CA2326202C - Method and apparatus for deposition of biaxially textured coatings - Google Patents

Method and apparatus for deposition of biaxially textured coatings Download PDF

Info

Publication number
CA2326202C
CA2326202C CA002326202A CA2326202A CA2326202C CA 2326202 C CA2326202 C CA 2326202C CA 002326202 A CA002326202 A CA 002326202A CA 2326202 A CA2326202 A CA 2326202A CA 2326202 C CA2326202 C CA 2326202C
Authority
CA
Canada
Prior art keywords
substrate
flux
energetic particles
target
directed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CA002326202A
Other languages
English (en)
French (fr)
Other versions
CA2326202A1 (en
Inventor
Roger De Gryse
Jurgen Denul
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bekaert NV SA
Original Assignee
Bekaert NV SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bekaert NV SA filed Critical Bekaert NV SA
Publication of CA2326202A1 publication Critical patent/CA2326202A1/en
Application granted granted Critical
Publication of CA2326202C publication Critical patent/CA2326202C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354Introduction of auxiliary energy into the plasma
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225Oblique incidence of vaporised material on substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/083Oxides of refractory metals or yttrium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/46Sputtering by ion beam produced by an external ion source
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3266Magnetic control means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405Magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Moulding By Coating Moulds (AREA)
CA002326202A 1998-03-31 1999-03-30 Method and apparatus for deposition of biaxially textured coatings Expired - Fee Related CA2326202C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP98201006 1998-03-31
EP98201006.8 1998-03-31
PCT/EP1999/002168 WO1999050471A1 (en) 1998-03-31 1999-03-30 Method and apparatus for deposition of biaxially textured coatings

Publications (2)

Publication Number Publication Date
CA2326202A1 CA2326202A1 (en) 1999-10-07
CA2326202C true CA2326202C (en) 2008-06-17

Family

ID=8233538

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002326202A Expired - Fee Related CA2326202C (en) 1998-03-31 1999-03-30 Method and apparatus for deposition of biaxially textured coatings

Country Status (8)

Country Link
EP (1) EP1070154A1 (de)
JP (1) JP2002509988A (de)
KR (1) KR20010042128A (de)
CN (1) CN1295628A (de)
AU (1) AU746645C (de)
CA (1) CA2326202C (de)
RU (1) RU2224050C2 (de)
WO (1) WO1999050471A1 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100352976B1 (ko) * 1999-12-24 2002-09-18 한국기계연구원 전기도금법에 의한 2축 집합조직을 갖는 니켈 도금층 및 그 제조방법
EA200601832A1 (ru) * 2006-08-16 2008-02-28 Владимир Яковлевич ШИРИПОВ Способ ионной обработки поверхности диэлектрика и устройство для осуществления способа
KR20120042748A (ko) 2009-05-13 2012-05-03 씨브이 홀딩스 엘엘씨 코팅된 표면 검사를 위한 가스제거 방법
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
KR101794586B1 (ko) 2011-05-23 2017-11-08 삼성디스플레이 주식회사 스퍼터링용 분할 타겟 장치 및 그것을 이용한 스퍼터링 방법
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
JP6095678B2 (ja) 2011-11-11 2017-03-15 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 薬剤パッケージ用の不動態化、pH保護又は滑性皮膜、被覆プロセス及び装置
RU2502151C1 (ru) * 2012-04-24 2013-12-20 Федеральное государственное бюджетное учреждение науки Институт общей физики им. А.М. Прохорова Российской академии наук (ИОФ РАН) Способ изготовления фотокатода и устройство для изготовления фотокатода
EP2846755A1 (de) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Saccharidschutzschicht für eine arzneimittelverpackung
CA2890066C (en) 2012-11-01 2021-11-09 Sio2 Medical Products, Inc. Coating inspection method
EP2920567B1 (de) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Verfahren und vorrichtung zur erkennung von schnellen sperrbeschichtungsintegritätseigenschaften
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
WO2014085346A1 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Hollow body with inside coating
EP2956258A1 (de) 2013-02-15 2015-12-23 Regents of the University of Minnesota Teilchenfunktionalisierung
EP2961858B1 (de) 2013-03-01 2022-09-07 Si02 Medical Products, Inc. Beschichtete spritze.
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
CA2904611C (en) 2013-03-11 2021-11-23 Sio2 Medical Products, Inc. Coated packaging
EP2971227B1 (de) 2013-03-15 2017-11-15 Si02 Medical Products, Inc. Beschichtungsverfahren.
EP3042978B1 (de) * 2013-09-04 2020-07-29 Toyo Kohan Co., Ltd. Geschichtetes substrat für epitaxialwachstum und verfahren zur herstellung davon
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
JP6526071B6 (ja) * 2014-06-23 2019-06-26 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated 層を堆積する方法、トランジスタを製造する方法、電子デバイスのための層スタック、及び電子デバイス
CN104109841B (zh) * 2014-07-23 2016-08-24 中国科学院上海光学精密机械研究所 磁控溅射倾斜沉积镀膜装置
CN104593742B (zh) * 2015-01-20 2017-02-22 清华大学深圳研究生院 一种制备具有双轴织构的氧化物薄膜的设备和方法
CA2995225C (en) 2015-08-18 2023-08-29 Sio2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate
RU2620534C2 (ru) * 2015-09-08 2017-05-26 Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Казанский (Приволжский) федеральный университет" (ФГАОУВПО КФУ) Способ нанесения покрытий и устройство для его осуществления
CN113808935B (zh) * 2020-06-16 2023-12-15 中微半导体设备(上海)股份有限公司 耐腐蚀涂层形成方法和装置、等离子体零部件和反应装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4333022A1 (de) * 1993-09-29 1995-03-30 Ronald Dipl Phys Gottzein Verfahren zur Herstellung bitexturierter Dünnfilme auf amorphen oder beliebig strukturierten Substraten
DE4436285C2 (de) * 1994-10-11 2002-01-10 Univ Stuttgart Verfahren und Vorrichtung zum Aufbringen von Orientierungsschichten auf ein Substrat zum Ausrichten von Flüssigkristallmolekülen
DE19641584C1 (de) * 1996-09-30 1998-01-08 Siemens Ag Anordnung und Verfahren zum Aufbringen einer dünnen Schicht auf ein Substrat

