CA2379077A1 - Filtre optique interferentiel a bande etroite - Google Patents
Filtre optique interferentiel a bande etroite Download PDFInfo
- Publication number
- CA2379077A1 CA2379077A1 CA002379077A CA2379077A CA2379077A1 CA 2379077 A1 CA2379077 A1 CA 2379077A1 CA 002379077 A CA002379077 A CA 002379077A CA 2379077 A CA2379077 A CA 2379077A CA 2379077 A1 CA2379077 A1 CA 2379077A1
- Authority
- CA
- Canada
- Prior art keywords
- layer
- layers
- lambda
- thickness
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 27
- 239000010410 layer Substances 0.000 claims description 99
- 238000000034 method Methods 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 5
- 239000002356 single layer Substances 0.000 claims description 4
- 230000003247 decreasing effect Effects 0.000 claims description 2
- 230000005540 biological transmission Effects 0.000 description 17
- 239000000463 material Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 125000006850 spacer group Chemical group 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- -1 Ta 20 5 Inorganic materials 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
- G02B5/288—Interference filters comprising deposited thin solid films comprising at least one thin film resonant cavity, e.g. in bandpass filters
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Optical Filters (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19932082.9 | 1999-07-12 | ||
| DE1999132082 DE19932082A1 (de) | 1999-07-12 | 1999-07-12 | Interferenzoptisches Schmalbandfilter |
| PCT/EP2000/006518 WO2001004668A1 (fr) | 1999-07-12 | 2000-07-10 | Filtre optique interferentiel a bande etroite |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2379077A1 true CA2379077A1 (fr) | 2001-01-18 |
Family
ID=7914238
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002379077A Abandoned CA2379077A1 (fr) | 1999-07-12 | 2000-07-10 | Filtre optique interferentiel a bande etroite |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP1194799A1 (fr) |
| CN (1) | CN1360681A (fr) |
| AU (2) | AU5826800A (fr) |
| CA (1) | CA2379077A1 (fr) |
| DE (1) | DE19932082A1 (fr) |
| TW (1) | TW452666B (fr) |
| WO (2) | WO2001004668A1 (fr) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10143145C1 (de) * | 2001-09-03 | 2002-10-31 | Fraunhofer Ges Forschung | Verfahren und Einrichtung zur Herstellung von Schichtsystemen für optische Präzisionselemente |
| US20080037127A1 (en) * | 2006-03-31 | 2008-02-14 | 3M Innovative Properties Company | Wide angle mirror system |
| DK2251453T3 (da) | 2009-05-13 | 2014-07-07 | Sio2 Medical Products Inc | Beholderholder |
| US9545360B2 (en) | 2009-05-13 | 2017-01-17 | Sio2 Medical Products, Inc. | Saccharide protective coating for pharmaceutical package |
| US9458536B2 (en) | 2009-07-02 | 2016-10-04 | Sio2 Medical Products, Inc. | PECVD coating methods for capped syringes, cartridges and other articles |
| US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
| US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
| US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
| US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
| CN103930595A (zh) | 2011-11-11 | 2014-07-16 | Sio2医药产品公司 | 用于药物包装的钝化、pH保护性或润滑性涂层、涂布方法以及设备 |
| CN102759768B (zh) * | 2012-07-31 | 2014-12-31 | 杭州科汀光学技术有限公司 | 一种光学滤波器 |
| CA2890066C (fr) | 2012-11-01 | 2021-11-09 | Sio2 Medical Products, Inc. | Procedes d'inspection de revetement |
