CA2117818A1 - Method of manufacturing semiconductor device - Google Patents
Method of manufacturing semiconductor deviceInfo
- Publication number
- CA2117818A1 CA2117818A1 CA002117818A CA2117818A CA2117818A1 CA 2117818 A1 CA2117818 A1 CA 2117818A1 CA 002117818 A CA002117818 A CA 002117818A CA 2117818 A CA2117818 A CA 2117818A CA 2117818 A1 CA2117818 A1 CA 2117818A1
- Authority
- CA
- Canada
- Prior art keywords
- chip
- wiring layer
- resist
- base
- package
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0402—Apparatus for fluid treatment
- H10P72/0404—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0441—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0444—Apparatus for wiring semiconductor or solid-state device
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/0711—Apparatus therefor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
- H10W70/68—Shapes or dispositions thereof
- H10W70/682—Shapes or dispositions thereof comprising holes having chips therein
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/013—Manufacture or treatment of die-attach connectors
- H10W72/01331—Manufacture or treatment of die-attach connectors using blanket deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/0198—Manufacture or treatment batch processes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/073—Connecting or disconnecting of die-attach connectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/073—Connecting or disconnecting of die-attach connectors
- H10W72/07302—Connecting or disconnecting of die-attach connectors using an auxiliary member
- H10W72/07304—Connecting or disconnecting of die-attach connectors using an auxiliary member the auxiliary member being temporary, e.g. a sacrificial coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/073—Connecting or disconnecting of die-attach connectors
- H10W72/07331—Connecting techniques
- H10W72/07337—Connecting techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/073—Connecting or disconnecting of die-attach connectors
- H10W72/07331—Connecting techniques
- H10W72/07337—Connecting techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy
- H10W72/07338—Connecting techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy hardening the adhesive by curing, e.g. thermosetting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/075—Connecting or disconnecting of bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
- H10W72/351—Materials of die-attach connectors
- H10W72/352—Materials of die-attach connectors comprising metals or metalloids, e.g. solders
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
- H10W72/351—Materials of die-attach connectors
- H10W72/353—Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics
- H10W72/354—Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics comprising polymers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/551—Materials of bond wires
- H10W72/552—Materials of bond wires comprising metals or metalloids, e.g. silver
- H10W72/5522—Materials of bond wires comprising metals or metalloids, e.g. silver comprising gold [Au]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/551—Materials of bond wires
- H10W72/552—Materials of bond wires comprising metals or metalloids, e.g. silver
- H10W72/5524—Materials of bond wires comprising metals or metalloids, e.g. silver comprising aluminium [Al]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/851—Dispositions of multiple connectors or interconnections
- H10W72/874—On different surfaces
- H10W72/884—Die-attach connectors and bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/731—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
