CA1106143A - Method of making an amorphous silicon dioxide free of metal ions - Google Patents

Method of making an amorphous silicon dioxide free of metal ions

Info

Publication number
CA1106143A
CA1106143A CA281,822A CA281822A CA1106143A CA 1106143 A CA1106143 A CA 1106143A CA 281822 A CA281822 A CA 281822A CA 1106143 A CA1106143 A CA 1106143A
Authority
CA
Canada
Prior art keywords
silicon dioxide
silicon
polishing
metal ions
making
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA281,822A
Other languages
English (en)
French (fr)
Inventor
Friedrich W. Schwerdt
Hans-Heinz Steinbeck
Friedrich C. Brunner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of CA1106143A publication Critical patent/CA1106143A/en
Expired legal-status Critical Current

Links

Classifications

    • H10P52/402—
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Silicon Compounds (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
CA281,822A 1976-07-02 1977-06-30 Method of making an amorphous silicon dioxide free of metal ions Expired CA1106143A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEP2629709.6 1976-07-02
DE2629709A DE2629709C2 (de) 1976-07-02 1976-07-02 Verfahren zur Herstellung eines metallionenfreien amorphen Siliciumdioxids und daraus hergestelltes Poliermittel zum mechanischen Polieren von Halbleiteroberflächen

Publications (1)

Publication Number Publication Date
CA1106143A true CA1106143A (en) 1981-08-04

Family

ID=5982012

Family Applications (1)

Application Number Title Priority Date Filing Date
CA281,822A Expired CA1106143A (en) 1976-07-02 1977-06-30 Method of making an amorphous silicon dioxide free of metal ions

Country Status (7)

Country Link
US (1) US4117093A (enExample)
JP (1) JPS535098A (enExample)
CA (1) CA1106143A (enExample)
DE (1) DE2629709C2 (enExample)
FR (1) FR2356595A1 (enExample)
GB (1) GB1540798A (enExample)
IT (1) IT1114887B (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4421527A (en) * 1977-12-20 1983-12-20 J. M. Huber Corporation High fluoride compatibility dentifrice abrasives and compositions
US4169337A (en) * 1978-03-30 1979-10-02 Nalco Chemical Company Process for polishing semi-conductor materials
AT391122B (de) * 1978-05-24 1990-08-27 Grace W R & Co Verfahren zur herstellung eines siliciumdioxidhydrogels
DE2909930C2 (de) * 1979-03-14 1984-05-10 Basf Ag, 6700 Ludwigshafen Neue kristalline SiO↓2↓-Modifikation und Verfahren zu ihrer Herstellung
JPS5845050B2 (ja) * 1979-12-28 1983-10-06 富士通株式会社 バス集中監視方式
JPS5696310A (en) * 1979-12-28 1981-08-04 Fujitsu Ltd Centralized control system of bus
AU568400B2 (en) * 1983-08-31 1987-12-24 E.I. Du Pont De Nemours And Company Preparation of silica polymorphs from silicon
JPS6244855A (ja) * 1985-08-22 1987-02-26 Panafacom Ltd メモリ・アクセス制御方式
JPH0686144U (ja) * 1991-10-01 1994-12-13 株式会社ピーエフユー メモリ・アクセス制御装置
US5391258A (en) * 1993-05-26 1995-02-21 Rodel, Inc. Compositions and methods for polishing
FR2761629B1 (fr) * 1997-04-07 1999-06-18 Hoechst France Nouveau procede de polissage mecano-chimique de couches de materiaux semi-conducteurs a base de polysilicium ou d'oxyde de silicium dope
AU7147798A (en) 1997-04-23 1998-11-13 Advanced Chemical Systems International, Inc. Planarization compositions for cmp of interlayer dielectrics
RU2144498C1 (ru) * 1999-02-01 2000-01-20 Земнухова Людмила Алексеевна Способ получения высокочистых аморфных диоксида кремния и углерода из рисовой шелухи
RU2161124C1 (ru) * 1999-09-16 2000-12-27 Виноградов Виктор Владимирович Способ подготовки рисовой шелухи для получения высокочистого диоксида кремния
DE10060343A1 (de) * 2000-12-04 2002-06-06 Bayer Ag Polierslurry für das chemisch-mechanische Polieren von Metall- und Dielektrikastrukturen
RU2191159C1 (ru) * 2001-05-25 2002-10-20 Хачатуров Николай Артемович Способ получения ультрадисперсного аморфного или нанокристаллического диоксида кремния
US7001827B2 (en) * 2003-04-15 2006-02-21 International Business Machines Corporation Semiconductor wafer front side protection
JP5972660B2 (ja) * 2012-03-28 2016-08-17 株式会社アドマテックス コロイドシリカの製造方法及びｃｍｐ用スラリーの製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2744001A (en) * 1950-09-08 1956-05-01 Rare Earths Inc Polishing material and method of making same
NL106490C (enExample) * 1955-12-22
US3208823A (en) * 1958-10-20 1965-09-28 Philadelphia Quartz Co Finely divided silica product and its method of preparation
US3715842A (en) * 1970-07-02 1973-02-13 Tizon Chem Corp Silica polishing compositions having a reduced tendency to scratch silicon and germanium surfaces
US3922393A (en) * 1974-07-02 1975-11-25 Du Pont Process for polishing silicon and germanium semiconductor materials

Also Published As

Publication number Publication date
DE2629709A1 (de) 1978-01-05
DE2629709C2 (de) 1982-06-03
JPS535098A (en) 1978-01-18
US4117093A (en) 1978-09-26
FR2356595B1 (enExample) 1979-03-09
JPS5551845B2 (enExample) 1980-12-26
IT1114887B (it) 1986-01-27
FR2356595A1 (fr) 1978-01-27
GB1540798A (en) 1979-02-14

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