CN111548489A - 一种光敏性材料及在制备柔性线路板中的应用及制备方法 - Google Patents
一种光敏性材料及在制备柔性线路板中的应用及制备方法 Download PDFInfo
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- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08G18/2865—Compounds having only one primary or secondary amino group; Ammonia
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- C—CHEMISTRY; METALLURGY
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- C—CHEMISTRY; METALLURGY
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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Abstract
本发明公开了一种光敏性材料及在制备柔性线路板中的应用及制备方法。所述光敏性材料由光敏性基团和聚合物接枝形成,其中光敏性基团占材料的质量分数为1~25%,所述光敏性基团的结构如式(Ⅰ)所示;其中R1、R2、R3、R4、R5各自独立地为氢、卤素、羟基、醛基、C1~4烷基、C1~2酰胺、C1~4醚基、C1~4酯基、C1~4酮基或单环芳香取代基;其中所述聚合物的分子链上含有可与羟基反应的基团。本发明利用光敏性材料制备柔性线路板的方法过程简单,通过短时间的掩模光照后,即可在材料曝光区域高效沉积催化剂,并实现化学镀,提升制备效率和原材料利用率,适合连续化作业生产,在柔性电子线路设备制造方面有着巨大应用前景及竞争力。
Description
技术领域
本发明涉及柔性线路板的制备技术领域,更具体地,涉及一种光敏性材料及在制备柔性线路板中的应用及制备方法。
背景技术
传统制备柔性线路板主要有两种方法:减成法与加成法。减成法制备柔性线路板是指在聚合物薄膜表面全覆盖金属薄层,然后在金属薄层上涂覆正性或负性光刻胶,再通过光刻将特定区域光刻胶固化,将未固化光刻胶通过特殊溶剂去除,暴露出的金属再通过特殊刻蚀剂去除,最后将固话的光刻胶用特殊溶剂去除后便在聚合物薄膜上留下预期金属线路,减成法制备柔性线路板存在最大问题是剩余金属线路侧蚀严重,且金属浪费率高,耗能大,污染物排放多。
相比于减成法,加成法制备柔性线路板是指利用特殊工艺在聚合物薄膜表面直接喷印含有金属纳米颗粒的油墨或接枝修饰功能性基团来固定金属镀催化剂以保证后续化学镀顺利进行,但加成法普遍存在喷印油墨制备成本高、金属导线与聚合物基板粘结力差、加工精度低问题。
不管是减成法还是加成法,目前在柔性线路板中的制备,均具有一定的缺陷,且上述两种方法对于基底材料均具有选择性,限制了柔性线路板的应用。
发明内容
本发明的目的在于提供一种光敏性材料在制备柔性线路板中的应用。本发明所述光敏性材料可涂覆在多种柔性基底材料表面,然后经过紫外光照射后,吸附催化剂并在金属溶液中化学度,即可简单、快速的制备得到所需路线或图案的柔性电路板。
本发明的另一目的在于提供一种利用光敏性材料制备柔性线路板的方法。
本发明的再一目的在于提供有上述方法制备得到的柔性线路板。
本发明的上述目的是通过以下方案予以实现的:
