CA1026220A - Method for stripping layers of organic material - Google Patents

Method for stripping layers of organic material

Info

Publication number
CA1026220A
CA1026220A CA199,318A CA199318A CA1026220A CA 1026220 A CA1026220 A CA 1026220A CA 199318 A CA199318 A CA 199318A CA 1026220 A CA1026220 A CA 1026220A
Authority
CA
Canada
Prior art keywords
organic material
stripping layers
stripping
layers
organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA199,318A
Other languages
English (en)
French (fr)
Other versions
CA199318S (en
Inventor
Theodor Vogtmann
Wolfgang Beck
Friedrich C. Brunner
Friedrich W. Schwerdt
Peter U. Frasch
Blanka Ivancic
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of CA1026220A publication Critical patent/CA1026220A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
    • H10P50/286—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of organic materials
    • H10P50/287—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of organic materials by chemical means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
CA199,318A 1973-05-24 1974-05-08 Method for stripping layers of organic material Expired CA1026220A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2326447A DE2326447C2 (de) 1973-05-24 1973-05-24 Verfahren zum Entfernen von Schichten aus organischem Material und seine Verwendung

Publications (1)

Publication Number Publication Date
CA1026220A true CA1026220A (en) 1978-02-14

Family

ID=5881998

Family Applications (1)

Application Number Title Priority Date Filing Date
CA199,318A Expired CA1026220A (en) 1973-05-24 1974-05-08 Method for stripping layers of organic material

Country Status (6)

Country Link
JP (1) JPS5231712B2 (https=)
CA (1) CA1026220A (https=)
DE (1) DE2326447C2 (https=)
FR (1) FR2231110B1 (https=)
GB (1) GB1427482A (https=)
IT (1) IT1006475B (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57186330A (en) * 1981-05-12 1982-11-16 Matsushita Electronics Corp Removing method for photoresist
JPS6053954A (ja) * 1983-09-05 1985-03-28 Oki Electric Ind Co Ltd フォトマスク洗浄方法
EP0256284B1 (en) * 1986-08-09 1991-03-27 Micro-Image Technology Limited Composition for use in the production of integrated circuits and method for its preparation and use
US4872919A (en) * 1988-01-28 1989-10-10 The Procter & Gamble Company Method for removing precipitated calcium citrate from juice pasteurization or sterilization equipment
JPH0294911A (ja) * 1988-09-30 1990-04-05 Toshiba Corp 弾性表面波素子の製造方法
JP3152430B2 (ja) * 1990-10-09 2001-04-03 クロリンエンジニアズ株式会社 有機物被膜の除去方法

Also Published As

Publication number Publication date
FR2231110B1 (https=) 1979-02-16
DE2326447A1 (de) 1974-12-12
JPS5021681A (https=) 1975-03-07
DE2326447C2 (de) 1986-02-06
IT1006475B (it) 1976-09-30
GB1427482A (en) 1976-03-10
FR2231110A1 (https=) 1974-12-20
JPS5231712B2 (https=) 1977-08-16

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