- H10W90/734—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked insulating package substrate, interposer or RDL
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/753—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between laterally-adjacent chips
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/754—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/028—Dicing
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Die Bonding (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP253978/1993 | 1993-10-12 | ||
| JP5253978A JPH07111254A (ja) | 1993-10-12 | 1993-10-12 | 半導体装置の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2117818A1 true CA2117818A1 (en) | 1995-04-13 |
Family
ID=17258574
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002117818A Abandoned CA2117818A1 (en) | 1993-10-12 | 1994-10-11 | Method of manufacturing semiconductor device |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5593926A (ref) |
| EP (1) | EP0647967A3 (ref) |
| JP (1) | JPH07111254A (ref) |
| KR (1) | KR950012641A (ref) |
| CA (1) | CA2117818A1 (ref) |
| TW (1) | TW255987B (ref) |
Families Citing this family (91)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6465743B1 (en) * | 1994-12-05 | 2002-10-15 | Motorola, Inc. | Multi-strand substrate for ball-grid array assemblies and method |
| US5832585A (en) * | 1996-08-13 | 1998-11-10 | National Semiconductor Corporation | Method of separating micro-devices formed on a substrate |
| US5776798A (en) * | 1996-09-04 | 1998-07-07 | Motorola, Inc. | Semiconductor package and method thereof |
| US6150193A (en) * | 1996-10-31 | 2000-11-21 | Amkor Technology, Inc. | RF shielded device |
| US6962829B2 (en) * | 1996-10-31 | 2005-11-08 | Amkor Technology, Inc. | Method of making near chip size integrated circuit package |
| US5981314A (en) * | 1996-10-31 | 1999-11-09 | Amkor Technology, Inc. | Near chip size integrated circuit package |
| KR100199293B1 (ko) * | 1996-11-08 | 1999-06-15 | 윤종용 | 반도체 패키지 제조 장치 |
| US6117705A (en) | 1997-04-18 | 2000-09-12 | Amkor Technology, Inc. | Method of making integrated circuit package having adhesive bead supporting planar lid above planar substrate |
| US5923995A (en) * | 1997-04-18 | 1999-07-13 | National Semiconductor Corporation | Methods and apparatuses for singulation of microelectromechanical systems |
| US6034429A (en) * | 1997-04-18 | 2000-03-07 | Amkor Technology, Inc. | Integrated circuit package |
| US6075278A (en) * | 1997-04-24 | 2000-06-13 | Micron Technology, Inc. | Aluminum based alloy bridge structure and method of forming same |
| KR100278137B1 (ko) | 1997-09-04 | 2001-01-15 | 가나이 쓰도무 | 반도체소자의 탑재방법 및 그 시스템, 반도체소자 분리장치 및ic카드의 제조방법 |
| US5962810A (en) * | 1997-09-09 | 1999-10-05 | Amkor Technology, Inc. | Integrated circuit package employing a transparent encapsulant |
| US6849328B1 (en) | 1999-07-02 | 2005-02-01 | Ppg Industries Ohio, Inc. | Light-transmitting and/or coated article with removable protective coating and methods of making the same |
| US6670719B2 (en) | 1999-08-25 | 2003-12-30 | Micron Technology, Inc. | Microelectronic device package filled with liquid or pressurized gas and associated method of manufacture |
| US7276788B1 (en) * | 1999-08-25 | 2007-10-02 | Micron Technology, Inc. | Hydrophobic foamed insulators for high density circuits |
| US7335965B2 (en) * | 1999-08-25 | 2008-02-26 | Micron Technology, Inc. | Packaging of electronic chips with air-bridge structures |
| US6709968B1 (en) | 2000-08-16 | 2004-03-23 | Micron Technology, Inc. | Microelectronic device with package with conductive elements and associated method of manufacture |
| US6121131A (en) | 1999-08-31 | 2000-09-19 | Micron Technology, Inc. | Method for forming conductive structures |
| US6413827B2 (en) | 2000-02-14 | 2002-07-02 | Paul A. Farrar | Low dielectric constant shallow trench isolation |
| US6677209B2 (en) | 2000-02-14 | 2004-01-13 | Micron Technology, Inc. | Low dielectric constant STI with SOI devices |
| US6890847B1 (en) | 2000-02-22 | 2005-05-10 | Micron Technology, Inc. | Polynorbornene foam insulation for integrated circuits |
| US7361404B2 (en) | 2000-05-10 | 2008-04-22 | Ppg Industries Ohio, Inc. | Coated article with removable protective coating and related methods |
| US7434305B2 (en) | 2000-11-28 | 2008-10-14 | Knowles Electronics, Llc. | Method of manufacturing a microphone |
| US8617934B1 (en) | 2000-11-28 | 2013-12-31 | Knowles Electronics, Llc | Methods of manufacture of top port multi-part surface mount silicon condenser microphone packages |
| US7166910B2 (en) * | 2000-11-28 | 2007-01-23 | Knowles Electronics Llc | Miniature silicon condenser microphone |
| US7439616B2 (en) | 2000-11-28 | 2008-10-21 | Knowles Electronics, Llc | Miniature silicon condenser microphone |
| TW577152B (en) * | 2000-12-18 | 2004-02-21 | Hitachi Ltd | Semiconductor integrated circuit device |
| DE10063180A1 (de) * | 2000-12-18 | 2002-06-27 | Bayer Ag | Vorrichtung zur Erzeugung von Lichtsignalen |
| US6420206B1 (en) | 2001-01-30 | 2002-07-16 | Axsun Technologies, Inc. | Optical membrane singulation process utilizing backside and frontside protective coating during die saw |
| US6888232B2 (en) * | 2001-08-15 | 2005-05-03 | Micron Technology | Semiconductor package having a heat-activated source of releasable hydrogen |
| US6433413B1 (en) | 2001-08-17 | 2002-08-13 | Micron Technology, Inc. | Three-dimensional multichip module |
| US6747347B2 (en) | 2001-08-30 | 2004-06-08 | Micron Technology, Inc. | Multi-chip electronic package and cooling system |
| US6686654B2 (en) | 2001-08-31 | 2004-02-03 | Micron Technology, Inc. | Multiple chip stack structure and cooling system |
| US20030183916A1 (en) * | 2002-03-27 | 2003-10-02 | John Heck | Packaging microelectromechanical systems |
| US6620638B1 (en) | 2002-06-05 | 2003-09-16 | Micron Technology, Inc. | Testing of multi-chip electronic modules |
| KR100439511B1 (ko) * | 2002-07-05 | 2004-07-09 | 삼성전기주식회사 | 마이크로 전기 기계 구조 칩의 다이싱 방법 |
| US6781231B2 (en) * | 2002-09-10 | 2004-08-24 | Knowles Electronics Llc | Microelectromechanical system package with environmental and interference shield |
| US7049219B1 (en) * | 2002-11-08 | 2006-05-23 | Micron Technology, Inc. | Coating of copper and silver air bridge structures to improve electromigration resistance and other applications |
| JP3793143B2 (ja) * | 2002-11-28 | 2006-07-05 | 株式会社シマノ | 自転車用電子制御装置 |
| US7192892B2 (en) | 2003-03-04 | 2007-03-20 | Micron Technology, Inc. | Atomic layer deposited dielectric layers |
| US20050137882A1 (en) * | 2003-12-17 | 2005-06-23 | Cameron Don T. | Method for authenticating goods |
| US20050158913A1 (en) * | 2004-01-19 | 2005-07-21 | Fuji Photo Film Co., Ltd. | Solid state imaging apparatus and its manufacturing method |
| US7033906B2 (en) * | 2004-02-02 | 2006-04-25 | John Shi Sun Wei | Airdome enclosure for components |
| US7300821B2 (en) * | 2004-08-31 | 2007-11-27 | Micron Technology, Inc. | Integrated circuit cooling and insulating device and method |
| US7405474B1 (en) * | 2004-10-12 | 2008-07-29 | Cypress Semiconductor Corporation | Low cost thermally enhanced semiconductor package |
| US7202562B2 (en) * | 2004-12-02 | 2007-04-10 | Micron Technology, Inc. | Integrated circuit cooling system and method |
| TWI262042B (en) * | 2004-12-20 | 2006-09-11 | Nan Ya Printed Circuit Board C | Method for cutting printed circuit board |
| US7795695B2 (en) | 2005-01-27 | 2010-09-14 | Analog Devices, Inc. | Integrated microphone |
