CN101093201B - 荧光x射线分析设备 - Google Patents

荧光x射线分析设备 Download PDF

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Publication number
CN101093201B
CN101093201B CN200710109917.5A CN200710109917A CN101093201B CN 101093201 B CN101093201 B CN 101093201B CN 200710109917 A CN200710109917 A CN 200710109917A CN 101093201 B CN101093201 B CN 101093201B
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CN
China
Prior art keywords
ray
sample
fluorescent
polarizing filter
detecting device
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CN200710109917.5A
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English (en)
Chinese (zh)
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CN101093201A (zh
Inventor
笹山则生
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Hitachi High Tech Science Corp
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SEIKO NANOTECHNOLOGY Inc
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Publication of CN101093201A publication Critical patent/CN101093201A/zh
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Publication of CN101093201B publication Critical patent/CN101093201B/zh
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN200710109917.5A 2006-06-06 2007-06-06 荧光x射线分析设备 Expired - Fee Related CN101093201B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006156821 2006-06-06
JP2006-156821 2006-06-06
JP2006156821A JP4902272B2 (ja) 2006-06-06 2006-06-06 蛍光ｘ線分析装置

Publications (2)

Publication Number Publication Date
CN101093201A CN101093201A (zh) 2007-12-26
CN101093201B true CN101093201B (zh) 2011-08-03

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ID=38283646

Family Applications (1)

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CN200710109917.5A Expired - Fee Related CN101093201B (zh) 2006-06-06 2007-06-06 荧光x射线分析设备

Country Status (5)

Country Link
US (1) US7471763B2 (enExample)
EP (1) EP1865309B1 (enExample)
JP (1) JP4902272B2 (enExample)
CN (1) CN101093201B (enExample)
DE (1) DE602007006249D1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102841108A (zh) * 2012-03-09 2012-12-26 深圳市华唯计量技术开发有限公司 一种偏振二次靶能量色散型x射线荧光光谱仪

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102460135A (zh) * 2009-06-03 2012-05-16 特莫尼托恩分析仪器股份有限公司 检测器位于聚焦元件内部的x射线系统和方法
US8439520B2 (en) * 2010-10-21 2013-05-14 Rambus Delaware Llc Color-configurable lighting assembly
US11029263B2 (en) * 2015-12-09 2021-06-08 Integrated-X, Inc. Systems and methods for inspection using electromagnetic radiation

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3944822A (en) * 1974-09-30 1976-03-16 The United States Of America As Represented By The Administrator Of The U. S. Environmental Protection Agency Polarization excitation device for X-ray fluorescence analysis
US6049589A (en) * 1997-06-26 2000-04-11 Metorex International Oy X-ray fluorescence measuring system making use of polarized excitation radiation, and X-ray tube
CN1305586A (zh) * 1998-06-12 2001-07-25 格鲁克麦狄泰克股份公司 测定偏振光的(主)偏振面到约0.1m°的偏振测量方法和实现此方法的可小型化的装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU1045094A1 (ru) 1982-05-04 1983-09-30 Научно-исследовательский институт ядерной физики при Томском политехническом институте им.С.М.Кирова Устройство дл рентгенофлуоресцентного анализа вещества
JPH088314A (ja) * 1994-06-24 1996-01-12 Toshiba Corp 半導体分析装置
JP3013827B2 (ja) * 1997-12-12 2000-02-28 日本電気株式会社 Ｘ線偏光分析器及びそれを用いたｘ線偏光分析方法
JP3498689B2 (ja) * 2000-07-31 2004-02-16 株式会社島津製作所 モノクロ線源励起用モノクロメータ及び蛍光ｘ線分析装置
JP2004004125A (ja) * 2003-08-22 2004-01-08 Shimadzu Corp 蛍光ｘ線分析装置
JP4754957B2 (ja) * 2005-12-08 2011-08-24 株式会社リガク 多元素同時型蛍光ｘ線分析装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3944822A (en) * 1974-09-30 1976-03-16 The United States Of America As Represented By The Administrator Of The U. S. Environmental Protection Agency Polarization excitation device for X-ray fluorescence analysis
US6049589A (en) * 1997-06-26 2000-04-11 Metorex International Oy X-ray fluorescence measuring system making use of polarized excitation radiation, and X-ray tube
CN1305586A (zh) * 1998-06-12 2001-07-25 格鲁克麦狄泰克股份公司 测定偏振光的(主)偏振面到约0.1m°的偏振测量方法和实现此方法的可小型化的装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102841108A (zh) * 2012-03-09 2012-12-26 深圳市华唯计量技术开发有限公司 一种偏振二次靶能量色散型x射线荧光光谱仪
CN102841108B (zh) * 2012-03-09 2014-12-17 深圳市华唯计量技术开发有限公司 一种偏振二次靶能量色散型x射线荧光光谱仪

Also Published As

Publication number Publication date
CN101093201A (zh) 2007-12-26
JP4902272B2 (ja) 2012-03-21
US7471763B2 (en) 2008-12-30
EP1865309B1 (en) 2010-05-05
US20070280414A1 (en) 2007-12-06
JP2007327756A (ja) 2007-12-20
DE602007006249D1 (de) 2010-06-17
EP1865309A1 (en) 2007-12-12

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Owner name: HITACHI HIGH TECH SCIENCE CORP.

Free format text: FORMER NAME: SEIKO NANOTECHNOLOGY INC.

CP03 Change of name, title or address

Address after: Tokyo, Japan, Japan

Patentee after: Hitachi High Tech Science Corp.

Address before: Chiba, Chiba, Japan

Patentee before: Seiko Nanotechnology Inc.

CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20110803

Termination date: 20200606

CF01 Termination of patent right due to non-payment of annual fee