| EP2920567B1 (fr) | 2012-11-16 | 2020-08-19 | SiO2 Medical Products, Inc. | Procédé et appareil pour détecter des caractéristiques d'intégrité de revêtement de barrière rapide |
| JP6382830B2 (ja) | 2012-11-30 | 2018-08-29 | エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド | 医療シリンジ、カートリッジ等上でのｐｅｃｖｄ堆積の均一性制御 |
| US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
| US9662450B2 (en) | 2013-03-01 | 2017-05-30 | Sio2 Medical Products, Inc. | Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus |
| US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
| CN110074968B (zh) | 2013-03-11 | 2021-12-21 | Sio2医药产品公司 | 涂布包装材料 |
| US9863042B2 (en) | 2013-03-15 | 2018-01-09 | Sio2 Medical Products, Inc. | PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases |
| EP3122917B1 (fr) | 2014-03-28 | 2020-05-06 | SiO2 Medical Products, Inc. | Revêtements antistatiques pour des récipients en plastique |
| JP2018523538A (ja) | 2015-08-18 | 2018-08-23 | エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド | 低酸素透過速度を有する薬剤包装及び他の包装 |
| CN106597591B (zh) * | 2017-01-25 | 2022-07-26 | 杭州科汀光学技术有限公司 | 一种高截止、低波纹的准矩形窄带滤光片 |
| CN111399104B (zh) * | 2020-04-26 | 2021-02-09 | 腾景科技股份有限公司 | 一种双峰超窄带陡峭光学干涉滤波器及其制作方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH557546A (de) * | 1972-10-19 | 1974-12-31 | Balzers Patent Beteilig Ag | Aus einer mehrzahl von einfachen oder zusammengesetzen (lambda)/4-schichten bestehender reflexionsvermindernder belag. |
| US4373782A (en) * | 1980-06-03 | 1983-02-15 | Optical Coating Laboratory, Inc. | Non-polarizing thin film edge filter |
| SU1125588A1 (ru) * | 1982-01-27 | 1984-11-23 | Киевское Научно-Производственное Объединение "Аналитприбор" | Интерференционный отрезающий фильтр |
| JPS619604A (ja) * | 1984-06-23 | 1986-01-17 | Koshin Kogaku:Kk | 誘電体多層膜フイルタ |
| US4793669A (en) * | 1987-09-11 | 1988-12-27 | Coherent, Inc. | Multilayer optical filter for producing colored reflected light and neutral transmission |
| US4896928A (en) * | 1988-08-29 | 1990-01-30 | Coherent, Inc. | Chromatically invariant multilayer dielectric thin film coating |
| JP3172537B2 (ja) * | 1994-03-29 | 2001-06-04 | カール−ツァイス−スティフツング | 湾曲した基材のコーティング用ｐｃｖｄ法及び装置 |
| DE4445427C2 (de) * | 1994-12-20 | 1997-04-30 | Schott Glaswerke | Plasma-CVD-Verfahren zur Herstellung einer Gradientenschicht |
| US6011652A (en) * | 1997-12-23 | 2000-01-04 | Cushing; David Henry | Multilayer thin film dielectric bandpass filter |
-
1999
- 1999-07-12 DE DE1999132082 patent/DE19932082A1/de not_active Withdrawn
-
2000
- 2000-07-10 CN CN 00810229 patent/CN1360681A/zh active Pending
- 2000-07-10 AU AU58268/00A patent/AU5826800A/en not_active Abandoned
- 2000-07-10 EP EP00944023A patent/EP1194799A1/fr not_active Withdrawn
- 2000-07-10 WO PCT/EP2000/006518 patent/WO2001004668A1/fr not_active Application Discontinuation
- 2000-07-10 AU AU66906/00A patent/AU6690600A/en not_active Abandoned
- 2000-07-10 CA CA002379077A patent/CA2379077A1/fr not_active Abandoned
- 2000-07-10 WO PCT/EP2000/006519 patent/WO2001004669A1/fr active Application Filing
- 2000-08-17 TW TW89113814A patent/TW452666B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| WO2001004668A1 (fr) | 2001-01-18 |
| AU5826800A (en) | 2001-01-30 |
| WO2001004669A1 (fr) | 2001-01-18 |
| AU6690600A (en) | 2001-01-30 |
| EP1194799A1 (fr) | 2002-04-10 |
| TW452666B (en) | 2001-09-01 |
| CN1360681A (zh) | 2002-07-24 |
| DE19932082A1 (de) | 2001-01-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FZDE | Discontinued |