CN101266408A - 层压体、和使用它的接枝膜形成方法及接枝图案的形成方法 - Google Patents

层压体、和使用它的接枝膜形成方法及接枝图案的形成方法 Download PDF

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Publication number
CN101266408A
CN101266408A CNA2008100846185A CN200810084618A CN101266408A CN 101266408 A CN101266408 A CN 101266408A CN A2008100846185 A CNA2008100846185 A CN A2008100846185A CN 200810084618 A CN200810084618 A CN 200810084618A CN 101266408 A CN101266408 A CN 101266408A
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CN
China
Prior art keywords
compound
graft polymer
mentioned
polymerization
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2008100846185A
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English (en)
Chinese (zh)
Inventor
松下泰明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of CN101266408A publication Critical patent/CN101266408A/zh
Pending legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00Coating on the layer surface
    • B32B2255/26Polymeric coating

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CNA2008100846185A 2007-03-16 2008-03-13 层压体、和使用它的接枝膜形成方法及接枝图案的形成方法 Pending CN101266408A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007068417 2007-03-16
JP068417/2007 2007-03-16

Publications (1)

Publication Number Publication Date
CN101266408A true CN101266408A (zh) 2008-09-17

Family

ID=39983120

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2008100846185A Pending CN101266408A (zh) 2007-03-16 2008-03-13 层压体、和使用它的接枝膜形成方法及接枝图案的形成方法

Country Status (3)

Country Link
JP (1) JP2008260272A (enExample)
KR (1) KR20080084755A (enExample)
CN (1) CN101266408A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109321877A (zh) * 2017-08-01 2019-02-12 上海自旭光电科技有限公司 成膜掩模及其制造方法
CN110277529A (zh) * 2019-06-28 2019-09-24 新乡市中科科技有限公司 一种高倍率锂离子电池用功能复合膜及其制备方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6652758B2 (ja) * 2015-09-30 2020-02-26 国立大学法人東北大学 複合材料、複合材料の製造方法
CN107371338B (zh) * 2016-05-13 2019-08-20 苏州卫鹏机电科技有限公司 一种超薄金属层的印刷线路板的制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4348253B2 (ja) * 2003-08-20 2009-10-21 富士フイルム株式会社 導電性パターン材料及び導電性パターンの形成方法
JP4708859B2 (ja) * 2004-09-07 2011-06-22 富士フイルム株式会社 薄層トランジスタ、それを用いたアクティブマトリックス型表示装置、及び、液晶表示装置
JP2006350307A (ja) * 2005-05-20 2006-12-28 Fujifilm Holdings Corp グラフトパターン形成方法及び導電性パターン形成方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109321877A (zh) * 2017-08-01 2019-02-12 上海自旭光电科技有限公司 成膜掩模及其制造方法
CN110277529A (zh) * 2019-06-28 2019-09-24 新乡市中科科技有限公司 一种高倍率锂离子电池用功能复合膜及其制备方法
CN110277529B (zh) * 2019-06-28 2021-11-05 新乡市中科科技有限公司 一种高倍率锂离子电池用功能复合膜及其制备方法

Also Published As

Publication number Publication date
JP2008260272A (ja) 2008-10-30
KR20080084755A (ko) 2008-09-19

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Application publication date: 20080917