CN100420512C - 激发式气体分子放电灯的照射装置及其使用方法 - Google Patents

激发式气体分子放电灯的照射装置及其使用方法 Download PDF

Info

Publication number
CN100420512C
CN100420512C CNB2004800127242A CN200480012724A CN100420512C CN 100420512 C CN100420512 C CN 100420512C CN B2004800127242 A CNB2004800127242 A CN B2004800127242A CN 200480012724 A CN200480012724 A CN 200480012724A CN 100420512 C CN100420512 C CN 100420512C
Authority
CN
China
Prior art keywords
discharge lamp
gas molecular
excited
molecular discharge
irradiated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CNB2004800127242A
Other languages
English (en)
Chinese (zh)
Other versions
CN1787875A (zh
Inventor
细谷浩二
坂元弘实
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GS Yuasa International Ltd
Original Assignee
GS Yuasa Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GS Yuasa Corp filed Critical GS Yuasa Corp
Publication of CN1787875A publication Critical patent/CN1787875A/zh
Application granted granted Critical
Publication of CN100420512C publication Critical patent/CN100420512C/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/123—Ultraviolet light
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
CNB2004800127242A 2003-12-26 2004-12-24 激发式气体分子放电灯的照射装置及其使用方法 Expired - Lifetime CN100420512C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003435750A JP2005193088A (ja) 2003-12-26 2003-12-26 エキシマランプ照射装置
JP435750/2003 2003-12-26

Publications (2)

Publication Number Publication Date
CN1787875A CN1787875A (zh) 2006-06-14
CN100420512C true CN100420512C (zh) 2008-09-24

Family

ID=34746912

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2004800127242A Expired - Lifetime CN100420512C (zh) 2003-12-26 2004-12-24 激发式气体分子放电灯的照射装置及其使用方法

Country Status (5)

Country Link
JP (1) JP2005193088A (enExample)
KR (1) KR100641309B1 (enExample)
CN (1) CN100420512C (enExample)
TW (1) TWI259497B (enExample)
WO (1) WO2005065817A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4501830B2 (ja) 2005-09-28 2010-07-14 ウシオ電機株式会社 エキシマランプ及び紫外線照射装置
JP5146061B2 (ja) * 2008-04-10 2013-02-20 ウシオ電機株式会社 エキシマランプおよびこれを備えたランプユニット
JP5195111B2 (ja) * 2008-07-17 2013-05-08 ウシオ電機株式会社 エキシマランプ装置
TWI841791B (zh) * 2019-10-07 2024-05-11 日商牛尾電機股份有限公司 紫外線照射裝置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11295500A (ja) * 1998-04-09 1999-10-29 Ushio Inc 紫外線照射装置
JP2000216128A (ja) * 1999-01-26 2000-08-04 Hitachi Electronics Eng Co Ltd 紫外線照射による基板処理装置
CN1337922A (zh) * 1999-06-04 2002-02-27 亨利·科兹罗维斯基 流体的紫外线处理装置
JP2002168999A (ja) * 2000-11-30 2002-06-14 Ushio Inc 誘電体バリヤ放電ランプを使った光照射装置。
CN1357415A (zh) * 2000-10-31 2002-07-10 诺德森公司 紫外灯系统及方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001185089A (ja) * 1999-12-28 2001-07-06 Quark Systems Co Ltd エキシマ照射装置
JP2001217216A (ja) * 1999-11-25 2001-08-10 Hoya Schott Kk 紫外線照射方法及び装置
JP2001319510A (ja) * 2000-05-11 2001-11-16 Ushio Inc 誘電体バリア放電ランプ装置
JP4126892B2 (ja) * 2001-09-14 2008-07-30 ウシオ電機株式会社 光照射装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11295500A (ja) * 1998-04-09 1999-10-29 Ushio Inc 紫外線照射装置
JP2000216128A (ja) * 1999-01-26 2000-08-04 Hitachi Electronics Eng Co Ltd 紫外線照射による基板処理装置
CN1337922A (zh) * 1999-06-04 2002-02-27 亨利·科兹罗维斯基 流体的紫外线处理装置
CN1357415A (zh) * 2000-10-31 2002-07-10 诺德森公司 紫外灯系统及方法
JP2002168999A (ja) * 2000-11-30 2002-06-14 Ushio Inc 誘電体バリヤ放電ランプを使った光照射装置。

Also Published As

Publication number Publication date
JP2005193088A (ja) 2005-07-21
KR100641309B1 (ko) 2006-11-01
CN1787875A (zh) 2006-06-14
TWI259497B (en) 2006-08-01
KR20060038900A (ko) 2006-05-04
TW200522127A (en) 2005-07-01
WO2005065817A1 (ja) 2005-07-21

Similar Documents

Publication Publication Date Title
CN102218414B (zh) 光处理装置及光处理方法
CN105493235B (zh) 光照射装置
TWI583525B (zh) A template cleaning method, a pattern forming method, a light cleaning apparatus, and a nanoimprint apparatus
CN100420512C (zh) 激发式气体分子放电灯的照射装置及其使用方法
TW202420397A (zh) 紫外線照射裝置
JP5408499B2 (ja) 光照射装置
JP2004097986A (ja) 紫外線照射装置
JP5088595B2 (ja) 外部電極型放電灯及びこれを用いた紫外線照射装置
CN102671891B (zh) 光照射装置
CN113451107B (zh) 准分子灯、光照射装置
JP2000216128A (ja) 紫外線照射による基板処理装置
US20210245100A1 (en) Light transmissive material and lamp, and gas treatment device and gas treatment method
TW201300177A (zh) 紫外線照射裝置
RU206812U1 (ru) Эксилампа, возбуждаемая барьерным разрядом
JP2002239484A (ja) 誘電体バリア放電ランプを使った基板処理装置
JPH07288112A (ja) 誘電体バリヤ放電ランプ装置
TWI569300B (zh) Lighting device
CN112204704B (zh) 准分子灯
JP4666205B2 (ja) ゲートバルブおよびそれを備えた真空チャンバ
JP3533918B2 (ja) 光源装置
JP5987522B2 (ja) テンプレート洗浄用光照射装置、ナノインプリント装置、テンプレート洗浄方法およびパターン形成方法
US6787787B1 (en) Ultraviolet radiation producing apparatus
EP1158574B1 (en) Ultraviolet radiation producing apparatus
JP2014193450A (ja) 光照射装置
TWM615686U (zh) 光觸媒反應裝置及空氣淨化系統

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
ASS Succession or assignment of patent right

Owner name: GS YUASA CORPORATION

Free format text: FORMER OWNER: YUASA BATTERY CO LTD

Effective date: 20101112

C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20101112

Address after: Kyoto Prefecture

Patentee after: GS YUASA INTERNATIONAL Ltd.

Address before: Kyoto Japan

Patentee before: GS YUASA Corp.

CX01 Expiry of patent term
CX01 Expiry of patent term

Granted publication date: 20080924