CN100473667C - 光引发剂,新型化合物和光固化性组合物 - Google Patents

光引发剂,新型化合物和光固化性组合物 Download PDF

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Publication number
CN100473667C
CN100473667C CNB038074575A CN03807457A CN100473667C CN 100473667 C CN100473667 C CN 100473667C CN B038074575 A CNB038074575 A CN B038074575A CN 03807457 A CN03807457 A CN 03807457A CN 100473667 C CN100473667 C CN 100473667C
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methyl
expression
ethyl
compound
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Chinese (zh)
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CN1642992A (zh
Inventor
A·拉霍夫茨
K-U·高德尔
J·弗比茨
F·G·格拉厄
于静
吴光辉
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DIC Corp
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Dainippon Ink and Chemicals Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
CNB038074575A 2002-04-03 2003-04-03 光引发剂,新型化合物和光固化性组合物 Expired - Fee Related CN100473667C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02007306 2002-04-03
EP02007306.0 2002-04-03

Publications (2)

Publication Number Publication Date
CN1642992A CN1642992A (zh) 2005-07-20
CN100473667C true CN100473667C (zh) 2009-04-01

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CNB038074575A Expired - Fee Related CN100473667C (zh) 2002-04-03 2003-04-03 光引发剂,新型化合物和光固化性组合物

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Country Link
US (1) US7166648B2 (https=)
EP (1) EP1490412B1 (https=)
JP (1) JP4127104B2 (https=)
CN (1) CN100473667C (https=)
CA (1) CA2479026C (https=)
DE (1) DE60336306D1 (https=)
ES (1) ES2359809T3 (https=)
WO (1) WO2003082929A1 (https=)

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DE602005021773D1 (de) * 2004-04-21 2010-07-22 Ashland Licensing & Intellectu Strahlungshärtbare michael-additions-harze mit eingebauten photoinitiatoren
US7799943B2 (en) * 2005-06-24 2010-09-21 Rohm And Haas Company Method for promoting Michael addition reactions
JP4781048B2 (ja) * 2005-08-30 2011-09-28 日本曹達株式会社 ジ置換β−ケトエステル類の製造方法
JP4597145B2 (ja) * 2006-12-18 2010-12-15 ナトコ株式会社 活性エネルギー線重合開始剤、それを含有する重合性組成物及びその硬化物
US7705064B2 (en) * 2007-07-23 2010-04-27 Henkel Corporation Photosensitive compounds, photopolymerizable compositions including the same, and methods of making and using the same
JP4726868B2 (ja) * 2007-08-01 2011-07-20 株式会社Adeka アルカリ現像性感光性樹脂組成物
JP5550814B2 (ja) * 2008-03-05 2014-07-16 株式会社Adeka カルバゾリル基を有するβ−ジケトン化合物及び該化合物を用いた光重合開始剤
JP5065123B2 (ja) * 2008-03-31 2012-10-31 株式会社Adeka アルカリ現像性感光性樹脂組成物
KR20100028020A (ko) * 2007-08-01 2010-03-11 가부시키가이샤 아데카 알칼리 현상성 감광성 수지 조성물 및 β-디케톤 화합물
JP2010218605A (ja) * 2009-03-13 2010-09-30 Toshiba Corp パターン転写用紫外線硬化性樹脂材料、及びこれを用いた磁気記録媒体の製造方法
JP2010218597A (ja) * 2009-03-13 2010-09-30 Toshiba Corp パターン転写用樹脂スタンパ、及びこれを用いた磁気記録媒体の製造方法
JP4543117B1 (ja) * 2009-03-13 2010-09-15 株式会社東芝 パターン転写用紫外線硬化性樹脂材料、及びこれを用いた磁気記録媒体の製造方法
JP4729114B2 (ja) * 2009-03-18 2011-07-20 株式会社東芝 磁気記録媒体の製造方法
TW201224653A (en) * 2010-09-01 2012-06-16 Sumitomo Chemical Co Photosensitive resin composition
CN102079707B (zh) * 2011-01-25 2013-10-30 深圳市有为化学技术有限公司 均三甲苯基芳香酮化合物、其制备方法以及光引发剂
JP6150987B2 (ja) * 2012-05-24 2017-06-21 富士フイルム株式会社 非水二次電池用電解液及び二次電池
AU2014288876B2 (en) * 2013-07-08 2018-11-22 IGM Group B.V Liquid bisacylphosphine oxide photoinitiator
US10459337B2 (en) 2015-12-14 2019-10-29 University Of Maryland, College Park Multicolor photolithography materials and methods
TWI730037B (zh) * 2016-01-26 2021-06-11 日商富士軟片和光純藥股份有限公司 光硬化方法,及用於該光硬化方法之化合物和組成物
CN109103489B (zh) * 2017-06-21 2020-05-05 宁德时代新能源科技股份有限公司 一种电解液及电池
US20220267249A1 (en) * 2019-07-17 2022-08-25 Arxada Ag Method for Preparation of Decolorized Acetoacetylated Ethylene Glycol
US12466908B2 (en) 2020-04-08 2025-11-11 3M Innovative Properties Company Curable compositions and methods of using the same
WO2021205324A1 (en) 2020-04-08 2021-10-14 3M Innovative Properties Company Curable compositions and methods of using the same