一种光敏性材料,所述光敏性材料由光敏性基团和聚合物接枝形成,其中光敏性基团占材料的质量分数为1~25%,所述光敏性基团的结构如式(Ⅰ)所示:
其中R1、R2、R3、R4、R5各自独立地为氢、卤素、羟基、醛基、C1~4烷基、C1~2酰胺、C1~4醚基、C1~4酯基、C1~4酮基或单环芳香取代基;
其中所述聚合物的分子链上含有可与羟基反应的基团,选自聚丙烯酸、聚丙烯酸酯涂料、环氧涂料、三胶醛涂料、聚氨酯涂料或不饱和聚酯涂料的一种或多种。
所述光敏性材料由光敏性基团和聚合物接枝形成,其结构如式(Ⅱ)所示:
式(Ⅱ)表示光敏性基团接枝在聚合物的支链上,且接枝率可进行调节。
其中,光敏基团和化合物的接枝可通过共混或者化学接枝的方式进行接枝。
以聚合物为聚酰胺酸为例,所述全息彩色图案的材料的制备过程如下所示:
其中,x︰y的范围为10︰1到100︰1。
将4,4’-联苯二胺及含光敏基团的联苯二胺加入到装有机械搅拌及惰性气体保护装置的设备中,加入无水N-甲基吡咯烷酮,0~25度下搅拌、溶解,然后将均苯四甲酸酐一次性加入上述物料中,继续搅拌反应,反应结束后即得到光敏性聚酰胺酸溶液,分离后,即为光敏性聚酰胺酸。
其中所述材料中的光敏性基团经氧化还原(紫外光照射后)后,其结构如式(Ⅲ)所示:
优选地,所述光敏性基团占材料的质量分数为5~10%。
优选地,R1、R2、R3、R4、R5各自独立地为氢、卤素、羟基、甲醛基、甲基、乙基、甲酰胺、C1~4醚基、C1~4酯基、C1~4酮基或单环芳香取代基;所述聚合物选自聚氨酯、环氧树脂或聚丙烯酸酯中的一种或多种。
优选地,所述R1、R2、R3各自独立地为氢、甲酯(-COOCH3)、乙酯基、甲酰胺或甲醛基;R4为氢、甲基或甲氧基;R5为氢。
优选地,所述光敏性基团的结构如下所示:
优选地,所述聚合物选自聚酰胺、AB型环氧树脂或聚氨酯中的一种或多种。
优选地,聚合物的分子链上含有可与羟基反应的基团为羧基、氨基、酰卤、酸酐、醛或卤代烷基团中的一种或多种。
本发明同时还保护所述光敏性材料在制备柔性线路板中的应用。
本发明同时还保护一种利用光敏性材料制备柔性线路板的方法,将所述光敏性材料配置成为溶液后,涂覆在基低材料上,并干燥成薄膜;将所需线路设置在透紫外光的掩膜板上,然后薄膜盖上掩膜板后,曝光在紫外光下,曝光结束后,再将薄膜浸泡于含化学镀所需催化剂的溶液吸附催化剂;最后再将薄膜置于金属镀液中进行化学镀,得到所需线路的柔性线路板。
光敏性材料在基地材料表面形成薄膜后,在紫外光的照射下,照射区域的光敏性材料结构中的光敏性基团被氧化还原,然后在含化学镀所需催化剂的溶液中浸泡时,照射区域会吸附溶液中的催化剂,然后在金属镀液中,与金属离子络合反应,从而在薄膜上形成金属线路或图案。其中所需要的线路或者图案设置在透紫外光的掩膜板上,具体的线路和图案可根据需求进行设计和调整,从而可简单、快速的在任一基底材料上制备得到柔性线路板。
优选地,所述基低材料为任意柔性聚合物基底,是的光敏性材料能在其表面成膜即可。
优选地,所述基低材料聚酰亚胺、聚对苯二甲酸乙二醇酯薄膜、聚乙烯薄膜、纸张、软性金属或陶瓷。
优选地,光敏性材料溶液涂覆在基低材料上后,去除溶剂,即在基地材料表层形成一层薄膜。其中去除溶剂可采用本领域常规的方法,例如鼓风加热处理等。
优选地,所述紫外光波长范围为200~400纳米,曝光时长为15~1500秒。
优选地,所述金属镀液为商品化的金属化学镀镀液,涉及金属的种类包括但不仅限于铜、金、银、镍。
优选地,所述含化学镀所需催化剂的溶液中的催化剂为钯盐、金盐或银盐。
