CA1157573A - Bipolar transistors - Google Patents

Bipolar transistors

Info

Publication number
CA1157573A
CA1157573A CA000372289A CA372289A CA1157573A CA 1157573 A CA1157573 A CA 1157573A CA 000372289 A CA000372289 A CA 000372289A CA 372289 A CA372289 A CA 372289A CA 1157573 A CA1157573 A CA 1157573A
Authority
CA
Canada
Prior art keywords
region
collector
base
transistor
emitter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000372289A
Other languages
English (en)
French (fr)
Inventor
Yoshihito Amemiya
Tsuneo Urisu
Yoshihiko Mizushima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Application granted granted Critical
Publication of CA1157573A publication Critical patent/CA1157573A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/137Collector regions of BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • H10D10/80Heterojunction BJTs
    • H10D10/821Vertical heterojunction BJTs
    • H10D10/861Vertical heterojunction BJTs having an emitter region comprising one or more non-monocrystalline elements of Group IV, e.g. amorphous silicon
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/40Crystalline structures

Landscapes

  • Bipolar Transistors (AREA)
  • Junction Field-Effect Transistors (AREA)
CA000372289A 1980-03-10 1981-03-04 Bipolar transistors Expired CA1157573A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP55030096A JPS5946103B2 (ja) 1980-03-10 1980-03-10 トランジスタ
JP30096/'80 1980-03-10

Publications (1)

Publication Number Publication Date
CA1157573A true CA1157573A (en) 1983-11-22

Family

ID=12294243

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000372289A Expired CA1157573A (en) 1980-03-10 1981-03-04 Bipolar transistors

Country Status (7)

Country Link
US (1) US4414557A (en:Method)
JP (1) JPS5946103B2 (en:Method)
CA (1) CA1157573A (en:Method)
DE (1) DE3108491A1 (en:Method)
FR (1) FR2477777B1 (en:Method)
GB (1) GB2073486B (en:Method)
NL (1) NL189272C (en:Method)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2520157B1 (fr) * 1982-01-18 1985-09-13 Labo Electronique Physique Dispositif semi-conducteur du genre transistor a heterojonction(s)
US4910562A (en) * 1982-04-26 1990-03-20 International Business Machines Corporation Field induced base transistor
JPS5941877A (ja) * 1982-08-31 1984-03-08 Junichi Nishizawa フオトトランジスタ
JPS59227161A (ja) * 1983-05-25 1984-12-20 アメリカン・テレフォン・アンド・テレグラフ・カムパニー バイポ−ラトランジスタ
US4794440A (en) * 1983-05-25 1988-12-27 American Telephone And Telegraph Company, At&T Bell Laboratories Heterojunction bipolar transistor
JPS60110159A (ja) * 1983-11-21 1985-06-15 Toshiba Corp ヘテロ接合バイポ−ラトランジスタ
JPH0750714B2 (ja) * 1984-01-30 1995-05-31 日本電気株式会社 バイポーラトランジスタ
US4691215A (en) * 1985-01-09 1987-09-01 American Telephone And Telegraph Company Hot electron unipolar transistor with two-dimensional degenerate electron gas base with continuously graded composition compound emitter
GB2191036A (en) * 1986-05-23 1987-12-02 Philips Electronic Associated Hot charge-carrier transistors
SE8704121D0 (sv) * 1987-10-23 1987-10-23 Linkopings Silicon Constructio Transistor
US4985742A (en) * 1989-07-07 1991-01-15 University Of Colorado Foundation, Inc. High temperature semiconductor devices having at least one gallium nitride layer
JP3150376B2 (ja) * 1991-09-30 2001-03-26 ローム株式会社 ヘテロ接合バイポーラトランジスタの製法
US5285083A (en) * 1992-04-27 1994-02-08 The University Of British Columbia Inverted heterojunction bipolar device having undoped amorphous silicon layer
US5700701A (en) * 1992-10-30 1997-12-23 Texas Instruments Incorporated Method for reducing junction capacitance and increasing current gain in collector-up bipolar transistors
US5766262A (en) * 1996-03-29 1998-06-16 Mikhail; W. E. Michael Femoral prosthesis with spacer
US6228092B1 (en) 1999-07-29 2001-05-08 W. E. Michael Mikhail System for performing hip prosthesis surgery
US6407617B1 (en) * 1999-11-19 2002-06-18 Matsushita Electric Industrial Co., Ltd. Bias circuit and method of fabricating semiconductor device
US7005702B1 (en) * 2000-05-05 2006-02-28 International Rectifier Corporation IGBT with amorphous silicon transparent collector
CN107516670B (zh) * 2017-08-17 2019-12-10 电子科技大学 一种具有高电流上升率的栅控晶闸管

