CN100549418C - 药液供给装置 - Google Patents

药液供给装置 Download PDF

Info

Publication number
CN100549418C
CN100549418C CNB2007101538276A CN200710153827A CN100549418C CN 100549418 C CN100549418 C CN 100549418C CN B2007101538276 A CNB2007101538276 A CN B2007101538276A CN 200710153827 A CN200710153827 A CN 200710153827A CN 100549418 C CN100549418 C CN 100549418C
Authority
CN
China
Prior art keywords
piston
chamber
pump
pressure
cylinder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CNB2007101538276A
Other languages
English (en)
Chinese (zh)
Other versions
CN101187365A (zh
Inventor
矢岛丈夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
K K KOGANEI
Koganei Corp
Original Assignee
K K KOGANEI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by K K KOGANEI filed Critical K K KOGANEI
Publication of CN101187365A publication Critical patent/CN101187365A/zh
Application granted granted Critical
Publication of CN100549418C publication Critical patent/CN100549418C/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B43/00—Machines, pumps, or pumping installations having flexible working members
    • F04B43/02—Machines, pumps, or pumping installations having flexible working members having plate-like flexible members, e.g. diaphragms
    • F04B43/06—Pumps having fluid drive
    • F04B43/067—Pumps having fluid drive the fluid being actuated directly by a piston
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B43/00—Machines, pumps, or pumping installations having flexible working members
    • F04B43/08—Machines, pumps, or pumping installations having flexible working members having tubular flexible members
    • F04B43/10—Pumps having fluid drive
    • F04B43/107—Pumps having fluid drive the fluid being actuated directly by a piston
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Reciprocating Pumps (AREA)
CNB2007101538276A 2006-11-20 2007-09-12 药液供给装置 Active CN100549418C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006312621A JP4547368B2 (ja) 2006-11-20 2006-11-20 薬液供給装置
JP2006312621 2006-11-20

Publications (2)

Publication Number Publication Date
CN101187365A CN101187365A (zh) 2008-05-28
CN100549418C true CN100549418C (zh) 2009-10-14

Family

ID=39415639

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2007101538276A Active CN100549418C (zh) 2006-11-20 2007-09-12 药液供给装置

Country Status (5)

Country Link
US (1) US7871250B2 (enExample)
JP (1) JP4547368B2 (enExample)
KR (1) KR100893991B1 (enExample)
CN (1) CN100549418C (enExample)
TW (1) TWI348520B (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4585563B2 (ja) 2007-12-03 2010-11-24 株式会社コガネイ 薬液供給装置およびポンプ組立体
US9850889B2 (en) * 2010-02-02 2017-12-26 Dajustco Ip Holdings Inc. Hydraulic fluid control system for a diaphragm pump
JP5114527B2 (ja) * 2010-04-20 2013-01-09 株式会社コガネイ 液体供給装置
JP5434781B2 (ja) * 2010-04-28 2014-03-05 東京エレクトロン株式会社 処理液供給機構
JP5438611B2 (ja) * 2010-07-09 2014-03-12 株式会社コガネイ 薬液供給装置
JP5475700B2 (ja) * 2011-02-03 2014-04-16 株式会社コガネイ 液体供給方法および装置
KR102122226B1 (ko) * 2013-08-26 2020-06-12 엘지디스플레이 주식회사 약액 공급 장치 및 이를 포함하는 슬릿 코터
JP6225080B2 (ja) 2014-07-17 2017-11-01 株式会社コガネイ 逆止弁および逆止弁を備えた液体供給装置
JP6438784B2 (ja) * 2015-02-03 2018-12-19 東京応化工業株式会社 ポンプおよび塗布装置
JP6780959B2 (ja) * 2016-06-10 2020-11-04 日本ピラー工業株式会社 ベローズポンプ装置
JP6719323B2 (ja) * 2016-08-03 2020-07-08 日本ピラー工業株式会社 往復動ポンプ
JP6174776B1 (ja) * 2016-12-12 2017-08-02 中外炉工業株式会社 塗布液供給装置
JP6956601B2 (ja) 2017-11-10 2021-11-02 東京応化工業株式会社 ポンプ及び塗布装置
WO2019106674A1 (en) * 2017-11-29 2019-06-06 Serenno Medical A dual active valve fluid pressure operated positive displacement pump
JP6941570B2 (ja) * 2018-01-19 2021-09-29 日本ピラー工業株式会社 ローリングダイアフラムポンプ
EP3712432B1 (en) * 2019-03-19 2024-07-17 Fast & Fluid Management B.V. Liquid dispenser and method of operating such a dispenser
KR102321443B1 (ko) * 2021-01-28 2021-11-03 박명철 고수명 비접촉식 펌프
US11913301B2 (en) * 2021-04-09 2024-02-27 Schlumberger Technology Corporation Integral bellows for oilfield equipment
KR102684195B1 (ko) 2021-08-10 2024-07-19 정조우 약품 정량 공급장치
JP2023097113A (ja) * 2021-12-27 2023-07-07 日機装株式会社 封止部材およびサブマージドポンプシステム
LU103099B1 (en) * 2023-04-12 2024-10-14 Stratec Se Pressure monitored piston pump

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2951450A (en) * 1956-04-17 1960-09-06 John C Fisher Fluid pump
JPS416418Y1 (enExample) 1964-04-13 1966-04-01
US4890851A (en) * 1989-01-19 1990-01-02 Durametallic Corporation Bellows seal with vibration damper
US5085560A (en) * 1990-01-12 1992-02-04 Semitool, Inc. Low contamination blending and metering systems for semiconductor processing
US5167837A (en) * 1989-03-28 1992-12-01 Fas-Technologies, Inc. Filtering and dispensing system with independently activated pumps in series
GB8909289D0 (en) * 1989-04-24 1989-06-07 Crane John Uk Ltd Mechanical face seals
JPH03149371A (ja) * 1989-11-02 1991-06-25 Nippon Fuiidaa Kogyo Kk ダイヤフラムポンプ
JP3554115B2 (ja) * 1996-08-26 2004-08-18 株式会社コガネイ 薬液供給装置
JP3461725B2 (ja) * 1998-06-26 2003-10-27 東京エレクトロン株式会社 処理液供給装置及び処理液供給方法
JP2002242842A (ja) * 2001-02-19 2002-08-28 Nikkiso Co Ltd ダイアフラムポンプ
KR20030048515A (ko) * 2001-12-12 2003-06-25 가부시키가이샤 고가네이 약액공급장치
JP2003275306A (ja) * 2002-03-26 2003-09-30 Ohtsu Tire & Rubber Co Ltd :The 薬液供給器及び薬液カートリッジ
JP4197107B2 (ja) 2002-07-18 2008-12-17 大日本印刷株式会社 塗工装置
JP2006144741A (ja) 2004-11-24 2006-06-08 Nikkiso Co Ltd 往復動ポンプ
JP4790311B2 (ja) * 2005-02-28 2011-10-12 株式会社鷺宮製作所 定量送液ポンプ

Also Published As

Publication number Publication date
KR20080045605A (ko) 2008-05-23
US7871250B2 (en) 2011-01-18
TWI348520B (en) 2011-09-11
US20080115662A1 (en) 2008-05-22
KR100893991B1 (ko) 2009-04-20
JP4547368B2 (ja) 2010-09-22
CN101187365A (zh) 2008-05-28
JP2008128059A (ja) 2008-06-05
TW200823368A (en) 2008-06-01

Similar Documents

Publication Publication Date Title
CN100549418C (zh) 药液供给装置
KR100904832B1 (ko) 약액 공급장치
CN101165348B (zh) 药液供给装置
JP7620720B2 (ja) 高寿命非接触式ポンプ
US8133042B2 (en) Chemical liquid supplying apparatus and pump assembly
CN102235345A (zh) 液体供给装置
JP5060766B2 (ja) 薬液供給装置
KR20030048515A (ko) 약액공급장치
JP4652067B2 (ja) ベローズポンプ
KR101414080B1 (ko) 약액공급장치
TWI685613B (zh) 泵浦及塗佈裝置
CN121184572A (zh) 双通道压力触发式料浆阀密封装置及其密封方法
WO2025057595A1 (ja) ダイアフラムポンプ
JPH0684786B2 (ja) 液圧駆動機構のシ−ル装置

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant