / ㎠ and a secondary etching condition at a spray pressure of 1.5 kgf / ) Of the ultra-thin glass (5) according to the etching rate.

As shown in Table 4, when the secondary etching condition is set at the injection pressure of 1.5 kgf / cm 2 and the bottom of the glass is not supported (No Touth), the etching rate is in a good quality state in the range of 1 to 10 μm / min.

Secondary etching conditions

result

Remarks
etching
Rate

Injection pressure
Glass
Floor support support
0.8 탆 / min

1.5kgf / cm2

Not supported

x
Defective thickness deviation (± 30%)
1.0
0
Good thickness deviation (± 5%)
5.0
0
Good thickness deviation (± 5%)
10
0
Good thickness deviation (± 5%)
12
x
Defective thickness deviation (± 30%)

After the first etching condition was completed, etching was performed at a thickness of 200 μm, an etching rate of 5 μm / min, an injection pressure of 1.5 kgf / cm 2, and a secondary etching condition at an etching rate of 5 μm / Touth), the thickness deviation of the ultra-thin glass 5 according to the injection pressure is confirmed.

As shown in Table 5, when the etching rate was 5 탆 / min and the bottom surface of the glass was not supported (No Touth), the quality was good at the injection pressure of 0.3 to 4.0 kgf / cm 2

Secondary etching conditions

result

Remarks
etching
Rate

Injection pressure
Glass
Floor support support

5 탆 / min

0.1 kgf / cm 2

Not supported

x
Defective thickness deviation (± 30%)
0.3
0
Good thickness deviation (± 5%)
1.5
0
Good thickness deviation (± 5%)
4
0
Good thickness deviation (± 5%)
4.2
x
Glass broken

Table 6 shows the results of the secondary etching at an etching rate of 5 占 퐉 / min and an injection pressure of 1.5 kgf / cm2 after the first etching condition was completed at a thickness of 200 占 퐉, an etching rate of 5 占 퐉 / min and an injection pressure of 1.5 kgf / (No Tough) and the bottom surface of the glass (No Touth).

As shown in Table 6, when the bottom of the glass was touched, the glass was broken. When the bottom of the glass was not touched (No Touth), the glass state was good.

Secondary etching conditions

result

Remarks
etching
Rate

Injection pressure
Glass
Floor support support

5 탆 / min

1.5kgf / cm2

support
(Touch)

x

Glass broken
Not supported
(No Touch)

O

Good glass condition

The second rinsing step is a step of cleaning the etchant remaining in the ultra-thin glass 5 with the wash water for removal of residual etchant and etchant causing defects as shown in FIG.

On the surface of the ultra-thin glass 5 after completion of the secondary etching, a considerable amount of etchant, which is a strong acid (PH 2.0 or less) and mainly composed of hydrofluoric acid and ammonium fluoride, remains and is not cleaned with the cleaning solution. Rinsing is necessary because it causes serious failure.

The wash water spraying method may be one of a top spray nozzle spraying method, a side spray nozzle spraying method, and a top and side spray nozzle spraying method. , And the washing liquid injection pressure is preferably 0.3 to 4.0 kgf / cm 2.

In the second unloading step, the second jig (2) having the second ultra-thin glass (5) mounted thereon is discharged from the etching apparatus, and then the ultra thin glass (5) is unloaded from the second jig .

The second unloading step may include a second jig discharging step of discharging the second jig (2) loaded with the ultra-thin glass (5), which is secondarily etched, from the etching apparatus; And an ultra-thin glass unloading step of unloading the ultra-thin glass 5 from the second jig.

As shown in FIG. 11, the first jig 1 includes a first frame part 11 forming an outer shape; A first support part (11) coupled to the first frame part (11) for holding and supporting left and right side surfaces and a bottom surface of the raw material glass (3), two first and second support parts 121 are composed of a plurality of first support portions 12 for loading a plurality of the raw material glass 3.

The first support 121 used for the left and right side surfaces of the raw material glass 3 has a cross-sectional shape such that the raw material glass 3 can be fitted.

The first frame part 11 includes a first front frame 111 which is coupled to the first support part 121 to support one side upper and middle edges of the raw material glass 3 and has a quadrangular shape; A first rear frame 112 coupled to the first support 121 to support the other upper and middle edges of the raw material glass 3 and having a quadrangular shape; And a first left and right frame 113 coupled to both ends of the first front frame 111 and the first rear frame 112 so that the inside of the first frame 11 forms a rectangular parallelepiped space.

A first intermediate supporting frame 1111 (see FIG. 1) is provided on the first front frame 111 and the first rear frame 112 and is interposed between the first supporting frames 121 to support a middle edge of the raw material glass 3 , 1121 are formed.

The first left and right side frames 113 are coupled to the first left and right side frames 113 so that the first left and right side frames 113 are spaced apart from each other by two first left and right side frames 113 And two first lower subframes 1131 which are formed on the inner side of the first left and right frame coupling base 1131 and which are provided with the first support base 121 and support the bottom surface of the raw material glass 3, (1132) is formed.

12, the first support 121 is coupled to the first frame part 11 to support the left and right side surfaces and the bottom surface of the raw material glass 3, Two of them are installed in each, and six of them form one set.

As shown in FIG. 12, the first support 121 used on the left and right sides of the raw material glass 3 has a C-shaped cross section so that the raw material glass 3 can be fitted therein. A glass insertion groove 1211 through which the raw material glass 3 is inserted is formed.

As shown in FIG. 13, the second jig 2 includes a second frame portion 21 having an outer shape; A second support 221 which is coupled to the second frame 21 to support and support the left and right sides of the primary etch glass 4, And a plurality of second supporting portions 22 for loading a plurality of sheets of the first etching glass.

The second frame part 21 includes a second front frame 211 which is coupled to the second support part 221 and supports a middle edge of one side of the first etching glass 4 and has a quadrangular shape, ,

A second rear frame 212 coupled with the second support 221 to support a middle edge of the other two sides of the first etching window 4 and having a quadrangular shape,

And a second left and right side frames 213 coupled to both ends of the second front frame 211 and the second rear frame 212 so that the inside of the second frame 21 forms a rectangular parallelepiped space,

The second support frame 221 is coupled to the second front frame 211 and the second rear frame 212 so as to support the middle edge of the first etching glass 4, (2111, 2121) are formed,

The second left and right side frames 213 are engaged with the second left and right side frames 213 to form two to four second left and right side frames 213, A frame coupling base 2131 is formed.

As shown in FIG. 14, the second jig 2 includes a second frame portion 21 having an outer shape; A second support 221 which is coupled to the second frame 21 to support and support the left and right sides of the primary etch glass 4, And a plurality of second supporting portions 22 for loading a plurality of sheets of the first etching glass.

The first support plate 22111 has a b shape.

The second support plate 22112 moves in accordance with the operation of the screw 2212 from the inside of the first support plate 22111.

The first support plate 22111 is formed with a first screw hole into which the screw 2212 is inserted and the second support plate 22111 is formed with a second screw hole into which the screw 2212 is inserted, The first screw hole and the second screw hole are formed with a female screw so that the gap between the first support plate 22111 and the second support plate 22112 is narrowed when the screw 2212 is rotated, 1 support plate 22111 and the second support plate 22112 are in close contact with each other.

1: first jig 11: first frame part
111: first front frame 1111: first intermediate auxiliary frame
112: first rear frame 1121: first intermediate auxiliary frame
113: first left and right side frames 1131: first left and right frame coupling bases
1132: first lower auxiliary frame 12: first supporting frame
121: first support table 1211: glass insertion groove
2: second jig 21: second frame part
211: second front frame 2111: second intermediate auxiliary frame
212: second rear frame 2121: second intermediate auxiliary frame
213: second left and right frame 2131: second left and right frame coupling base
22: second support rod 221: second support rod
2211: Support plate 22111: First support plate
22112: second support plate 2212: screw
3: Raw material glass
4: Primary etching glass
5: Ultra-thin glass

