CN101403785B - 探测装置以及探测方法 - Google Patents

探测装置以及探测方法 Download PDF

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Publication number
CN101403785B
CN101403785B CN2008101695407A CN200810169540A CN101403785B CN 101403785 B CN101403785 B CN 101403785B CN 2008101695407 A CN2008101695407 A CN 2008101695407A CN 200810169540 A CN200810169540 A CN 200810169540A CN 101403785 B CN101403785 B CN 101403785B
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CN
China
Prior art keywords
wafer
image unit
platform
video recording
putting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2008101695407A
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English (en)
Chinese (zh)
Other versions
CN101403785A (zh
Inventor
山本保人
小泽和博
加贺美史
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of CN101403785A publication Critical patent/CN101403785A/zh
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Publication of CN101403785B publication Critical patent/CN101403785B/zh
Expired - Fee Related legal-status Critical Current
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2886Features relating to contacting the IC under test, e.g. probe heads; chucks
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/073Multiple probes
    • G01R1/07307Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2855Environmental, reliability or burn-in testing
    • G01R31/286External aspects, e.g. related to chambers, contacting devices or handlers
    • G01R31/2865Holding devices, e.g. chucks; Handlers or transport devices
CN2008101695407A 2007-09-28 2008-09-28 探测装置以及探测方法 Expired - Fee Related CN101403785B (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2007256804 2007-09-28
JP2007-256804 2007-09-28
JP2007256804 2007-09-28
JP2008092934A JP5120027B2 (ja) 2007-09-28 2008-03-31 プローブ装置及びプロービング方法
JP2008092934 2008-03-31
JP2008-092934 2008-03-31

Publications (2)

Publication Number Publication Date
CN101403785A CN101403785A (zh) 2009-04-08
CN101403785B true CN101403785B (zh) 2012-01-11

Family

ID=40537857

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2008101695407A Expired - Fee Related CN101403785B (zh) 2007-09-28 2008-09-28 探测装置以及探测方法

Country Status (4)

Country Link
JP (1) JP5120027B2 (ja)
KR (1) KR101020396B1 (ja)
CN (1) CN101403785B (ja)
TW (1) TWI442494B (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4949454B2 (ja) * 2009-11-17 2012-06-06 東京エレクトロン株式会社 プローブ装置
JP2013024829A (ja) * 2011-07-26 2013-02-04 Seiko Epson Corp 電子部品搬送装置及び電子部品搬送方法
JP2014135363A (ja) * 2013-01-09 2014-07-24 Tokyo Electron Ltd プローブ装置及びウエハ搬送ユニット
JP6220596B2 (ja) * 2013-08-01 2017-10-25 東京エレクトロン株式会社 プローバ
JP6084140B2 (ja) * 2013-09-06 2017-02-22 ヤマハファインテック株式会社 電気検査装置
US11159784B2 (en) * 2014-10-23 2021-10-26 Cognex Corporation System and method for calibrating a vision system with respect to a touch probe
JP6999321B2 (ja) * 2017-07-31 2022-01-18 東京エレクトロン株式会社 検査装置、検査方法及び記憶媒体
TWI794324B (zh) * 2017-11-24 2023-03-01 日商日本電產理德股份有限公司 基板檢查裝置、檢查位置補正方法、位置補正資訊產生方法、以及位置補正資訊產生系統
CN114308709A (zh) * 2021-12-28 2022-04-12 傲普(上海)新能源有限公司 一种电芯极片叠片对位检测方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3306972B2 (ja) * 1993-02-26 2002-07-24 キヤノン株式会社 位置検出装置及びそれを用いた半導体素子の製造方法
JPH0915302A (ja) * 1995-06-30 1997-01-17 Olympus Optical Co Ltd 回路基板検査機の位置決め装置および位置決め方法
JP3303968B2 (ja) * 1998-02-19 2002-07-22 東京エレクトロン株式会社 ウエハと接触子の位置合わせ装置
JP4740405B2 (ja) 2000-11-09 2011-08-03 東京エレクトロン株式会社 位置合わせ方法及びプログラム記録媒体
JP2003152037A (ja) * 2001-11-12 2003-05-23 Moritex Corp ウェハ検査方法、検査装置及び検査用赤外線撮像装置
JP2004063877A (ja) 2002-07-30 2004-02-26 Tokyo Seimitsu Co Ltd ウェハの位置決め修正方法
JP2004140084A (ja) * 2002-10-16 2004-05-13 Sharp Corp 半導体チップのピックアップ方法およびそのピックアップ装置
KR20050024922A (ko) * 2003-09-05 2005-03-11 김광렬 웨이퍼의 결함 검사장치 및 그 방법
JP2005223251A (ja) * 2004-02-09 2005-08-18 Seiko Epson Corp 半導体装置の検査方法及びその検査装置、並びにその検査装置の制御プログラム
JP4799880B2 (ja) 2005-02-23 2011-10-26 オー・エイチ・ティー株式会社 検査装置及び検査方法並びに位置決め方法

Also Published As

Publication number Publication date
CN101403785A (zh) 2009-04-08
TWI442494B (zh) 2014-06-21
JP2009099937A (ja) 2009-05-07
JP5120027B2 (ja) 2013-01-16
KR101020396B1 (ko) 2011-03-08
TW200931556A (en) 2009-07-16
KR20090033036A (ko) 2009-04-01

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Granted publication date: 20120111

Termination date: 20160928