CA1204474A - Hydrogen-selective sensor and manufacturing method therefor - Google Patents
Hydrogen-selective sensor and manufacturing method thereforInfo
- Publication number
- CA1204474A CA1204474A CA000444091A CA444091A CA1204474A CA 1204474 A CA1204474 A CA 1204474A CA 000444091 A CA000444091 A CA 000444091A CA 444091 A CA444091 A CA 444091A CA 1204474 A CA1204474 A CA 1204474A
- Authority
- CA
- Canada
- Prior art keywords
- gas
- hydrogen
- silicon
- sensing element
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000001257 hydrogen Substances 0.000 title claims abstract description 43
- 229910052739 hydrogen Inorganic materials 0.000 title claims abstract description 43
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 125000004435 hydrogen atom Chemical class [H]* 0.000 title 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 27
- 150000002431 hydrogen Chemical class 0.000 claims abstract description 22
- 239000004065 semiconductor Substances 0.000 claims abstract description 21
- 239000007789 gas Substances 0.000 claims abstract description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 13
- 230000003647 oxidation Effects 0.000 claims abstract description 8
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 8
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 7
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 7
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 7
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 14
- -1 alkyl silicon halides Chemical class 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 12
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- 239000010703 silicon Substances 0.000 claims description 11
- 229910010293 ceramic material Inorganic materials 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- 125000005234 alkyl aluminium group Chemical group 0.000 claims description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims 4
- 229910002113 barium titanate Inorganic materials 0.000 claims 2
- UBEWDCMIDFGDOO-UHFFFAOYSA-N cobalt(II,III) oxide Inorganic materials [O-2].[O-2].[O-2].[O-2].[Co+2].[Co+3].[Co+3] UBEWDCMIDFGDOO-UHFFFAOYSA-N 0.000 claims 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims 2
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten(VI) oxide Inorganic materials O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 1
- 238000005234 chemical deposition Methods 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 description 16
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 15
- 229910001887 tin oxide Inorganic materials 0.000 description 10
- 239000005051 trimethylchlorosilane Substances 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 150000003377 silicon compounds Chemical class 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 241000282320 Panthera leo Species 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 210000003462 vein Anatomy 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 235000008314 Echinocereus dasyacanthus Nutrition 0.000 description 1
- 240000005595 Echinocereus dasyacanthus Species 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical group [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57227568A JPS59120945A (ja) | 1982-12-28 | 1982-12-28 | 水素選択性センサ |
JP227568/1982 | 1982-12-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA1204474A true CA1204474A (en) | 1986-05-13 |
Family
ID=16862951
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA000444091A Expired CA1204474A (en) | 1982-12-28 | 1983-12-22 | Hydrogen-selective sensor and manufacturing method therefor |
Country Status (5)
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4638286A (en) * | 1985-03-26 | 1987-01-20 | Enron Corp. | Reactive gas sensor |
JPS61223644A (ja) * | 1985-03-29 | 1986-10-04 | Nohmi Bosai Kogyo Co Ltd | 水素ガス検出素子及びその製法 |
GB8521628D0 (en) * | 1985-08-30 | 1985-10-02 | Atomic Energy Authority Uk | Sensor |
JPS6283641A (ja) * | 1985-10-08 | 1987-04-17 | Sharp Corp | 電界効果型半導体センサ |
DE3604594A1 (de) * | 1986-02-14 | 1987-08-20 | Schott Glaswerke | Duennfilmgassensoren mit hoher messempfindlichkeit als mehrschichtsysteme auf der basis von indiumoxid-tauchschichten zum nachweis von gasspuren in traegergasen |
US4751022A (en) * | 1986-04-24 | 1988-06-14 | Mitsubishi Gas Chemical Company, Inc. | Humidity-sensing component composition |
KR960016712B1 (ko) * | 1986-11-05 | 1996-12-20 | 오오니시 마사후미 | 가스센서 및 그의 제조방법 |
JPS63114629U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1987-01-21 | 1988-07-23 | ||
JPS63124924U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1987-02-05 | 1988-08-15 | ||
JPH0318833U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1989-02-28 | 1991-02-25 | ||
JP2702279B2 (ja) * | 1990-11-30 | 1998-01-21 | 新コスモス電機株式会社 | ガス検知素子 |
WO1993018399A1 (de) * | 1992-03-06 | 1993-09-16 | Siemens Aktiengesellschaft | Anordnung zur detektion von gasen in flüssigkeiten |
DE4431456C2 (de) * | 1994-09-03 | 1996-07-11 | Bosch Gmbh Robert | In Dick- oder Dünnschichttechnik hergestellter Gassensor |
US6265222B1 (en) * | 1999-01-15 | 2001-07-24 | Dimeo, Jr. Frank | Micro-machined thin film hydrogen gas sensor, and method of making and using the same |
JP4532671B2 (ja) * | 1999-06-01 | 2010-08-25 | 新コスモス電機株式会社 | 水素ガス検知素子 |
DE10213805A1 (de) * | 2001-03-28 | 2002-11-07 | Denso Corp | Gassensor und Verfahren zum Herstellen eines Gassensors |
US20060124448A1 (en) * | 2003-01-23 | 2006-06-15 | Jayaraman Raviprakash | Thin film semi-permeable membranes for gas sensor and catalytic applications |
WO2004111628A1 (ja) * | 2003-06-12 | 2004-12-23 | Riken Keiki Co., Ltd. | 接触燃焼式ガスセンサ、及びその製造方法 |
JP3868989B2 (ja) | 2003-10-22 | 2007-01-17 | 東洋インキ製造株式会社 | プロトン受容型センサー、水素ガスセンサー及び酸センサー |
JP4056987B2 (ja) * | 2004-04-28 | 2008-03-05 | アルプス電気株式会社 | 水素センサ及び水素の検知方法 |
JP2007248424A (ja) * | 2006-03-20 | 2007-09-27 | Atsumi Tec:Kk | 水素センサ |
GB2476123A (en) * | 2009-12-14 | 2011-06-15 | Graviner Ltd Kidde | MOS gas sensor apparatus and method of use |
GB2476122A (en) * | 2009-12-14 | 2011-06-15 | Graviner Ltd Kidde | MOS gas sensor apparatus and method of use |
FR3003626B1 (fr) * | 2013-03-20 | 2015-04-17 | Technip France | Panneau de protection pour une installation d'exploitation de fluide a basse temperature, ensemble, installation et procede associes |
CN104237339B (zh) * | 2014-09-29 | 2016-09-21 | 南京理工大学 | 一种四氧化三钴-氧化锌/石墨烯三元复合物及其制备方法 |
JP6761764B2 (ja) | 2016-03-18 | 2020-09-30 | パナソニックセミコンダクターソリューションズ株式会社 | 水素センサ及び燃料電池自動車、並びに水素検出方法 |
JP6437689B1 (ja) * | 2018-08-07 | 2018-12-12 | 新コスモス電機株式会社 | Mems型半導体式ガス検知素子 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1482584A (en) * | 1973-07-13 | 1977-08-10 | Tokyo Shibaura Electric Co | Moisture responsive resistance element |
JPS5320318B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1973-12-20 | 1978-06-26 | ||
GB1477082A (en) * | 1974-10-15 | 1977-06-22 | Tokyo Shibaura Electric Co | Gas-sensing material |
DE3062564D1 (en) * | 1979-01-31 | 1983-05-11 | Rosemount Eng Co Ltd | An oxygen-sensitive element and a method of detecting oxygen concentration |
JPS56168542A (en) * | 1980-05-30 | 1981-12-24 | Sharp Corp | Aging device for sno2 series semiconductor gas sensor |
US4324761A (en) * | 1981-04-01 | 1982-04-13 | General Electric Company | Hydrogen detector |
-
1982
- 1982-12-28 JP JP57227568A patent/JPS59120945A/ja active Granted
-
1983
- 1983-12-22 CA CA000444091A patent/CA1204474A/en not_active Expired
- 1983-12-22 EP EP83307857A patent/EP0115183B1/en not_active Expired
- 1983-12-22 US US06/564,446 patent/US4608549A/en not_active Expired - Lifetime
- 1983-12-22 DE DE8383307857T patent/DE3379285D1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0115183B1 (en) | 1989-03-01 |
JPS59120945A (ja) | 1984-07-12 |
JPS6131422B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1986-07-19 |
EP0115183A3 (en) | 1985-09-25 |
DE3379285D1 (en) | 1989-04-06 |
US4608549A (en) | 1986-08-26 |
EP0115183A2 (en) | 1984-08-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MKEX | Expiry |