CN101127296B - 用于气流测量的方法及装置 - Google Patents
用于气流测量的方法及装置 Download PDFInfo
- Publication number
- CN101127296B CN101127296B CN2007101404553A CN200710140455A CN101127296B CN 101127296 B CN101127296 B CN 101127296B CN 2007101404553 A CN2007101404553 A CN 2007101404553A CN 200710140455 A CN200710140455 A CN 200710140455A CN 101127296 B CN101127296 B CN 101127296B
- Authority
- CN
- China
- Prior art keywords
- gas
- flow
- sense line
- air
- process chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
- G01F1/34—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure
- G01F1/36—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure the pressure or differential pressure being created by the use of flow constriction
- G01F1/40—Details of construction of the flow constriction devices
- G01F1/42—Orifices or nozzles
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
- G01F25/10—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters
- G01F25/17—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters using calibrated reservoirs
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
- G01F25/10—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters
- G01F25/15—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters specially adapted for gas meters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0324—With control of flow by a condition or characteristic of a fluid
- Y10T137/0368—By speed of fluid
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7758—Pilot or servo controlled
- Y10T137/7761—Electrically actuated valve
Landscapes
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Measuring Volume Flow (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US82234506P | 2006-08-14 | 2006-08-14 | |
| US60/822,345 | 2006-08-14 | ||
| US11/833,623 US7743670B2 (en) | 2006-08-14 | 2007-08-03 | Method and apparatus for gas flow measurement |
| US11/833,623 | 2007-08-03 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101127296A CN101127296A (zh) | 2008-02-20 |
| CN101127296B true CN101127296B (zh) | 2010-06-09 |
Family
ID=38729030
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007101404553A Active CN101127296B (zh) | 2006-08-14 | 2007-08-14 | 用于气流测量的方法及装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US7743670B2 (enExample) |
| EP (1) | EP1890117A1 (enExample) |
| JP (1) | JP2008089575A (enExample) |
| KR (3) | KR20080015374A (enExample) |
| CN (1) | CN101127296B (enExample) |
| TW (1) | TW200820320A (enExample) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7461549B1 (en) * | 2007-06-27 | 2008-12-09 | Mks Instruments, Inc. | Mass flow verifiers capable of providing different volumes, and related methods |
| US7743670B2 (en) * | 2006-08-14 | 2010-06-29 | Applied Materials, Inc. | Method and apparatus for gas flow measurement |
| US8074677B2 (en) * | 2007-02-26 | 2011-12-13 | Applied Materials, Inc. | Method and apparatus for controlling gas flow to a processing chamber |
| US8205629B2 (en) * | 2008-04-25 | 2012-06-26 | Applied Materials, Inc. | Real time lead-line characterization for MFC flow verification |
| EP2113274B1 (en) * | 2008-04-30 | 2016-04-27 | ResMed R&D Germany GmbH | Apparatus for controlled delivery of a breathing gas to the respiratory tracts of a user |
| EP3597251B1 (en) | 2008-06-05 | 2023-04-26 | ResMed Pty Ltd | Treatment of respiratory conditions |
| DE102009004363B4 (de) * | 2009-01-08 | 2022-08-25 | Inficon Gmbh | Leckdetektionsverfahren |
| DE102009018401A1 (de) * | 2009-04-22 | 2010-10-28 | Airbus Deutschland Gmbh | System und Verfahren zum Kühlen eines Raums in einem Fahrzeug |
| CN101872729B (zh) * | 2010-05-28 | 2012-02-29 | 日月光封装测试(上海)有限公司 | 打线设备及其保护气体自动切换系统与方法 |
| CN102288262A (zh) * | 2011-05-04 | 2011-12-21 | 中国航空工业集团公司西安飞机设计研究所 | 一种散热器冷边风量现场校验方法 |
| US9772629B2 (en) | 2011-09-29 | 2017-09-26 | Applied Materials, Inc. | Methods for monitoring a flow controller coupled to a process chamber |
