CA1309291C - Processing of exposed lithographic printing plates - Google Patents
Processing of exposed lithographic printing platesInfo
- Publication number
- CA1309291C CA1309291C CA000533663A CA533663A CA1309291C CA 1309291 C CA1309291 C CA 1309291C CA 000533663 A CA000533663 A CA 000533663A CA 533663 A CA533663 A CA 533663A CA 1309291 C CA1309291 C CA 1309291C
- Authority
- CA
- Canada
- Prior art keywords
- plate
- water
- irradiation
- coated surface
- plates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 52
- 238000000034 method Methods 0.000 claims abstract description 20
- 238000010438 heat treatment Methods 0.000 claims abstract description 13
- 238000000576 coating method Methods 0.000 claims description 13
- 239000011248 coating agent Substances 0.000 claims description 12
- 238000001816 cooling Methods 0.000 claims description 6
- 230000005855 radiation Effects 0.000 claims description 4
- 239000007921 spray Substances 0.000 claims description 3
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 claims description 2
- 229920003986 novolac Polymers 0.000 claims description 2
- 229920005989 resin Polymers 0.000 claims description 2
- 239000011347 resin Substances 0.000 claims description 2
- 229920003987 resole Polymers 0.000 claims description 2
- 101100165186 Caenorhabditis elegans bath-34 gene Proteins 0.000 description 5
- 239000004743 Polypropylene Substances 0.000 description 3
- -1 polypropylene Polymers 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- 239000003570 air Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 description 1
- 241000407429 Maja Species 0.000 description 1
- 240000004543 Vicia ervilia Species 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000003413 degradative effect Effects 0.000 description 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB8705925A GB2188448B (en) | 1986-03-13 | 1987-03-12 | Reversal processing of exposed lithographic printing plates |
| ZA872295A ZA872295B (en, 2012) | 1986-03-13 | 1987-03-30 | |
| CA000533663A CA1309291C (en) | 1986-03-13 | 1987-04-02 | Processing of exposed lithographic printing plates |
| US07/274,730 US4927741A (en) | 1986-03-13 | 1988-11-14 | Processing of exposed lithographic printing plates by conducting second exposure under water |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB868606258A GB8606258D0 (en) | 1986-03-13 | 1986-03-13 | Processing of lithographic printing plates |
| CA000533663A CA1309291C (en) | 1986-03-13 | 1987-04-02 | Processing of exposed lithographic printing plates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1309291C true CA1309291C (en) | 1992-10-27 |
Family
ID=25671294
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000533663A Expired - Fee Related CA1309291C (en) | 1986-03-13 | 1987-04-02 | Processing of exposed lithographic printing plates |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US4927741A (en, 2012) |
| CA (1) | CA1309291C (en, 2012) |
| ZA (1) | ZA872295B (en, 2012) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5286609A (en) * | 1988-11-01 | 1994-02-15 | Yamatoya & Co., Ltd. | Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray |
| DE3940911A1 (de) * | 1989-12-12 | 1991-06-13 | Hoechst Ag | Verfahren zur herstellung negativer kopien |
| US5330875A (en) * | 1993-05-05 | 1994-07-19 | Sun Chemical Corporation | Process for producing negative and positive original images on a bilevel printing plate utilizing non-silver halide layer and silver halide overlayer |
| US5372915A (en) * | 1993-05-19 | 1994-12-13 | Eastman Kodak Company | Method of making a lithographic printing plate containing a resole resin and a novolac resin in the radiation sensitive layer |
| DE69512113T2 (de) * | 1994-03-14 | 2000-05-25 | Kodak Polychrome Graphics Llc, Norwalk | Strahlungsempfindliche Zusammensetzung, enthaltend ein Resolharz, ein Novolakharz, einen Infrarotabsorber und ein Triazin, und seine Verwendung in lithographischen Druckplatten |
| US5466557A (en) * | 1994-08-29 | 1995-11-14 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates |
| US5491046A (en) * | 1995-02-10 | 1996-02-13 | Eastman Kodak Company | Method of imaging a lithographic printing plate |
| EP0887182B1 (en) | 1996-04-23 | 2002-07-24 | Kodak Polychrome Graphics Company Ltd. | Heat-sensitive composition for making a lithographic printing form precursor |
| US5858626A (en) | 1996-09-30 | 1999-01-12 | Kodak Polychrome Graphics | Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition |
| US5705322A (en) * | 1996-09-30 | 1998-01-06 | Eastman Kodak Company | Method of providing an image using a negative-working infrared photosensitive element |