Also Published As

Publication number Publication date
RU2224050C2 (ru) 2004-02-20
JP2002509988A (ja) 2002-04-02
AU746645B2 (en) 2002-05-02
CA2326202A1 (en) 1999-10-07
CN1295628A (zh) 2001-05-16
WO1999050471A1 (en) 1999-10-07
EP1070154A1 (de) 2001-01-24
KR20010042128A (ko) 2001-05-25
AU746645C (en) 2003-02-20
AU3418899A (en) 1999-10-18

Similar Documents

Publication Publication Date Title
CA2326202C (en) Method and apparatus for deposition of biaxially textured coatings
US5234560A (en) Method and device for sputtering of films
KR100396456B1 (ko) 절단된 코니칼 스퍼터링 타겟용 고 타겟 이용 자기 장치
EP0328076B1 (de) Gerät zur Bildung dünner Schichten und durch Mikrowellen-Zerstäubung arbeitende Ionenquelle
US7327089B2 (en) Beam plasma source
US4885070A (en) Method and apparatus for the application of materials
US7578908B2 (en) Sputter coating system
US7932678B2 (en) Magnetic mirror plasma source and method using same
EP0413291B1 (de) Verfahren und Vorrichtung zum Sputterauftragen von Filmen
US5378341A (en) Conical magnetron sputter source
WO2005091329A2 (en) Sputtering device for manufacturing thin films
US6740212B2 (en) Rectangular magnetron sputtering cathode with high target utilization
US6432286B1 (en) Conical sputtering target
Golan et al. Ring etching zones on magnetron sputtering targets
JPS63307272A (ja) イオンビ−ムスパツタ装置
Tereshin et al. Thin films deposition with ECR planar plasma source
MXPA00009560A (en) Method and apparatus for deposition of biaxially textured coatings
Hoshi et al. High‐rate, low‐temperature sputtering method of facing‐targets type and its application for deposition of magnetic films
Shibata et al. Application of sheet shaped plasma supplemented with radio frequency plasma source for production of thin films
JPH0539569A (ja) 対向ターゲツト式スパツタ装置及びスパツタ方法
JPH1150245A (ja) スパッタ成膜装置およびスパッタリングターゲット
JPH0273966A (ja) スパッタリングによる多成分系薄膜作成方法
JPS62280357A (ja) 電子ビ−ム蒸発イオンプレ−テイングとその装置
JPS6160881A (ja) プラズマ処理方法及びその装置
JPH02194174A (ja) スパッタリング装置

Legal Events

Date Code Title Description
EEER Examination request
MKLA Lapsed