JP5056025B2 - 感放射線性樹脂組成物およびカラーフィルタ - Google Patents
感放射線性樹脂組成物およびカラーフィルタ Download PDFInfo
- Publication number
- JP5056025B2 JP5056025B2 JP2007011667A JP2007011667A JP5056025B2 JP 5056025 B2 JP5056025 B2 JP 5056025B2 JP 2007011667 A JP2007011667 A JP 2007011667A JP 2007011667 A JP2007011667 A JP 2007011667A JP 5056025 B2 JP5056025 B2 JP 5056025B2
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- acrylate
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Polymerisation Methods In General (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007011667A JP5056025B2 (ja) | 2007-01-22 | 2007-01-22 | 感放射線性樹脂組成物およびカラーフィルタ |
SG200800542-3A SG144851A1 (en) | 2007-01-22 | 2008-01-21 | Radiation sensitive resin composition and color filter |
KR1020080006191A KR101408422B1 (ko) | 2007-01-22 | 2008-01-21 | 감방사선성 수지 조성물 및 컬러 필터 |
CNA2008100037763A CN101231468A (zh) | 2007-01-22 | 2008-01-22 | 放射线敏感性树脂组合物和滤色器 |
TW097102384A TWI457612B (zh) | 2007-01-22 | 2008-01-22 | 感射線樹脂組成物以及彩色濾光片 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007011667A JP5056025B2 (ja) | 2007-01-22 | 2007-01-22 | 感放射線性樹脂組成物およびカラーフィルタ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008176218A JP2008176218A (ja) | 2008-07-31 |
JP5056025B2 true JP5056025B2 (ja) | 2012-10-24 |
Family
ID=39703267
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007011667A Expired - Fee Related JP5056025B2 (ja) | 2007-01-22 | 2007-01-22 | 感放射線性樹脂組成物およびカラーフィルタ |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5056025B2 (ko) |
KR (1) | KR101408422B1 (ko) |
CN (1) | CN101231468A (ko) |
SG (1) | SG144851A1 (ko) |
TW (1) | TWI457612B (ko) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101453771B1 (ko) * | 2010-11-08 | 2014-10-23 | 제일모직 주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
TWI422631B (zh) * | 2011-06-30 | 2014-01-11 | Everlight Chem Ind Corp | 黑色樹脂組成物、黑色矩陣及遮光層 |
TW201305728A (zh) * | 2011-07-20 | 2013-02-01 | Chi Mei Corp | 感光性樹脂組成物及其應用 |
JP5940274B2 (ja) * | 2011-10-11 | 2016-06-29 | 東京インキ株式会社 | 重合体、重合体組成物、重合体の製造方法およびブロック共重合体の製造方法 |
JP7010093B2 (ja) * | 2018-03-19 | 2022-01-26 | Jsr株式会社 | 感放射線性組成物 |
JP7406983B2 (ja) * | 2019-12-26 | 2023-12-28 | 住友化学株式会社 | 組成物および表示装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR970003683B1 (ko) * | 1993-09-28 | 1997-03-21 | 제일합섬 주식회사 | 액정디스플레이 컬러필터용 감광성 수지 조성물 |
JP2003186176A (ja) * | 2001-12-21 | 2003-07-03 | Fuji Photo Film Co Ltd | フォトマスク材料、フォトマスク及びその製造方法 |
KR100433430B1 (ko) * | 2002-08-07 | 2004-05-31 | 삼성전자주식회사 | 피씨엠씨아이에이 어댑터를 가지는 휴대용 이동통신시스템 |
JP2005316388A (ja) * | 2004-03-30 | 2005-11-10 | Jsr Corp | カラーフィルタ用感放射線性組成物、カラーフィルタおよびカラー液晶表示装置 |
JP4492238B2 (ja) * | 2004-07-26 | 2010-06-30 | Jsr株式会社 | 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル |
JP2006047686A (ja) * | 2004-08-04 | 2006-02-16 | Jsr Corp | カラーフィルタ用感放射線性組成物、その調製法、カラーフィルタおよびカラー液晶表示装置 |
JP2006195425A (ja) * | 2004-12-15 | 2006-07-27 | Jsr Corp | 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル |
JP4923496B2 (ja) * | 2005-02-18 | 2012-04-25 | Jsr株式会社 | カラーフィルタ用感放射線性樹脂組成物およびカラーフィルタ |
-
2007
- 2007-01-22 JP JP2007011667A patent/JP5056025B2/ja not_active Expired - Fee Related
-
2008
- 2008-01-21 KR KR1020080006191A patent/KR101408422B1/ko active IP Right Grant
- 2008-01-21 SG SG200800542-3A patent/SG144851A1/en unknown
- 2008-01-22 CN CNA2008100037763A patent/CN101231468A/zh active Pending
- 2008-01-22 TW TW097102384A patent/TWI457612B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
SG144851A1 (en) | 2008-08-28 |
KR101408422B1 (ko) | 2014-06-17 |
TW200905263A (en) | 2009-02-01 |
TWI457612B (zh) | 2014-10-21 |
KR20080069133A (ko) | 2008-07-25 |
CN101231468A (zh) | 2008-07-30 |
JP2008176218A (ja) | 2008-07-31 |
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