JP5056025B2 - 感放射線性樹脂組成物およびカラーフィルタ - Google Patents

感放射線性樹脂組成物およびカラーフィルタ Download PDF

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Publication number
JP5056025B2
JP5056025B2 JP2007011667A JP2007011667A JP5056025B2 JP 5056025 B2 JP5056025 B2 JP 5056025B2 JP 2007011667 A JP2007011667 A JP 2007011667A JP 2007011667 A JP2007011667 A JP 2007011667A JP 5056025 B2 JP5056025 B2 JP 5056025B2
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Japan
Prior art keywords
group
carbon atoms
meth
acrylate
weight
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Expired - Fee Related
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JP2007011667A
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English (en)
Japanese (ja)
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JP2008176218A (ja
Inventor
雅史 荒井
達慶 河本
龍 松本
和博 小林
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JSR Corp
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JSR Corp
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Application filed by JSR Corp filed Critical JSR Corp
Priority to JP2007011667A priority Critical patent/JP5056025B2/ja
Priority to SG200800542-3A priority patent/SG144851A1/en
Priority to KR1020080006191A priority patent/KR101408422B1/ko
Priority to CNA2008100037763A priority patent/CN101231468A/zh
Priority to TW097102384A priority patent/TWI457612B/zh
Publication of JP2008176218A publication Critical patent/JP2008176218A/ja
Application granted granted Critical
Publication of JP5056025B2 publication Critical patent/JP5056025B2/ja
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
JP2007011667A 2007-01-22 2007-01-22 感放射線性樹脂組成物およびカラーフィルタ Expired - Fee Related JP5056025B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2007011667A JP5056025B2 (ja) 2007-01-22 2007-01-22 感放射線性樹脂組成物およびカラーフィルタ
SG200800542-3A SG144851A1 (en) 2007-01-22 2008-01-21 Radiation sensitive resin composition and color filter
KR1020080006191A KR101408422B1 (ko) 2007-01-22 2008-01-21 감방사선성 수지 조성물 및 컬러 필터
CNA2008100037763A CN101231468A (zh) 2007-01-22 2008-01-22 放射线敏感性树脂组合物和滤色器
TW097102384A TWI457612B (zh) 2007-01-22 2008-01-22 感射線樹脂組成物以及彩色濾光片

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007011667A JP5056025B2 (ja) 2007-01-22 2007-01-22 感放射線性樹脂組成物およびカラーフィルタ

Publications (2)

Publication Number Publication Date
JP2008176218A JP2008176218A (ja) 2008-07-31
JP5056025B2 true JP5056025B2 (ja) 2012-10-24

Family

ID=39703267

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007011667A Expired - Fee Related JP5056025B2 (ja) 2007-01-22 2007-01-22 感放射線性樹脂組成物およびカラーフィルタ

Country Status (5)

Country Link
JP (1) JP5056025B2 (ko)
KR (1) KR101408422B1 (ko)
CN (1) CN101231468A (ko)
SG (1) SG144851A1 (ko)
TW (1) TWI457612B (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101453771B1 (ko) * 2010-11-08 2014-10-23 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
TWI422631B (zh) * 2011-06-30 2014-01-11 Everlight Chem Ind Corp 黑色樹脂組成物、黑色矩陣及遮光層
TW201305728A (zh) * 2011-07-20 2013-02-01 Chi Mei Corp 感光性樹脂組成物及其應用
JP5940274B2 (ja) * 2011-10-11 2016-06-29 東京インキ株式会社 重合体、重合体組成物、重合体の製造方法およびブロック共重合体の製造方法
JP7010093B2 (ja) * 2018-03-19 2022-01-26 Jsr株式会社 感放射線性組成物
JP7406983B2 (ja) * 2019-12-26 2023-12-28 住友化学株式会社 組成物および表示装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR970003683B1 (ko) * 1993-09-28 1997-03-21 제일합섬 주식회사 액정디스플레이 컬러필터용 감광성 수지 조성물
JP2003186176A (ja) * 2001-12-21 2003-07-03 Fuji Photo Film Co Ltd フォトマスク材料、フォトマスク及びその製造方法
KR100433430B1 (ko) * 2002-08-07 2004-05-31 삼성전자주식회사 피씨엠씨아이에이 어댑터를 가지는 휴대용 이동통신시스템
JP2005316388A (ja) * 2004-03-30 2005-11-10 Jsr Corp カラーフィルタ用感放射線性組成物、カラーフィルタおよびカラー液晶表示装置
JP4492238B2 (ja) * 2004-07-26 2010-06-30 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
JP2006047686A (ja) * 2004-08-04 2006-02-16 Jsr Corp カラーフィルタ用感放射線性組成物、その調製法、カラーフィルタおよびカラー液晶表示装置
JP2006195425A (ja) * 2004-12-15 2006-07-27 Jsr Corp 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
JP4923496B2 (ja) * 2005-02-18 2012-04-25 Ｊｓｒ株式会社 カラーフィルタ用感放射線性樹脂組成物およびカラーフィルタ

Also Published As

Publication number Publication date
SG144851A1 (en) 2008-08-28
KR101408422B1 (ko) 2014-06-17
TW200905263A (en) 2009-02-01
TWI457612B (zh) 2014-10-21
KR20080069133A (ko) 2008-07-25
CN101231468A (zh) 2008-07-30
JP2008176218A (ja) 2008-07-31

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