CN101183632B - 图案形成装置和图案形成方法 - Google Patents
图案形成装置和图案形成方法 Download PDFInfo
- Publication number
- CN101183632B CN101183632B CN2007101863094A CN200710186309A CN101183632B CN 101183632 B CN101183632 B CN 101183632B CN 2007101863094 A CN2007101863094 A CN 2007101863094A CN 200710186309 A CN200710186309 A CN 200710186309A CN 101183632 B CN101183632 B CN 101183632B
- Authority
- CN
- China
- Prior art keywords
- pattern
- substrate
- illumination
- irradiates light
- spray nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
Abstract
Description
Claims (12)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006-308598 | 2006-11-15 | ||
JP2006308598 | 2006-11-15 | ||
JP2006308598A JP4738319B2 (ja) | 2006-11-15 | 2006-11-15 | パターン形成装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101183632A CN101183632A (zh) | 2008-05-21 |
CN101183632B true CN101183632B (zh) | 2010-06-02 |
Family
ID=39448836
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007101863094A Expired - Fee Related CN101183632B (zh) | 2006-11-15 | 2007-11-12 | 图案形成装置和图案形成方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4738319B2 (zh) |
KR (1) | KR100836415B1 (zh) |
CN (1) | CN101183632B (zh) |
TW (1) | TWI371057B (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5819621B2 (ja) * | 2011-03-25 | 2015-11-24 | 株式会社Screenホールディングス | パターン形成方法およびパターン形成装置 |
JP5790098B2 (ja) * | 2011-04-05 | 2015-10-07 | セイコーエプソン株式会社 | 液体吐出装置、及び、液体吐出方法 |
JP6452318B2 (ja) * | 2014-05-20 | 2019-01-16 | 中外炉工業株式会社 | 基板の塗布装置及び基板の塗布方法 |
CN109870880A (zh) * | 2019-04-09 | 2019-06-11 | 合肥京东方显示技术有限公司 | 涂胶设备及涂胶方法 |
CN110687722B (zh) * | 2019-10-29 | 2021-09-03 | 武汉华星光电技术有限公司 | 配向液涂布方法及掩膜板组件 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0806786A1 (en) * | 1996-05-09 | 1997-11-12 | Fujitsu Limited | Apparatus for and method of manufacturing fluorescent layers for plasma display panels |
CN1419261A (zh) * | 2001-09-13 | 2003-05-21 | 日本网目版制造株式会社 | 形成平屏显示器阻挡肋的方法和装置及该显示器与其背板 |
CN1773650A (zh) * | 2004-11-10 | 2006-05-17 | 大日本网目版制造株式会社 | 图案形成方法和图案形成装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0698628B2 (ja) * | 1989-09-01 | 1994-12-07 | 株式会社総合歯科医療研究所 | 可視光重合型レジンの連続硬化方法及び装置 |
JPH05335223A (ja) * | 1992-05-30 | 1993-12-17 | Sony Corp | レジスト・パターンの形成方法 |
JP3501598B2 (ja) * | 1996-10-16 | 2004-03-02 | キヤノン株式会社 | レーザー加工方法、インクジェット記録ヘッド及びインクジェット記録ヘッド製造装置 |
JP3366630B2 (ja) * | 2000-10-04 | 2003-01-14 | 大日本スクリーン製造株式会社 | 平面表示装置用の隔壁形成方法及びその装置 |
JP2003279724A (ja) * | 2002-03-26 | 2003-10-02 | Seiko Epson Corp | 表示装置製造方法、表示装置製造装置、表示装置、及びデバイス |
JP4082499B2 (ja) * | 2002-09-20 | 2008-04-30 | 大日本スクリーン製造株式会社 | パターン形成装置およびパターン形成方法 |
JP4408241B2 (ja) * | 2004-06-14 | 2010-02-03 | 大日本スクリーン製造株式会社 | パターン形成装置およびパターン形成方法 |
JP4383268B2 (ja) | 2004-06-29 | 2009-12-16 | アルプス電気株式会社 | スプレーコート方法及びスプレーコート装置 |
WO2006085741A1 (en) * | 2005-02-09 | 2006-08-17 | Stichting Dutch Polymer Institute | Process for preparing a polymeric relief structure |
-
2006
- 2006-11-15 JP JP2006308598A patent/JP4738319B2/ja not_active Expired - Fee Related
-
2007
- 2007-08-27 TW TW096131624A patent/TWI371057B/zh not_active IP Right Cessation
- 2007-09-07 KR KR1020070090761A patent/KR100836415B1/ko not_active IP Right Cessation
- 2007-11-12 CN CN2007101863094A patent/CN101183632B/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0806786A1 (en) * | 1996-05-09 | 1997-11-12 | Fujitsu Limited | Apparatus for and method of manufacturing fluorescent layers for plasma display panels |
CN1419261A (zh) * | 2001-09-13 | 2003-05-21 | 日本网目版制造株式会社 | 形成平屏显示器阻挡肋的方法和装置及该显示器与其背板 |
CN1773650A (zh) * | 2004-11-10 | 2006-05-17 | 大日本网目版制造株式会社 | 图案形成方法和图案形成装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20080044152A (ko) | 2008-05-20 |
KR100836415B1 (ko) | 2008-06-09 |
JP2008119647A (ja) | 2008-05-29 |
CN101183632A (zh) | 2008-05-21 |
TW200822172A (en) | 2008-05-16 |
TWI371057B (en) | 2012-08-21 |
JP4738319B2 (ja) | 2011-08-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: SCREEN GROUP CO., LTD. Free format text: FORMER NAME: DAINIPPON SCREEN MFG. CO., LTD. Owner name: DAINIPPON SCREEN MFG. CO., LTD. Free format text: FORMER NAME: DAINIPPON MESH PLATE MFR. CO., LTD. |
|
CP01 | Change in the name or title of a patent holder |
Address after: Kyoto City, Kyoto, Japan Patentee after: Skilling Group Address before: Kyoto City, Kyoto, Japan Patentee before: DAINIPPON SCREEN MFG Co.,Ltd. Address after: Kyoto City, Kyoto, Japan Patentee after: DAINIPPON SCREEN MFG Co.,Ltd. Address before: Kyoto City, Kyoto, Japan Patentee before: Dainippon Screen Mfg. Co.,Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100602 Termination date: 20181112 |
|
CF01 | Termination of patent right due to non-payment of annual fee |