CA1049313A - Method for developing a photosensitive resin plate - Google Patents

Method for developing a photosensitive resin plate

Info

Publication number
CA1049313A
CA1049313A CA223,660A CA223660A CA1049313A CA 1049313 A CA1049313 A CA 1049313A CA 223660 A CA223660 A CA 223660A CA 1049313 A CA1049313 A CA 1049313A
Authority
CA
Canada
Prior art keywords
suction
plate
photosensitive
exposed
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA223,660A
Other languages
English (en)
French (fr)
Other versions
CA223660S (en
Inventor
Takezo Sano
Yukikazu Uemura
Akihiro Furuta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Application granted granted Critical
Publication of CA1049313A publication Critical patent/CA1049313A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/36Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CA223,660A 1974-04-24 1975-04-02 Method for developing a photosensitive resin plate Expired CA1049313A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4678574A JPS50139741A (enrdf_load_stackoverflow) 1974-04-24 1974-04-24

Publications (1)

Publication Number Publication Date
CA1049313A true CA1049313A (en) 1979-02-27

Family

ID=12756972

Family Applications (1)

Application Number Title Priority Date Filing Date
CA223,660A Expired CA1049313A (en) 1974-04-24 1975-04-02 Method for developing a photosensitive resin plate

Country Status (7)

Country Link
JP (1) JPS50139741A (enrdf_load_stackoverflow)
CA (1) CA1049313A (enrdf_load_stackoverflow)
DE (1) DE2518274A1 (enrdf_load_stackoverflow)
FR (1) FR2280109A1 (enrdf_load_stackoverflow)
GB (1) GB1483716A (enrdf_load_stackoverflow)
IT (1) IT1032728B (enrdf_load_stackoverflow)
NL (1) NL7504882A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52113807A (en) * 1976-03-19 1977-09-24 Ube Industries Apparatus for treating photoosensitive resin plate
DE3424187A1 (de) * 1984-06-30 1986-01-09 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung eines resistmusters
JP2516866B2 (ja) * 1991-12-10 1996-07-24 株式会社白興商会 シャツ類を包装するためのハンガ―及び該ハンガ―を利用したシャツ類の包装方法と簡易包装装置
JP2003021916A (ja) * 2001-06-21 2003-01-24 Agfa Gevaert Nv 平板印刷用版前駆体の製造法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS541201B2 (enrdf_load_stackoverflow) * 1973-12-25 1979-01-22

Also Published As

Publication number Publication date
FR2280109A1 (fr) 1976-02-20
JPS50139741A (enrdf_load_stackoverflow) 1975-11-08
FR2280109B1 (enrdf_load_stackoverflow) 1979-07-13
NL7504882A (nl) 1975-10-28
DE2518274A1 (de) 1975-11-06
GB1483716A (en) 1977-08-24
IT1032728B (it) 1979-06-20

Similar Documents

Publication Publication Date Title
KR100214738B1 (ko) 인쇄판
CA1179180A (en) Lithographic printing plate with photosensitive layer containing an emulsion polymer having perfluoroalkyl groups
EP0043132B2 (en) A developer for dry planographic printing plates
ATE93632T1 (de) Fluessige zusammensetzung fuer die reinigung einer oberflaeche von ihr anhaftenden polymeren materialien.
US5629132A (en) Method for engraving and/or etching with image-carrying mask and photo-sensitive laminate film for use in making the mask
US5427890A (en) Photo-sensitive laminate film for use in making the mask comprising a supporting sheet, an image mask protection layer which is water insoluble and a water soluble image mask forming composition
US3632375A (en) Plate for dry planography and method of making same
JPH0769617B2 (ja) 光重合により架橋されるレリ−フ版体の製造方法
US4225663A (en) Driographic printing plate
DK151199B (da) Fremgangsmaade til fremstilling af en fotopolymerdybtryksplade til gravuretrykning
CA1049313A (en) Method for developing a photosensitive resin plate
EP0909991B1 (en) A screen printing stencil
JP4362233B2 (ja) 固体キャップされた(solid−capped)液体フォトポリマー印刷要素
US6500601B1 (en) Method of manufacturing photopolymer plates
US5518857A (en) Image-carrying mask photo-sensitive laminate film for use in making an image carry mask
NL8105657A (nl) Zeefdrukprocede alsmede zeefdrukvorm die geschikt is om daarbij te worden gebruikt.
JP2921093B2 (ja) 水なし平版印刷版用現像液
JPS5914744B2 (ja) 地汚れの防止された印刷版の製造法
JPS6060051B2 (ja) 平版印刷板の製版方法
EP0674229A1 (en) Polymeric composition and method for surface detackification
JPS6153716B2 (enrdf_load_stackoverflow)
JP3033292B2 (ja) 水なし平版印刷版の製版方法
JPH0811365B2 (ja) 彫食刻マスク用感光性積層フイルム
US3874945A (en) Method of fabricating plastic printing plates
JPS61160748A (ja) 感光性樹脂版の製版方法