CA1164943A - Gas detector - Google Patents
Gas detectorInfo
- Publication number
- CA1164943A CA1164943A CA000356948A CA356948A CA1164943A CA 1164943 A CA1164943 A CA 1164943A CA 000356948 A CA000356948 A CA 000356948A CA 356948 A CA356948 A CA 356948A CA 1164943 A CA1164943 A CA 1164943A
- Authority
- CA
- Canada
- Prior art keywords
- film
- gas
- substance
- electrically conductive
- detected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000126 substance Substances 0.000 claims abstract description 43
- 238000010438 heat treatment Methods 0.000 claims abstract description 31
- 230000003197 catalytic effect Effects 0.000 claims abstract description 24
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 239000000463 material Substances 0.000 claims abstract description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims 1
- 150000004706 metal oxides Chemical class 0.000 claims 1
- 239000007789 gas Substances 0.000 description 34
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 32
- 235000012239 silicon dioxide Nutrition 0.000 description 17
- 239000000377 silicon dioxide Substances 0.000 description 17
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- 229910052681 coesite Inorganic materials 0.000 description 11
- 229910052906 cristobalite Inorganic materials 0.000 description 11
- 229910052682 stishovite Inorganic materials 0.000 description 11
- 229910052905 tridymite Inorganic materials 0.000 description 11
- 238000010276 construction Methods 0.000 description 8
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 229910052697 platinum Inorganic materials 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 229910018879 Pt—Pd Inorganic materials 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 230000006903 response to temperature Effects 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 239000002341 toxic gas Substances 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- PBAYDYUZOSNJGU-UHFFFAOYSA-N chelidonic acid Natural products OC(=O)C1=CC(=O)C=C(C(O)=O)O1 PBAYDYUZOSNJGU-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000003057 platinum Chemical class 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/14—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of an electrically-heated body in dependence upon change of temperature
- G01N27/16—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of an electrically-heated body in dependence upon change of temperature caused by burning or catalytic oxidation of surrounding material to be tested, e.g. of gas
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9363879A JPS5618750A (en) | 1979-07-25 | 1979-07-25 | Gas detector |
| JP93638/1979 | 1979-07-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1164943A true CA1164943A (en) | 1984-04-03 |
Family
ID=14087883
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000356948A Expired CA1164943A (en) | 1979-07-25 | 1980-07-24 | Gas detector |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4343768A (en, 2012) |
| JP (1) | JPS5618750A (en, 2012) |
| CA (1) | CA1164943A (en, 2012) |
| DE (1) | DE3028249C2 (en, 2012) |
Families Citing this family (83)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2085166A (en) * | 1980-10-07 | 1982-04-21 | Itt Ind Ltd | Semiconductor gas sensor |
| US4423407A (en) * | 1981-02-27 | 1983-12-27 | Dart Industries Inc. | Apparatus and method for measuring the concentration of gases |
