CN100578356C - 印刷物的制造方法 - Google Patents
印刷物的制造方法 Download PDFInfo
- Publication number
- CN100578356C CN100578356C CN03824490A CN03824490A CN100578356C CN 100578356 C CN100578356 C CN 100578356C CN 03824490 A CN03824490 A CN 03824490A CN 03824490 A CN03824490 A CN 03824490A CN 100578356 C CN100578356 C CN 100578356C
- Authority
- CN
- China
- Prior art keywords
- protuberance
- printing
- flexographic plates
- exposure
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007639 printing Methods 0.000 title claims abstract description 110
- 238000004519 manufacturing process Methods 0.000 title claims description 36
- 239000000463 material Substances 0.000 claims description 62
- 238000000034 method Methods 0.000 claims description 52
- 239000000758 substrate Substances 0.000 abstract description 8
- 239000000126 substance Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 description 46
- 239000011347 resin Substances 0.000 description 46
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 42
- 206010000496 acne Diseases 0.000 description 23
- 239000011521 glass Substances 0.000 description 16
- 239000004973 liquid crystal related substance Substances 0.000 description 12
- 230000000694 effects Effects 0.000 description 11
- 239000012528 membrane Substances 0.000 description 9
- 239000003566 sealing material Substances 0.000 description 8
- 238000012360 testing method Methods 0.000 description 8
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000007790 scraping Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 238000010023 transfer printing Methods 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 238000003854 Surface Print Methods 0.000 description 1
- 239000005030 aluminium foil Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/02—Engraving; Heads therefor
- B41C1/025—Engraving; Heads therefor characterised by means for the liquid etching of substrates for the manufacturing of relief or intaglio printing forms, already provided with resist pattern
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1083—Mechanical aspects of off-press plate preparation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M1/00—Inking and printing with a printer's forme
- B41M1/02—Letterpress printing, e.g. book printing
- B41M1/04—Flexographic printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2032—Simultaneous exposure of the front side and the backside
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Printing Methods (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
黏度(Pa·s) | 0.5 | 5 | 50 | 500 |
印刷材料残留 | ○ | ○ | × | × |
印刷性 | ○ | ○ | × | × |
倾斜角 | 0° | 5° | 10° | 15° | 20° | 25° |
印刷材料残留 | ○ | ○ | ○ | △ | × | × |
印刷性 | △ | ○ | ○ | △ | × | × |
Claims (3)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002305908A JP4080839B2 (ja) | 2002-10-21 | 2002-10-21 | フレキソ印刷版の製造方法および印刷物の製造方法 |
JP305908/2002 | 2002-10-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1688935A CN1688935A (zh) | 2005-10-26 |
CN100578356C true CN100578356C (zh) | 2010-01-06 |
Family
ID=32105189
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN03824490A Expired - Lifetime CN100578356C (zh) | 2002-10-21 | 2003-09-05 | 印刷物的制造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20060016355A1 (zh) |
JP (1) | JP4080839B2 (zh) |
KR (1) | KR20050074967A (zh) |
CN (1) | CN100578356C (zh) |
TW (1) | TWI227199B (zh) |
WO (1) | WO2004036313A1 (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8236479B2 (en) * | 2008-01-23 | 2012-08-07 | E I Du Pont De Nemours And Company | Method for printing a pattern on a substrate |
US8241835B2 (en) * | 2008-01-30 | 2012-08-14 | E I Du Pont De Nemours And Company | Device and method for preparing relief printing form |
US20090191482A1 (en) * | 2008-01-30 | 2009-07-30 | E.I. Du Pont De Nemours And Company | Device and method for preparing relief printing form |
JP5234110B2 (ja) * | 2008-07-09 | 2013-07-10 | 日本電気株式会社 | 液晶表示装置 |
JP2010234753A (ja) * | 2009-03-31 | 2010-10-21 | Fujifilm Corp | 凸版印刷版並びに凸版印刷版の製版方法及び装置 |
EP2448764B1 (en) | 2009-07-02 | 2016-03-02 | E. I. du Pont de Nemours and Company | Method for preparing a relief printing form and use thereof in a method for printing a material onto a substrate |
JP2012011665A (ja) * | 2010-06-30 | 2012-01-19 | Sharp Corp | フレキソ印刷装置、および当該フレキソ印刷装置に用いるフレキソ印刷版 |
EP2466381B1 (en) * | 2010-12-16 | 2021-05-19 | Xeikon Prepress N.V. | A processing apparatus for processing a flexographic plate, a method and a computer program product |
JP6133866B2 (ja) | 2011-08-26 | 2017-05-24 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーE.I.Du Pont De Nemours And Company | 凸版印刷フォームの調製方法 |
CN102774127B (zh) * | 2012-07-20 | 2014-12-24 | 京东方科技集团股份有限公司 | 一种印刷凸版结构 |
US9097974B2 (en) | 2012-08-23 | 2015-08-04 | E I Du Pont De Nemours And Company | Method for preparing a relief printing form |
KR101298103B1 (ko) * | 2012-10-31 | 2013-08-20 | 홍석현 | 미세 회로 패턴 제조 장치와 방법 및 이에 의해 제조되는 미세 회로 패턴 |
JP5702006B1 (ja) * | 2014-02-17 | 2015-04-15 | 住友ゴム工業株式会社 | フレキソ印刷版とそれを用いた液晶表示素子の製造方法 |
JP6499841B2 (ja) * | 2014-09-12 | 2019-04-10 | 株式会社コムラテック | フレキソ印刷版 |
JP6278942B2 (ja) * | 2015-10-21 | 2018-02-14 | 日本航空電子工業株式会社 | フレキソ印刷による絶縁膜の形成方法 |
JP6902219B2 (ja) * | 2017-01-26 | 2021-07-14 | Smk株式会社 | 印刷物及びスクリーン印刷方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4889006A (zh) * | 1972-03-01 | 1973-11-21 | ||
US4264705A (en) * | 1979-12-26 | 1981-04-28 | Uniroyal, Inc. | Multilayered elastomeric printing plate |
JPS614063A (ja) * | 1984-06-18 | 1986-01-09 | Sakata Shokai Ltd | 感光性樹脂層の凹凸成型方法、それに用いる半遮光性材料及び該材料を張り付けた原稿パタ−ン |
JP3362797B2 (ja) * | 1993-04-30 | 2003-01-07 | 東洋紡績株式会社 | 印刷原版用感光性樹脂積層体 |
JP3496086B2 (ja) * | 1997-02-18 | 2004-02-09 | 株式会社コムラテック | 低カッピング性樹脂凸版の製造方法 |
JP2001147520A (ja) * | 1999-11-22 | 2001-05-29 | Nippon Denshi Seiki Kk | 感光性樹脂着色薄膜と感光性樹脂層を積層してなる感光性樹脂フレキソ版材 |
US6343550B1 (en) * | 2000-01-24 | 2002-02-05 | Douglas W. Feesler | Flexographic printing apparatus and method |
US7419570B2 (en) * | 2002-11-27 | 2008-09-02 | Kimberly-Clark Worldwide, Inc. | Soft, strong clothlike webs |
-
2002
- 2002-10-21 JP JP2002305908A patent/JP4080839B2/ja not_active Expired - Lifetime
-
2003
- 2003-09-05 CN CN03824490A patent/CN100578356C/zh not_active Expired - Lifetime
- 2003-09-05 WO PCT/JP2003/011400 patent/WO2004036313A1/ja active Application Filing
- 2003-09-05 KR KR1020057006757A patent/KR20050074967A/ko not_active Application Discontinuation
- 2003-09-05 US US10/532,166 patent/US20060016355A1/en not_active Abandoned
- 2003-09-19 TW TW092125941A patent/TWI227199B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN1688935A (zh) | 2005-10-26 |
JP2004138973A (ja) | 2004-05-13 |
JP4080839B2 (ja) | 2008-04-23 |
TWI227199B (en) | 2005-02-01 |
US20060016355A1 (en) | 2006-01-26 |
WO2004036313A1 (ja) | 2004-04-29 |
TW200410829A (en) | 2004-07-01 |
KR20050074967A (ko) | 2005-07-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN100578356C (zh) | 印刷物的制造方法 | |
JP3689536B2 (ja) | 画像形成法 | |
JP4580830B2 (ja) | 画像形成方法及びそれを用いた画像形成装置 | |
KR101733585B1 (ko) | 잉크 패턴 형성 방법 및 잉크 패턴 인쇄 장치 | |
AU2011290907B2 (en) | System and method for digital creation of a print master using a multiple printhead unit | |
CN101321625B (zh) | 将印版安装至粘接构件的系统和方法 | |
JP2006289983A (ja) | ロールツーロール輪転印刷法を用いた電子素子の製造方法及び製造装置 | |
JP4683239B2 (ja) | 印刷用凹版の製造方法、電気基板の製造方法、および表示装置の製造方法 | |
JP2005338806A (ja) | クリシェの製造方法及びパターン形成方法 | |
JPH11198337A (ja) | 印刷機 | |
US10857779B2 (en) | Three dimensional pattern printing device and method for manufacturing micro-optical film structure by using same | |
EP2371541B1 (en) | System and method for digital creation of a print master using a multiple printhead unit | |
WO2018026378A1 (en) | Method of imprint lithography of conductive materials; stamp for imprint lithography, and apparatus for imprint lithograph | |
JP2002107530A5 (zh) | ||
JP2010058330A (ja) | 画像パターン形成方法および画像パターン並びに半導体デバイス、電気回路、表示体モジュール、カラーフィルタおよび発光素子 | |
JP2012240419A (ja) | デジタルオフセット版へのダイレクトインキングのための方法、装置、およびシステム | |
US11446947B2 (en) | Flexographic printing form having microcell patterns on surface | |
JP2009137085A (ja) | 高精細樹脂凸版印刷版 | |
CN101456309B (zh) | 凸版印版 | |
WO2017159415A1 (ja) | 印刷版 | |
CN105644133A (zh) | 用于胶印的移印版及其制备方法 | |
JP2013184457A (ja) | 反転印刷方法および反転印刷装置 | |
JP2012011666A (ja) | フレキソ印刷装置、および該フレキソ印刷装置に備えるフレキソ印刷版、ならびに該フレキソ印刷版の製造方法 | |
JP2004082441A (ja) | スクリーン印刷用版の製作方法 | |
KR100724480B1 (ko) | 패턴형성을 위한 인쇄장치 및 이를 이용한 패턴형성방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CI01 | Publication of corrected invention patent application |
Correction item: Patentee|Address|Co-patentee Correct: Sharp Corp.|Osaka, Japan|Hitachi Plant Technologies, Ltd.|KOMURA-TECH CO.,LTD. False: Sharp Corp.|Osaka, Japan|Hitachi Plant Technologies, Ltd.|KOMURA TECH Co.,Ltd. Number: 01 Volume: 26 |
|
CI03 | Correction of invention patent |
Correction item: Applicant Correct: KOMURA-TECH CO.,LTD. False: KOMURA TECH Co.,Ltd. Number: 01 Page: The title page Volume: 26 |
|
ERR | Gazette correction |
Free format text: CORRECT: PATENTEE; ADDRESS; CO-PATENTEE; FROM: SHARP CORPORATION: OSAKA, JAPAN; HITACHI PLANT TECHNOLOGIES, LTD., KOMURA TECH CO LTD TO: SHARP CORPORATION: OSAKA, JAPAN; HITACHI PLANT TECHNOLOGIES, LTD., KOMURA-TECH CO., LTD. |
|
ASS | Succession or assignment of patent right |
Owner name: HITACHI,LTD. OMURA TECHNOLOGY CO. LTD. Free format text: FORMER OWNER: HITACHI PLANT TECHNOLOGIES LTD. OMURA TECHNOLOGY CO. LTD. Effective date: 20141009 Free format text: FORMER OWNER: HITACHI,LTD. OMURA TECHNOLOGY CO. LTD. Effective date: 20141009 Owner name: OMURA TECHNOLOGY CO. LTD. Free format text: FORMER OWNER: SHARP CORPORATION Effective date: 20141009 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20141009 Address after: Osaka City, East Japan Osaka Patentee after: KOMURA-TECH CO.,LTD. Address before: Osaka, Japan Patentee before: Sharp Corp. Patentee before: Hitachi, Ltd. Patentee before: KOMURA-TECH CO.,LTD. Effective date of registration: 20141009 Address after: Osaka, Japan Patentee after: Sharp Corp. Patentee after: Hitachi, Ltd. Patentee after: KOMURA-TECH CO.,LTD. Address before: Osaka, Japan Patentee before: Sharp Corp. Patentee before: Hitachi Plant Technologies, Ltd. Patentee before: KOMURA-TECH CO.,LTD. |
|
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20100106 |