CH623555A5 - Abrasive particles, and process for the production of such particles - Google Patents
Abrasive particles, and process for the production of such particles Download PDFInfo
- Publication number
- CH623555A5 CH623555A5 CH955976A CH955976A CH623555A5 CH 623555 A5 CH623555 A5 CH 623555A5 CH 955976 A CH955976 A CH 955976A CH 955976 A CH955976 A CH 955976A CH 623555 A5 CH623555 A5 CH 623555A5
- Authority
- CH
- Switzerland
- Prior art keywords
- metal
- particles
- substrate
- compound
- coating
- Prior art date
Links
- 239000002245 particle Substances 0.000 title claims description 218
- 238000000034 method Methods 0.000 title claims description 27
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 239000000758 substrate Substances 0.000 claims description 94
- 238000000576 coating method Methods 0.000 claims description 93
- 239000010432 diamond Substances 0.000 claims description 90
- 229910052751 metal Inorganic materials 0.000 claims description 84
- 239000002184 metal Substances 0.000 claims description 84
- 229910003460 diamond Inorganic materials 0.000 claims description 81
- 239000011248 coating agent Substances 0.000 claims description 75
- 238000000227 grinding Methods 0.000 claims description 73
- 150000002736 metal compounds Chemical class 0.000 claims description 43
- 239000000463 material Substances 0.000 claims description 40
- 150000001875 compounds Chemical class 0.000 claims description 36
- 239000010410 layer Substances 0.000 claims description 29
- 238000010304 firing Methods 0.000 claims description 28
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 claims description 24
- ITRNXVSDJBHYNJ-UHFFFAOYSA-N tungsten disulfide Chemical compound S=[W]=S ITRNXVSDJBHYNJ-UHFFFAOYSA-N 0.000 claims description 21
- 239000002344 surface layer Substances 0.000 claims description 17
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 17
- 229910052721 tungsten Inorganic materials 0.000 claims description 17
- 239000010937 tungsten Substances 0.000 claims description 17
- -1 niobsulfide Chemical compound 0.000 claims description 13
- 150000004767 nitrides Chemical class 0.000 claims description 10
- 229920001971 elastomer Polymers 0.000 claims description 8
- 239000011817 metal compound particle Substances 0.000 claims description 8
- 239000005060 rubber Substances 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 7
- 229910052582 BN Inorganic materials 0.000 claims description 6
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 6
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 6
- 239000004033 plastic Substances 0.000 claims description 6
- 229920003023 plastic Polymers 0.000 claims description 6
- 150000002739 metals Chemical class 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 239000011733 molybdenum Substances 0.000 claims description 4
- 230000000149 penetrating effect Effects 0.000 claims description 4
- 238000000354 decomposition reaction Methods 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- WVMYSOZCZHQCSG-UHFFFAOYSA-N bis(sulfanylidene)zirconium Chemical compound S=[Zr]=S WVMYSOZCZHQCSG-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 claims description 2
- 229910044991 metal oxide Inorganic materials 0.000 claims description 2
- 150000004706 metal oxides Chemical class 0.000 claims description 2
- 230000007935 neutral effect Effects 0.000 claims description 2
- FAWYJKSBSAKOFP-UHFFFAOYSA-N tantalum(iv) sulfide Chemical compound S=[Ta]=S FAWYJKSBSAKOFP-UHFFFAOYSA-N 0.000 claims description 2
- 229910021555 Chromium Chloride Inorganic materials 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 1
- 229910052758 niobium Inorganic materials 0.000 claims 1
- 239000010955 niobium Substances 0.000 claims 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims 1
- RCYJPSGNXVLIBO-UHFFFAOYSA-N sulfanylidenetitanium Chemical compound [S].[Ti] RCYJPSGNXVLIBO-UHFFFAOYSA-N 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
- 239000002923 metal particle Substances 0.000 description 18
- 239000001257 hydrogen Substances 0.000 description 9
- 229910052739 hydrogen Inorganic materials 0.000 description 9
- 239000000843 powder Substances 0.000 description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 7
- 239000004698 Polyethylene Substances 0.000 description 7
- 229920000573 polyethylene Polymers 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 230000001464 adherent effect Effects 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 6
- 238000001000 micrograph Methods 0.000 description 6
- 229910003178 Mo2C Inorganic materials 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 238000003801 milling Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000006061 abrasive grain Substances 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229910001312 Amalgam (dentistry) Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 239000000448 dental amalgam Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- 238000000386 microscopy Methods 0.000 description 2
- 229920003052 natural elastomer Polymers 0.000 description 2
- 229920001194 natural rubber Polymers 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 229920003051 synthetic elastomer Polymers 0.000 description 2
- 239000005061 synthetic rubber Substances 0.000 description 2
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 2
- QIJNJJZPYXGIQM-UHFFFAOYSA-N 1lambda4,2lambda4-dimolybdacyclopropa-1,2,3-triene Chemical compound [Mo]=C=[Mo] QIJNJJZPYXGIQM-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 244000043261 Hevea brasiliensis Species 0.000 description 1
- 229910039444 MoC Inorganic materials 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000003708 ampul Substances 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000009969 flowable effect Effects 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 238000005087 graphitization Methods 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000004452 microanalysis Methods 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- CFJRPNFOLVDFMJ-UHFFFAOYSA-N titanium disulfide Chemical compound S=[Ti]=S CFJRPNFOLVDFMJ-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
- C23C24/045—Impact or kinetic deposition of particles by trembling using impacting inert media
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Composite Materials (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Laminated Bodies (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/599,942 US4011064A (en) | 1975-07-28 | 1975-07-28 | Modifying the surface of cubic boron nitride particles |
| US05/599,941 US4063907A (en) | 1975-07-28 | 1975-07-28 | Modifying the surface of diamond particles |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH623555A5 true CH623555A5 (en) | 1981-06-15 |
Family
ID=27083486
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH955976A CH623555A5 (en) | 1975-07-28 | 1976-07-27 | Abrasive particles, and process for the production of such particles |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS5853988B2 (enrdf_load_stackoverflow) |
| CH (1) | CH623555A5 (enrdf_load_stackoverflow) |
| DE (1) | DE2632865A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2319462A1 (enrdf_load_stackoverflow) |
| IE (1) | IE42894B1 (enrdf_load_stackoverflow) |
| IT (1) | IT1062482B (enrdf_load_stackoverflow) |
| SE (1) | SE431535B (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4505720A (en) * | 1983-06-29 | 1985-03-19 | Minnesota Mining And Manufacturing Company | Granular silicon carbide abrasive grain coated with refractory material, method of making the same and articles made therewith |
| DE3836587A1 (de) * | 1988-10-27 | 1990-05-03 | Winter & Sohn Ernst | Innenlochsaege |
| US5024680A (en) * | 1988-11-07 | 1991-06-18 | Norton Company | Multiple metal coated superabrasive grit and methods for their manufacture |
| JP2735685B2 (ja) * | 1990-11-16 | 1998-04-02 | ノートン カンパニー | 被覆された超研摩材砥粒及びこれを含んでなる工具 |
| US6099798A (en) | 1997-10-31 | 2000-08-08 | Nanogram Corp. | Ultraviolet light block and photocatalytic materials |
| RU2428299C1 (ru) * | 2010-02-24 | 2011-09-10 | Игорь Игоревич Лопатин | Абразивный материал |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1228766A (fr) * | 1958-07-03 | 1960-09-02 | Maschf Augsburg Nuernberg Ag | Procédé et dispositif pour l'application d'un film de disulfure de molybdène sur des outils de coupe |
| US3650714A (en) * | 1969-03-04 | 1972-03-21 | Permattach Diamond Tool Corp | A method of coating diamond particles with metal |
| US3663191A (en) * | 1970-07-23 | 1972-05-16 | Dentsply Int Inc | Diamond tool and method of making the same |
| FR2169577A5 (en) * | 1972-01-24 | 1973-09-07 | Christensen Diamond Prod Co | Abrasive particles for grinding tools - encapsulated in metal |
| GB1388172A (en) * | 1972-03-22 | 1975-03-26 | De Beers Ind Diamond | Metal coating of diamonds |
| JPS4910968A (enrdf_load_stackoverflow) * | 1972-05-29 | 1974-01-30 | ||
| JPS5519961B2 (enrdf_load_stackoverflow) * | 1973-04-02 | 1980-05-30 | ||
| JPS5166592A (en) * | 1974-12-05 | 1976-06-09 | Toyoda Machine Works Ltd | Rejinoidotoishino seizohoho |
-
1976
- 1976-07-05 IE IE1477/74A patent/IE42894B1/en unknown
- 1976-07-15 IT IT25343/76A patent/IT1062482B/it active
- 1976-07-21 DE DE19762632865 patent/DE2632865A1/de active Granted
- 1976-07-27 CH CH955976A patent/CH623555A5/de not_active IP Right Cessation
- 1976-07-27 FR FR7622805A patent/FR2319462A1/fr active Granted
- 1976-07-28 JP JP51089254A patent/JPS5853988B2/ja not_active Expired
- 1976-07-28 SE SE7608534A patent/SE431535B/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| DE2632865C2 (enrdf_load_stackoverflow) | 1988-01-14 |
| IT1062482B (it) | 1984-10-10 |
| SE7608534L (sv) | 1977-01-29 |
| FR2319462B1 (enrdf_load_stackoverflow) | 1980-05-30 |
| JPS5853988B2 (ja) | 1983-12-02 |
| JPS5222190A (en) | 1977-02-19 |
| IE42894B1 (en) | 1980-11-05 |
| DE2632865A1 (de) | 1977-02-10 |
| SE431535B (sv) | 1984-02-13 |
| IE42894L (en) | 1977-01-28 |
| FR2319462A1 (fr) | 1977-02-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased | ||
| PL | Patent ceased |