US3695217A - Vapor deposition apparatus - Google Patents

Vapor deposition apparatus Download PDF

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Publication number
US3695217A
US3695217A US45496A US3695217DA US3695217A US 3695217 A US3695217 A US 3695217A US 45496 A US45496 A US 45496A US 3695217D A US3695217D A US 3695217DA US 3695217 A US3695217 A US 3695217A
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US
United States
Prior art keywords
disc
heat
pockets
evaporated
substances
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US45496A
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English (en)
Inventor
Jan Roland Jacobsson
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AGA AB
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AGA AB
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Filing date
Publication date
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Publication of US3695217A publication Critical patent/US3695217A/en
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Definitions

  • the disc has a thermal inertia such that sufficlent heat is retained at all pockets, whlch have passed 3,271,561 9/1966 Fledler et al ..2l9/27l out of the immediate influence f said heat means, 3,485,997 12/ 1969 Rhemherger ..1 17/933 X whereby to effect a simultaneous evaporation from all 2,482,329 9/ l 949 Dimmick ..1 18/49 pockets 2,745,773 5/1956 Weimer ..118/49 X 3,227,133 l/ 1966 Anderson et al. ..l 18/49.l 4 Claims, 3 Drawing Figures PATENTEDnm 3 m2 Fig.
  • This invention relates to an apparatus for coating of surfaces of substrates with one or more substances by means of evaporation in a vacuum.
  • the apparatus includes a vacuum chamber, a source for evaporation of the substances, means for heating these substances and holders for the substrates.
  • Previously known devices for this purpose usually have been constructed with an evaporation source of geometrical extension, which has been small compared to the substrates to be coated.
  • the present invention concerns an apparatus for surface coating of a substrate by means of vacuum evaporation of one or several substances, including a vacuum chamber, a source for evaporating the substances in the form of disc which is rotatable around an axis through its center, and means which are arranged to heat at each moment a smaller part of the surface of the substances to be evaporated.
  • the source for the substances to be evaporated has such a thermal inertia that a ring-shaped part of the source as a whole serves as evaporation source by being successively heated along its circumference and that the substrates to be coated are arranged above the ring-shaped source.
  • FIG. 1 shows one possible form of the invention and FIGS. 2 and 3 show other forms of the sources for evaporating the substances in vacuum.
  • the device shown in FIG. ll includes a vacuum chamber in the form of a bell jar l resting on a base plate 3 and a vacuum seal 2.
  • the vacuum chamber is connected to a well known vacuum pump system 5 by means of a tube 4.
  • a holder 7 for a substrate 8 Inside the chamber and held by a stand 6 is a holder 7 for a substrate 8, a surface of which substrate is to be coated.
  • An electric motor 9 rests on base plate 3.
  • a shaft of the motor carries the disc 10.
  • the ring shaped circumferential groove ill in disc 10 serves as a crucible for the substances to be evaporated.
  • These substances can consist of a homogeneous mixture of different substances or grooves 11 can be divided into a number of sectors along the circumference, each of which contains one particular substance.
  • Heating of the substances can be achieved by means of electrons which are brought against the surface.
  • the elctron source can consist of a thermal cathode 12 held by a suitable holder.
  • the holder with the thermal cathode can be placed below disc 10.
  • the electrons are accelerated, deflected and focused on part of groove 11 with the substances to be evaporated.
  • disc 10 with crucible 11 rotates relative to the heating element, all parts of the crucible 11 containing the substances to be evaporated will be successively'heated.
  • crucible 11 will be very uniformly heated and as a result the vapor distribution from the circumferential groove will also be uniform and reproducible.
  • the film thickness on subject 8 will therefore be uniform.
  • crucible 11 contains several different substances the proportions of these substances may be changed by making them occupy sectors of different lengths along the circumference.
  • FIG. 2 shows a disc 10 with specially shaped containers for the substances to be evaporated.
  • the groove ill has a larger radial extension which is bounded in this case by two concentric circles 14 and 15.
  • the device for heating the substances is designed to concentrate heat at a part of the groove 11 at a certain distance from the center of the disc.
  • the device is made with boundaries 17 between the different substances.
  • the boundaries 17 may be constituted by for instance by watercooled metal walls or they may be obtained by shaping the different substances in a form indicated by sectors shown in FIG. 2. In FIG. 2 the boundaries are shown as parts of circles, but also other forms are possible. The boundaries are designed so that within ring shaped areas within groove 11' at different distances from the center of the disc different proportions of the different substances to be evaporated are obtained.
  • the ratio between these substances is approximately equal whereas within the ringshaped areas at greater or smaller distances from the center, greater or smaller proportions of the one or the other substance will be evaporated.
  • the deflection of the electron beam can be controlled by many well known methods and directed in such away that the diameter of the heated ring shaped area can be controlled. In this way the proportions of the evaporated substances can be varied during evaporation.
  • disc 10 instead of being provided with grooves containing the substances may itself consist of such substances for instance glass or quarts. Also other means for heating may be used such as laser beams or thermal radiation conveniently concentrated by means of a reflector.
  • An apparatus for coating by vapor deposition comprising a vacuum chamber;
  • said disc including a plurality of pockets about the periphery thereof whereby to support a plurality of different materials to be evaporated;
  • said disc having a thermal inertia such that it maintains sufficient heat to simultaneously evaporate said plurality of different materials including the material in each of said pockets which are out of the immediate influence of said means to heat; and substrate support means disposed above and on a common axis with said disc whereby to effect said vapor deposition.
  • thermoelectric means comprises an electron beam source, and magnetic and electrostatic means for deflecting and directing the electrons towards the surface of the source substance to be evaporated.
  • An apparatus including at least two of said means to heat said two means being placed at different positions along the circumference of the disc.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Toxicology (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
US45496A 1969-06-13 1970-06-11 Vapor deposition apparatus Expired - Lifetime US3695217A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE8403/69A SE345881B (de) 1969-06-13 1969-06-13