| US6117610A (en) * | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
| US5705308A (en) * | 1996-09-30 | 1998-01-06 | Eastman Kodak Company | Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element |
| US5919601A (en) * | 1996-11-12 | 1999-07-06 | Kodak Polychrome Graphics, Llc | Radiation-sensitive compositions and printing plates |
| US6063544A (en) * | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
| US6090532A (en) * | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
| WO1999001795A2 (en) | 1997-07-05 | 1999-01-14 | Kodak Polychrome Graphics Company Ltd. | Pattern-forming methods and radiation sensitive materials |
| US6060217A (en) * | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
| US7264354B2 (en) * | 1999-07-02 | 2007-09-04 | E-Vision, Llc | Method and apparatus for correcting vision using an electro-active phoropter |
| US6143479A (en) * | 1999-08-31 | 2000-11-07 | Kodak Polychrome Graphics Llc | Developing system for alkaline-developable lithographic printing plates |
| US6255042B1 (en) | 1999-11-24 | 2001-07-03 | Kodak Polychrome Graphics, Llc | Developing system for alkaline-developable lithographic printing plates with different interlayers |
| US6315916B1 (en) | 2000-05-08 | 2001-11-13 | Pisces-Print Image Sciences, Inc. | Chemical imaging of a lithographic printing plate |
| US20040154489A1 (en) * | 2000-05-08 | 2004-08-12 | Deutsch Albert S. | Chemical imaging of a lithographic printing plate |
| US6691618B2 (en) | 2000-05-08 | 2004-02-17 | Pisces-Print Imaging Sciences, Inc. | Chemical imaging of a lithographic printing plate |
| US6677106B2 (en) | 2002-01-03 | 2004-01-13 | Kodak Polychrome Graphics Llc | Method and equipment for using photo- or thermally imagable, negatively working patterning compositions |
| US6599676B2 (en) | 2002-01-03 | 2003-07-29 | Kodak Polychrome Graphics Llc | Process for making thermal negative printing plate |
| US6843176B2 (en) * | 2002-04-26 | 2005-01-18 | Kodak Polychrome Graphics, Llc | Method to remove unwanted, unexposed, radiation-sensitive layer in a lithographic printing plate |
| US7041174B2 (en) * | 2003-02-19 | 2006-05-09 | Sunmodics,Inc. | Grafting apparatus and method of using |
| JP6549482B2 (ja) | 2012-06-01 | 2019-07-24 | サーモディクス，インコーポレイテッド | バルーンカテーテルをコーティングするための装置および方法 |
| US9827401B2 (en) | 2012-06-01 | 2017-11-28 | Surmodics, Inc. | Apparatus and methods for coating medical devices |
| US11090468B2 (en) | 2012-10-25 | 2021-08-17 | Surmodics, Inc. | Apparatus and methods for coating medical devices |
| US11628466B2 (en) | 2018-11-29 | 2023-04-18 | Surmodics, Inc. | Apparatus and methods for coating medical devices |
| US11819590B2 (en) | 2019-05-13 | 2023-11-21 | Surmodics, Inc. | Apparatus and methods for coating medical devices |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL138044C (en, 2012) * | 1961-07-28 | |||
| US3723120A (en) * | 1971-08-30 | 1973-03-27 | Du Pont | Process for hardening photohardenable images |
| SU542167A1 (ru) * | 1974-11-19 | 1977-01-05 | Украинский Научно-Исследовательский Институт Полиграфической Промышленности | Способ изготовлени фотополимерных печатных форм |
| US4148934A (en) * | 1977-12-02 | 1979-04-10 | W. R. Grace Ltd. | Secondary photocuring of photocured printing plate, apparatus and method |
| US4338007A (en) * | 1978-12-22 | 1982-07-06 | Howard A. Fromson | Apparatus and process for making lithographic printing plate with reinforced image |
| DE3020976C2 (de) * | 1980-06-03 | 1983-01-27 | Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf | Verfahren zur Erhöhung der Verarbeitungsbreite von lichthärtbaren Aufzeichnungsmaterialien |
| JPS5897043A (ja) * | 1981-12-04 | 1983-06-09 | Teijin Ltd | 液中後露光法 |
| JPS58100128A (ja) * | 1981-12-10 | 1983-06-14 | Teijin Ltd | 液中後露光方法 |
| US4415654A (en) * | 1982-08-19 | 1983-11-15 | Hercules Incorporated | Post-exposure process |
| NL8203521A (nl) * | 1982-09-10 | 1984-04-02 | Philips Nv | Werkwijze voor het vervaardigen van een inrichting. |
| DE3325023A1 (de) * | 1983-07-11 | 1985-01-24 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden |
| DE3325022A1 (de) * | 1983-07-11 | 1985-01-24 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden |
| GB2171530B (en) * | 1985-02-27 | 1989-06-28 | Imtec Products Inc | Method of producing reversed photoresist images by vapour diffusion |
-
1987
- 1987-03-30 ZA ZA872295A patent/ZA872295B/xx unknown
- 1987-04-02 CA CA000533663A patent/CA1309291C/en not_active Expired - Fee Related
-
1988
- 1988-11-14 US US07/274,730 patent/US4927741A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US4927741A (en) | 1990-05-22 |
| ZA872295B (en, 2012) | 1987-09-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKLA | Lapsed |