GB1483716A - Method for the development of an exposed photosensitive resin surface - Google Patents

Method for the development of an exposed photosensitive resin surface

Info

Publication number
GB1483716A
GB1483716A GB1662575A GB1662575A GB1483716A GB 1483716 A GB1483716 A GB 1483716A GB 1662575 A GB1662575 A GB 1662575A GB 1662575 A GB1662575 A GB 1662575A GB 1483716 A GB1483716 A GB 1483716A
Authority
GB
United Kingdom
Prior art keywords
development
resin
exposed
port
april
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1662575A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of GB1483716A publication Critical patent/GB1483716A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1483716 Developing photohardenable resin surfaces SUMITOMO CHEMICAL CO Ltd 22 April 1975 [24 April 1974] 16625/75 Heading G2X An exposed photohardenable resin surface, e.g. of a printing plate, is developed by removal of resin at the non-exposed and non-hardened areas by bringing the exposed surface into close proximity with a port through which suction is applied. The surface and the port are preferably moved relative to each other. The perimeter of the port, which may comprise a slit in a cylinder from which air is continuously removed, may have a covering of an elastic material such as rubber or a polyurethane resin. The surface may be heated to lower the viscosity of the resin for development, and a second exposure may be made after development. A post-development treatment by spraying with liquid developer or by wiping with blotting paper may be given.
GB1662575A 1974-04-24 1975-04-22 Method for the development of an exposed photosensitive resin surface Expired GB1483716A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4678574A JPS50139741A (en) 1974-04-24 1974-04-24

Publications (1)

Publication Number Publication Date
GB1483716A true GB1483716A (en) 1977-08-24

Family

ID=12756972

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1662575A Expired GB1483716A (en) 1974-04-24 1975-04-22 Method for the development of an exposed photosensitive resin surface

Country Status (7)

Country Link
JP (1) JPS50139741A (en)
CA (1) CA1049313A (en)
DE (1) DE2518274A1 (en)
FR (1) FR2280109A1 (en)
GB (1) GB1483716A (en)
IT (1) IT1032728B (en)
NL (1) NL7504882A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52113807A (en) * 1976-03-19 1977-09-24 Ube Industries Apparatus for treating photoosensitive resin plate
DE3424187A1 (en) * 1984-06-30 1986-01-09 Basf Ag, 6700 Ludwigshafen METHOD FOR PRODUCING A RESIST PATTERN
JP2516866B2 (en) * 1991-12-10 1996-07-24 株式会社白興商会 Hanger for packaging shirts, shirt packaging method using the hanger, and simple packaging device
JP2003021916A (en) * 2001-06-21 2003-01-24 Agfa Gevaert Nv Method for developing lithographic printing plate precursor

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS541201B2 (en) * 1973-12-25 1979-01-22

Also Published As

Publication number Publication date
CA1049313A (en) 1979-02-27
NL7504882A (en) 1975-10-28
FR2280109A1 (en) 1976-02-20
JPS50139741A (en) 1975-11-08
IT1032728B (en) 1979-06-20
FR2280109B1 (en) 1979-07-13
DE2518274A1 (en) 1975-11-06

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee