CN100341901C - 聚合物合成和由聚合物制得的膜 - Google Patents

聚合物合成和由聚合物制得的膜 Download PDF

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Publication number
CN100341901C
CN100341901C CNB021190720A CN02119072A CN100341901C CN 100341901 C CN100341901 C CN 100341901C CN B021190720 A CNB021190720 A CN B021190720A CN 02119072 A CN02119072 A CN 02119072A CN 100341901 C CN100341901 C CN 100341901C
Authority
CN
China
Prior art keywords
ester
diacrylate
divinyl
monomers
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB021190720A
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English (en)
Chinese (zh)
Other versions
CN1384123A (zh
Inventor
R·H·戈尔
M·K·加拉格尔
Y·尤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronic Materials International LLC
Original Assignee
Shipley Co LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co LLC filed Critical Shipley Co LLC
Publication of CN1384123A publication Critical patent/CN1384123A/zh
Application granted granted Critical
Publication of CN100341901C publication Critical patent/CN100341901C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/04Polymerisation in solution
    • C08F2/06Organic solvent
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676Single layer compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
CNB021190720A 2001-03-26 2002-03-26 聚合物合成和由聚合物制得的膜 Expired - Fee Related CN100341901C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US27890401P 2001-03-26 2001-03-26
US60/278,904 2001-03-26

Publications (2)

Publication Number Publication Date
CN1384123A CN1384123A (zh) 2002-12-11
CN100341901C true CN100341901C (zh) 2007-10-10

Family

ID=23066886

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB021190720A Expired - Fee Related CN100341901C (zh) 2001-03-26 2002-03-26 聚合物合成和由聚合物制得的膜

Country Status (6)

Country Link
US (1) US6903175B2 (enExample)
EP (1) EP1245586A3 (enExample)
JP (1) JP2003048905A (enExample)
KR (1) KR20020076136A (enExample)
CN (1) CN100341901C (enExample)
TW (1) TW584639B (enExample)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100038121A1 (en) * 1999-08-27 2010-02-18 Lex Kosowsky Metal Deposition
US7825491B2 (en) * 2005-11-22 2010-11-02 Shocking Technologies, Inc. Light-emitting device using voltage switchable dielectric material
US20080035370A1 (en) * 1999-08-27 2008-02-14 Lex Kosowsky Device applications for voltage switchable dielectric material having conductive or semi-conductive organic material
US20100038119A1 (en) * 1999-08-27 2010-02-18 Lex Kosowsky Metal Deposition
WO2001017320A1 (en) 1999-08-27 2001-03-08 Lex Kosowsky Current carrying structure using voltage switchable dielectric material
US6998148B1 (en) * 2001-03-28 2006-02-14 Shipley Company, L.L.C. Porous materials
US6939922B2 (en) * 2001-03-30 2005-09-06 Rohm And Haas Company Coating and coating composition
US6780499B2 (en) * 2001-05-03 2004-08-24 International Business Machines Corporation Ordered two-phase dielectric film, and semiconductor device containing the same
US7635741B2 (en) 2002-02-15 2009-12-22 Dow Global Technologies Inc. Multifunctional monomers and their use in making cross-linked polymers and porous films
US20030162890A1 (en) * 2002-02-15 2003-08-28 Kalantar Thomas H. Nanoscale polymerized hydrocarbon particles and methods of making and using such particles
US7115321B2 (en) * 2002-07-26 2006-10-03 Kimberly-Clark Worldwide, Inc. Absorbent binder coating
US7205259B2 (en) * 2002-07-26 2007-04-17 Kimberly-Clark Worldwide, Inc. Absorbent binder desiccant composition and articles incorporating it
US7153754B2 (en) * 2002-08-29 2006-12-26 Micron Technology, Inc. Methods for forming porous insulators from “void” creating materials and structures and semiconductor devices including same
US6812132B2 (en) * 2003-03-21 2004-11-02 Intel Corporation Filling small dimension vias using supercritical carbon dioxide
JP3999746B2 (ja) 2003-05-19 2007-10-31 ローム アンド ハース カンパニー ポリマーナノ粒子の高固形分調製方法
US7626059B2 (en) 2003-10-21 2009-12-01 Dow Global Technologies Inc. Multifunctional ethynyl substituted monomers and polyarylene compositions therefrom
JP4885724B2 (ja) 2003-10-21 2012-02-29 ダウ グローバル テクノロジーズ エルエルシー 結合メソゲン性ポラゲン形成性部分を含有する多官能性モノマー及びそれからのポリアリーレン組成物
KR100597418B1 (ko) * 2004-07-19 2006-07-05 주식회사 성림화학 고분자 중합체 제조용 용매 및 이를 이용한 고분자 중합방법
KR100662176B1 (ko) 2004-12-30 2006-12-27 제일모직주식회사 이방성 도전 필름용 조성물
EP2404940B1 (en) * 2005-08-03 2014-12-24 The Inctec Inc. Method for producing polymer composition and polymer composition
TWI328622B (en) * 2005-09-30 2010-08-11 Rohm & Haas Elect Mat Leveler compounds
US20070106050A1 (en) * 2005-11-08 2007-05-10 Sokolowski Alex D Crosslinked poly(arylene ether) composition, method, and article
US7923844B2 (en) * 2005-11-22 2011-04-12 Shocking Technologies, Inc. Semiconductor devices including voltage switchable materials for over-voltage protection
US20100263200A1 (en) * 2005-11-22 2010-10-21 Lex Kosowsky Wireless communication device using voltage switchable dielectric material
US7619131B2 (en) * 2005-12-02 2009-11-17 Kimberly-Clark Worldwide, Inc. Articles comprising transparent/translucent polymer composition
US7981325B2 (en) * 2006-07-29 2011-07-19 Shocking Technologies, Inc. Electronic device for voltage switchable dielectric material having high aspect ratio particles
US20080029405A1 (en) * 2006-07-29 2008-02-07 Lex Kosowsky Voltage switchable dielectric material having conductive or semi-conductive organic material
US20080032049A1 (en) * 2006-07-29 2008-02-07 Lex Kosowsky Voltage switchable dielectric material having high aspect ratio particles
JP2010504437A (ja) * 2006-09-24 2010-02-12 ショッキング テクノロジーズ インコーポレイテッド 電圧で切替可能な誘電体材料および光補助を用いた基板デバイスをメッキする技法
EP2084748A4 (en) 2006-09-24 2011-09-28 Shocking Technologies Inc VOLTAGE GRADUATED RESPONSE VOLTAGE-SWITCHABLE DIELECTRIC MATERIAL, AND METHOD FOR MANUFACTURING THE SAME
US7793236B2 (en) * 2007-06-13 2010-09-07 Shocking Technologies, Inc. System and method for including protective voltage switchable dielectric material in the design or simulation of substrate devices
US20090050856A1 (en) * 2007-08-20 2009-02-26 Lex Kosowsky Voltage switchable dielectric material incorporating modified high aspect ratio particles
US8206614B2 (en) * 2008-01-18 2012-06-26 Shocking Technologies, Inc. Voltage switchable dielectric material having bonded particle constituents
US20090220771A1 (en) * 2008-02-12 2009-09-03 Robert Fleming Voltage switchable dielectric material with superior physical properties for structural applications
US8203421B2 (en) * 2008-04-14 2012-06-19 Shocking Technologies, Inc. Substrate device or package using embedded layer of voltage switchable dielectric material in a vertical switching configuration
US20100047535A1 (en) * 2008-08-22 2010-02-25 Lex Kosowsky Core layer structure having voltage switchable dielectric material
US20100065785A1 (en) * 2008-09-17 2010-03-18 Lex Kosowsky Voltage switchable dielectric material containing boron compound
JP2012504870A (ja) 2008-09-30 2012-02-23 ショッキング テクノロジーズ インコーポレイテッド 導電コアシェル粒子を含有する電圧で切替可能な誘電体材料
US9208931B2 (en) 2008-09-30 2015-12-08 Littelfuse, Inc. Voltage switchable dielectric material containing conductor-on-conductor core shelled particles
US8362871B2 (en) * 2008-11-05 2013-01-29 Shocking Technologies, Inc. Geometric and electric field considerations for including transient protective material in substrate devices
US20100148129A1 (en) * 2008-12-15 2010-06-17 Lex Kosowsky Voltage Switchable Dielectric Material Containing Insulative and/or Low-Dielectric Core Shell Particles
US20100159259A1 (en) * 2008-12-19 2010-06-24 Lex Kosowsky Voltage switchable dielectric material incorporating p and n type material
KR20110112843A (ko) * 2009-01-23 2011-10-13 쇼킹 테크놀로지스 인코포레이티드 유전체 조성물
US9226391B2 (en) 2009-01-27 2015-12-29 Littelfuse, Inc. Substrates having voltage switchable dielectric materials
US8399773B2 (en) * 2009-01-27 2013-03-19 Shocking Technologies, Inc. Substrates having voltage switchable dielectric materials
US8272123B2 (en) 2009-01-27 2012-09-25 Shocking Technologies, Inc. Substrates having voltage switchable dielectric materials
KR101679099B1 (ko) * 2009-03-26 2016-11-23 쇼킹 테크놀로지스 인코포레이티드 전압 스위칭형 유전 물질을 갖는 소자
US9053844B2 (en) * 2009-09-09 2015-06-09 Littelfuse, Inc. Geometric configuration or alignment of protective material in a gap structure for electrical devices
JP5882583B2 (ja) * 2010-02-04 2016-03-09 東京応化工業株式会社 エアギャップ形成用シリカ系被膜形成材料及びエアギャップ形成方法
US9320135B2 (en) 2010-02-26 2016-04-19 Littelfuse, Inc. Electric discharge protection for surface mounted and embedded components
US9082622B2 (en) 2010-02-26 2015-07-14 Littelfuse, Inc. Circuit elements comprising ferroic materials
US9224728B2 (en) 2010-02-26 2015-12-29 Littelfuse, Inc. Embedded protection against spurious electrical events
US10093752B2 (en) * 2013-06-13 2018-10-09 Gwangju Institute Of Science And Technology Homopolymer nanoparticles by self-emulsion polymerization reaction and preparation method thereof
JP6146512B2 (ja) * 2016-05-10 2017-06-14 三菱ケミカル株式会社 半導体リソグラフィー用重合体およびその製造方法
CN110117417B (zh) * 2018-02-07 2021-03-26 比亚迪股份有限公司 聚合物电解质膜及其制备方法和锂离子电池

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4988568A (en) * 1988-03-30 1991-01-29 Nippon Zeon Co., Ltd. Hydrophilic fine gel particles and process for production thereof
US5837790A (en) * 1994-10-24 1998-11-17 Amcol International Corporation Precipitation polymerization process for producing an oil adsorbent polymer capable of entrapping solid particles and liquids and the product thereof
US5863996A (en) * 1980-12-30 1999-01-26 National Research Development Corporation Solution polymerization to form sol of crosslinked particles
EP1035183A1 (en) * 1998-09-25 2000-09-13 Catalysts & Chemicals Industries Co., Ltd. Coating fluid for forming low-permittivity silica-based coating film and substrate with low-permittivity coating film

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4533681A (en) * 1983-02-23 1985-08-06 Ford Motor Company Crosslinked flow control additives for high solids paints I
JPH0618802B2 (ja) * 1986-04-22 1994-03-16 関西ペイント株式会社 高屈折率重合体微粒子の分散液の製造方法
JP2790021B2 (ja) * 1993-09-30 1998-08-27 日本油脂株式会社 塗料組成物
NO310360B1 (no) * 1997-01-20 2001-06-25 Polymers Holding As Fremgangsmate for fremstilling av selvaktiverte polymerpartikler med en smal storrelsesfordeling
DE19903391A1 (de) * 1999-01-29 2000-08-03 Bayer Ag Wäßriges Überzugsmittel, Verfahren zu seiner Herstellung und seine Verwendung
US6420441B1 (en) * 1999-10-01 2002-07-16 Shipley Company, L.L.C. Porous materials
US6271273B1 (en) * 2000-07-14 2001-08-07 Shipley Company, L.L.C. Porous materials
AU2001292783A1 (en) * 2000-09-19 2002-04-02 Shipley Company, L.L.C. Antireflective composition
TW588072B (en) * 2000-10-10 2004-05-21 Shipley Co Llc Antireflective porogens

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5863996A (en) * 1980-12-30 1999-01-26 National Research Development Corporation Solution polymerization to form sol of crosslinked particles
US4988568A (en) * 1988-03-30 1991-01-29 Nippon Zeon Co., Ltd. Hydrophilic fine gel particles and process for production thereof
US5837790A (en) * 1994-10-24 1998-11-17 Amcol International Corporation Precipitation polymerization process for producing an oil adsorbent polymer capable of entrapping solid particles and liquids and the product thereof
EP1035183A1 (en) * 1998-09-25 2000-09-13 Catalysts & Chemicals Industries Co., Ltd. Coating fluid for forming low-permittivity silica-based coating film and substrate with low-permittivity coating film

Also Published As

Publication number Publication date
EP1245586A3 (en) 2002-10-16
KR20020076136A (ko) 2002-10-09
JP2003048905A (ja) 2003-02-21
TW584639B (en) 2004-04-21
CN1384123A (zh) 2002-12-11
EP1245586A2 (en) 2002-10-02
US20030008989A1 (en) 2003-01-09
US6903175B2 (en) 2005-06-07

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Granted publication date: 20071010