CN101231468A - 放射线敏感性树脂组合物和滤色器 - Google Patents

放射线敏感性树脂组合物和滤色器 Download PDF

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Publication number
CN101231468A
CN101231468A CNA2008100037763A CN200810003776A CN101231468A CN 101231468 A CN101231468 A CN 101231468A CN A2008100037763 A CNA2008100037763 A CN A2008100037763A CN 200810003776 A CN200810003776 A CN 200810003776A CN 101231468 A CN101231468 A CN 101231468A
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CN
China
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Pending
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CNA2008100037763A
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English (en)
Chinese (zh)
Inventor
荒井雅史
河本达庆
松本龙
小林和博
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JSR Corp
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JSR Corp
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Publication of CN101231468A publication Critical patent/CN101231468A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
CNA2008100037763A 2007-01-22 2008-01-22 放射线敏感性树脂组合物和滤色器 Pending CN101231468A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007011667 2007-01-22
JP2007011667A JP5056025B2 (ja) 2007-01-22 2007-01-22 感放射線性樹脂組成物およびカラーフィルタ

Publications (1)

Publication Number Publication Date
CN101231468A true CN101231468A (zh) 2008-07-30

Family

ID=39703267

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2008100037763A Pending CN101231468A (zh) 2007-01-22 2008-01-22 放射线敏感性树脂组合物和滤色器

Country Status (5)

Country Link
JP (1) JP5056025B2 (ko)
KR (1) KR101408422B1 (ko)
CN (1) CN101231468A (ko)
SG (1) SG144851A1 (ko)
TW (1) TWI457612B (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102466972A (zh) * 2010-11-08 2012-05-23 第一毛织株式会社 用于彩色滤光片的光敏树脂组合物和应用其的彩色滤光片
CN102890419A (zh) * 2011-07-20 2013-01-23 奇美实业股份有限公司 感光性树脂组成物及其应用

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI422631B (zh) * 2011-06-30 2014-01-11 Everlight Chem Ind Corp 黑色樹脂組成物、黑色矩陣及遮光層
JP5940274B2 (ja) * 2011-10-11 2016-06-29 東京インキ株式会社 重合体、重合体組成物、重合体の製造方法およびブロック共重合体の製造方法
JP7010093B2 (ja) * 2018-03-19 2022-01-26 Jsr株式会社 感放射線性組成物
JP7406983B2 (ja) * 2019-12-26 2023-12-28 住友化学株式会社 組成物および表示装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR970003683B1 (ko) * 1993-09-28 1997-03-21 제일합섬 주식회사 액정디스플레이 컬러필터용 감광성 수지 조성물
JP2003186176A (ja) * 2001-12-21 2003-07-03 Fuji Photo Film Co Ltd フォトマスク材料、フォトマスク及びその製造方法
KR100433430B1 (ko) * 2002-08-07 2004-05-31 삼성전자주식회사 피씨엠씨아이에이 어댑터를 가지는 휴대용 이동통신시스템
JP2005316388A (ja) * 2004-03-30 2005-11-10 Jsr Corp カラーフィルタ用感放射線性組成物、カラーフィルタおよびカラー液晶表示装置
JP4492238B2 (ja) * 2004-07-26 2010-06-30 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
JP2006047686A (ja) * 2004-08-04 2006-02-16 Jsr Corp カラーフィルタ用感放射線性組成物、その調製法、カラーフィルタおよびカラー液晶表示装置
JP2006195425A (ja) * 2004-12-15 2006-07-27 Jsr Corp 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
JP4923496B2 (ja) * 2005-02-18 2012-04-25 Ｊｓｒ株式会社 カラーフィルタ用感放射線性樹脂組成物およびカラーフィルタ

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102466972A (zh) * 2010-11-08 2012-05-23 第一毛织株式会社 用于彩色滤光片的光敏树脂组合物和应用其的彩色滤光片
CN102466972B (zh) * 2010-11-08 2014-05-07 第一毛织株式会社 用于彩色滤光片的光敏树脂组合物和应用其的彩色滤光片
CN102890419A (zh) * 2011-07-20 2013-01-23 奇美实业股份有限公司 感光性树脂组成物及其应用

Also Published As

Publication number Publication date
JP5056025B2 (ja) 2012-10-24
SG144851A1 (en) 2008-08-28
KR101408422B1 (ko) 2014-06-17
TW200905263A (en) 2009-02-01
TWI457612B (zh) 2014-10-21
KR20080069133A (ko) 2008-07-25
JP2008176218A (ja) 2008-07-31

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Application publication date: 20080730