优选地,所述含化学镀所需催化剂的溶液中溶剂为乙醇、水、乙腈、N,N-二甲基甲酰胺、N,N-二乙基乙酰胺、N-甲基吡咯烷酮、四氢呋喃、甲醇或二甲亚砜中的一种或多种。
优选地,薄膜在含化学镀所需催化剂的溶液中的浸泡时间为1~60秒。
上述任一所述方法制备得到的柔性线路板也在本发明的保护范围之类。
与现有技术相比,本发明具有以下有益效果:
本发明所述光敏性材料由光敏性基团和聚合物接枝而成,其可涂覆在多种基底材料表面,因此基底材料的适用性广;其经紫外光照射后,其光敏性基团中的吡啶环发生氧化还原反应,反应后的基团可按需求镀上金属电路,简单、快速的制备得到柔性线路板。
本发明所述柔性线路板的制备过程简单、耗时短,通过短时间的掩模光照后,即可在材料曝光区域高效沉积催化剂,并可实现基材表面的化学镀,大大缩减制备时间、提升制备效率和原材料利用率,尤其适合连续化作业生产,在柔性电子线路设备制造方面有着巨大应用前景及竞争力。
附图说明
图1为本发明实施例1中在玻璃表面涂敷聚酰胺酸基光敏涂料后进行图案化镀铜,形成金属图案的实物图;
图2为本发明实施例2中光敏环氧涂料直接成膜后光照,再通过化学镀铜操作后形成金属图案的实物图。
具体实施方式
下面结合具体实施例对本发明做出进一步地详细阐述,所述实施例只用于解释本发明,并非用于限定本发明的范围。下述实施例中所使用的试验方法如无特殊说明,均为常规方法;所使用的材料、试剂等,如无特殊说明,为可从商业途径得到的试剂和材料。
实施例1:一种柔性线路板的制备过程
1、采用的原料为光敏性聚酰胺酸,其制备过程如下:
将4,4’-联苯二胺(18.4克)及含光敏性结构的联苯二胺(111克)加入到装有机械搅拌及惰性气体保护装置的设备中,加入无水N-甲基吡咯烷酮(1556克),0~25度下搅拌溶解光敏二胺单体后,将均苯四甲酸酐(43.6克)一次性加入,继续搅拌反应24小时,得到光敏性聚酰胺酸溶液。
其中,x︰y的范围为10︰1到100︰1之间。
2、表面含特定导电金属图案(线路)的柔性材料的制备:
室温避光下,将所得聚酰胺酸溶液经过滤消泡工艺后均匀流延在清洁的玻璃上,在鼓风加热设备中,90度下溶剂蒸发5小时,得到厚度为3~300微米厚的光敏性聚酰胺酸薄膜。将含目标图案(或线路)的可透紫外线掩模板覆盖在光敏性聚酰胺酸薄膜上,在可发射波长为365纳米的短波光源下照射10分钟,关闭光源移去掩模板后,将曝光后薄膜浸入含化学镀所需催化剂的有机溶液中(5克氯化钯溶解在1升无水乙醇中)进行10分钟吸附,所需催化剂可高效沉积在薄膜曝光区域;将沉积了催化剂的聚酰胺酸薄膜在惰性气体氛围下,于250摄氏度烘干60分钟,于300摄氏度下烘干60分钟,冷却后浸入商品化金属镀铜液中进行化学镀,得到最终表面含特定导电金属铜图案。
制备的实物图如图1所示。
实施例2:一种可制备柔性线路板的特种涂料和工艺流程,操作如下:
使用AB型环氧树脂,采用以下光敏二胺作为B组分环氧树脂固化剂:
将AB型环氧树脂的A组分及含光敏性结构的联苯醚二胺,以100:1的质量比混合,流延在平整整洁的钢板上涂膜,然后加热到160摄氏度进行固化2小时,将含目标图案的掩模板覆盖在该光敏性薄膜上,以365纳米的紫外光照射15分钟,关闭光源移去掩模板后,将曝光后薄膜浸入含化学镀所需催化剂的有机溶液中(硝酸银5克溶解在1升无水甲醇中)进行显影,浸泡时长为15秒,所需催化剂可高效沉积在薄膜曝光区域。将沉积了催化剂的环氧薄膜浸入商品化化学镀铜液中进行化学镀,得到最终表面含特定导电金属铜图案的环氧薄膜材料。
制备的实物图如图2所示。
实施例3:一种可制备柔性线路板的特种涂料和工艺流程,操作如下:
1、采用的原料为光敏性聚酰胺酸,其制备过程如下:
其中x︰y︰z约为30︰10︰1。