Claims

A manufacturing method of manufacturing an ultra-thin glass (5) having a thickness of 50 탆 or less by etching a raw material glass (3) having a thickness of 550 탆 or 700 탆 in an etching apparatus,
The manufacturing method includes a first loading step of loading the raw material glass (3) into the first jig (1) and loading the first jig (1) loaded with the raw material glass (3) into the etching apparatus;
Top Spray Nozzle Spray, side spray nozzle spray or top and side spray nozzle spray to etch the etchant and reduce thickness variation. A primary etching step of performing primary etching to a thickness of 150 to 250 탆 and processing the primary etching glass (4);
After the first jig 1 on which the first etching window 4 is mounted is discharged from the etching apparatus, the first etching glass 4 is unloaded from the first jig 1, A first unloading step;
A second loading step of loading the first etching glass (4) into the second jig (2) and loading the second jig (2) loaded with the first etching glass (4) into the etching apparatus;
Top spray nozzles (Top Spray Nozzle) Spray nozzles (Side Spray Nozzle) or Top and Side Spray Nozzle spray nozzles are used to spray the etchant, A second etching step of making an ultra-thin glass (5);
And a second unloading step of unloading the ultra-thin glass 5 from the second jig after ejecting the second jig 2 having the second ultra-thin glass 5 loaded thereon from the etching apparatus &Lt; / RTI >
In the first etching step, the raw material glass 3 has left and right surfaces and a bottom surface fixed to the first jig 1 in order to increase the etching rate and increase the productivity,
In the second etching step, the left and right surfaces of the first etching glass (4) are formed to have a thickness of 100 μm or less in order to prevent the first and second etching windows The bottom surface of the first etching glass 4 is fixed to the jig 2 and the bottom surface of the first etching glass 4 is not fixed to the second jig 2, To prevent the lower portion of the body from becoming an excessive angle,
The first jig (1) comprises a first frame part (11) forming an outer shape;
A first support part (11) coupled to the first frame part (11) for holding and supporting left and right side surfaces and a bottom surface of the raw material glass (3), two first and second support parts 121) is composed of a plurality of first supporting members (12) for loading a plurality of said raw material glass (3)
The first support 121 used for the left and right side surfaces of the raw material glass 3 has a cross-sectional shape such that the raw material glass 3 can be fitted,
The second jig (2) comprises a second frame part (21) forming an outer shape;
A second support 221 which is coupled to the second frame 21 to support and support the left and right sides of the primary etch glass 4, A plurality of second support portions 22 for loading a plurality of sheets of the first etching glass,
The second support base 221 can support the left or right side of the first etching glass 4 on both sides and includes a support plate 2211 composed of a first support plate 22111 and a second support plate 22112;
The first support plate 22111 and the second support plate 22112 are closely attached to the support plate 2211 so as to eliminate a clearance between the primary etch glass 4 and the support plate 2211, And a screw (2212) for allowing the glass (4) to be supported by the left and right supports without supporting the lower part. The method for manufacturing ultra-thin glass with minimized thickness deviation

The method according to claim 1,
The manufacturing method includes a first rinsing process (cleaning process) for cleaning the etchant remaining in the first etching glass 4 to remove etching unevenness and stains that cause a defect between the first etching process and the first unloading process Rinsing steps and:
A second rinsing step of cleaning the etchant remaining in the ultra-thin glass 5 with the wash water for removing residual etchant and etchant stains causing defects between the second etching step and the second unloading step A method of manufacturing an ultra-thin glass having a minimized thickness deviation

The method of claim 1, wherein
Wherein the first etching step has an etching rate of 1 to 10 mu m / min and an injection pressure of 0.3 to 4.0 kgf /
Wherein the second etching step has an etching rate of 1 to 10 mu m / min and an injection pressure of 0.3 to 4.0 kgf / cm < 2 >

delete

3. The method of claim 2,
The wash water may be pure water (DI Water) or alkaline water washing liquid,
The purity of the pure water should be at least 0.1 M OMEGA,
The alkaline aqueous solution is prepared by adding a surfactant to the potassium hydroxide (KOH) or sodium hydroxide (NaOH) solution in order to shorten the surface resistance and shorten the rinsing time, Manufactured,
The wash water spraying method may be one of a top spray nozzle spraying method, a side spray nozzle spraying method, and a top and side spray nozzle spraying method. ,
Characterized in that the washing liquid injection pressure is 0.3 to 4.0 kgf / cm < 2 >