CN101155650B - 溅射靶 - Google Patents

溅射靶 Download PDF

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Publication number
CN101155650B
CN101155650B CN2006800115901A CN200680011590A CN101155650B CN 101155650 B CN101155650 B CN 101155650B CN 2006800115901 A CN2006800115901 A CN 2006800115901A CN 200680011590 A CN200680011590 A CN 200680011590A CN 101155650 B CN101155650 B CN 101155650B
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CN
China
Prior art keywords
texture
tantalum
metal sheet
metal
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN2006800115901A
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English (en)
Chinese (zh)
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CN101155650A (zh
Inventor
小查尔斯·E·威克沙姆
弗拉迪米尔·I·莱维特
P·托德·亚历山大
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cabot Corp
Original Assignee
Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Corp filed Critical Cabot Corp
Priority to CN201110393399.0A priority Critical patent/CN102513353B/zh
Publication of CN101155650A publication Critical patent/CN101155650A/zh
Application granted granted Critical
Publication of CN101155650B publication Critical patent/CN101155650B/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/02—Alloys based on vanadium, niobium, or tantalum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/02—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling heavy work, e.g. ingots, slabs, blooms, or billets, in which the cross-sectional form is unimportant ; Rolling combined with forging or pressing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/38—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling sheets of limited length, e.g. folded sheets, superimposed sheets, pack rolling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21H—MAKING PARTICULAR METAL OBJECTS BY ROLLING, e.g. SCREWS, WHEELS, RINGS, BARRELS, BALLS
    • B21H1/00—Making articles shaped as bodies of revolution
    • B21H1/02—Making articles shaped as bodies of revolution discs; disc wheels
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/16—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
    • C22F1/18—High-melting or refractory metals or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12229—Intermediate article [e.g., blank, etc.]
    • Y10T428/12236—Panel having nonrectangular perimeter
    • Y10T428/12243—Disk

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Metal Rolling (AREA)
CN2006800115901A 2005-02-10 2006-02-07 溅射靶 Expired - Lifetime CN101155650B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201110393399.0A CN102513353B (zh) 2005-02-10 2006-02-07 溅射靶及制造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/055,535 US7998287B2 (en) 2005-02-10 2005-02-10 Tantalum sputtering target and method of fabrication
US11/055,535 2005-02-10
PCT/US2006/004143 WO2006086319A2 (en) 2005-02-10 2006-02-07 Sputtering target and method of fabrication

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201110393399.0A Division CN102513353B (zh) 2005-02-10 2006-02-07 溅射靶及制造方法

Publications (2)

Publication Number Publication Date
CN101155650A CN101155650A (zh) 2008-04-02
CN101155650B true CN101155650B (zh) 2012-02-01

Family

ID=36572042

Family Applications (2)

Application Number Title Priority Date Filing Date
CN2006800115901A Expired - Lifetime CN101155650B (zh) 2005-02-10 2006-02-07 溅射靶
CN201110393399.0A Expired - Lifetime CN102513353B (zh) 2005-02-10 2006-02-07 溅射靶及制造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201110393399.0A Expired - Lifetime CN102513353B (zh) 2005-02-10 2006-02-07 溅射靶及制造方法

Country Status (6)

Country Link
US (2) US7998287B2 (enExample)
EP (1) EP1848552B1 (enExample)
JP (1) JP4880620B2 (enExample)
KR (1) KR101253377B1 (enExample)
CN (2) CN101155650B (enExample)
WO (1) WO2006086319A2 (enExample)

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US7998287B2 (en) 2005-02-10 2011-08-16 Cabot Corporation Tantalum sputtering target and method of fabrication
DE112007000440B4 (de) 2006-03-07 2021-01-07 Global Advanced Metals, Usa, Inc. Verfahren zum Erzeugen von verformten Metallartikeln
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JP5586221B2 (ja) * 2007-02-27 2014-09-10 日本碍子株式会社 金属板材の圧延方法
US8250895B2 (en) * 2007-08-06 2012-08-28 H.C. Starck Inc. Methods and apparatus for controlling texture of plates and sheets by tilt rolling
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KR100869268B1 (ko) * 2008-04-25 2008-11-18 주식회사 에스앤에스텍 하프톤형 위상반전 블랭크 마스크, 하프톤형 위상반전포토마스크 및 그의 제조 방법
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CN101649439B (zh) * 2009-05-08 2012-07-25 宁波江丰电子材料有限公司 靶材塑性变形方法
KR101288651B1 (ko) * 2009-05-22 2013-07-22 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 탄탈륨 스퍼터링 타겟
CN103069044B (zh) * 2010-08-09 2015-02-18 吉坤日矿日石金属株式会社 钽溅射靶
CN101956159A (zh) * 2010-09-30 2011-01-26 金堆城钼业股份有限公司 一种高纯钼溅射靶材的制备方法
CN102350439B (zh) * 2011-09-23 2014-04-23 宁波江丰电子材料有限公司 半导体用镍靶坯热轧方法
CN103827348B (zh) * 2011-11-30 2015-11-25 吉坤日矿日石金属株式会社 钽溅射靶及其制造方法
CN102513789B (zh) * 2011-12-21 2014-04-09 宁波江丰电子材料有限公司 钨靶材的制作方法
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CN102699247B (zh) * 2012-05-18 2014-06-18 宁夏东方钽业股份有限公司 一种超导钽棒的锻造方法
EP2878699B1 (en) 2012-12-19 2020-07-15 JX Nippon Mining & Metals Corp. Tantalum sputtering target and method for producing same
WO2014097900A1 (ja) 2012-12-19 2014-06-26 Jx日鉱日石金属株式会社 タンタルスパッタリングターゲット及びその製造方法
KR20150095885A (ko) 2013-03-04 2015-08-21 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 탄탈 스퍼터링 타깃 및 그 제조 방법
MX2015017559A (es) * 2013-07-10 2016-05-09 Alcoa Inc Metodos para generar productos forjados y otros productos trabajados.
WO2015050041A1 (ja) 2013-10-01 2015-04-09 Jx日鉱日石金属株式会社 タンタルスパッタリングターゲット
WO2015146516A1 (ja) 2014-03-27 2015-10-01 Jx日鉱日石金属株式会社 タンタルスパッタリングターゲット及びその製造方法
KR20170134365A (ko) 2015-04-10 2017-12-06 토소우 에스엠디, 인크 탄탈 스퍼터 타겟의 제조 방법 및 그에 의해 제조된 스퍼터 타겟
JP6293928B2 (ja) * 2015-05-22 2018-03-14 Ｊｘ金属株式会社 タンタルスパッタリングターゲット及びその製造方法
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Also Published As

Publication number Publication date
CN101155650A (zh) 2008-04-02
KR20070107114A (ko) 2007-11-06
US20110297536A1 (en) 2011-12-08
CN102513353A (zh) 2012-06-27
CN102513353B (zh) 2016-02-17
US7998287B2 (en) 2011-08-16
JP4880620B2 (ja) 2012-02-22
US8231745B2 (en) 2012-07-31
JP2008532765A (ja) 2008-08-21
EP1848552B1 (en) 2012-10-10
EP1848552A2 (en) 2007-10-31
WO2006086319A3 (en) 2006-12-28
WO2006086319A2 (en) 2006-08-17
US20070089815A1 (en) 2007-04-26
KR101253377B1 (ko) 2013-04-11

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