JPS4947631B1 - - Google Patents

Info

Publication number
JPS4947631B1
JPS4947631B1 JP45051456A JP5145670A JPS4947631B1 JP S4947631 B1 JPS4947631 B1 JP S4947631B1 JP 45051456 A JP45051456 A JP 45051456A JP 5145670 A JP5145670 A JP 5145670A JP S4947631 B1 JPS4947631 B1 JP S4947631B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP45051456A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4947631B1 publication Critical patent/JPS4947631B1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP45051456A 1969-06-13 1970-06-13 Pending JPS4947631B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE8403/69A SE345881B (de) 1969-06-13 1969-06-13

Publications (1)

Publication Number Publication Date
JPS4947631B1 true JPS4947631B1 (de) 1974-12-17

Family

ID=20273979

Family Applications (1)

Application Number Title Priority Date Filing Date
JP45051456A Pending JPS4947631B1 (de) 1969-06-13 1970-06-13

Country Status (7)

Country Link
US (1) US3695217A (de)
JP (1) JPS4947631B1 (de)
CH (1) CH553258A (de)
DE (1) DE2029014C3 (de)
FR (1) FR2052572A5 (de)
GB (1) GB1318046A (de)
SE (1) SE345881B (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3996469A (en) * 1975-01-06 1976-12-07 Jersey Nuclear-Avco Isotopes, Inc. Floating convection barrier for evaporation source
US4048462A (en) * 1975-01-17 1977-09-13 Airco, Inc. Compact rotary evaporation source
US4091257A (en) * 1975-02-24 1978-05-23 General Electric Company Deep diode devices and method and apparatus
DE3316554C1 (de) * 1983-05-06 1984-07-12 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Verdampfervorrichtung mit Strahlheizung zum Aufdampfen mehrerer Materialien
JP2913745B2 (ja) * 1990-04-10 1999-06-28 松下電器産業株式会社 真空蒸着装置
JP2003113466A (ja) * 2001-07-31 2003-04-18 Fuji Photo Film Co Ltd 真空蒸着装置
DE102012207159A1 (de) * 2012-04-30 2013-10-31 Von Ardenne Anlagentechnik Gmbh Vorrichtung zum Beschichten von Substraten

Also Published As

Publication number Publication date
DE2029014C3 (de) 1979-10-04
US3695217A (en) 1972-10-03
CH553258A (de) 1974-08-30
DE2029014B2 (de) 1972-12-07
DE2029014A1 (de) 1971-01-07
GB1318046A (en) 1973-05-23
FR2052572A5 (de) 1971-04-09
SE345881B (de) 1972-06-12

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