GB0703044D0 - Apparatus - Google Patents

Apparatus

Info

Publication number
GB0703044D0
GB0703044D0 GBGB0703044.8A GB0703044A GB0703044D0 GB 0703044 D0 GB0703044 D0 GB 0703044D0 GB 0703044 A GB0703044 A GB 0703044A GB 0703044 D0 GB0703044 D0 GB 0703044D0
Authority
GB
United Kingdom
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
GBGB0703044.8A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nordiko Technical Services Ltd
Original Assignee
Nordiko Technical Services Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nordiko Technical Services Ltd filed Critical Nordiko Technical Services Ltd
Priority to GBGB0703044.8A priority Critical patent/GB0703044D0/en
Publication of GB0703044D0 publication Critical patent/GB0703044D0/en
Priority to JP2009549482A priority patent/JP2010519681A/ja
Priority to EP08709618A priority patent/EP2111630A1/en
Priority to US12/304,251 priority patent/US20100044579A1/en
Priority to PCT/GB2008/050098 priority patent/WO2008099218A1/en
Priority to CNA200880000419XA priority patent/CN101542675A/zh
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H01J27/024—Extraction optics, e.g. grids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/024—Moving components not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/03—Mounting, supporting, spacing or insulating electrodes
    • H01J2237/032—Mounting or supporting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/03—Mounting, supporting, spacing or insulating electrodes
    • H01J2237/036—Spacing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/03—Mounting, supporting, spacing or insulating electrodes
    • H01J2237/038—Insulating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0456—Supports
    • H01J2237/0458—Supports movable, i.e. for changing between differently sized apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3142—Ion plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3151—Etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
GBGB0703044.8A 2007-02-15 2007-02-16 Apparatus Ceased GB0703044D0 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
GBGB0703044.8A GB0703044D0 (en) 2007-02-16 2007-02-16 Apparatus
JP2009549482A JP2010519681A (ja) 2007-02-16 2008-02-15 可動マウントに取り付けられた電極を備えるイオンビーム加速装置
EP08709618A EP2111630A1 (en) 2007-02-16 2008-02-15 Ion beam accelerating apparatus with electrodes mounted in a movable mount
US12/304,251 US20100044579A1 (en) 2007-02-15 2008-02-15 Apparatus
PCT/GB2008/050098 WO2008099218A1 (en) 2007-02-16 2008-02-15 Ion beam accelerating apparatus with electrodes mounted in a movable mount
CNA200880000419XA CN101542675A (zh) 2007-02-16 2008-02-15 具有安装在可移动安装件中的电极的离子束加速设备

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB0703044.8A GB0703044D0 (en) 2007-02-16 2007-02-16 Apparatus

Publications (1)

Publication Number Publication Date
GB0703044D0 true GB0703044D0 (en) 2007-03-28

Family

ID=37908761

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB0703044.8A Ceased GB0703044D0 (en) 2007-02-15 2007-02-16 Apparatus

Country Status (6)

Country Link
US (1) US20100044579A1 (enExample)
EP (1) EP2111630A1 (enExample)
JP (1) JP2010519681A (enExample)
CN (1) CN101542675A (enExample)
GB (1) GB0703044D0 (enExample)
WO (1) WO2008099218A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101602517B1 (ko) 2008-08-04 2016-03-10 에이지씨 플랫 글래스 노스 아메리카, 인코퍼레이티드 Ｐｅｃｖｄ를 이용한 박막 코팅을 증착하기 위한 플라즈마 소스 및 방법
DE102009048400A1 (de) * 2009-10-06 2011-04-14 Siemens Aktiengesellschaft HF-Resonatorkavität und Beschleuniger
JP2013098003A (ja) * 2011-10-31 2013-05-20 Nissin Ion Equipment Co Ltd イオンビーム引出し用電極およびこれを備えたイオン源
ES2900321T3 (es) 2014-12-05 2022-03-16 Agc Flat Glass Na Inc Fuente de plasma que utiliza un recubrimiento de reducción de macropartículas y procedimiento para usar una fuente de plasma que utiliza un recubrimiento de reducción de macropartículas para la deposición de recubrimientos de película delgada y modificación de superficies
MX2017007356A (es) 2014-12-05 2018-04-11 Agc Flat Glass Europe S A Fuente de plasma del catodo hueco.
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US9721764B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Method of producing plasma by multiple-phase alternating or pulsed electrical current
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
EA201891455A1 (ru) * 2015-12-18 2019-01-31 Эй-Джи-Си Флет Гласс Норт Эмерике, Инк. Ионный источник с полым катодом и способ экстрагирования и ускорения ионов
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
US9807864B1 (en) * 2016-08-04 2017-10-31 Varian Semiconductor Equipment Associates Inc. Electrode, accelerator column and ion implantation apparatus including same

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4149055A (en) * 1977-05-02 1979-04-10 Hughes Aircraft Company Focusing ion accelerator
JPS6043620B2 (ja) * 1982-11-25 1985-09-28 日新ハイボルテージ株式会社 マイクロ波イオン源
JPS59207553A (ja) * 1983-05-11 1984-11-24 Hitachi Ltd 荷電粒子線軸合せ装置
JPH0746588B2 (ja) * 1986-09-09 1995-05-17 日本電信電話株式会社 マイクロ波イオン源
JPH01204341A (ja) * 1988-02-08 1989-08-16 Japan Steel Works Ltd:The イオンビーム装置
US4933551A (en) * 1989-06-05 1990-06-12 The United State Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Reversal electron attachment ionizer for detection of trace species
US5365070A (en) * 1992-04-29 1994-11-15 The Regents Of The University Of California Negative ion beam injection apparatus with magnetic shield and electron removal means
JPH0668806A (ja) * 1992-08-21 1994-03-11 Japan Steel Works Ltd:The イオン源
US5608773A (en) * 1993-11-30 1997-03-04 Canon Kabushiki Kaisha Mask holding device, and an exposure apparatus and a device manufacturing method using the device
JP3243168B2 (ja) * 1996-02-06 2002-01-07 キヤノン株式会社 原版保持装置およびこれを用いた露光装置
DE19851097A1 (de) * 1997-11-05 1999-05-06 Ims Ionen Mikrofab Syst Mechanisch einstellbare, elektrostatische Linse
JPH11283552A (ja) * 1998-03-31 1999-10-15 Tadamoto Tamai イオン注入装置、イオン注入方法、イオンビーム源、及び可変スリット機構
US6458723B1 (en) * 1999-06-24 2002-10-01 Silicon Genesis Corporation High temperature implant apparatus
TW521295B (en) * 1999-12-13 2003-02-21 Semequip Inc Ion implantation ion source, system and method
US6501078B1 (en) * 2000-03-16 2002-12-31 Applied Materials, Inc. Ion extraction assembly
TW543071B (en) * 2000-11-20 2003-07-21 Varian Semiconductor Equipment Extraction and deceleration of low energy beam with low beam divergence
US6768120B2 (en) * 2001-08-31 2004-07-27 The Regents Of The University Of California Focused electron and ion beam systems
US6936981B2 (en) * 2002-11-08 2005-08-30 Applied Materials, Inc. Retarding electron beams in multiple electron beam pattern generation
JP3858092B2 (ja) 2002-11-14 2006-12-13 独立行政法人航空宇宙技術研究所 イオン抽出装置
US7145157B2 (en) * 2003-09-11 2006-12-05 Applied Materials, Inc. Kinematic ion implanter electrode mounting
JP4316394B2 (ja) * 2004-01-21 2009-08-19 株式会社東芝 荷電ビーム装置
JP5068928B2 (ja) * 2004-11-30 2012-11-07 株式会社Ｓｅｎ 低エネルギービーム増大化方法及びビーム照射装置
US7279687B2 (en) * 2005-08-26 2007-10-09 Varian Semiconductor Equipment Associates, Inc. Technique for implementing a variable aperture lens in an ion implanter
JP5337028B2 (ja) 2006-06-30 2013-11-06 ノルディコ テクニカル サーヴィシズ リミテッド 装置

Also Published As

Publication number Publication date
JP2010519681A (ja) 2010-06-03
US20100044579A1 (en) 2010-02-25
CN101542675A (zh) 2009-09-23
WO2008099218A1 (en) 2008-08-21
EP2111630A1 (en) 2009-10-28

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Legal Events

Date Code Title Description
AT Applications terminated before publication under section 16(1)