| US4472239A (en) * | 1981-10-09 | 1984-09-18 | Honeywell, Inc. | Method of making semiconductor device |
| US4696188A (en) * | 1981-10-09 | 1987-09-29 | Honeywell Inc. | Semiconductor device microstructure |
| DE3377738D1 (en) * | 1982-08-27 | 1988-09-22 | Toshiba Kk | Co gas detecting device and circuit for driving the same |
| US4478077A (en) * | 1982-09-30 | 1984-10-23 | Honeywell Inc. | Flow sensor |
| US4825693A (en) * | 1982-09-30 | 1989-05-02 | Honeywell Inc. | Slotted diaphragm semiconductor device |
| US4478076A (en) * | 1982-09-30 | 1984-10-23 | Honeywell Inc. | Flow sensor |
| US4683159A (en) * | 1982-09-30 | 1987-07-28 | Honeywell Inc. | Semiconductor device structure and processing |
| US4442420A (en) * | 1982-09-30 | 1984-04-10 | Ford Motor Company | Partial pressure of oxygen sensor-II |
| US4651564A (en) * | 1982-09-30 | 1987-03-24 | Honeywell Inc. | Semiconductor device |
| US4501144A (en) * | 1982-09-30 | 1985-02-26 | Honeywell Inc. | Flow sensor |
| JPS5991350A (ja) * | 1982-11-17 | 1984-05-26 | Toyota Central Res & Dev Lab Inc | 薄膜酸素センサ |
| JPS59143946A (ja) * | 1983-02-07 | 1984-08-17 | Richo Seiki Kk | ガス検出装置 |
| JPS59143945A (ja) * | 1983-02-07 | 1984-08-17 | Richo Seiki Kk | ガス検出装置 |
| JPS6060547A (ja) * | 1983-09-13 | 1985-04-08 | Richo Seiki Kk | ガス検出装置 |
| CA1216330A (en) * | 1983-02-07 | 1987-01-06 | Junji Manaka | Low power gas detector |
| JPS6013220A (ja) * | 1983-07-04 | 1985-01-23 | Esutetsuku:Kk | ガス流量センサ−及びその製造方法 |
| US4542650A (en) * | 1983-08-26 | 1985-09-24 | Innovus | Thermal mass flow meter |
| US4966037A (en) * | 1983-09-12 | 1990-10-30 | Honeywell Inc. | Cantilever semiconductor device |
| US4829818A (en) * | 1983-12-27 | 1989-05-16 | Honeywell Inc. | Flow sensor housing |
| DE3513033A1 (de) * | 1984-05-05 | 1985-11-21 | Gesellschaft für Gerätebau mbH, 4600 Dortmund | Sensor fuer die katalytische verbrennung |
| US4594889A (en) * | 1984-12-06 | 1986-06-17 | Ford Motor Company | Mass airflow sensor |
| JPS61170618A (ja) * | 1985-01-24 | 1986-08-01 | Toyota Central Res & Dev Lab Inc | 流速検出用半導体センサ |
| JPS6295454A (ja) * | 1985-10-22 | 1987-05-01 | Nippon Telegr & Teleph Corp <Ntt> | マイクロガスセンサおよびその製造方法 |
| US4706493A (en) * | 1985-12-13 | 1987-11-17 | General Motors Corporation | Semiconductor gas sensor having thermally isolated site |
| JPH079411B2 (ja) * | 1986-03-24 | 1995-02-01 | リコ−精器株式会社 | 雰囲気検出装置 |
| GB8607874D0 (en) * | 1986-04-01 | 1986-05-08 | Lucas Ind Plc | Temperature/sensitive resistance element |
| US4682503A (en) * | 1986-05-16 | 1987-07-28 | Honeywell Inc. | Microscopic size, thermal conductivity type, air or gas absolute pressure sensor |
| JPH0795002B2 (ja) | 1987-04-22 | 1995-10-11 | シャープ株式会社 | センサ素子 |
| DE3724966C3 (de) * | 1986-07-29 | 1996-03-21 | Sharp Kk | Sensor |
| EP0265834B1 (en) * | 1986-10-28 | 1992-07-22 | Figaro Engineering Inc. | Sensor and method of producing same |
| JPS63282662A (ja) * | 1987-03-05 | 1988-11-18 | Yamatake Honeywell Co Ltd | 流速センサ |
| JPH0695082B2 (ja) * | 1987-10-08 | 1994-11-24 | 新コスモス電機株式会社 | 吸引式オゾンガス検知器 |
| US4909078A (en) * | 1987-10-14 | 1990-03-20 | Rosemount Inc. | Fluid flow detector |
| JPH0264417A (ja) * | 1988-08-31 | 1990-03-05 | Ricoh Co Ltd | 流速センサ |
| DE3844023A1 (de) * | 1988-12-27 | 1990-06-28 | Hartmann & Braun Ag | Sensor zur bestimmung der gaskonzentration in einem gasgemisch durch messung der waermetoenung |
| JPH02211711A (ja) * | 1989-02-13 | 1990-08-23 | Iseki Tory Tech Inc | 自己保持回路及び前記自己保持回路を用いた順序判別回路 |
| US4953387A (en) * | 1989-07-31 | 1990-09-04 | The Regents Of The University Of Michigan | Ultrathin-film gas detector |
| CN1019331B (zh) * | 1989-08-11 | 1992-12-02 | 法国煤矿公司 | 薄膜细丝型传感器及其制造方法和应用 |
| GB2238617A (en) * | 1989-11-28 | 1991-06-05 | Eev Ltd | Detector for flammable gases |
| US5314828A (en) * | 1990-06-12 | 1994-05-24 | Catalytica, Inc. | NOx sensor and process for detecting NOx |
| ATE134446T1 (de) * | 1990-06-12 | 1996-03-15 | Catalytica Inc | Stickoxyd-sensoraufbau |
| US5338515A (en) * | 1990-08-17 | 1994-08-16 | Catalytica, Inc. | SO2 sensor |
| US5201221A (en) * | 1991-03-15 | 1993-04-13 | Ford Motor Company | Flow sensor and method of manufacture |
| US5262127A (en) * | 1992-02-12 | 1993-11-16 | The Regents Of The University Of Michigan | Solid state chemical micro-reservoirs |
| US5382341A (en) * | 1992-09-10 | 1995-01-17 | Aroutiounian; Vladimir M. | Method of making smoke detector |
| US5466605A (en) * | 1993-03-15 | 1995-11-14 | Arizona Board Of Regents | Method for detection of chemical components |
| WO1994028372A1 (en) * | 1993-05-25 | 1994-12-08 | Rosemount Inc. | Organic chemical sensor |
| US5372785A (en) * | 1993-09-01 | 1994-12-13 | International Business Machines Corporation | Solid-state multi-stage gas detector |
| DE4402117C2 (de) * | 1994-01-25 | 1995-11-23 | Siemens Matsushita Components | Hochtemperatur-Gassensor und Verfahren zu seiner Herstellung |
| JP3452409B2 (ja) * | 1994-08-10 | 2003-09-29 | 株式会社リコー | マイクロブリッジヒータ |
| JP2880651B2 (ja) * | 1994-08-12 | 1999-04-12 | 東京瓦斯株式会社 | 熱式マイクロフローセンサ及びその製造方法 |
| KR100332742B1 (ko) * | 1994-10-26 | 2002-11-23 | 엘지전자주식회사 | 가스센서의제조방법 |
| US5985673A (en) * | 1994-12-22 | 1999-11-16 | Arizona Baord Of Regents | Method for regeneration of a sensor |
| FR2746183B1 (fr) * | 1996-03-14 | 1998-06-05 | Dispositif capteur chimique a semiconducteur et procede de formation d'un dispositif capteur chimique a semiconducteur | |
| US5759493A (en) * | 1996-04-30 | 1998-06-02 | Arizona Instrument Corporation | Apparatus for detecting a specified gas within a mixture |
| US5659127A (en) * | 1996-08-26 | 1997-08-19 | Opto Tech Corporation | Substrate structure of monolithic gas sensor |
| US5948361A (en) * | 1996-08-27 | 1999-09-07 | Motorola, Inc. | Chemical sensor and method of making same |
| TW366417B (en) * | 1997-10-27 | 1999-08-11 | Nat Science Council | Integrated high-performance gas sensor and the manufacturing method |
| US6032527A (en) * | 1998-07-01 | 2000-03-07 | Memsys, Inc. | Solid state microanemometer |
| DE69924516D1 (de) * | 1998-10-31 | 2005-05-04 | Yellow Springs Optical Sensor | Kapsel für co2 sensor |
| US6911894B2 (en) * | 1998-12-07 | 2005-06-28 | Honeywell International Inc. | Sensor package for harsh environments |
| US7258003B2 (en) * | 1998-12-07 | 2007-08-21 | Honeywell International Inc. | Flow sensor with self-aligned flow channel |
| US6474138B1 (en) | 2000-11-28 | 2002-11-05 | Honeywell International Inc. | Adsorption based carbon monoxide sensor and method |
| US6550310B1 (en) | 2000-11-28 | 2003-04-22 | Honeywell International Inc. | Catalytic adsorption and oxidation based carbon monoxide sensor and detection method |
| US7034652B2 (en) * | 2001-07-10 | 2006-04-25 | Littlefuse, Inc. | Electrostatic discharge multifunction resistor |
| US6681623B2 (en) | 2001-10-30 | 2004-01-27 | Honeywell International Inc. | Flow and pressure sensor for harsh fluids |
| US6916664B2 (en) * | 2002-06-14 | 2005-07-12 | Honeywell International Inc. | Flammable vapor sensor |
| RU2231779C1 (ru) * | 2002-10-18 | 2004-06-27 | Институт физики полупроводников Объединенного института физики полупроводников СО РАН | Полупроводниковый датчик для регистрации взрывоопасных газовых компонент в воздухе |
| US20040084308A1 (en) * | 2002-11-01 | 2004-05-06 | Cole Barrett E. | Gas sensor |
| US6763699B1 (en) * | 2003-02-06 | 2004-07-20 | The United States Of America As Represented By The Administrator Of Natural Aeronautics And Space Administration | Gas sensors using SiC semiconductors and method of fabrication thereof |
| US6973819B2 (en) * | 2003-11-01 | 2005-12-13 | Honeywell International Inc. | Differential compensated vapor sensor |
| US20050120805A1 (en) * | 2003-12-04 | 2005-06-09 | John Lane | Method and apparatus for substrate temperature control |
| US7036369B2 (en) * | 2004-06-30 | 2006-05-02 | Codman & Shurtleff, Inc. | Thermal flow sensor having recesses in a substrate |
| US7181963B2 (en) * | 2004-06-30 | 2007-02-27 | Codman & Shurtleff, Inc | Thermal flow sensor having streamlined packaging |
| US20060000272A1 (en) * | 2004-06-30 | 2006-01-05 | Beat Neuenschwander | Thermal flow sensor having an asymmetric design |
| US20080013291A1 (en) * | 2006-07-17 | 2008-01-17 | Toralf Bork | Thermal flow sensor having streamlined packaging |
| US7255001B1 (en) * | 2006-07-25 | 2007-08-14 | Honeywell International Inc. | Thermal fluid flow sensor and method of forming same technical field |
| RU2347078C1 (ru) * | 2007-07-02 | 2009-02-20 | Государственное образовательное учреждение высшего профессионального образования "Уральский государственный университет путей сообщения" (УрГУПС) | Устройство контроля концентрации метана в атмосфере подземных выработок |
| US8021617B2 (en) * | 2009-10-27 | 2011-09-20 | Clean Air Engineering, Inc. | Flue gas monitoring and dynamic spiking for sulfur trioxide/sulfuric acid |
| DE102013217465A1 (de) * | 2013-09-02 | 2015-03-05 | Continental Automotive Gmbh | Sensor zur Detektion oxidierbarer Gase |
| US10900922B2 (en) * | 2018-07-17 | 2021-01-26 | Msa Technology, Llc | Power reduction in combustible gas sensors |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3479257A (en) * | 1966-11-25 | 1969-11-18 | Gen Electric | Methods and apparatus for measuring the content of hydrogen or reducing gases in an atmosphere |
| US3901067A (en) * | 1973-06-21 | 1975-08-26 | Gen Monitors | Semiconductor gas detector and method therefor |
| US4039941A (en) * | 1975-05-09 | 1977-08-02 | Stanford Research Institute | Gas sensor |
| JPS5395097A (en) * | 1977-01-31 | 1978-08-19 | Toshiba Corp | Gas-sensitive element |
| JPS55119381A (en) * | 1979-03-08 | 1980-09-13 | Mitsuteru Kimura | Electric heater |
-
1979
- 1979-07-25 JP JP9363879A patent/JPS5618750A/ja active Granted
-
1980
- 1980-07-23 US US06/171,387 patent/US4343768A/en not_active Expired - Lifetime
- 1980-07-24 CA CA000356948A patent/CA1164943A/en not_active Expired
- 1980-07-25 DE DE3028249A patent/DE3028249C2/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US4343768A (en) | 1982-08-10 |
| JPS5618750A (en) | 1981-02-21 |
| JPS6323500B2 (en, 2012) | 1988-05-17 |
| DE3028249A1 (de) | 1981-02-05 |
| DE3028249C2 (de) | 1985-10-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry |