CN100517706C - 辐射源和用于制造透镜模的方法 - Google Patents

辐射源和用于制造透镜模的方法 Download PDF

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CN100517706C
CN100517706C CNB018137725A CN01813772A CN100517706C CN 100517706 C CN100517706 C CN 100517706C CN B018137725 A CNB018137725 A CN B018137725A CN 01813772 A CN01813772 A CN 01813772A CN 100517706 C CN100517706 C CN 100517706C
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semiconductor chip
lens
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CN1447983A (zh
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G·博纳
W·格拉曼
P·克罗莫蒂斯
W·马希尔
W·施佩斯
G·维特尔
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Ams Osram International GmbH
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Abstract

本发明涉及一种辐射源,它具有一个半导体芯片组,这些芯片位于一个布置在六方网格结构里的微型透镜(8)的组下面。该辐射源的特征是辐射功率和辐射密度大。

Description

辐射源和用于制造透镜模的方法
技术领域
本发明涉及一种辐射源,它具有许多相互并排布置的发出辐射的半导体芯片。
本发明还涉及一种用来制造一个适用于加工微型透镜的组合场的透镜模的方法。
背景技术
辐射源,例如象发光二极管,通常具有一个注塑在透明的透镜体里的半导体芯片。还已众所周知的是,通过设置许多半导体芯片来提高这种类型辐射源的辐射功率。这类辐射源通常有一个由一个透镜组成的聚光装置。这类辐射源的辐射密度当然往往并不令人满意,这是因为这样一种光照强烈的辐射源伸展的空间范围较小。
发明内容
从这种技术现状出发,本发明的任务是提出一种高辐射强度的辐射源。
按照本发明提供了一种辐射源,,其具有许多相互并排布置的发出辐射的半导体芯片的辐射源,其中半导体芯片直接布置在同一块印刷电路板上,并且在半导体芯片前的射出方向上布置有一个构成六方形网格的透镜的组。。
由于透镜成六方型布置所配属的这些半导体芯片就可以实现大的表面密度。相应地该辐射源的辐射强度也就大。由于这些透镜通常由球体部分构成,因而可以选择具有大半径的球体部分用于透镜。因而半导体芯片的发出辐射的活化层大部分都位于配属于各自球体的威氏(Weierstrass’schen)球内。因而各个半导体芯片都有高的辐射效率。
本发明另外的任务是提出一种用于制造一种适于制成一个透镜组的透镜模的合理的方法。
按照本发明提供了一种上述方法,其中使透镜模在球的一个由一个六方形的托座固定住的群组上成型。
若这些球密集地布置,那么通过该六方形托座就使球的群组几乎自动地置入一个六方形网格结构里。因此足够可以使托座完全用待成型的球来填满。
本发明的其它合理的技术方案见下文。
附图说明
以下按附图对本发明详细地加以说明。图示为:
图1是一个装有半导体芯片并且已经焊接好的用于按本发明的辐射源的印刷电路板的俯视图;
图2是图1所示印刷电路板的一个放大的横断面视图;
图3是一个透镜组的俯视图;
图4是穿过一个可用于制造一种用于制成微型透镜组的注模的横截面图;
图5是图4所示注模的俯视图;
图6是穿过另外一个用于制成该注模的装置的一个横断面图;
图7是穿过用于制造微透镜组的注塑装置的一个横断面图;和
图8是表示出辐射功率与在半导体芯片的上棱边和对应配属的半球形的微透镜之间的间距的相互关系的图表。
具体实施方式
图1表示了一个由Al2O3或Si制成的印刷电路板1的俯视图。在印刷电路板1上设有连接接点2,其中焊线3通向接点位置4,在这些接点位置上设有连接线5,这些连接线又通向芯片接触表面6。在芯片接触面6上装有半导体芯片7并分别成行成列地进行焊接连接。
图2表示了穿过装有微透镜8的焊线板1的一个横断面的放大部分断面。可以看到,半导体芯片7的一个底面9分别放置在芯片接触面6上。在半导体芯片7的顶面10上分别有连接线5,这些线通向一个相邻的芯片接触面6或者其中一个接点位置4。
微透镜8是半径为R的半球体。微透镜8的几何中心位于离半导体芯片7的顶面距离ΔX处。距离ΔX是如此选择的,以使半导体芯片7发出辐射的各活化层至少有一半位于半径为R/n的威氏球内,其中n是用于微透镜8的材料的折射率。威氏球的中心与这些微透镜8的中心相重合。在威氏球内所产生的辐射可以射出微透镜8。因而其优点是:半导体芯片7的活化层的尽可能大的一部分各自位于威氏球内。因此选择微透镜8的半径尽可能地大是有意义的。与此对立的是在半导体芯片7之间的距离也必须相应选得大。但是在半导体芯片7之间较大的距离会造成较小的辐射强度。因此就尽力使微透镜8之间的距离尽可能地小。图3所示的微透镜8在一个六方形网格结构中的布置是微透镜8的可能的最密的布置,并且能够实现大的辐射功率,同时有大的辐射强度。
较有利的是微透镜8由人造树脂注塑而成。该制造方法按如下进行。
首先制成第一模板11,如图4所示它有一个横断面为图5中可见到的六方形的中央芯轴12。芯轴12布置在一个托座13上。在托座13附近有螺栓14。在第一模板11上还装有一个保持框15,该保持框在其内侧上具有凹槽16。由保持框15所限制住的内腔填充有硅树脂。这就生成一个硅树脂框17,该框在其中心具有一个横断面为六方形的孔。硅树脂框17啮入凹槽16里并因而能够简单地与保持框15一起安放在一个图6所示的第二模板19上。这里也有螺栓14,它用于对准在第二模板19上的保持框15和硅树脂框17。因此硅树脂框17就位于第二模板19上,从而使硅树脂框17的孔18与第二模板19上的一个托座20对中。托座20用其侧连板21占据第一模板11的托座13的空腔。它也同样具有一个六方形横断面。在托座20里致密布置地放入了小球22。这些小球22的半径基本上等于待制造的微透镜8的半径。由于托座20有一个六方形的横断面,而且由于小球22致密地布置,因而这些小球22就按照一种六方形的网格构造布置。
接着用硅树脂装填孔18。这就成了图7所示的,在一个注塑装置23里所示的微透镜模24。注塑装置23有一个吸入支管25,在其上面放置了一块基板26,该基板固定住印刷电路板1。为此目的设有一个中央抽吸孔27,该孔通向印刷电路板1。在基板26之上是带微透镜模24的保持框15。这二者部分地由一块压板28盖住,该压板通过一个未示出的螺钉连接件与基板26相连接,并保证使微透镜模24可靠地坐在基板26上。
螺栓14在微透镜模24里留有通孔29,这些通孔用于将人造树脂装入印刷电路板1之上的微透镜24的空心腔里。
显然可看出,印刷电路板1在微透镜模24下面已经设有半导体芯片3并已连接焊好。
最后通过些通孔填入浇注树脂。这样就使微透镜模24和焊线3之间的空腔被填满并形成微透镜8。
最后,在图8中表示了一个图表,其中表示出了在一个半开口角为60°,即开口角为120°的立体角上的辐射功率Φ与间距ΔX之间的关系。
图8包含了计算的结果。这些计算用一个底面积为200μm×200μm和高度为250μm的半导体芯片7来进行。假定半导体芯片从其顶边10发射出其辐射功率的70%。其余30%则应该由半导体芯片7的侧面射出。一黑体在2000K时的光谱被作为光谱。对二类浇注树脂进行了计算,半导体芯片7埋入在这些树脂里。曾经对于一种浇注树脂采用n=1.55的折射率,对另一种树脂采用n=1.87的折射率。计算出的曲线30,31和33反映了在计算指数n=1.55时,微透镜8的半径分别为250μm,300μm和350μm的结果。曲线33,34和35反映了树脂的折射率n=1.78时,微透镜8的半径为250μm,300μm和350μm的结果。最后线36表示了无微透镜8时所期望的结果。
微透镜8的直径达500μm,600μm和700μm。根据图8所示显然可见,在间距ΔX为0.1mm时在所检测的立体角内的辐射功率被认为是最大值。那时的辐射功率大致为没有微透镜8时的二倍。在此间距时半导体芯片7的活化层的大部分也都位于微透镜8的威氏球内。
由下表1也可以看到微透镜8呈六方形布置的优点:
表1
  布置方式   正方形   六方形   六方形
  透镜直径   600μm   600μm   700μm
  每单位元件的面积   0.36mm<sup>2</sup>   0.312mm<sup>2</sup>   0.42mm<sup>2</sup>
  70°半角时的总辐射功率   0.4777W   0.45919W   0.48668W
  单位面积的辐射功率   1.3269W/mm<sup>2</sup>   1.4718W/mm<sup>2</sup>   1.1588W/mm<sup>2</sup>
由表1明显可见,加大微透镜8的半径并不一定能提高单位面积的辐射功率。因为由于微透镜8的较大的半径虽然使半导体芯片7的活化层的较大部分位于威氏球内,但是为此使半导体芯片7的间距增大了,因而使辐射强度降低了。
出于实际使用的考虑,若微透镜8的直径选为700μm仍然是有利的,这是因为否则的话在将半导体芯片7焊接到芯片接触面6上时,以及在焊接连接这些连接线5时都可能出现问题。此外通常的浇注树脂在硬化时都要收缩,因此硬化的微透镜大致总要比微透镜模24的相应形状小6%。

Claims (7)

1.具有许多相互并排布置的发出辐射的半导体芯片(7)的辐射源,其中所述半导体芯片直接布置在同一块印刷电路板(1)上,并且在所述半导体芯片(7)前的射出方向上布置有一个构成六方形网格的透镜(8)的组,其中,所述透镜彼此间整体地形成一个透镜网格体,并且所述半导体芯片被所述透镜网格体封装起来。
2.按权利要求1所述的辐射源,其特征在于,所述透镜(8)由半球构成。
3.按权利要求1或2所述的辐射源,其特征在于,所述透镜(8)布置在六方形的最致密的网格里。
4.按权利要求1或2所述的辐射源,其特征在于,该网格的轮廓是一个六方形的构造。
5.按权利要求1或2所述的辐射源,其特征在于,所述半导体芯片(7)成行地焊接。
6.按权利要求1或2所述的辐射源,其特征在于,所述半导体芯片(7)的色组在不同的波长时具有其发射最大值。
7.按权利要求6所述的辐射源,其特征在于,该色组成行地布置。
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