CA1049313A - Method for developing a photosensitive resin plate - Google Patents
Method for developing a photosensitive resin plateInfo
- Publication number
- CA1049313A CA1049313A CA223,660A CA223660A CA1049313A CA 1049313 A CA1049313 A CA 1049313A CA 223660 A CA223660 A CA 223660A CA 1049313 A CA1049313 A CA 1049313A
- Authority
- CA
- Canada
- Prior art keywords
- suction
- plate
- photosensitive
- exposed
- resin composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
METHOD FOR DEVELOPING A PHOTOSENSITIVE RESIN PLATE
Abstract of the Disclosure A method for developing a photosensitive resin plate after exposure to make an image, which comprises applying suction to the surface of the photosensitive layer of the exposed plate so as to remove the resin composition at the non-exposed and non-hardended portion of the photosensitive layer.
Abstract of the Disclosure A method for developing a photosensitive resin plate after exposure to make an image, which comprises applying suction to the surface of the photosensitive layer of the exposed plate so as to remove the resin composition at the non-exposed and non-hardended portion of the photosensitive layer.
Description
10~93~3 The present invent10n relates to a method for developing a photosensitive resin plate. More part~cularly, it relates to a method for develop$ng a photosensitve resin plate after exposure by the utilization of a suction force.
In developing a photosensitive resin plate after exposure to form an image, there has hitherto been employed a rinsing out method, a.g. spraying a developer on the plate or dippin~ the plate ln a developer while applying ultrasonic waves thereto so as to dissolve or disperse the resin composition at the non-exposed and non-hardened portion of the photosensitive layer on the plate into the developer. The developers used for this purpose are organic solvents, aqueous alkali solutions, water, etc. The rinsing out method, however, produces disadvantage-ausly a large amount of waste liq~or. In case of a photosensitive resln plate having a photosens$tive layer containing an unsaturated polyester, for example, 20 to 40 liters of an aqeuous alkali solution is consumed for developing 10 plates, each having a size of 420 x 594 cm, For this reason, the rinsing out method is always faced with the problem of disposal of waste liquor and requires a special installation for this purpose.
Recently, as a substitute for the rinsing out method, there has been proposed an a~r jet method wherein development is effected by blowing off the resin composition at the non-exposed and non-hardened portion of the photosensitve layer.
Since no developer is used therein, it does not involve any difficult problem occurring from waste liquor or its disposal.
Howéver, it has a different problem such as noise and odor.
It is the ob~ect of the present invent~on to provide a method for developing photosensitve resin plates which overcomes the above problems, ,............... - . . - .
10~313 The method or development o~ this lnvention comprises applying suctlon to the surface of the photosensitive layer of a photosensitive re9in plate after expo~ure to form an image BO .
that the resin composition at the non-exposet and non-hardened portion of the photosensitive layer is removed therefrom.
It i5 applicable to any photosensitive resin plate of which the photosensitive layer is in a liquid or viscous state, for instance, made of a conventional resin composition comprising an unsaturated polyester or an unsaturated polyurethane with a polymerizable monomer thereto, a photosensitizer and a neat polymerization inhibitor.
The lower is the viscosity of the resin ccmposition, the faster the development rate can be. Even with one having a high viscosity up to about 30,000 cp, the elimination of the resin composition at the non-exposed and non-hardened portion may be accomplished to attain the development, although it is however frequently preferred to lower the viscosity of the resin composition by application of heat thereto. To obtain a perfect letterpress, exposure may be again made after completion of the development by removal of the resin composition at the non-exposed and non-hardened portlon with suction.
When a more perfect development i9 required, any post-treatment such as spraying of a developer or wiping with a blottlng paper may be applied after removal of the resin composition at the non-exposed and non-hardened portion with suction. When using a developer for the post-treatment, its amount may be sufficient to eliminate the resin composition remaining after development with suction. Thus, the developer may be used in a very small amount for a much longer period,,in comparison with that to be used ln the rinsing out method.
