CA2034274A1 - Polymers containing halomethyl-1,3,5-triazine moieties - Google Patents

Polymers containing halomethyl-1,3,5-triazine moieties

Info

Publication number
CA2034274A1
CA2034274A1 CA002034274A CA2034274A CA2034274A1 CA 2034274 A1 CA2034274 A1 CA 2034274A1 CA 002034274 A CA002034274 A CA 002034274A CA 2034274 A CA2034274 A CA 2034274A CA 2034274 A1 CA2034274 A1 CA 2034274A1
Authority
CA
Canada
Prior art keywords
polymer
group
triazine
substituted
halomethyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002034274A
Other languages
English (en)
French (fr)
Inventor
James A. Bonham
Mitchell A. Rossman
Richard J. Grant
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of CA2034274A1 publication Critical patent/CA2034274A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/04Chromates
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295Photolytic halogen compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904Monomer or polymer contains initiating group

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
CA002034274A 1990-02-07 1991-01-16 Polymers containing halomethyl-1,3,5-triazine moieties Abandoned CA2034274A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US47634090A 1990-02-07 1990-02-07
US07/476,340 1990-02-07

Publications (1)

Publication Number Publication Date
CA2034274A1 true CA2034274A1 (en) 1991-08-08

Family

ID=23891452

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002034274A Abandoned CA2034274A1 (en) 1990-02-07 1991-01-16 Polymers containing halomethyl-1,3,5-triazine moieties

Country Status (7)

Country Link
US (1) US5723513A (enExample)
EP (1) EP0441524B1 (enExample)
JP (1) JPH04213304A (enExample)
KR (1) KR910015884A (enExample)
AU (1) AU635603B2 (enExample)
CA (1) CA2034274A1 (enExample)
DE (1) DE69130300T2 (enExample)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2034274A1 (en) * 1990-02-07 1991-08-08 James A. Bonham Polymers containing halomethyl-1,3,5-triazine moieties
US5298361A (en) * 1991-08-30 1994-03-29 Minnesota Mining And Manufacturing Company Light-sensitive article containing migration-resistant halomethyl-1,3,5-triazine photoinitiator
DE69402232T2 (de) * 1993-02-26 1997-09-18 Ibm Universaler negativ arbeitender Photoresist
US6410044B1 (en) 1998-03-19 2002-06-25 Surmodics, Inc. Crosslinkable macromers
US7547445B2 (en) * 1998-03-19 2009-06-16 Surmodics, Inc. Crosslinkable macromers
US6007833A (en) * 1998-03-19 1999-12-28 Surmodics, Inc. Crosslinkable macromers bearing initiator groups
EP1289967B1 (en) * 2000-06-12 2009-10-28 LG Chemical Co. Ltd Triazine-based compound comprising functionalized alkylthio groups, and photopolymerization initiator
US6448301B1 (en) 2000-09-08 2002-09-10 3M Innovative Properties Company Crosslinkable polymeric compositions and use thereof
GB0102388D0 (en) * 2001-01-31 2001-03-14 Secr Defence Polymers
KR100379760B1 (ko) * 2001-02-24 2003-04-10 한국화학연구원 고굴절 트리아진형 단량체
KR100451442B1 (ko) * 2001-11-12 2004-10-06 엘지전선 주식회사 트리아진 고리를 주쇄로 하는 폴리유레아계 감광성 고분자액정 배향제와 이를 이용한 액정 배향막
US7087194B2 (en) * 2002-04-04 2006-08-08 3M Innovative Properties Company K-type polarizer and preparation thereof
US6949207B2 (en) * 2002-04-04 2005-09-27 3M Innovative Properties Company K-type polarizer and preparation thereof
US7323290B2 (en) * 2002-09-30 2008-01-29 Eternal Technology Corporation Dry film photoresist
DE102004018544A1 (de) * 2004-04-14 2005-11-03 Basf Ag Verfahren zur Herstellung von 1,3,5-Triazincarbamaten und -harnstoffen
DE102004018546A1 (de) * 2004-04-14 2005-11-03 Basf Ag Strahlungshärtbare 1,3,5-Triazincarbamate und -harnstoffe
US20070077498A1 (en) * 2005-09-30 2007-04-05 Fuji Photo Film Co., Ltd. Optical recording composition, optical recording medium and production method thereof, optical recording method and optical recording apparatus
US9482951B2 (en) 2007-07-30 2016-11-01 Brewer Science Inc. Non-covalently crosslinkable materials for photolithography processes
EP2563843B1 (en) 2010-04-28 2017-12-06 University Of Georgia Research Foundation, Inc. Photochemical cross-linkable polymers, methods of marking photochemical cross-linkable polymers, methods of using photochemical cross-linkable polymers, and methods of making articles containing photochemical cross-linkable polymers
CN102985447A (zh) * 2010-06-22 2013-03-20 科洛普拉斯特公司 基于聚氨酯的光引发剂
US9464143B2 (en) 2010-06-22 2016-10-11 Coloplast A/S Grafted photoinitiators
WO2011160641A2 (en) * 2010-06-22 2011-12-29 Coloplast A/S Hydrophilic gels from polyurethane-based photoinitiators
CN103282429B (zh) 2010-12-29 2015-11-25 3M创新有限公司 具有三嗪-环氧交联体系的压敏粘合剂
WO2013056007A2 (en) 2011-10-14 2013-04-18 University Of Georgia Research Foundation, Inc. Photochemical cross-linkable polymers, methods of making photochemical cross-linkable plolymers, methods of using photochemical cross-linkable poloymers, and methods of making articles containing photochemical cross-linkable polymers
CN102585186B (zh) * 2012-02-06 2014-01-29 中南大学 一种含芳基-1,3,5-三嗪结构聚芳酯及其制备方法
TWI624519B (zh) 2012-12-20 2018-05-21 3M新設資產公司 包含具有吸收紫外線基團之寡聚物之氟聚合物組合物
CN106661365B (zh) 2014-06-25 2019-03-01 3M创新有限公司 包含至少一种低聚物的含氟聚合物组合物
US11110689B2 (en) 2014-06-25 2021-09-07 3M Innovative Properties Company Pressure sensitive adhesive composition including ultraviolet light-absorbing oligomer
WO2016210140A1 (en) * 2015-06-25 2016-12-29 3M Innovative Properties Company Copolymer including ultraviolet light-absorbing group and compositions including the same
JP7256954B2 (ja) * 2019-01-31 2023-04-13 セイコーエプソン株式会社 分散液、インクジェット記録用インク組成物、及びインクジェット記録方法
ES3041272T3 (en) * 2019-11-28 2025-11-11 Evonik Operations Gmbh Polyether-modified polybutadiene and process for its preparation

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3154523A (en) * 1960-10-11 1964-10-27 Dal Mon Research Co Polymerizable triazines and products thereof
NL126765C (enExample) * 1966-03-21
US3847916A (en) * 1968-06-03 1974-11-12 Dow Corning Fluorocarbon triazine compounds
US3652464A (en) * 1968-10-28 1972-03-28 Dow Corning Perfluoroalkylene ether and thioether triazine polymers
US3644300A (en) * 1969-04-14 1972-02-22 Hooker Chemical Corp Crosslinking of perfluoroalkylene triazine polymer
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
JPS5928328B2 (ja) * 1977-11-29 1984-07-12 富士写真フイルム株式会社 光重合性組成物
JPS5815503A (ja) * 1981-07-20 1983-01-28 Fuji Photo Film Co Ltd 光重合性組成物
US4356287A (en) * 1981-07-20 1982-10-26 American Cyanamid Company Novel polymeric light stabilizers for polymers
JPH067263B2 (ja) * 1985-08-19 1994-01-26 富士写真フイルム株式会社 光可溶化組成物
JPH0642074B2 (ja) * 1986-09-10 1994-06-01 富士写真フイルム株式会社 感光性組成物
GB8719730D0 (en) * 1987-08-20 1987-09-30 Vickers Plc Radiation sensitive compounds
US5262276A (en) * 1988-05-11 1993-11-16 Fuji Photo Film Co., Ltd. Light-sensitive compositions
JPH0820734B2 (ja) * 1988-08-11 1996-03-04 富士写真フイルム株式会社 感光性組成物及びそれを用いた光重合性組成物
EP0359431B1 (en) * 1988-09-07 1993-12-22 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a sensitizer moiety
US4985562A (en) * 1988-09-07 1991-01-15 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing an amine-containing moiety
EP0359430B1 (en) * 1988-09-07 1995-05-10 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a monomeric moiety
CA2034274A1 (en) * 1990-02-07 1991-08-08 James A. Bonham Polymers containing halomethyl-1,3,5-triazine moieties
US5561029A (en) * 1995-04-28 1996-10-01 Polaroid Corporation Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates

Also Published As

Publication number Publication date
AU635603B2 (en) 1993-03-25
JPH04213304A (ja) 1992-08-04
DE69130300D1 (de) 1998-11-12
KR910015884A (ko) 1991-09-30
DE69130300T2 (de) 1999-05-06
US5723513A (en) 1998-03-03
AU6983691A (en) 1991-08-08
EP0441524A2 (en) 1991-08-14
EP0441524B1 (en) 1998-10-07
EP0441524A3 (enExample) 1994-01-19

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Legal Events

Date Code Title Description
EEER Examination request
FZDE Discontinued