| DE102005008511B4 (de) * | 2005-02-24 | 2019-09-12 | Tdk Corporation | MEMS-Mikrofon |
| DE102005008514B4 (de) * | 2005-02-24 | 2019-05-16 | Tdk Corporation | Mikrofonmembran und Mikrofon mit der Mikrofonmembran |
| DE102005008512B4 (de) | 2005-02-24 | 2016-06-23 | Epcos Ag | Elektrisches Modul mit einem MEMS-Mikrofon |
| EP1861880B1 (en) * | 2005-03-25 | 2012-06-20 | FUJIFILM Corporation | Method of manufacturing solid state imaging device |
| JP5095113B2 (ja) * | 2005-03-25 | 2012-12-12 | 富士フイルム株式会社 | 固体撮像装置の製造方法、及び固体撮像装置 |
| JP5095114B2 (ja) * | 2005-03-25 | 2012-12-12 | 富士フイルム株式会社 | 固体撮像装置の製造方法 |
| US8034652B2 (en) * | 2005-03-25 | 2011-10-11 | Fujifilm Corporation | Solid state imaging device and manufacturing method thereof |
| US20070071268A1 (en) * | 2005-08-16 | 2007-03-29 | Analog Devices, Inc. | Packaged microphone with electrically coupled lid |
| US7825484B2 (en) * | 2005-04-25 | 2010-11-02 | Analog Devices, Inc. | Micromachined microphone and multisensor and method for producing same |
| US7885423B2 (en) * | 2005-04-25 | 2011-02-08 | Analog Devices, Inc. | Support apparatus for microphone diaphragm |
| US7449356B2 (en) * | 2005-04-25 | 2008-11-11 | Analog Devices, Inc. | Process of forming a microphone using support member |
| US7927948B2 (en) | 2005-07-20 | 2011-04-19 | Micron Technology, Inc. | Devices with nanocrystals and methods of formation |
| US20070040231A1 (en) * | 2005-08-16 | 2007-02-22 | Harney Kieran P | Partially etched leadframe packages having different top and bottom topologies |
| US7961897B2 (en) * | 2005-08-23 | 2011-06-14 | Analog Devices, Inc. | Microphone with irregular diaphragm |
| US8477983B2 (en) * | 2005-08-23 | 2013-07-02 | Analog Devices, Inc. | Multi-microphone system |
| US20070069327A1 (en) * | 2005-09-29 | 2007-03-29 | Infineon Technologies Ag | Method for manufacturing an integrated semiconductor device |
| DE102005053765B4 (de) * | 2005-11-10 | 2016-04-14 | Epcos Ag | MEMS-Package und Verfahren zur Herstellung |
| DE102005053767B4 (de) * | 2005-11-10 | 2014-10-30 | Epcos Ag | MEMS-Mikrofon, Verfahren zur Herstellung und Verfahren zum Einbau |
| US8344487B2 (en) * | 2006-06-29 | 2013-01-01 | Analog Devices, Inc. | Stress mitigation in packaged microchips |
| WO2008014324A2 (en) * | 2006-07-25 | 2008-01-31 | Analog Devices, Inc. | Multiple microphone system |
| US7846776B2 (en) * | 2006-08-17 | 2010-12-07 | Micron Technology, Inc. | Methods for releasably attaching sacrificial support members to microfeature workpieces and microfeature devices formed using such methods |
| US20080042223A1 (en) * | 2006-08-17 | 2008-02-21 | Lu-Lee Liao | Microelectromechanical system package and method for making the same |
| US20080083957A1 (en) * | 2006-10-05 | 2008-04-10 | Wen-Chieh Wei | Micro-electromechanical system package |
| US7894622B2 (en) | 2006-10-13 | 2011-02-22 | Merry Electronics Co., Ltd. | Microphone |
| JP2008108780A (ja) * | 2006-10-23 | 2008-05-08 | Nec Electronics Corp | 半導体装置 |
| TW200847827A (en) * | 2006-11-30 | 2008-12-01 | Analog Devices Inc | Microphone system with silicon microphone secured to package lid |
| JP2008205375A (ja) * | 2007-02-22 | 2008-09-04 | Oki Electric Ind Co Ltd | 半導体装置及びその製造方法 |
| US7694610B2 (en) * | 2007-06-27 | 2010-04-13 | Siemens Medical Solutions Usa, Inc. | Photo-multiplier tube removal tool |
| JP5237900B2 (ja) * | 2009-08-11 | 2013-07-17 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
| TW201137960A (en) * | 2010-04-20 | 2011-11-01 | Raydium Semiconductor Corp | Integrated circuit wafer dicing method |
| JP5805411B2 (ja) | 2011-03-23 | 2015-11-04 | ファスフォードテクノロジ株式会社 | ダイボンダのピックアップ方法およびダイボンダ |
| WO2013066343A1 (en) | 2011-11-04 | 2013-05-10 | Knowles Electronics, Llc | Embedded dielectric as a barrier in an acoustic device and method of manufacture |
| US9078063B2 (en) | 2012-08-10 | 2015-07-07 | Knowles Electronics, Llc | Microphone assembly with barrier to prevent contaminant infiltration |
| DE102013200868B4 (de) * | 2013-01-21 | 2016-05-12 | Infineon Technologies Ag | Verfahren zur Herstellung einer stoffschlüssigen Verbindung und einer elektrischen Verbindung |
| US9676614B2 (en) | 2013-02-01 | 2017-06-13 | Analog Devices, Inc. | MEMS device with stress relief structures |
| DE102013106353B4 (de) * | 2013-06-18 | 2018-06-28 | Tdk Corporation | Verfahren zum Aufbringen einer strukturierten Beschichtung auf ein Bauelement |
| US10167189B2 (en) | 2014-09-30 | 2019-01-01 | Analog Devices, Inc. | Stress isolation platform for MEMS devices |
| US9794661B2 (en) | 2015-08-07 | 2017-10-17 | Knowles Electronics, Llc | Ingress protection for reducing particle infiltration into acoustic chamber of a MEMS microphone package |
| US10131538B2 (en) | 2015-09-14 | 2018-11-20 | Analog Devices, Inc. | Mechanically isolated MEMS device |
| US11417611B2 (en) | 2020-02-25 | 2022-08-16 | Analog Devices International Unlimited Company | Devices and methods for reducing stress on circuit components |
| US11981560B2 (en) | 2020-06-09 | 2024-05-14 | Analog Devices, Inc. | Stress-isolated MEMS device comprising substrate having cavity and method of manufacture |
| JP7391450B2 (ja) * | 2021-03-30 | 2023-12-05 | ▲騰▼▲訊▼科技(深▲セン▼)有限公司 | フォトレジスト除去方法及びフォトレジスト除去システム |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3978578A (en) * | 1974-08-29 | 1976-09-07 | Fairchild Camera And Instrument Corporation | Method for packaging semiconductor devices |
| JPS55110032A (en) * | 1979-02-19 | 1980-08-25 | Fujitsu Ltd | Method for high-frequency heated epitaxial growth |
| JPS63152185A (ja) * | 1986-12-16 | 1988-06-24 | Sharp Corp | 感磁性半導体装置の製造方法 |
| US4833102A (en) * | 1987-03-17 | 1989-05-23 | National Semiconductor Corporation | Process of making a ceramic lid for use in a hermetic seal package |
| US4904610A (en) * | 1988-01-27 | 1990-02-27 | General Instrument Corporation | Wafer level process for fabricating passivated semiconductor devices |
| JPH01277011A (ja) * | 1988-04-28 | 1989-11-07 | Toko Inc | 表面弾性波共振器の製造方法 |
| JPH02106947A (ja) * | 1988-10-17 | 1990-04-19 | Sumitomo Electric Ind Ltd | 半導体装置の製造方法 |
| US5019535A (en) * | 1989-03-28 | 1991-05-28 | General Electric Company | Die attachment method using nonconductive adhesive for use in high density interconnected assemblies |
| JP2856778B2 (ja) * | 1989-09-07 | 1999-02-10 | 株式会社東芝 | 半導体装置の配線構造 |
| JPH07118534B2 (ja) * | 1990-02-22 | 1995-12-18 | 三菱電機株式会社 | 半導体装置の製造方法 |
| US5208178A (en) * | 1990-08-02 | 1993-05-04 | Hitachi, Ltd. | Manufacturing a semiconductor integrated circuit device having on chip logic correction |
| JPH05291398A (ja) * | 1992-04-08 | 1993-11-05 | Sony Corp | 素子基板及び液晶表示装置の製造方法 |
| US5393706A (en) * | 1993-01-07 | 1995-02-28 | Texas Instruments Incorporated | Integrated partial sawing process |
-
1993
- 1993-10-12 JP JP5253978A patent/JPH07111254A/ja active Pending
-
1994
- 1994-09-12 TW TW083108399A patent/TW255987B/zh active
- 1994-10-07 US US08/319,546 patent/US5593926A/en not_active Expired - Fee Related
- 1994-10-11 CA CA002117818A patent/CA2117818A1/en not_active Abandoned
- 1994-10-11 KR KR1019940025950A patent/KR950012641A/ko not_active Ceased
- 1994-10-12 EP EP94116085A patent/EP0647967A3/en not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| EP0647967A2 (en) | 1995-04-12 |
| EP0647967A3 (en) | 1997-05-21 |
| US5593926A (en) | 1997-01-14 |
| KR950012641A (ko) | 1995-05-16 |
| TW255987B (ref) | 1995-09-01 |
| JPH07111254A (ja) | 1995-04-25 |
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