The application of suction to the surface of the photo-sensltive layer may be effected by facing the said surface to a -10~313 ~uction port through wh~ch 9uctlon 1~ applled while moving elther one of them relative to the other.
A larger suction rate and a higher degree of reduction are favored for attaining the prompt elimination of the resin compo~ition at the non-exposed and non-hardened portion. Among them, a larger suction rate may be rather preferred to a higher degree of reduction.
In order to attain a rapid development, a suction rate of not less than about 0.1 m / min per 1 cm of the suction port is normally desira~le, although the condition is more or less varied with the size of the photosensitive resin plate to be treated, the thickness of the relief, the area of the æuction port, the viscosity of the resin composition and the liXe. The suction rate, as u~ed herein, is intended to mean the value obtained by dividing the exhaust rate of the used - suction pump by the area of the suction port. The shape of the suctlon port may bè any conventional one such as a slit, net or grid. The size of the suction port may be appropriately selected depending on the size of the photosensitive resin plate, the thickness of the relief, the viscosity of the resin composition and the liXe.
A preferred embodiment is illustrated in the drawings in which:
Figure 1 is a perspective view of a suction drum and Figure 2 is a sectional view of the drum and photosensitive plate.
In the drawings, the suction drum (1) is provided with a suctlon port in the form of a slit, and a duct (3), which is connected to a source of suction. The photosensitive resin plate (4) after exposure is moved over the suction port (2) in the direction of the arrow i~n such manner that the photosensitive ' 109~9313 layer ls closely faced to the suction port. In the photosensitve layer, there are the expoeed and hardened portions (5) and the non-exposed and non-hardened port~ons (6). When each of the non-exposed and non-hardened portions reaches on the suction port, the resin compos~tion is removed from the photosensitve resin plate and sucked into the suction drum and retained at the bottom.
Although the suction drum ls fixed and the photosensitive resin plate ls moved in the embodiment shown in Figures 1 and 2, the suction drum may be moved with the photosensitive resin plate being fixed.
By covering the circumference of the suction port with a soft, resilient material such as rubber or polyurethane and bringing the surface of the photosensitive layer into close acce~s to the suction port over the same, the development can be carried out very efficiently without causing any damage to the lmage portion of the photosensitive resin plate. The rate of movement of the plate or the suction port may be more rapid when the vlscosity of the resin composition i5 lower. For this reason, heating of the plate with any heating means provided near the suction port so as to lower the viscosity of the resin composition is favourable for attainment of the rapid and complete development.
On the size of the photosensitive resin plate, there ls no specific limitation. Also, it is applicable to any plate having a relief thickness of from about several microns to several milllmeters.
As understood from the above descriptions, it is an advantageous feature of the invention that large volumes of waste liquor are not produced during development, since the resin compositlon at the non-exposed and non-hardened portion is simply removed by a suctlon force. By the use of an appropriate suction 3~ apparatus, the removed resin composition can be collected and retained therein. Such resin composition may be easily dl8po9ed of, for instance7 by burning beczuse the amount i3 relatively ~mall or s~b~ected to repeated use beca~se 7ao contamination is present therein.
Another advantageous feature of the invention is that, ~lnce the resin composition at the non-exposed and non-hardened portion is sucked one-sidely through the suction port, any adherence of the removed resin composition on any part of the plate does not occ~r so that the development can be accomplished efficiently within a short period of time. In the rinsing out method, the adherence of the sludge of the resin composition dispersed in the developer occurs frequently, and a troublesome operation for eliminating this may become necessary.
A further advantageous feature of the invention is that, since no chemical is used, a high degree of safety is assured from the viewpoint not only of human health but also of flre.
The method of the present invention is utilizable not only for the preparation of a printing plate but also for various other mouldings using photosensitive resins.
A preferred embodiment of the invention is illustrated by the following Example.
