CN101540299B - 元件搭载用基板、半导体组件及其制造方法及便携式设备 - Google Patents
元件搭载用基板、半导体组件及其制造方法及便携式设备 Download PDFInfo
- Publication number
- CN101540299B CN101540299B CN2009101346932A CN200910134693A CN101540299B CN 101540299 B CN101540299 B CN 101540299B CN 2009101346932 A CN2009101346932 A CN 2009101346932A CN 200910134693 A CN200910134693 A CN 200910134693A CN 101540299 B CN101540299 B CN 101540299B
- Authority
- CN
- China
- Prior art keywords
- projected electrode
- wiring layer
- electrode
- insulating resin
- mounting substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 179
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 34
- 229920005989 resin Polymers 0.000 claims abstract description 171
- 239000011347 resin Substances 0.000 claims abstract description 171
- 239000000758 substrate Substances 0.000 claims description 109
- 229910052751 metal Inorganic materials 0.000 claims description 97
- 239000002184 metal Substances 0.000 claims description 97
- 238000000034 method Methods 0.000 claims description 96
- 230000008569 process Effects 0.000 claims description 32
- 238000005530 etching Methods 0.000 claims description 23
- 238000002788 crimping Methods 0.000 claims description 16
- 239000007921 spray Substances 0.000 claims description 6
- 230000003746 surface roughness Effects 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 328
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 75
- 229910052802 copper Inorganic materials 0.000 description 72
- 239000010949 copper Substances 0.000 description 72
- 230000008646 thermal stress Effects 0.000 description 45
- 230000015572 biosynthetic process Effects 0.000 description 34
- 229910000679 solder Inorganic materials 0.000 description 25
- 239000010931 gold Substances 0.000 description 22
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 21
- 239000000463 material Substances 0.000 description 19
- 229920000647 polyepoxide Polymers 0.000 description 16
- 239000011248 coating agent Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- 230000000694 effects Effects 0.000 description 13
- 239000004033 plastic Substances 0.000 description 13
- 239000011241 protective layer Substances 0.000 description 13
- 238000009713 electroplating Methods 0.000 description 12
- 239000004593 Epoxy Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 10
- 125000003700 epoxy group Chemical group 0.000 description 10
- 238000009434 installation Methods 0.000 description 10
- 229920001187 thermosetting polymer Polymers 0.000 description 10
- 239000012141 concentrate Substances 0.000 description 9
- 230000006378 damage Effects 0.000 description 8
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
- 229910052737 gold Inorganic materials 0.000 description 7
- 238000005304 joining Methods 0.000 description 7
- 230000035882 stress Effects 0.000 description 7
- 238000009826 distribution Methods 0.000 description 6
- 239000003822 epoxy resin Substances 0.000 description 6
- 238000001459 lithography Methods 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 238000004873 anchoring Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 208000037656 Respiratory Sounds Diseases 0.000 description 4
- 238000001259 photo etching Methods 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 3
- 239000004411 aluminium Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000003475 lamination Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 238000002203 pretreatment Methods 0.000 description 3
- 238000005096 rolling process Methods 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 2
- 238000004380 ashing Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000006071 cream Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000011532 electronic conductor Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000013517 stratification Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/023—Redistribution layers [RDL] for bonding areas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
Landscapes
- Wire Bonding (AREA)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008022013A JP5028291B2 (ja) | 2008-01-31 | 2008-01-31 | 素子搭載用基板、素子搭載用基板の製造方法、半導体モジュールおよび半導体モジュールの製造方法 |
JP022013/08 | 2008-01-31 | ||
JP050473/08 | 2008-02-29 | ||
JP2008050473A JP2009212114A (ja) | 2008-02-29 | 2008-02-29 | 突起電極の構造、素子搭載用基板およびその製造方法、半導体モジュール、ならびに携帯機器 |
JP080994/08 | 2008-03-26 | ||
JP2008080994A JP5022963B2 (ja) | 2008-03-26 | 2008-03-26 | 突起電極の構造、素子搭載用基板およびその製造方法、半導体モジュール、ならびに携帯機器 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101540299A CN101540299A (zh) | 2009-09-23 |
CN101540299B true CN101540299B (zh) | 2013-04-24 |
Family
ID=41035973
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2009101346932A Active CN101540299B (zh) | 2008-01-31 | 2009-02-01 | 元件搭载用基板、半导体组件及其制造方法及便携式设备 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP5028291B2 (enrdf_load_stackoverflow) |
CN (1) | CN101540299B (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101669534B1 (ko) * | 2009-12-07 | 2016-10-26 | 해성디에스 주식회사 | 범프를 구비한 회로기판 및 그 제조 방법 |
WO2011136363A1 (ja) * | 2010-04-28 | 2011-11-03 | 三洋電機株式会社 | 回路装置の製造方法 |
US9398389B2 (en) * | 2013-05-13 | 2016-07-19 | Knowles Electronics, Llc | Apparatus for securing components in an electret condenser microphone (ECM) |
JP7226472B2 (ja) * | 2020-05-26 | 2023-02-21 | 株式会社村田製作所 | 部品相互接続要素を備えた電子部品 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6010769A (en) * | 1995-11-17 | 2000-01-04 | Kabushiki Kaisha Toshiba | Multilayer wiring board and method for forming the same |
US6452280B1 (en) * | 1996-03-06 | 2002-09-17 | Matsushita Electric Industrial Co., Ltd. | Flip chip semiconductor apparatus with projecting electrodes and method for producing same |
US6831234B1 (en) * | 1996-06-19 | 2004-12-14 | Ibiden Co., Ltd. | Multilayer printed circuit board |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5823943B2 (ja) * | 1975-07-16 | 1983-05-18 | 松下電器産業株式会社 | 絶縁体の貫通電極形成方法 |
JP3769587B2 (ja) * | 2000-11-01 | 2006-04-26 | 株式会社ノース | 配線回路用部材とその製造方法と多層配線回路基板と半導体集積回路装置 |
JP2004095913A (ja) * | 2002-08-30 | 2004-03-25 | Dainippon Printing Co Ltd | プリント配線基板及びその製造方法 |
JP2006310530A (ja) * | 2005-04-28 | 2006-11-09 | Sanyo Electric Co Ltd | 回路装置およびその製造方法 |
JP4568215B2 (ja) * | 2005-11-30 | 2010-10-27 | 三洋電機株式会社 | 回路装置および回路装置の製造方法 |
-
2008
- 2008-01-31 JP JP2008022013A patent/JP5028291B2/ja active Active
-
2009
- 2009-02-01 CN CN2009101346932A patent/CN101540299B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6010769A (en) * | 1995-11-17 | 2000-01-04 | Kabushiki Kaisha Toshiba | Multilayer wiring board and method for forming the same |
US6452280B1 (en) * | 1996-03-06 | 2002-09-17 | Matsushita Electric Industrial Co., Ltd. | Flip chip semiconductor apparatus with projecting electrodes and method for producing same |
US6831234B1 (en) * | 1996-06-19 | 2004-12-14 | Ibiden Co., Ltd. | Multilayer printed circuit board |
Also Published As
Publication number | Publication date |
---|---|
JP2009182274A (ja) | 2009-08-13 |
CN101540299A (zh) | 2009-09-23 |
JP5028291B2 (ja) | 2012-09-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8309864B2 (en) | Device mounting board and manufacturing method therefor, and semiconductor module | |
CN100542375C (zh) | 布线电路基板、布线电路基板的制造方法和电路模块 | |
CN102326247B (zh) | 用于集成电路的面对面(f2f)复合式结构 | |
CN100547778C (zh) | 柔性电路衬底及形成方法以及包括柔性电路衬底的组件 | |
US8288865B2 (en) | Semiconductor module having semiconductor device mounted on device mounting substrate | |
CN101197338B (zh) | 半导体模块、半导体模块的制造方法及便携式设备 | |
CN102598250A (zh) | 元件搭载用基板及其制造方法、半导体组件以及便携设备 | |
CN101540299B (zh) | 元件搭载用基板、半导体组件及其制造方法及便携式设备 | |
JP2009182272A (ja) | 素子搭載用基板およびその製造方法、半導体モジュールおよびその製造方法、ならびに携帯機器 | |
CN102027591B (zh) | 半导体模块、半导体模块的制造方法及便携式设备 | |
CN102870209A (zh) | 电路装置的制造方法 | |
CN101499443B (zh) | 元件安装用基板、半导体组件及便携式设备 | |
JP2009224581A (ja) | 素子搭載用基板およびその製造方法、半導体モジュールおよびその製造方法、電極構造、携帯機器 | |
CN101488487B (zh) | 元件搭载用基板、半导体组件及其制造方法及便携式设备 | |
US8362611B2 (en) | Semiconductor module, method for manufacturing semiconductor module, and portable device | |
CN101853841A (zh) | 元件装配用基板及其制造方法、半导体模块及其制造方法 | |
JP5295211B2 (ja) | 半導体モジュールの製造方法 | |
JP5061010B2 (ja) | 半導体モジュール | |
WO2003013201A1 (en) | Method for forming device-landing pad of multi-layered printed circuit board | |
US20240080970A1 (en) | Electronic circuit packages | |
JP5022963B2 (ja) | 突起電極の構造、素子搭載用基板およびその製造方法、半導体モジュール、ならびに携帯機器 | |
CN101494213A (zh) | 元件安装用基板、半导体组件及其制造方法及便携式设备 | |
JP5306443B2 (ja) | 素子搭載用基板、素子搭載用基板の製造方法、半導体モジュールおよび半導体モジュールの製造方法 | |
JP2009212114A (ja) | 突起電極の構造、素子搭載用基板およびその製造方法、半導体モジュール、ならびに携帯機器 | |
JP2002343923A (ja) | 半導体モジュール及びその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant |