CN101065649B - 基于激光器的退火系统中用于高温计的多带通过滤 - Google Patents
基于激光器的退火系统中用于高温计的多带通过滤 Download PDFInfo
- Publication number
- CN101065649B CN101065649B CN2005800402899A CN200580040289A CN101065649B CN 101065649 B CN101065649 B CN 101065649B CN 2005800402899 A CN2005800402899 A CN 2005800402899A CN 200580040289 A CN200580040289 A CN 200580040289A CN 101065649 B CN101065649 B CN 101065649B
- Authority
- CN
- China
- Prior art keywords
- wavelength
- laser
- pyrometer
- radiation
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/06—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4012—Beam combining, e.g. by the use of fibres, gratings, polarisers, prisms
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Radiation Pyrometers (AREA)
- Laser Beam Processing (AREA)
- Semiconductor Lasers (AREA)
- Optical Filters (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US62752704P | 2004-11-12 | 2004-11-12 | |
| US60/627,527 | 2004-11-12 | ||
| US11/195,380 | 2005-08-02 | ||
| US11/195,380 US7438468B2 (en) | 2004-11-12 | 2005-08-02 | Multiple band pass filtering for pyrometry in laser based annealing systems |
| PCT/US2005/036796 WO2006055130A2 (en) | 2004-11-12 | 2005-10-12 | Multiple band pass filtering for pyrometry in laser based annealing systems |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101065649A CN101065649A (zh) | 2007-10-31 |
| CN101065649B true CN101065649B (zh) | 2012-11-28 |
Family
ID=35695702
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2005800402899A Expired - Lifetime CN101065649B (zh) | 2004-11-12 | 2005-10-12 | 基于激光器的退火系统中用于高温计的多带通过滤 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US7438468B2 (enExample) |
| EP (1) | EP1831658B1 (enExample) |
| JP (1) | JP5103186B2 (enExample) |
| KR (1) | KR101226634B1 (enExample) |
| CN (1) | CN101065649B (enExample) |
| WO (1) | WO2006055130A2 (enExample) |
Families Citing this family (40)
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| US6987240B2 (en) * | 2002-04-18 | 2006-01-17 | Applied Materials, Inc. | Thermal flux processing by scanning |
| US7910499B2 (en) * | 2004-11-12 | 2011-03-22 | Applied Materials, Inc. | Autofocus for high power laser diode based annealing system |
| US7438468B2 (en) | 2004-11-12 | 2008-10-21 | Applied Materials, Inc. | Multiple band pass filtering for pyrometry in laser based annealing systems |
| US7422988B2 (en) * | 2004-11-12 | 2008-09-09 | Applied Materials, Inc. | Rapid detection of imminent failure in laser thermal processing of a substrate |
| US20070221640A1 (en) | 2006-03-08 | 2007-09-27 | Dean Jennings | Apparatus for thermal processing structures formed on a substrate |
| US20070291505A1 (en) * | 2006-06-02 | 2007-12-20 | Rance Fortenberry | Light source assembly with integrated optical pipe |
| US7494272B2 (en) * | 2006-06-27 | 2009-02-24 | Applied Materials, Inc. | Dynamic surface annealing using addressable laser array with pyrometry feedback |
| US7548364B2 (en) | 2006-07-31 | 2009-06-16 | Applied Materials, Inc. | Ultra-fast beam dithering with surface acoustic wave modulator |
| US20080025354A1 (en) * | 2006-07-31 | 2008-01-31 | Dean Jennings | Ultra-Fast Beam Dithering with Surface Acoustic Wave Modulator |
| US7674999B2 (en) | 2006-08-23 | 2010-03-09 | Applied Materials, Inc. | Fast axis beam profile shaping by collimation lenslets for high power laser diode based annealing system |
| US7659187B2 (en) | 2006-11-03 | 2010-02-09 | Applied Materials, Inc. | Method of forming PN junctions including a post-ion implant dynamic surface anneal process with minimum interface trap density at the gate insulator-silicon interface |
| US7804042B2 (en) * | 2007-06-18 | 2010-09-28 | Applied Materials, Inc. | Pryometer for laser annealing system compatible with amorphous carbon optical absorber layer |
| US8148663B2 (en) | 2007-07-31 | 2012-04-03 | Applied Materials, Inc. | Apparatus and method of improving beam shaping and beam homogenization |
| US8674257B2 (en) | 2008-02-11 | 2014-03-18 | Applied Materials, Inc. | Automatic focus and emissivity measurements for a substrate system |
| US7713757B2 (en) * | 2008-03-14 | 2010-05-11 | Applied Materials, Inc. | Method for measuring dopant concentration during plasma ion implantation |
| US8319149B2 (en) * | 2008-04-16 | 2012-11-27 | Applied Materials, Inc. | Radiant anneal throughput optimization and thermal history minimization by interlacing |
| US7947584B2 (en) * | 2008-05-02 | 2011-05-24 | Applied Materials, Inc. | Suitably short wavelength light for laser annealing of silicon in DSA type systems |
| WO2009155117A2 (en) | 2008-05-30 | 2009-12-23 | Applied Materials, Inc. | Method and apparatus for detecting the substrate temperature in a laser anneal system |
| US9664012B2 (en) | 2008-08-20 | 2017-05-30 | Foro Energy, Inc. | High power laser decomissioning of multistring and damaged wells |
| US11590606B2 (en) * | 2008-08-20 | 2023-02-28 | Foro Energy, Inc. | High power laser tunneling mining and construction equipment and methods of use |
| US9080425B2 (en) | 2008-10-17 | 2015-07-14 | Foro Energy, Inc. | High power laser photo-conversion assemblies, apparatuses and methods of use |
| US10301912B2 (en) | 2008-08-20 | 2019-05-28 | Foro Energy, Inc. | High power laser flow assurance systems, tools and methods |
| US20120074110A1 (en) * | 2008-08-20 | 2012-03-29 | Zediker Mark S | Fluid laser jets, cutting heads, tools and methods of use |
| US9089928B2 (en) | 2008-08-20 | 2015-07-28 | Foro Energy, Inc. | Laser systems and methods for the removal of structures |
| US9719302B2 (en) | 2008-08-20 | 2017-08-01 | Foro Energy, Inc. | High power laser perforating and laser fracturing tools and methods of use |
| US9669492B2 (en) | 2008-08-20 | 2017-06-06 | Foro Energy, Inc. | High power laser offshore decommissioning tool, system and methods of use |
| US8254767B2 (en) * | 2008-08-29 | 2012-08-28 | Applied Materials, Inc. | Method and apparatus for extended temperature pyrometry |
| JP5349129B2 (ja) * | 2009-05-07 | 2013-11-20 | 住友重機械工業株式会社 | レーザ照射装置 |
| JP5537615B2 (ja) * | 2011-08-10 | 2014-07-02 | ウルトラテック インク | 時間平均化ライン像を形成するシステム及び方法 |
| US8946594B2 (en) * | 2011-11-04 | 2015-02-03 | Applied Materials, Inc. | Optical design for line generation using microlens array |
| KR101288993B1 (ko) * | 2011-12-20 | 2013-08-16 | 삼성디스플레이 주식회사 | 레이저 어닐링 장치 |
| US9028135B1 (en) | 2012-01-12 | 2015-05-12 | United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Pyrometer |
| DE102012020743A1 (de) * | 2012-10-23 | 2014-04-24 | Oerlikon Trading Ag, Trübbach | UV-Bestrahlungsvorrichtung für den getakteten Betrieb |
| US8912495B2 (en) * | 2012-11-21 | 2014-12-16 | Kla-Tencor Corp. | Multi-spectral defect inspection for 3D wafers |
| WO2014204535A1 (en) | 2013-03-15 | 2014-12-24 | Foro Energy, Inc. | High power laser fluid jets and beam paths using deuterium oxide |
| CN103592713A (zh) * | 2013-11-29 | 2014-02-19 | 苏州大学 | 无旁瓣角度选择激光滤波器 |
| DE102016223215A1 (de) | 2016-11-23 | 2018-05-24 | Trumpf Laser- Und Systemtechnik Gmbh | Bestrahlungseinrichtung und Bearbeitungsmaschine damit |
| CN106949974B (zh) * | 2017-04-11 | 2019-04-05 | 东北林业大学 | 多光谱线温真温测量装置和方法 |
| CN113795736A (zh) * | 2019-04-30 | 2021-12-14 | ams传感器新加坡私人有限公司 | 包括含有光导管的照明通道的光谱仪 |
| JP7542350B2 (ja) * | 2020-07-21 | 2024-08-30 | Jswアクティナシステム株式会社 | レーザアニール装置、レーザアニール方法、及び半導体装置の製造方法 |
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-
2005
- 2005-08-02 US US11/195,380 patent/US7438468B2/en active Active
- 2005-10-12 KR KR1020077012613A patent/KR101226634B1/ko not_active Expired - Lifetime
- 2005-10-12 EP EP05809879.9A patent/EP1831658B1/en not_active Ceased
- 2005-10-12 WO PCT/US2005/036796 patent/WO2006055130A2/en not_active Ceased
- 2005-10-12 CN CN2005800402899A patent/CN101065649B/zh not_active Expired - Lifetime
- 2005-10-12 JP JP2007541192A patent/JP5103186B2/ja not_active Expired - Lifetime
-
2008
- 2008-09-12 US US12/283,615 patent/US7717617B2/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4448547A (en) * | 1977-12-07 | 1984-05-15 | Luxtron Corporation | Optical temperature measurement technique utilizing phosphors |
| US4647774A (en) * | 1985-03-04 | 1987-03-03 | Quantum Logic Corporation | Pyrometer #2 |
| US6530687B1 (en) * | 1999-03-30 | 2003-03-11 | Tokyo Electron Limited | Temperature measuring system |
| US6747245B2 (en) * | 2002-11-06 | 2004-06-08 | Ultratech Stepper, Inc. | Laser scanning apparatus and methods for thermal processing |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101065649A (zh) | 2007-10-31 |
| WO2006055130A2 (en) | 2006-05-26 |
| KR20070085742A (ko) | 2007-08-27 |
| US7438468B2 (en) | 2008-10-21 |
| EP1831658B1 (en) | 2016-08-03 |
| WO2006055130A3 (en) | 2006-07-13 |
| JP5103186B2 (ja) | 2012-12-19 |
| JP2008520096A (ja) | 2008-06-12 |
| US20060102607A1 (en) | 2006-05-18 |
| US20090084986A1 (en) | 2009-04-02 |
| EP1831658A2 (en) | 2007-09-12 |
| KR101226634B1 (ko) | 2013-01-25 |
| US7717617B2 (en) | 2010-05-18 |
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