将光敏分子(35克),对苯二异氰酸酯(16),甘油(9.2克)溶解于200克丙酮,加入0.5克有机锡催化剂T9,室温反应20分钟后,加入对苯二异氰酸酯(144克),聚丁二醇-2000(1800克),室温搅拌1小时,加入200克水稀释,得到光敏性聚氨酯溶液。
2、表面含特定导电金属图案的聚氨酯材料制备:
室温避光下,将所得聚氨酯溶液经过滤消泡工艺后刮涂在平整整洁的钢板上,在鼓风加热设备中,80摄氏度下烘干1小时,得到厚度为0.3毫米具有自支撑性的光敏性聚氨酯薄膜。将光敏性聚氨酯薄膜送入365纳米紫外光光刻设备中,在高集中光源下直接按预定程序将所需图案曝光在薄膜表面,单个像素点曝光时长为300毫秒,将曝光后薄膜浸入浸入含化学镀所需催化剂的有机溶液中(氯化钯1g溶解在1升无水乙醇中)进行吸附10秒,所需催化剂则沉积在薄膜曝光区域。在将薄膜浸入商品化金属镀镍液中进行化学镀,得到最终表面含特定导电金属镍图案的聚氨酯材料。
对比例1
一种可制备柔性线路板的特种涂料和工艺流程,操作如下:
聚合物使用AB型环氧树脂,采用的光敏基团为光敏二胺,结构如下所示:
制备方法同实施例2。
其中光敏性基团占光敏性聚酰胺酸质量分数的2%-15%。
以上述制备的环氧树脂为原料,采用实施例2中的流程制备柔性线路板,将不能得到所设计的金属电路,原因是该结构中羧基含量过高,会导致金属离子无差别吸附(紫外光照前后薄膜吸附铜离子的能力不变)导致整个环氧树脂覆盖区域都被镀上金属。
最后所应当说明的是,以上实施例仅用以说明本发明的技术方案而非对本发明保护范围的限制,对于本领域的普通技术人员来说,在上述说明及思路的基础上还可以做出其它不同形式的变化或变动,这里无需也无法对所有的实施方式予以穷举。凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本发明权利要求的保护范围之内。
Claims (10)
2.根据权利要求1所述光敏性材料,其特征在于,所述光敏性基团占光敏材料的质量分数为5~10%。
3.根据权利要求1所述光敏性材料,其特征在于,R1、R2、R3、R4、R5各自独立地为氢、卤素、羟基、甲醛基、甲基、乙基、甲酰胺、C1~4醚基、C1~4酯基、C1~4酮基或单环芳香取代基;所述聚合物选自聚氨酯、环氧树脂或聚丙烯酸酯中的一种或多种。
4.权利要求1至3任一所述光敏性材料在制备柔性线路板中的应用。
5.一种利用光敏性材料制备柔性线路板的方法,其特征在于,将权利要求1至3任一所述光敏性材料配置成为溶液后,涂覆在基低材料上,并干燥成薄膜;将所需线路设置在透紫外光的掩膜板上,然后薄膜盖上掩膜板后,曝光在紫外光下,曝光结束后,再将薄膜浸泡于含化学镀所需催化剂的溶液吸附催化剂;最后再将薄膜置于金属镀液中进行化学镀,得到所需线路的柔性线路板。
6.根据权利要求5所述利用光敏性材料制备柔性线路板的方法,其特征在于,所述基低材料为任意柔性聚合物基底。
7.根据权利要5所述利用光敏性材料制备柔性线路板的方法,其特征在于,所述基低材料聚酰亚胺、聚对苯二甲酸乙二醇酯薄膜、聚乙烯薄膜、纸张、软性金属或陶瓷。
8.根据权利要求5所述利用光敏性材料制备柔性线路板的方法,其特征在于,所述紫外光波长范围为200~400纳米,曝光时长为15~1500秒。
9.根据权利要求5所述利用光敏性材料制备柔性线路板的方法,其特征在于,所述含化学镀所需催化剂的溶液中的催化剂为钯盐、金盐或银盐。
10.权利要求5至9任一所述方法制备得到的柔性线路板。
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