EXAMPLE
On an iron plate of 128 x 182 cm in size, a photo-sensitive resin composition containing an unsaturated polyester (9,000 cp) is coated to make a photosensitive layer having a thickrless of 0. 8 mm. On the photosensitive layer of the thus prepared photosensitive resin plate, a negative film sandwiched by a cover film and a glass plate was placed thereon in such a manner that the glass plate is present at the top to make a close contact.
Exposure is effected by, irradiation with an ultravio71et fluorescent .
i(~49313 lamp for 3 mlnutes. The exposed surface i~ closely faced to a ~uctlon port in slit form ~4 mm wide, 15 cm long) provided on a ~uction drum of 8 cm in diameter, which is connected to a suction pump with an exh~ust rate of 3.6 m3 J min and moved over the suction port in about 30 seconds, whereby the res$n composition at the non-exposed and non-hardened portion is eliminated at a rate of 91 X by wei~ht. Then, the thus de~eloped surface is again subjected to exposure by irradiation with an ultraviolet fluorescent lamp for 3 minutes to obtain a complete letterpress.
' 10
In developing a photosensitive resin plate after exposure to form an image, there has hitherto been employed a rinsing out method, a.g. spraying a developer on the plate or dippin~ the plate ln a developer while applying ultrasonic waves thereto so as to dissolve or disperse the resin composition at the non-exposed and non-hardened portion of the photosensitive layer on the plate into the developer. The developers used for this purpose are organic solvents, aqueous alkali solutions, water, etc. The rinsing out method, however, produces disadvantage-ausly a large amount of waste liq~or. In case of a photosensitive resln plate having a photosens$tive layer containing an unsaturated polyester, for example, 20 to 40 liters of an aqeuous alkali solution is consumed for developing 10 plates, each having a size of 420 x 594 cm, For this reason, the rinsing out method is always faced with the problem of disposal of waste liquor and requires a special installation for this purpose.
Recently, as a substitute for the rinsing out method, there has been proposed an a~r jet method wherein development is effected by blowing off the resin composition at the non-exposed and non-hardened portion of the photosensitve layer.
Since no developer is used therein, it does not involve any difficult problem occurring from waste liquor or its disposal.
Howéver, it has a different problem such as noise and odor.
It is the ob~ect of the present invent~on to provide a method for developing photosensitve resin plates which overcomes the above problems, ,............... - . . - .
10~313 The method or development o~ this lnvention comprises applying suctlon to the surface of the photosensitive layer of a photosensitive re9in plate after expo~ure to form an image BO .
that the resin composition at the non-exposet and non-hardened portion of the photosensitive layer is removed therefrom.
It i5 applicable to any photosensitive resin plate of which the photosensitive layer is in a liquid or viscous state, for instance, made of a conventional resin composition comprising an unsaturated polyester or an unsaturated polyurethane with a polymerizable monomer thereto, a photosensitizer and a neat polymerization inhibitor.
The lower is the viscosity of the resin ccmposition, the faster the development rate can be. Even with one having a high viscosity up to about 30,000 cp, the elimination of the resin composition at the non-exposed and non-hardened portion may be accomplished to attain the development, although it is however frequently preferred to lower the viscosity of the resin composition by application of heat thereto. To obtain a perfect letterpress, exposure may be again made after completion of the development by removal of the resin composition at the non-exposed and non-hardened portlon with suction.
When a more perfect development i9 required, any post-treatment such as spraying of a developer or wiping with a blottlng paper may be applied after removal of the resin composition at the non-exposed and non-hardened portion with suction. When using a developer for the post-treatment, its amount may be sufficient to eliminate the resin composition remaining after development with suction. Thus, the developer may be used in a very small amount for a much longer period,,in comparison with that to be used ln the rinsing out method.
The application of suction to the surface of the photo-sensltive layer may be effected by facing the said surface to a -10~313 ~uction port through wh~ch 9uctlon 1~ applled while moving elther one of them relative to the other.
A larger suction rate and a higher degree of reduction are favored for attaining the prompt elimination of the resin compo~ition at the non-exposed and non-hardened portion. Among them, a larger suction rate may be rather preferred to a higher degree of reduction.
In order to attain a rapid development, a suction rate of not less than about 0.1 m / min per 1 cm of the suction port is normally desira~le, although the condition is more or less varied with the size of the photosensitive resin plate to be treated, the thickness of the relief, the area of the æuction port, the viscosity of the resin composition and the liXe. The suction rate, as u~ed herein, is intended to mean the value obtained by dividing the exhaust rate of the used - suction pump by the area of the suction port. The shape of the suctlon port may bè any conventional one such as a slit, net or grid. The size of the suction port may be appropriately selected depending on the size of the photosensitive resin plate, the thickness of the relief, the viscosity of the resin composition and the liXe.
A preferred embodiment is illustrated in the drawings in which:
Figure 1 is a perspective view of a suction drum and Figure 2 is a sectional view of the drum and photosensitive plate.
In the drawings, the suction drum (1) is provided with a suctlon port in the form of a slit, and a duct (3), which is connected to a source of suction. The photosensitive resin plate (4) after exposure is moved over the suction port (2) in the direction of the arrow i~n such manner that the photosensitive ' 109~9313 layer ls closely faced to the suction port. In the photosensitve layer, there are the expoeed and hardened portions (5) and the non-exposed and non-hardened port~ons (6). When each of the non-exposed and non-hardened portions reaches on the suction port, the resin compos~tion is removed from the photosensitve resin plate and sucked into the suction drum and retained at the bottom.
Although the suction drum ls fixed and the photosensitive resin plate ls moved in the embodiment shown in Figures 1 and 2, the suction drum may be moved with the photosensitive resin plate being fixed.
By covering the circumference of the suction port with a soft, resilient material such as rubber or polyurethane and bringing the surface of the photosensitive layer into close acce~s to the suction port over the same, the development can be carried out very efficiently without causing any damage to the lmage portion of the photosensitive resin plate. The rate of movement of the plate or the suction port may be more rapid when the vlscosity of the resin composition i5 lower. For this reason, heating of the plate with any heating means provided near the suction port so as to lower the viscosity of the resin composition is favourable for attainment of the rapid and complete development.
On the size of the photosensitive resin plate, there ls no specific limitation. Also, it is applicable to any plate having a relief thickness of from about several microns to several milllmeters.
As understood from the above descriptions, it is an advantageous feature of the invention that large volumes of waste liquor are not produced during development, since the resin compositlon at the non-exposed and non-hardened portion is simply removed by a suctlon force. By the use of an appropriate suction 3~ apparatus, the removed resin composition can be collected and retained therein. Such resin composition may be easily dl8po9ed of, for instance7 by burning beczuse the amount i3 relatively ~mall or s~b~ected to repeated use beca~se 7ao contamination is present therein.
Another advantageous feature of the invention is that, ~lnce the resin composition at the non-exposed and non-hardened portion is sucked one-sidely through the suction port, any adherence of the removed resin composition on any part of the plate does not occ~r so that the development can be accomplished efficiently within a short period of time. In the rinsing out method, the adherence of the sludge of the resin composition dispersed in the developer occurs frequently, and a troublesome operation for eliminating this may become necessary.
A further advantageous feature of the invention is that, since no chemical is used, a high degree of safety is assured from the viewpoint not only of human health but also of flre.
The method of the present invention is utilizable not only for the preparation of a printing plate but also for various other mouldings using photosensitive resins.
A preferred embodiment of the invention is illustrated by the following Example.
EXAMPLE
On an iron plate of 128 x 182 cm in size, a photo-sensitive resin composition containing an unsaturated polyester (9,000 cp) is coated to make a photosensitive layer having a thickrless of 0. 8 mm. On the photosensitive layer of the thus prepared photosensitive resin plate, a negative film sandwiched by a cover film and a glass plate was placed thereon in such a manner that the glass plate is present at the top to make a close contact.
Exposure is effected by, irradiation with an ultravio71et fluorescent .
i(~49313 lamp for 3 mlnutes. The exposed surface i~ closely faced to a ~uctlon port in slit form ~4 mm wide, 15 cm long) provided on a ~uction drum of 8 cm in diameter, which is connected to a suction pump with an exh~ust rate of 3.6 m3 J min and moved over the suction port in about 30 seconds, whereby the res$n composition at the non-exposed and non-hardened portion is eliminated at a rate of 91 X by wei~ht. Then, the thus de~eloped surface is again subjected to exposure by irradiation with an ultraviolet fluorescent lamp for 3 minutes to obtain a complete letterpress.
' 10
Claims (5)
PROPERTY OR PRIVILGE IS CLAIMED ARE DEFINED AS FOLLOWS:
1. A method for developing a photosensitive resin plate after exposure to make an image, which comprises applying suction to the surface of the photosensitive layer of the exposed plate 80 as to remove-the resin composition at the non-exposed and non-hardened portion of the photosensitive layer.
2. The method according to claim 1, wherein the application of the section is effected by facing the surface of the photosensitve layer in close proximity to a suction port, through which the suction force is applied, while moving either one of said layer and port relative to the other.
3. The method according to claim 2, wherein the suction port is provided in a slit form on a suction drum.
4. The method according to claim 2 wherein a suction rate of at least 0.1 m3 / min per / cm2 of suction port is applied.
5. The method according to claim 1, 2 or 3 wherein the resin is an unsaturated polyester,
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4678574A JPS50139741A (en) | 1974-04-24 | 1974-04-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1049313A true CA1049313A (en) | 1979-02-27 |
Family
ID=12756972
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA223,660A Expired CA1049313A (en) | 1974-04-24 | 1975-04-02 | Method for developing a photosensitive resin plate |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS50139741A (en) |
| CA (1) | CA1049313A (en) |
| DE (1) | DE2518274A1 (en) |
| FR (1) | FR2280109A1 (en) |
| GB (1) | GB1483716A (en) |
| IT (1) | IT1032728B (en) |
| NL (1) | NL7504882A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52113807A (en) * | 1976-03-19 | 1977-09-24 | Ube Industries | Apparatus for treating photoosensitive resin plate |
| DE3424187A1 (en) * | 1984-06-30 | 1986-01-09 | Basf Ag, 6700 Ludwigshafen | METHOD FOR PRODUCING A RESIST PATTERN |
| JP2516866B2 (en) * | 1991-12-10 | 1996-07-24 | 株式会社白興商会 | Hanger for packaging shirts, shirt packaging method using the hanger, and simple packaging device |
| JP2003021916A (en) * | 2001-06-21 | 2003-01-24 | Agfa Gevaert Nv | Method for developing lithographic printing plate precursor |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS541201B2 (en) * | 1973-12-25 | 1979-01-22 |
-
1974
- 1974-04-24 JP JP4678574A patent/JPS50139741A/ja active Pending
-
1975
- 1975-04-02 CA CA223,660A patent/CA1049313A/en not_active Expired
- 1975-04-14 FR FR7511555A patent/FR2280109A1/en active Granted
- 1975-04-21 IT IT6802575A patent/IT1032728B/en active
- 1975-04-22 GB GB1662575A patent/GB1483716A/en not_active Expired
- 1975-04-24 NL NL7504882A patent/NL7504882A/en not_active Application Discontinuation
- 1975-04-24 DE DE19752518274 patent/DE2518274A1/en not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| GB1483716A (en) | 1977-08-24 |
| NL7504882A (en) | 1975-10-28 |
| FR2280109A1 (en) | 1976-02-20 |
| JPS50139741A (en) | 1975-11-08 |
| IT1032728B (en) | 1979-06-20 |
| FR2280109B1 (en) | 1979-07-13 |
| DE2518274A1 (en) | 1975-11-06 |
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