CN101542675A - 具有安装在可移动安装件中的电极的离子束加速设备 - Google Patents

具有安装在可移动安装件中的电极的离子束加速设备 Download PDF

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Publication number
CN101542675A
CN101542675A CNA200880000419XA CN200880000419A CN101542675A CN 101542675 A CN101542675 A CN 101542675A CN A200880000419X A CNA200880000419X A CN A200880000419XA CN 200880000419 A CN200880000419 A CN 200880000419A CN 101542675 A CN101542675 A CN 101542675A
Authority
CN
China
Prior art keywords
electrode
equipment
movable mount
hole
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA200880000419XA
Other languages
English (en)
Chinese (zh)
Inventor
安德鲁·詹姆斯·蒂莫西·霍姆斯
默文·霍华德·戴维斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nordiko Technical Services Ltd
Original Assignee
Nordiko Technical Services Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nordiko Technical Services Ltd filed Critical Nordiko Technical Services Ltd
Publication of CN101542675A publication Critical patent/CN101542675A/zh
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H01J27/024—Extraction optics, e.g. grids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/024—Moving components not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/03—Mounting, supporting, spacing or insulating electrodes
    • H01J2237/032—Mounting or supporting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/03—Mounting, supporting, spacing or insulating electrodes
    • H01J2237/036—Spacing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/03—Mounting, supporting, spacing or insulating electrodes
    • H01J2237/038—Insulating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0456—Supports
    • H01J2237/0458—Supports movable, i.e. for changing between differently sized apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3142—Ion plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3151—Etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
CNA200880000419XA 2007-02-16 2008-02-15 具有安装在可移动安装件中的电极的离子束加速设备 Pending CN101542675A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0703044.8 2007-02-15
GBGB0703044.8A GB0703044D0 (en) 2007-02-16 2007-02-16 Apparatus

Publications (1)

Publication Number Publication Date
CN101542675A true CN101542675A (zh) 2009-09-23

Family

ID=37908761

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA200880000419XA Pending CN101542675A (zh) 2007-02-16 2008-02-15 具有安装在可移动安装件中的电极的离子束加速设备

Country Status (6)

Country Link
US (1) US20100044579A1 (enExample)
EP (1) EP2111630A1 (enExample)
JP (1) JP2010519681A (enExample)
CN (1) CN101542675A (enExample)
GB (1) GB0703044D0 (enExample)
WO (1) WO2008099218A1 (enExample)

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Publication number Priority date Publication date Assignee Title
KR101602517B1 (ko) 2008-08-04 2016-03-10 에이지씨 플랫 글래스 노스 아메리카, 인코퍼레이티드 Ｐｅｃｖｄ를 이용한 박막 코팅을 증착하기 위한 플라즈마 소스 및 방법
DE102009048400A1 (de) * 2009-10-06 2011-04-14 Siemens Aktiengesellschaft HF-Resonatorkavität und Beschleuniger
JP2013098003A (ja) * 2011-10-31 2013-05-20 Nissin Ion Equipment Co Ltd イオンビーム引出し用電極およびこれを備えたイオン源
MY191327A (en) 2014-12-05 2022-06-16 Agc Flat Glass Na Inc Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
ES2883288T3 (es) 2014-12-05 2021-12-07 Agc Glass Europe Sa Fuente de plasma de cátodo hueco
US9721764B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Method of producing plasma by multiple-phase alternating or pulsed electrical current
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
BR112018012413A2 (pt) * 2015-12-18 2018-12-18 Agc Flat Glass Na Inc fonte de íons de catodo oco e método de extração e aceleração de íons
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
US9807864B1 (en) * 2016-08-04 2017-10-31 Varian Semiconductor Equipment Associates Inc. Electrode, accelerator column and ion implantation apparatus including same

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US4149055A (en) * 1977-05-02 1979-04-10 Hughes Aircraft Company Focusing ion accelerator
JPS6043620B2 (ja) * 1982-11-25 1985-09-28 日新ハイボルテージ株式会社 マイクロ波イオン源
JPS59207553A (ja) * 1983-05-11 1984-11-24 Hitachi Ltd 荷電粒子線軸合せ装置
JPH0746588B2 (ja) * 1986-09-09 1995-05-17 日本電信電話株式会社 マイクロ波イオン源
JPH01204341A (ja) * 1988-02-08 1989-08-16 Japan Steel Works Ltd:The イオンビーム装置
US4933551A (en) * 1989-06-05 1990-06-12 The United State Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Reversal electron attachment ionizer for detection of trace species
US5365070A (en) * 1992-04-29 1994-11-15 The Regents Of The University Of California Negative ion beam injection apparatus with magnetic shield and electron removal means
JPH0668806A (ja) * 1992-08-21 1994-03-11 Japan Steel Works Ltd:The イオン源
US5608773A (en) * 1993-11-30 1997-03-04 Canon Kabushiki Kaisha Mask holding device, and an exposure apparatus and a device manufacturing method using the device
JP3243168B2 (ja) * 1996-02-06 2002-01-07 キヤノン株式会社 原版保持装置およびこれを用いた露光装置
DE19851097A1 (de) * 1997-11-05 1999-05-06 Ims Ionen Mikrofab Syst Mechanisch einstellbare, elektrostatische Linse
JPH11283552A (ja) * 1998-03-31 1999-10-15 Tadamoto Tamai イオン注入装置、イオン注入方法、イオンビーム源、及び可変スリット機構
US6458723B1 (en) * 1999-06-24 2002-10-01 Silicon Genesis Corporation High temperature implant apparatus
EP1245036B1 (en) * 1999-12-13 2013-06-19 Semequip, Inc. Ion implantation ion source
US6501078B1 (en) * 2000-03-16 2002-12-31 Applied Materials, Inc. Ion extraction assembly
KR100843805B1 (ko) * 2000-11-20 2008-07-03 베리안 세미콘덕터 이큅먼트 어소시에이츠, 인크. 이온 비임을 생성하기 위한 이온 광학 장치 및 방법
US6768120B2 (en) * 2001-08-31 2004-07-27 The Regents Of The University Of California Focused electron and ion beam systems
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JP3858092B2 (ja) 2002-11-14 2006-12-13 独立行政法人航空宇宙技術研究所 イオン抽出装置
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JP4316394B2 (ja) * 2004-01-21 2009-08-19 株式会社東芝 荷電ビーム装置
JP5068928B2 (ja) * 2004-11-30 2012-11-07 株式会社Ｓｅｎ 低エネルギービーム増大化方法及びビーム照射装置
US7279687B2 (en) * 2005-08-26 2007-10-09 Varian Semiconductor Equipment Associates, Inc. Technique for implementing a variable aperture lens in an ion implanter
WO2008000836A2 (en) 2006-06-30 2008-01-03 Nordiko Technical Services Limited Apparatus for accelerating an ion beam

Also Published As

Publication number Publication date
WO2008099218A1 (en) 2008-08-21
JP2010519681A (ja) 2010-06-03
EP2111630A1 (en) 2009-10-28
GB0703044D0 (en) 2007-03-28
US20100044579A1 (en) 2010-02-25

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SE01 Entry into force of request for substantive examination
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Application publication date: 20090923