CA1166766A - Method and apparatus for forming a variable size electron beam - Google Patents

Method and apparatus for forming a variable size electron beam

Info

Publication number
CA1166766A
CA1166766A CA000291957A CA291957A CA1166766A CA 1166766 A CA1166766 A CA 1166766A CA 000291957 A CA000291957 A CA 000291957A CA 291957 A CA291957 A CA 291957A CA 1166766 A CA1166766 A CA 1166766A
Authority
CA
Canada
Prior art keywords
image
aperture
deflection
source
plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000291957A
Other languages
English (en)
French (fr)
Inventor
Hans C. Pfeiffer
Philip M. Ryan
Edward V. Weber
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of CA1166766A publication Critical patent/CA1166766A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
CA000291957A 1977-02-23 1977-11-29 Method and apparatus for forming a variable size electron beam Expired CA1166766A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US77123577A 1977-02-23 1977-02-23
US771,235 1977-02-23

Publications (1)

Publication Number Publication Date
CA1166766A true CA1166766A (en) 1984-05-01

Family

ID=25091155

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000291957A Expired CA1166766A (en) 1977-02-23 1977-11-29 Method and apparatus for forming a variable size electron beam

Country Status (9)

Country Link
JP (1) JPS53124078A (uk)
BR (1) BR7801031A (uk)
CA (1) CA1166766A (uk)
DE (1) DE2805371C2 (uk)
FR (1) FR2382091A1 (uk)
GB (1) GB1587852A (uk)
IT (1) IT1158434B (uk)
NL (1) NL7802010A (uk)
SE (1) SE437441B (uk)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS543476A (en) * 1977-06-09 1979-01-11 Jeol Ltd Electron beam exposure device
GB1598219A (en) * 1977-08-10 1981-09-16 Ibm Electron beam system
JPS5679429A (en) * 1979-12-03 1981-06-30 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron beam exposure process
EP0053225B1 (en) * 1980-11-28 1985-03-13 International Business Machines Corporation Electron beam system and method
US4423305A (en) * 1981-07-30 1983-12-27 International Business Machines Corporation Method and apparatus for controlling alignment of an electron beam of a variable shape
JPS5928336A (ja) * 1982-08-09 1984-02-15 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成法
CN116441562B (zh) * 2023-06-16 2023-08-15 西安赛隆增材技术股份有限公司 一种电子束的束斑的校准装置及校准方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6807439A (uk) * 1968-05-27 1969-12-01
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3801792A (en) * 1973-05-23 1974-04-02 Bell Telephone Labor Inc Electron beam apparatus
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
GB1557924A (en) * 1976-02-05 1979-12-19 Western Electric Co Irradiation apparatus and methods
FR2351497A1 (fr) * 1976-05-14 1977-12-09 Thomson Csf Dispositif permettant le trace programme de figures de formes differentes
NL177578C (nl) * 1976-05-14 1985-10-16 Thomson Csf Inrichting voor het beschrijven van een voorwerp met een deeltjesbundel.
DE2627632A1 (de) * 1976-06-19 1977-12-22 Jenoptik Jena Gmbh Verfahren und einrichtung zur nichtthermischen elektronenstrahlbearbeitung
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus

Also Published As

Publication number Publication date
NL7802010A (nl) 1978-08-25
DE2805371A1 (de) 1978-08-24
IT7820143A0 (it) 1978-02-10
SE7801728L (sv) 1978-08-24
DE2805371C2 (de) 1984-02-16
JPS5424833B2 (uk) 1979-08-23
IT1158434B (it) 1987-02-18
GB1587852A (en) 1981-04-08
JPS53124078A (en) 1978-10-30
SE437441B (sv) 1985-02-25
FR2382091A1 (fr) 1978-09-22
FR2382091B1 (uk) 1982-04-09
BR7801031A (pt) 1978-12-12

Similar Documents

Publication Publication Date Title
US4243866A (en) Method and apparatus for forming a variable size electron beam
US4145597A (en) Electron beam lithographic system
CA1103813A (en) Apparatus for electron beam lithography
GB2116358A (en) Charged particle beam exposure system utilizing variable line scan
EP0073658B1 (en) Electron beam exposing method
CA1166766A (en) Method and apparatus for forming a variable size electron beam
JPH02125609A (ja) 半導体製造装置
JPS5823155A (ja) 荷電粒子ビ−ムの整列制御装置
EP0139325B1 (en) Electron lithography apparatus
CA1149086A (en) Variable-spot raster scanning in an electron beam exposure system
US4167676A (en) Variable-spot scanning in an electron beam exposure system
EP0023810A1 (en) Method of electron beam exposure
US4392058A (en) Electron beam lithography
US6455863B1 (en) Apparatus and method for forming a charged particle beam of arbitrary shape
US5712488A (en) Electron beam performance measurement system and method thereof
EP0035556B1 (en) Electron beam system
JP3299647B2 (ja) 電子線描画装置および電子線描画方法
US5936252A (en) Charged particle beam performance measurement system and method thereof
US4868395A (en) Electron beam lithography system for delineating a desired pattern on a target by means of electron beams
US4158140A (en) Electron beam exposure apparatus
CN111433881B (zh) 样品检查中的图像对比度增强
JP3697494B2 (ja) ビームエッジぼけ量測定方法及びリフォーカス量決定方法、これらの方法に用いられるステンシルマスク並びに荷電粒子ビーム露光方法及び装置
TWI840768B (zh) 帶電粒子束描圖裝置
JP2594660B2 (ja) 荷電粒子ビーム露光方法
JP3094454B2 (ja) 電子線露光方法

Legal Events

Date Code Title Description
MKEX Expiry