CN100453702C - 等离子体处理装置及其部件和部件的寿命检测方法 - Google Patents

等离子体处理装置及其部件和部件的寿命检测方法 Download PDF

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Publication number
CN100453702C
CN100453702C CNB2006100082257A CN200610008225A CN100453702C CN 100453702 C CN100453702 C CN 100453702C CN B2006100082257 A CNB2006100082257 A CN B2006100082257A CN 200610008225 A CN200610008225 A CN 200610008225A CN 100453702 C CN100453702 C CN 100453702C
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basic point
parts
plasma
processing apparatus
identifier
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Expired - Fee Related
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CNB2006100082257A
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Chinese (zh)
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CN1821448A (zh
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林大辅
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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  • Plasma Technology (AREA)
CNB2006100082257A 2005-02-17 2006-02-16 等离子体处理装置及其部件和部件的寿命检测方法 Expired - Fee Related CN100453702C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005040870A JP4409459B2 (ja) 2005-02-17 2005-02-17 プラズマ処理装置およびその部品と部品の寿命検出方法
JP2005040870 2005-02-17

Publications (2)

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CN1821448A CN1821448A (zh) 2006-08-23
CN100453702C true CN100453702C (zh) 2009-01-21

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CNB2006100082257A Expired - Fee Related CN100453702C (zh) 2005-02-17 2006-02-16 等离子体处理装置及其部件和部件的寿命检测方法

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JP (1) JP4409459B2 (ja)
CN (1) CN100453702C (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101087514B1 (ko) * 2006-09-11 2011-11-28 가부시키가이샤 알박 드라이 에칭 방법
KR101124795B1 (ko) * 2008-03-28 2012-03-23 도쿄엘렉트론가부시키가이샤 플라즈마 처리장치, 챔버내 부품 및 챔버내 부품의 수명 검출 방법
JP2009245988A (ja) * 2008-03-28 2009-10-22 Tokyo Electron Ltd プラズマ処理装置、チャンバ内部品及びチャンバ内部品の寿命検出方法
JP2012009659A (ja) * 2010-06-25 2012-01-12 Panasonic Corp ドライエッチング装置及びそれに使用される隔壁カバー部
JP5630319B2 (ja) * 2011-02-23 2014-11-26 三菱マテリアル株式会社 プラズマ処理装置用部品及び識別表示の刻印方法
JP2013016532A (ja) * 2011-06-30 2013-01-24 Tokyo Electron Ltd シリコン製部品の製造方法及びエッチング処理装置用のシリコン製部品
JP6311255B2 (ja) * 2013-09-26 2018-04-18 株式会社ジェイテクト 軸受、及び軸受の製造方法、並びに軸受の管理方法
US10041868B2 (en) * 2015-01-28 2018-08-07 Lam Research Corporation Estimation of lifetime remaining for a consumable-part in a semiconductor manufacturing chamber
US10651097B2 (en) 2018-08-30 2020-05-12 Lam Research Corporation Using identifiers to map edge ring part numbers onto slot numbers
US20240145281A1 (en) * 2022-10-27 2024-05-02 Applied Materials, Inc. Detection and analysis of substrate support and pre-heat ring in a process chamber via imaging

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4936608A (en) * 1987-08-27 1990-06-26 Daimler-Benz Ag Marking of industrial products or individual parts thereof
US6176434B1 (en) * 1998-04-17 2001-01-23 Forensic Technology Wai Inc. Method and structure for identifying solid objects having a dynamic surface
CN1432071A (zh) * 2000-03-27 2003-07-23 应用材料有限公司 加工配套元件部件及其使用方法
US20040055489A1 (en) * 2002-09-19 2004-03-25 William Burrow Printing rolls having wear indicators and methods for determining wear of printing and anilox rolls and sleeves
US20040125360A1 (en) * 2002-12-31 2004-07-01 Tokyo Electron Limited Monitoring erosion of system components by optical emission
US6837966B2 (en) * 2002-09-30 2005-01-04 Tokyo Electron Limeted Method and apparatus for an improved baffle plate in a plasma processing system

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4936608A (en) * 1987-08-27 1990-06-26 Daimler-Benz Ag Marking of industrial products or individual parts thereof
US6176434B1 (en) * 1998-04-17 2001-01-23 Forensic Technology Wai Inc. Method and structure for identifying solid objects having a dynamic surface
CN1432071A (zh) * 2000-03-27 2003-07-23 应用材料有限公司 加工配套元件部件及其使用方法
US20040055489A1 (en) * 2002-09-19 2004-03-25 William Burrow Printing rolls having wear indicators and methods for determining wear of printing and anilox rolls and sleeves
US6837966B2 (en) * 2002-09-30 2005-01-04 Tokyo Electron Limeted Method and apparatus for an improved baffle plate in a plasma processing system
US20040125360A1 (en) * 2002-12-31 2004-07-01 Tokyo Electron Limited Monitoring erosion of system components by optical emission

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Publication number Publication date
CN1821448A (zh) 2006-08-23
JP4409459B2 (ja) 2010-02-03
JP2006228966A (ja) 2006-08-31

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