Citations (1)

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Publication number Priority date Publication date Assignee Title
CN1160718A (zh) * 1996-03-04 1997-10-01 希巴特殊化学控股公司 烷基苯基二酰基氧化膦及光引发剂混合物

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US3974052A (en) * 1973-12-06 1976-08-10 Imperial Chemical Industries Limited Photopolymerizable compositions containing triketone/alcohol adducts as photosensitizers
CH598288A5 (https=) * 1975-12-23 1978-04-28 Ciba Geigy Ag
US4151056A (en) * 1977-09-29 1979-04-24 Union Carbide Corporation Radiation curable coating compositions containing alkanediones or cycloalkanediones
US5144057A (en) * 1990-10-15 1992-09-01 Lonza Ltd. Process for the production of 3-oxocarboxylic acid esters
US5945489A (en) * 1997-09-19 1999-08-31 Ashland, Inc. Liquid oligomers containing unsaturation
US6025410A (en) * 1997-09-19 2000-02-15 Ashland Inc. Liquid oligomers containing acrylate unsaturation
GB2335424A (en) * 1998-03-20 1999-09-22 Courtaulds Coatings Acrylic monomers and polymers prepared therefrom
US6486345B1 (en) * 1998-09-25 2002-11-26 Lonza Ag Method for producing 6,6-dialkoxy-5-hydroxy-3-oxo-hexanoic acid esters
US6204302B1 (en) * 1998-11-20 2001-03-20 Bisco, Inc. Photosensitizers for free radical polymerization initiation resins and method of making the same
US6673851B2 (en) * 2001-10-12 2004-01-06 Ashland Inc. Self-photoinitiating multifunctional acrylates
EP1342737B1 (en) * 2002-03-07 2007-06-13 Dainippon Ink And Chemicals, Inc. Initiator-free crosslinkable oligomers and polymers

Patent Citations (1)

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Publication number Priority date Publication date Assignee Title
CN1160718A (zh) * 1996-03-04 1997-10-01 希巴特殊化学控股公司 烷基苯基二酰基氧化膦及光引发剂混合物

Also Published As

Publication number Publication date
DE60336306D1 (de) 2011-04-21
EP1490412B1 (en) 2011-03-09
ES2359809T3 (es) 2011-05-27
EP1490412A1 (en) 2004-12-29
US7166648B2 (en) 2007-01-23
JP2003327610A (ja) 2003-11-19
CA2479026C (en) 2010-10-12
US20050256218A1 (en) 2005-11-17
CA2479026A1 (en) 2003-10-09
WO2003082929A1 (en) 2003-10-09
CN1642992A (zh) 2005-07-20
JP4127104B2 (ja) 2008-07-30

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