CN101267708B - 等离子处理装置及等离子处理方法 - Google Patents
等离子处理装置及等离子处理方法 Download PDFInfo
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- CN101267708B CN101267708B CN 200810100302 CN200810100302A CN101267708B CN 101267708 B CN101267708 B CN 101267708B CN 200810100302 CN200810100302 CN 200810100302 CN 200810100302 A CN200810100302 A CN 200810100302A CN 101267708 B CN101267708 B CN 101267708B
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- lower electrode
- plasma
- bias power
- substrate
- vacuum chamber
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- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (14)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070013900A KR101297711B1 (ko) | 2007-02-09 | 2007-02-09 | 플라즈마 처리장치 및 플라즈마 처리방법 |
KR13900/07 | 2007-02-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101267708A CN101267708A (zh) | 2008-09-17 |
CN101267708B true CN101267708B (zh) | 2012-08-08 |
Family
ID=39757325
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 200810100302 Active CN101267708B (zh) | 2007-02-09 | 2008-02-05 | 等离子处理装置及等离子处理方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5465835B2 (zh) |
KR (1) | KR101297711B1 (zh) |
CN (1) | CN101267708B (zh) |
TW (1) | TWI452945B (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101754564B (zh) * | 2008-12-09 | 2014-02-19 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 等离子体加工设备 |
JP2010263051A (ja) * | 2009-05-01 | 2010-11-18 | Ulvac Japan Ltd | ドライエッチング装置 |
CN101924003B (zh) * | 2009-06-12 | 2013-09-11 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 电极结构及等离子体设备 |
AT513190B9 (de) * | 2012-08-08 | 2014-05-15 | Berndorf Hueck Band Und Pressblechtechnik Gmbh | Vorrichtung und Verfahren zur Plasmabeschichtung eines Substrats, insbesondere eines Pressblechs |
JP6258146B2 (ja) * | 2014-07-18 | 2018-01-10 | 株式会社Ihi環境エンジニアリング | プラズマ放電状態検知装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05182916A (ja) * | 1991-12-28 | 1993-07-23 | Kokusai Electric Co Ltd | プラズマ処理方法及びその装置 |
JP3311812B2 (ja) * | 1993-04-09 | 2002-08-05 | 東京エレクトロン株式会社 | 静電チャック |
JPH07169745A (ja) * | 1993-12-16 | 1995-07-04 | Sharp Corp | 平行平板型ドライエッチング装置 |
JPH07263178A (ja) * | 1994-03-23 | 1995-10-13 | Mitsubishi Heavy Ind Ltd | プラズマ計測装置 |
JPH08167588A (ja) * | 1994-12-12 | 1996-06-25 | Sony Corp | プラズマ処理装置及びプラズマモニタリング装置 |
JP3220383B2 (ja) * | 1996-07-23 | 2001-10-22 | 東京エレクトロン株式会社 | プラズマ処理装置及びその方法 |
JPH10280172A (ja) * | 1997-04-01 | 1998-10-20 | Tokyo Electron Ltd | プラズマ処理装置 |
JPH10326772A (ja) * | 1997-05-26 | 1998-12-08 | Ricoh Co Ltd | ドライエッチング装置 |
KR100626279B1 (ko) * | 1999-12-30 | 2006-09-22 | 엘지.필립스 엘시디 주식회사 | 드라이 에칭장치 |
JP3840990B2 (ja) * | 2002-03-05 | 2006-11-01 | 住友電気工業株式会社 | 半導体/液晶製造装置 |
JP3642773B2 (ja) * | 2002-11-12 | 2005-04-27 | 東京エレクトロン株式会社 | プラズマ処理方法およびプラズマ処理装置 |
JP4149395B2 (ja) * | 2004-03-11 | 2008-09-10 | 三井造船株式会社 | 粒子密度分布測定装置 |
-
2007
- 2007-02-09 KR KR1020070013900A patent/KR101297711B1/ko active IP Right Grant
-
2008
- 2008-01-29 JP JP2008017093A patent/JP5465835B2/ja active Active
- 2008-02-05 CN CN 200810100302 patent/CN101267708B/zh active Active
- 2008-02-05 TW TW097104726A patent/TWI452945B/zh active
Also Published As
Publication number | Publication date |
---|---|
TWI452945B (zh) | 2014-09-11 |
TW200850078A (en) | 2008-12-16 |
KR20080074587A (ko) | 2008-08-13 |
KR101297711B1 (ko) | 2013-08-20 |
JP2008198601A (ja) | 2008-08-28 |
CN101267708A (zh) | 2008-09-17 |
JP5465835B2 (ja) | 2014-04-09 |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SAMSUNG DISPLAY CO., LTD. Free format text: FORMER OWNER: SAMSUNG ELECTRONICS CO., LTD. Effective date: 20121115 |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20121115 Address after: Gyeonggi Do, South Korea Patentee after: Samsung Display Co.,Ltd. Patentee after: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY Address before: Gyeonggi Do, South Korea Patentee before: Samsung Electronics Co.,Ltd. Patentee before: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY |