CN101026920B - 等离子体发生装置和工件处理装置 - Google Patents

等离子体发生装置和工件处理装置 Download PDF

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Publication number
CN101026920B
CN101026920B CN2007100028736A CN200710002873A CN101026920B CN 101026920 B CN101026920 B CN 101026920B CN 2007100028736 A CN2007100028736 A CN 2007100028736A CN 200710002873 A CN200710002873 A CN 200710002873A CN 101026920 B CN101026920 B CN 101026920B
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CN
China
Prior art keywords
microwave
microwaves
main body
waveguide
plasma
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CN2007100028736A
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English (en)
Chinese (zh)
Other versions
CN101026920A (zh
Inventor
吉田和弘
岩崎龙一
万川宏史
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SAIAN CORP
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Noritsu Koki Co Ltd
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Publication of CN101026920A publication Critical patent/CN101026920A/zh
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32311—Circuits specially adapted for controlling the microwave discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
CN2007100028736A 2006-02-20 2007-02-08 等离子体发生装置和工件处理装置 Expired - Fee Related CN101026920B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006042197 2006-02-20
JP2006-042197 2006-02-20
JP2006042197A JP4699235B2 (ja) 2006-02-20 2006-02-20 プラズマ発生装置およびそれを用いるワーク処理装置

Publications (2)

Publication Number Publication Date
CN101026920A CN101026920A (zh) 2007-08-29
CN101026920B true CN101026920B (zh) 2010-10-06

Family

ID=38426875

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2007100028736A Expired - Fee Related CN101026920B (zh) 2006-02-20 2007-02-08 等离子体发生装置和工件处理装置

Country Status (5)

Country Link
US (1) US7682482B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JP4699235B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (1) KR100884663B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CN (1) CN101026920B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
TW (1) TW200742505A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7562638B2 (en) * 2005-12-23 2009-07-21 Lam Research Corporation Methods and arrangement for implementing highly efficient plasma traps
JP2009099721A (ja) * 2007-10-16 2009-05-07 Dainippon Screen Mfg Co Ltd 基板冷却方法および基板冷却装置
TW200930158A (en) * 2007-12-25 2009-07-01 Ind Tech Res Inst Jet plasma gun and plasma device using the same
KR20100025249A (ko) * 2008-08-27 2010-03-09 (주)쎄미시스코 공정챔버의 리크 검출 방법
US8808456B2 (en) * 2008-08-29 2014-08-19 Tokyo Electron Limited Film deposition apparatus and substrate process apparatus
US9297072B2 (en) * 2008-12-01 2016-03-29 Tokyo Electron Limited Film deposition apparatus
US8841629B2 (en) 2012-06-27 2014-09-23 Applied Materials, Inc. Microwave excursion detection for semiconductor processing
US9284210B2 (en) * 2014-03-31 2016-03-15 Corning Incorporated Methods and apparatus for material processing using dual source cyclonic plasma reactor
US10079135B1 (en) * 2018-04-18 2018-09-18 Consolidated Nuclear Security, LLC Gas-sealed stub tuner for microwave systems
WO2020039562A1 (ja) * 2018-08-23 2020-02-27 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、半導体装置の製造方法、及びプログラム
CN114222626A (zh) * 2019-04-05 2022-03-22 派罗波有限公司 用于微波热解系统的内部冷却的阻抗调谐器
CN114747299B (zh) * 2019-12-24 2025-01-07 株式会社富士 等离子体装置
CN112844949A (zh) * 2020-12-31 2021-05-28 上海爱声生物医疗科技有限公司 一种医用导管涂层涂覆设备

Citations (6)

* Cited by examiner, † Cited by third party
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CN2064507U (zh) * 1990-03-17 1990-10-24 地方国营宿迁无线电厂 微波泄漏检测器
US5328515A (en) * 1992-05-07 1994-07-12 France Telecom Etablissement Autonome De Droit Public Chemical treatment plasma apparatus for forming a ribbon-like plasma
US20050001527A1 (en) * 2003-02-24 2005-01-06 Akira Sugiyama Plasma processing apparatus
CN2704179Y (zh) * 2004-05-14 2005-06-08 徐仁本 微波炉安全防护罩
CN1633216A (zh) * 2004-11-11 2005-06-29 南开大学 具有在线实时显示微波泄漏的微波协助化学反应谐振腔
US20060021581A1 (en) * 2004-07-30 2006-02-02 Lee Sang H Plasma nozzle array for providing uniform scalable microwave plasma generation

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5378170A (en) * 1976-12-22 1978-07-11 Toshiba Corp Continuous processor for gas plasma etching
US5645796A (en) * 1990-08-31 1997-07-08 Abtox, Inc. Process for plasma sterilizing with pulsed antimicrobial agent treatment
JPH06244140A (ja) * 1992-10-28 1994-09-02 Nec Kyushu Ltd ドライエッチング装置
JPH07135196A (ja) * 1993-06-29 1995-05-23 Nec Kyushu Ltd 半導体基板アッシング装置
JP3137810B2 (ja) * 1993-07-29 2001-02-26 キヤノン株式会社 マイクロ波プラズマ放電停止検知方法、マイクロ波プラズマ処理方法及びマイクロ波プラズマ処理装置
JP4044397B2 (ja) 2001-10-15 2008-02-06 積水化学工業株式会社 プラズマ表面処理装置
JP3977114B2 (ja) * 2002-03-25 2007-09-19 株式会社ルネサステクノロジ プラズマ処理装置
AU2003230265A1 (en) * 2002-05-08 2003-11-11 Dana Corporation Methods and apparatus for forming and using plasma jets
US20060057016A1 (en) * 2002-05-08 2006-03-16 Devendra Kumar Plasma-assisted sintering
US6769288B2 (en) * 2002-11-01 2004-08-03 Peak Sensor Systems Llc Method and assembly for detecting a leak in a plasma system
US7164095B2 (en) * 2004-07-07 2007-01-16 Noritsu Koki Co., Ltd. Microwave plasma nozzle with enhanced plume stability and heating efficiency
US20060021980A1 (en) 2004-07-30 2006-02-02 Lee Sang H System and method for controlling a power distribution within a microwave cavity
JP4022590B2 (ja) * 2005-03-25 2007-12-19 株式会社エーイーティー マイクロ波プラズマ発生装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2064507U (zh) * 1990-03-17 1990-10-24 地方国营宿迁无线电厂 微波泄漏检测器
US5328515A (en) * 1992-05-07 1994-07-12 France Telecom Etablissement Autonome De Droit Public Chemical treatment plasma apparatus for forming a ribbon-like plasma
US20050001527A1 (en) * 2003-02-24 2005-01-06 Akira Sugiyama Plasma processing apparatus
CN2704179Y (zh) * 2004-05-14 2005-06-08 徐仁本 微波炉安全防护罩
US20060021581A1 (en) * 2004-07-30 2006-02-02 Lee Sang H Plasma nozzle array for providing uniform scalable microwave plasma generation
CN1633216A (zh) * 2004-11-11 2005-06-29 南开大学 具有在线实时显示微波泄漏的微波协助化学反应谐振腔

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP-特开平6-244140A 1994.09.02
US 20050001527 A1,全文.

Also Published As

Publication number Publication date
US20070193516A1 (en) 2007-08-23
KR100884663B1 (ko) 2009-02-18
TWI343764B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2011-06-11
CN101026920A (zh) 2007-08-29
TW200742505A (en) 2007-11-01
KR20070083176A (ko) 2007-08-23
US7682482B2 (en) 2010-03-23
JP4699235B2 (ja) 2011-06-08
JP2007220586A (ja) 2007-08-30

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Owner name: SAIAN CO., LTD.

Free format text: FORMER OWNER: NORITSU KOKI CO. LTD.

Effective date: 20100903

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Address after: Wakayama County

Applicant after: Saian Corp.

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Granted publication date: 20101006

Termination date: 20120208