Publications (1)

Publication Number Publication Date
US3695217A true US3695217A (en) 1972-10-03

Family

ID=20273979

Family Applications (1)

Application Number Title Priority Date Filing Date
US45496A Expired - Lifetime US3695217A (en) 1969-06-13 1970-06-11 Vapor deposition apparatus

Country Status (7)

Country Link
US (1) US3695217A (de)
JP (1) JPS4947631B1 (de)
CH (1) CH553258A (de)
DE (1) DE2029014C3 (de)
FR (1) FR2052572A5 (de)
GB (1) GB1318046A (de)
SE (1) SE345881B (de)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3996469A (en) * 1975-01-06 1976-12-07 Jersey Nuclear-Avco Isotopes, Inc. Floating convection barrier for evaporation source
US4048462A (en) * 1975-01-17 1977-09-13 Airco, Inc. Compact rotary evaporation source
US4091257A (en) * 1975-02-24 1978-05-23 General Electric Company Deep diode devices and method and apparatus
US4632059A (en) * 1983-05-06 1986-12-30 Dr. Johannes Heidenhain Gmbh Evaporator device for the evaporation of several materials
US5190590A (en) * 1990-04-10 1993-03-02 Matsushita Electric Industrial Co., Ltd. Vacuum coating apparatus
US20030024479A1 (en) * 2001-07-31 2003-02-06 Fuji Photo Film Co., Ltd. Vacuum deposition apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012207159A1 (de) * 2012-04-30 2013-10-31 Von Ardenne Anlagentechnik Gmbh Vorrichtung zum Beschichten von Substraten

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3996469A (en) * 1975-01-06 1976-12-07 Jersey Nuclear-Avco Isotopes, Inc. Floating convection barrier for evaporation source
US4048462A (en) * 1975-01-17 1977-09-13 Airco, Inc. Compact rotary evaporation source
US4091257A (en) * 1975-02-24 1978-05-23 General Electric Company Deep diode devices and method and apparatus
US4632059A (en) * 1983-05-06 1986-12-30 Dr. Johannes Heidenhain Gmbh Evaporator device for the evaporation of several materials
US5190590A (en) * 1990-04-10 1993-03-02 Matsushita Electric Industrial Co., Ltd. Vacuum coating apparatus
US20030024479A1 (en) * 2001-07-31 2003-02-06 Fuji Photo Film Co., Ltd. Vacuum deposition apparatus

Also Published As

Publication number Publication date
FR2052572A5 (de) 1971-04-09
DE2029014B2 (de) 1972-12-07
CH553258A (de) 1974-08-30
JPS4947631B1 (de) 1974-12-17
DE2029014C3 (de) 1979-10-04
GB1318046A (en) 1973-05-23
DE2029014A1 (de) 1971-01-07
SE345881B (de) 1972-06-12

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