| US9644796B2 (en) * | 2011-09-29 | 2017-05-09 | Applied Materials, Inc. | Methods for in-situ calibration of a flow controller |
| JP5433660B2 (ja) * | 2011-10-12 | 2014-03-05 | Ckd株式会社 | ガス流量監視システム |
| JP5809012B2 (ja) * | 2011-10-14 | 2015-11-10 | 株式会社堀場エステック | 流量制御装置、流量測定機構、又は、当該流量測定機構を備えた流量制御装置に用いられる診断装置及び診断用プログラム |
| JP6094277B2 (ja) * | 2013-03-13 | 2017-03-15 | 三浦工業株式会社 | ボイラ負荷分析装置 |
| US9429247B2 (en) | 2013-03-13 | 2016-08-30 | Applied Materials, Inc. | Acoustically-monitored semiconductor substrate processing systems and methods |
| US9910448B2 (en) | 2013-03-14 | 2018-03-06 | Christopher Max Horwitz | Pressure-based gas flow controller with dynamic self-calibration |
| CN104750125B (zh) * | 2013-12-31 | 2017-10-24 | 北京北方华创微电子装备有限公司 | 一种质量流量控制器的校准方法及装置 |
| GB2557670B (en) * | 2016-12-15 | 2020-04-15 | Thermo Fisher Scient Bremen Gmbh | Improved gas flow control |
| US10031004B2 (en) | 2016-12-15 | 2018-07-24 | Mks Instruments, Inc. | Methods and apparatus for wide range mass flow verification |
| US10663337B2 (en) | 2016-12-30 | 2020-05-26 | Ichor Systems, Inc. | Apparatus for controlling flow and method of calibrating same |
| CN107958838B (zh) * | 2017-11-08 | 2020-08-04 | 上海华力微电子有限公司 | 一种根据射频时数改善一体化刻蚀工艺面内均匀性的方法 |
| KR101915535B1 (ko) | 2017-11-24 | 2018-11-06 | 주식회사 센트리 | 가스측정장치 |
| US11718912B2 (en) | 2019-07-30 | 2023-08-08 | Applied Materials, Inc. | Methods and apparatus for calibrating concentration sensors for precursor delivery |
| CN112563105B (zh) * | 2019-09-10 | 2023-11-03 | 中微半导体设备(上海)股份有限公司 | 等离子体处理装置中实现气体流量验证的系统及方法 |
| US11761083B2 (en) | 2019-09-19 | 2023-09-19 | Applied Materials, Inc. | Methods for controlling a flow pulse shape |
| EP3940288A1 (en) * | 2020-06-25 | 2022-01-19 | Romet Limited | A method and system of monitoring a meter set using a sensor |
| CN114623904B (zh) * | 2022-03-14 | 2023-07-25 | 中公高远(北京)汽车检测技术有限公司 | 一种气体流量计的校准装置和方法 |
| US12264950B2 (en) * | 2022-03-23 | 2025-04-01 | Mks Instruments, Inc. | Method and apparatus for mass flow verification |
| CN116293468A (zh) * | 2022-12-27 | 2023-06-23 | 四川芙蓉川南建设工程有限公司 | 煤层气产量的风险量化评估和收益最大化计算评价方法 |
| WO2025128720A1 (en) * | 2023-12-15 | 2025-06-19 | Lam Research Corporation | Active divert pressure tuning |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0323205A1 (en) * | 1987-12-31 | 1989-07-05 | Nomix-Chipman Limited | Apparatus for delivering a liquid |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5313296B2 (enExample) * | 1973-10-06 | 1978-05-09 | ||
| JPH07263350A (ja) * | 1994-03-18 | 1995-10-13 | Fujitsu Ltd | 半導体製造方法 |
| US5684245A (en) | 1995-11-17 | 1997-11-04 | Mks Instruments, Inc. | Apparatus for mass flow measurement of a gas |
| JP3372840B2 (ja) * | 1997-09-08 | 2003-02-04 | 九州日本電気株式会社 | ドライエッチング装置およびガス流量制御の検査方法 |
| US6119710A (en) * | 1999-05-26 | 2000-09-19 | Cyber Instrument Technologies Llc | Method for wide range gas flow system with real time flow measurement and correction |
| US6299753B1 (en) * | 1999-09-01 | 2001-10-09 | Applied Materials, Inc. | Double pressure vessel chemical dispenser unit |
| US6333272B1 (en) * | 2000-10-06 | 2001-12-25 | Lam Research Corporation | Gas distribution apparatus for semiconductor processing |
| JP4148346B2 (ja) * | 2002-02-07 | 2008-09-10 | 東京エレクトロン株式会社 | 熱処理装置 |
| US6875271B2 (en) * | 2002-04-09 | 2005-04-05 | Applied Materials, Inc. | Simultaneous cyclical deposition in different processing regions |
| JP4078982B2 (ja) | 2002-04-22 | 2008-04-23 | 東京エレクトロン株式会社 | 処理システム及び流量測定方法 |
| US6704667B2 (en) * | 2002-05-13 | 2004-03-09 | Taiwan Semiconductor Manufacturing Co., Ltd | Real time mass flow control system with interlock |
| JP2005537464A (ja) * | 2002-07-19 | 2005-12-08 | マイクロリス コーポレイション | 流体フロー測定および比例流体フロー制御デバイス |
| US6813943B2 (en) | 2003-03-19 | 2004-11-09 | Mks Instruments, Inc. | Method and apparatus for conditioning a gas flow to improve a rate of pressure change measurement |
| US6955072B2 (en) | 2003-06-25 | 2005-10-18 | Mks Instruments, Inc. | System and method for in-situ flow verification and calibration |
| JP4421393B2 (ja) | 2004-06-22 | 2010-02-24 | 東京エレクトロン株式会社 | 基板処理装置 |
| US7150201B2 (en) | 2004-12-15 | 2006-12-19 | Celerity, Inc. | System and method for measuring flow |
| KR100706243B1 (ko) * | 2005-02-22 | 2007-04-11 | 삼성전자주식회사 | 질화 텅스텐 증착 장치 및 증착 방법 |
| KR101501426B1 (ko) * | 2006-06-02 | 2015-03-11 | 어플라이드 머티어리얼스, 인코포레이티드 | 차압 측정들에 의한 가스 유동 제어 |
| US7743670B2 (en) | 2006-08-14 | 2010-06-29 | Applied Materials, Inc. | Method and apparatus for gas flow measurement |
| US7846497B2 (en) * | 2007-02-26 | 2010-12-07 | Applied Materials, Inc. | Method and apparatus for controlling gas flow to a processing chamber |
| US7775236B2 (en) * | 2007-02-26 | 2010-08-17 | Applied Materials, Inc. | Method and apparatus for controlling gas flow to a processing chamber |
| US8205629B2 (en) * | 2008-04-25 | 2012-06-26 | Applied Materials, Inc. | Real time lead-line characterization for MFC flow verification |
-
2007
- 2007-08-03 US US11/833,623 patent/US7743670B2/en active Active
- 2007-08-08 TW TW96129288A patent/TW200820320A/zh unknown
- 2007-08-11 JP JP2007210558A patent/JP2008089575A/ja active Pending
- 2007-08-14 KR KR1020070081657A patent/KR20080015374A/ko not_active Ceased
- 2007-08-14 EP EP20070015987 patent/EP1890117A1/en not_active Withdrawn
- 2007-08-14 CN CN2007101404553A patent/CN101127296B/zh active Active
-
2010
- 2010-06-25 US US12/823,935 patent/US7975558B2/en active Active
- 2010-06-30 KR KR1020100062945A patent/KR101434869B1/ko active Active
-
2013
- 2013-08-19 KR KR1020130097764A patent/KR20130100085A/ko not_active Withdrawn
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0323205A1 (en) * | 1987-12-31 | 1989-07-05 | Nomix-Chipman Limited | Apparatus for delivering a liquid |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20130100085A (ko) | 2013-09-09 |
| US7743670B2 (en) | 2010-06-29 |
| US20080035202A1 (en) | 2008-02-14 |
| KR20100091931A (ko) | 2010-08-19 |
| US7975558B2 (en) | 2011-07-12 |
| KR20080015374A (ko) | 2008-02-19 |
| US20100251828A1 (en) | 2010-10-07 |
| JP2008089575A (ja) | 2008-04-17 |
| TW200820320A (en) | 2008-05-01 |
| CN101127296A (zh) | 2008-02-20 |
| KR101434869B1 (ko) | 2014-09-02 |
| EP1890117A1 (en) | 2008-02-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101127296B (zh) | 用于气流测量的方法及装置 | |
| US8205629B2 (en) | Real time lead-line characterization for MFC flow verification | |
| CN110073181B (zh) | 用于大范围质量流量检验的方法和设备 | |
| US7174263B2 (en) | External volume insensitive flow verification | |
| CN101563663B (zh) | 流量控制装置的检定方法 | |
| JP6426474B2 (ja) | 自己確認型質量流量制御器および自己確認型質量流量計を提供するためのシステムおよび方法 | |
| TWI731159B (zh) | 流量比率控制裝置、儲存流量比率控制裝置用程式的程式記錄媒體以及流量比率控制方法 | |
| US6439253B1 (en) | System for and method of monitoring the flow of semiconductor process gases from a gas delivery system | |
| JP2008089575A5 (enExample) | ||
| JP2020024728A (ja) | 質量流量コントローラを通る流量を実時間で監視するシステムおよび方法 | |
| TWI642910B (zh) | 流量控制機器、流量控制機器的流量校正方法、流量測定機器及使用流量測定機器的流量測定方法 | |
| KR20090080529A (ko) | 실제 흐름 검증을 실시하는 방법 | |
| KR20100047236A (ko) | 상이한 체적을 제공할 수 있는 질량 유동 검증기 및 그 방법 | |
| WO2012014375A1 (ja) | ガス供給装置用流量制御器の校正方法及び流量計測方法 | |
| EP2247819A1 (en) | Method and apparatus for in situ testing of gas flow controllers | |
| US9778083B2 (en) | Metrology method for transient gas flow | |
| WO2005123236A1 (ja) | 基板処理装置 | |
| CN109755153A (zh) | 监测装置和包括该装置的半导体制造装置 | |
| KR20250123783A (ko) | 질량 흐름 제어를 위한 방법 및 장치 | |
| CN101178327A (zh) | 气体流量校准的方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee | ||
| CP01 | Change in the name or title of a patent holder |
Address after: American California Patentee after: Applied Materials Inc. Address before: American California Patentee before: Applied Materials Inc. |