CN101410761A - 曝光装置 - Google Patents

曝光装置 Download PDF

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Publication number
CN101410761A
CN101410761A CNA2007800107882A CN200780010788A CN101410761A CN 101410761 A CN101410761 A CN 101410761A CN A2007800107882 A CNA2007800107882 A CN A2007800107882A CN 200780010788 A CN200780010788 A CN 200780010788A CN 101410761 A CN101410761 A CN 101410761A
Authority
CN
China
Prior art keywords
workpiece substrate
fulcrum arrangement
discharge duct
exposure
air discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2007800107882A
Other languages
English (en)
Chinese (zh)
Inventor
佐藤俊德
佐治伸仁
中村刚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NSK Ltd
Original Assignee
NSK Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NSK Ltd filed Critical NSK Ltd
Publication of CN101410761A publication Critical patent/CN101410761A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
CNA2007800107882A 2006-06-14 2007-05-28 曝光装置 Pending CN101410761A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006164658 2006-06-14
JP164658/2006 2006-06-14

Publications (1)

Publication Number Publication Date
CN101410761A true CN101410761A (zh) 2009-04-15

Family

ID=38831590

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2007800107882A Pending CN101410761A (zh) 2006-06-14 2007-05-28 曝光装置

Country Status (4)

Country Link
JP (1) JPWO2007145072A1 (ja)
KR (1) KR20080104172A (ja)
CN (1) CN101410761A (ja)
WO (1) WO2007145072A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102375346A (zh) * 2010-08-06 2012-03-14 株式会社日立高新技术 液晶曝光装置
CN113286755A (zh) * 2018-12-27 2021-08-20 科福罗有限公司 用于非接触式支撑平台的端口布置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5145524B2 (ja) * 2007-10-25 2013-02-20 株式会社ブイ・テクノロジー 露光装置
JP6917691B2 (ja) * 2016-10-04 2021-08-11 株式会社日本製鋼所 レーザ照射装置、レーザ照射方法、及び半導体装置の製造方法
DE102017212090B4 (de) * 2017-07-14 2022-11-03 Carl Zeiss Industrielle Messtechnik Gmbh Luftlagereinrichtung, Halteeinrichtung, Koordinatenmessgerät und Verfahren zur Herstellung

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11237744A (ja) * 1997-12-18 1999-08-31 Sanee Giken Kk 露光装置および露光方法
JP4349101B2 (ja) * 2003-11-21 2009-10-21 株式会社Ｉｈｉ 基板搬送装置
JP4554397B2 (ja) * 2005-02-23 2010-09-29 東京エレクトロン株式会社 ステージ装置および塗布処理装置
JP4553376B2 (ja) * 2005-07-19 2010-09-29 東京エレクトロン株式会社 浮上式基板搬送処理装置及び浮上式基板搬送処理方法
JP4917780B2 (ja) * 2005-09-08 2012-04-18 住友化学株式会社 露光装置
JP4535972B2 (ja) * 2005-09-09 2010-09-01 株式会社ブイ・テクノロジー ワークステージ及び露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102375346A (zh) * 2010-08-06 2012-03-14 株式会社日立高新技术 液晶曝光装置
CN113286755A (zh) * 2018-12-27 2021-08-20 科福罗有限公司 用于非接触式支撑平台的端口布置

Also Published As

Publication number Publication date
JPWO2007145072A1 (ja) 2009-10-29
WO2007145072A1 (ja) 2007-12-21
KR20080104172A (ko) 2008-12-01

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C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication