CH553258A - Vorrichtung zum vakuumaufdampfen. - Google Patents

Vorrichtung zum vakuumaufdampfen.

Info

Publication number
CH553258A
CH553258A CH900970A CH900970A CH553258A CH 553258 A CH553258 A CH 553258A CH 900970 A CH900970 A CH 900970A CH 900970 A CH900970 A CH 900970A CH 553258 A CH553258 A CH 553258A
Authority
CH
Switzerland
Prior art keywords
vacuum evaporation
evaporation
vacuum
Prior art date
Application number
CH900970A
Other languages
English (en)
Original Assignee
Aga Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aga Ab filed Critical Aga Ab
Publication of CH553258A publication Critical patent/CH553258A/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CH900970A 1969-06-13 1970-06-15 Vorrichtung zum vakuumaufdampfen. CH553258A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE8403/69A SE345881B (de) 1969-06-13 1969-06-13

Publications (1)

Publication Number Publication Date
CH553258A true CH553258A (de) 1974-08-30

Family

ID=20273979

Family Applications (1)

Application Number Title Priority Date Filing Date
CH900970A CH553258A (de) 1969-06-13 1970-06-15 Vorrichtung zum vakuumaufdampfen.

Country Status (7)

Country Link
US (1) US3695217A (de)
JP (1) JPS4947631B1 (de)
CH (1) CH553258A (de)
DE (1) DE2029014C3 (de)
FR (1) FR2052572A5 (de)
GB (1) GB1318046A (de)
SE (1) SE345881B (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0124829A1 (de) * 1983-05-06 1984-11-14 Dr. Johannes Heidenhain GmbH Verdampfervorrichtung mit Strahlheizung zum Aufdampfen mehrerer Materialien
DE102012207159A1 (de) * 2012-04-30 2013-10-31 Von Ardenne Anlagentechnik Gmbh Vorrichtung zum Beschichten von Substraten

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3996469A (en) * 1975-01-06 1976-12-07 Jersey Nuclear-Avco Isotopes, Inc. Floating convection barrier for evaporation source
US4048462A (en) * 1975-01-17 1977-09-13 Airco, Inc. Compact rotary evaporation source
US4091257A (en) * 1975-02-24 1978-05-23 General Electric Company Deep diode devices and method and apparatus
JP2913745B2 (ja) * 1990-04-10 1999-06-28 松下電器産業株式会社 真空蒸着装置
JP2003113466A (ja) * 2001-07-31 2003-04-18 Fuji Photo Film Co Ltd 真空蒸着装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0124829A1 (de) * 1983-05-06 1984-11-14 Dr. Johannes Heidenhain GmbH Verdampfervorrichtung mit Strahlheizung zum Aufdampfen mehrerer Materialien
DE102012207159A1 (de) * 2012-04-30 2013-10-31 Von Ardenne Anlagentechnik Gmbh Vorrichtung zum Beschichten von Substraten

Also Published As

Publication number Publication date
DE2029014C3 (de) 1979-10-04
US3695217A (en) 1972-10-03
DE2029014B2 (de) 1972-12-07
DE2029014A1 (de) 1971-01-07
GB1318046A (en) 1973-05-23
JPS4947631B1 (de) 1974-12-17
FR2052572A5 (de) 1971-04-09
SE345881B (de) 1972-06-12

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Legal Events

Date Code Title Description
PL Patent ceased