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2569347A (en) * 1948-06-26 1951-09-25 Bell Telephone Labor Inc Circuit element utilizing semiconductive material
US3780359A (en) * 1971-12-20 1973-12-18 Ibm Bipolar transistor with a heterojunction emitter and a method fabricating the same
JPS5147583B2 (en:Method) * 1972-12-29 1976-12-15
JPS50128697A (en:Method) * 1974-03-30 1975-10-09
JPS51128268A (en) * 1975-04-30 1976-11-09 Sony Corp Semiconductor unit
FR2352404A1 (fr) * 1976-05-20 1977-12-16 Comp Generale Electricite Transistor a heterojonction
JPS5368985A (en) * 1976-12-02 1978-06-19 Toshiba Corp Junction type field effect transistor
US4173763A (en) * 1977-06-09 1979-11-06 International Business Machines Corporation Heterojunction tunneling base transistor
US4160258A (en) * 1977-11-18 1979-07-03 Bell Telephone Laboratories, Incorporated Optically coupled linear bilateral transistor
US4254429A (en) * 1978-07-08 1981-03-03 Shunpei Yamazaki Hetero junction semiconductor device

Also Published As

Publication number Publication date
FR2477777A1 (fr) 1981-09-11
DE3108491A1 (de) 1982-04-01
NL189272C (nl) 1993-02-16
GB2073486A (en) 1981-10-14
DE3108491C2 (en:Method) 1990-03-22
US4414557A (en) 1983-11-08
NL8101107A (nl) 1981-10-01
GB2073486B (en) 1984-12-19
FR2477777B1 (fr) 1985-09-20
JPS56125871A (en) 1981-10-02
JPS5946103B2 (ja) 1984-11-10
NL189272B (nl) 1992-09-16

Similar Documents

Publication Publication Date Title
CA1157573A (en) Bipolar transistors
CA1075373A (en) Semiconductor device having a hetero junction
US5734183A (en) Heterojunction bipolar transistor structure
CA1071772A (en) Method of manufacturing a semi-conductor device employing semi-conductor to semi-insulator conversion by ion implantation
EP0507454B1 (en) Semiconductor device comprising a heterojunction bipolar transistor and method of making the same
US3717507A (en) Method of manufacturing semiconductor devices utilizing ion-implantation and arsenic diffusion
US4672413A (en) Barrier emitter transistor
EP0168325B1 (en) Ion implantation to increase emitter energy gap in bipolar transistors
Sasaki et al. An amorphous SiC: H emitter heterojunction bipolar transistor
US5912481A (en) Heterojunction bipolar transistor having wide bandgap, low interdiffusion base-emitter junction
KR930002511B1 (ko) 반도체장치
US3872494A (en) Field-contoured high speed, high voltage transistor
US5473172A (en) Hetero junction bipolar transistor
EP0622853B1 (en) Insulated gate bipolar transistor
EP0116652B1 (en) Phototransistor
US4811070A (en) Heterojunction bipolar transistor with inversion layer base
EP0361759A2 (en) Heterostructure bipolar transistor
Symons et al. The use of amorphous and microcrystalline silicon for silicon heterojunction bipolar transistors
KR810000963B1 (ko) 반도체 장치
JPH06101450B2 (ja) 半導体装置の製造方法
EP0231656B1 (en) Silicon semiconductor device
JPH06252158A (ja) 半導体装置
Chang et al. An isolated Al-poly Si-(p) Si-(n+) Si switching device
JPH0249432A (ja) ヘテロバイポーラトランジスタ
JP2768970B2 (ja) 半導体装置およびこれを用いた光電変換装置

Legal Events

Date Code Title Description
MKEX Expiry