CN101103310B - 图案形成材料以及图案形成装置及图案形成方法 - Google Patents

图案形成材料以及图案形成装置及图案形成方法 Download PDF

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Publication number
CN101103310B
CN101103310B CN2005800470449A CN200580047044A CN101103310B CN 101103310 B CN101103310 B CN 101103310B CN 2005800470449 A CN2005800470449 A CN 2005800470449A CN 200580047044 A CN200580047044 A CN 200580047044A CN 101103310 B CN101103310 B CN 101103310B
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China
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pattern
methyl
light
photographic layer
acid
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CN2005800470449A
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Chinese (zh)
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CN101103310A (zh
Inventor
高桥秀知
若田裕一
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Asahi Kasei Corp
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Asahi Chemical Co Ltd
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Publication of CN101103310A publication Critical patent/CN101103310A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Polymerisation Methods In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN2005800470449A 2004-11-30 2005-11-24 图案形成材料以及图案形成装置及图案形成方法 Active CN101103310B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP347638/2004 2004-11-30
JP2004347638A JP4500657B2 (ja) 2004-11-30 2004-11-30 パターン形成材料、並びにパターン形成装置及びパターン形成方法
PCT/JP2005/021589 WO2006059532A1 (ja) 2004-11-30 2005-11-24 パターン形成材料、並びにパターン形成装置及びパターン形成方法

Publications (2)

Publication Number Publication Date
CN101103310A CN101103310A (zh) 2008-01-09
CN101103310B true CN101103310B (zh) 2012-03-14

Family

ID=36564966

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2005800470449A Active CN101103310B (zh) 2004-11-30 2005-11-24 图案形成材料以及图案形成装置及图案形成方法

Country Status (5)

Country Link
JP (1) JP4500657B2 (ja)
KR (3) KR101528784B1 (ja)
CN (1) CN101103310B (ja)
TW (2) TWI514076B (ja)
WO (1) WO2006059532A1 (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006208730A (ja) * 2005-01-27 2006-08-10 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP4942969B2 (ja) * 2005-09-16 2012-05-30 富士フイルム株式会社 パターン形成材料及びパターン形成方法
TWI546574B (zh) * 2011-06-01 2016-08-21 Jsr股份有限公司 著色組成物、彩色濾光片及顯示元件
CN103918021B (zh) * 2012-09-18 2016-05-25 深圳市柔宇科技有限公司 大尺寸显示屏及其制造方法
JP7308014B2 (ja) * 2017-02-23 2023-07-13 旭化成株式会社 感光性樹脂組成物及び感光性樹脂積層体
JP6968633B2 (ja) * 2017-09-07 2021-11-17 東京応化工業株式会社 感光性組成物、及びそれに用いられる光重合開始剤
KR20200112551A (ko) * 2019-03-22 2020-10-05 주식회사 엘지화학 포토레지스트 제거용 스트리퍼 조성물 및 이를 이용한 포토레지스트의 박리방법
WO2021029039A1 (ja) * 2019-08-14 2021-02-18 昭和電工マテリアルズ株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP7437212B2 (ja) * 2020-03-26 2024-02-22 株式会社オーク製作所 露光装置および露光方法
KR102325273B1 (ko) * 2021-05-07 2021-11-10 황록연 카메라 렌즈용 스페이서 제조방법 및 이로부터 제조되는 스페이서

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3931467A1 (de) * 1989-09-21 1991-04-04 Hoechst Ag Durch strahlung polymerisierbares gemisch und verfahren zur herstellung einer loetstopmaske
JPH04240854A (ja) * 1991-01-25 1992-08-28 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
JPH07199458A (ja) * 1993-07-22 1995-08-04 E I Du Pont De Nemours & Co プリント回路のための多層、光画像形成性、水性処理可能なエレメント
JP3239881B2 (ja) * 1998-11-16 2001-12-17 キヤノン株式会社 光学系及びそれを用いた投影装置
JP2001159817A (ja) * 1999-12-03 2001-06-12 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
JP2001318461A (ja) * 2000-05-11 2001-11-16 Nichigo Morton Co Ltd 感光性樹脂組成物およびそれを用いてなる感光性フィルム
JP4096682B2 (ja) * 2002-10-04 2008-06-04 三菱化学株式会社 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法
JP4448707B2 (ja) * 2003-02-06 2010-04-14 富士フイルム株式会社 感光性平版印刷版
JP4305732B2 (ja) * 2003-04-17 2009-07-29 日立化成工業株式会社 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造方法及びプリント配線板の製造方法
JP2004335639A (ja) * 2003-05-06 2004-11-25 Fuji Photo Film Co Ltd 投影露光装置
JP4244156B2 (ja) * 2003-05-07 2009-03-25 富士フイルム株式会社 投影露光装置
JP4450689B2 (ja) * 2003-07-31 2010-04-14 富士フイルム株式会社 露光ヘッド
JP4708785B2 (ja) * 2003-12-26 2011-06-22 富士フイルム株式会社 画像露光方法および装置

Also Published As

Publication number Publication date
WO2006059532A1 (ja) 2006-06-08
KR101338091B1 (ko) 2013-12-06
KR101528784B1 (ko) 2015-06-15
KR20150009609A (ko) 2015-01-26
JP2006154556A (ja) 2006-06-15
CN101103310A (zh) 2008-01-09
TW201407283A (zh) 2014-02-16
KR101516613B1 (ko) 2015-05-04
TWI514076B (zh) 2015-12-21
JP4500657B2 (ja) 2010-07-14
KR20070084581A (ko) 2007-08-24
TW200627067A (en) 2006-08-01
KR20130101590A (ko) 2013-09-13
TWI460541B (zh) 2014-11-11

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
ASS Succession or assignment of patent right

Owner name: ASAHI KASEI ELECTRONICS MATERIALS CO., LTD.

Free format text: FORMER OWNER: FUJI FILM CO., LTD.

Effective date: 20100610

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20100610

Address after: Tokyo, Japan

Applicant after: Asahi Chemical Corp.

Address before: Tokyo, Japan

Applicant before: Fuji Film Corp.

C14 Grant of patent or utility model
GR01 Patent grant
C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20160504

Address after: Tokyo, Japan, Japan

Patentee after: Asahi Kasei Kogyo K. K.

Address before: Tokyo, Japan

Patentee before: Asahi Chemical Corp.